Patents Assigned to Entegris, In.
  • Germanium tetraflouride and hydrogen mixtures for an ion implantation system
    Patent number: 11299802
    Abstract: The current disclosure is directed to methods and assemblies configured to deliver a mixture of germanium tetrafluoride (GeF4) and hydrogen (H2) gases to an ion implantation apparatus, so H2 is present in an amount in the range of 25%-67% (volume) of the gas mixture, or the GeF4 and H2 are present in a volume ratio (GeF4:H2) in the range of 3:1 to 33:67. The use of the H2 gas in an amount in mixture or relative to the GeF4 gas prevents the volatilization of cathode material, thereby improving performance and lifetime of the ion implantation apparatus. Gas mixtures according to the disclosure also result in a significant Ge+ current gain and W+ peak reduction during an ion implantation procedure.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: April 12, 2022
    Assignee: ENTEGRIS, INC.
    Inventors: Oleg Byl, Ying Tang, Joseph R. Despres, Joseph Sweeney, Sharad N. Yedave
  • Coated porous polymeric membranes
    Patent number: 11285443
    Abstract: The present disclosure provides a porous polymeric membrane that is coated with a cross-linked polymerized monomer. The coating on the porous polymeric membrane has a charge when it is immersed in an organic liquid. The coated porous polymeric membrane, a filter utilizing the membrane, and a method for treating an organic liquid used for photoresist with the coated porous polymeric membrane to remove metal contaminants from the organic liquid are disclosed.
    Type: Grant
    Filed: May 26, 2017
    Date of Patent: March 29, 2022
    Assignee: ENTEGRIS, INC.
    Inventors: Jad Ali Jaber, Saksatha Ly, James Hamzik, Testu Kohyama
  • Valve and valve member for controlling fluid flow
    Patent number: 11280429
    Abstract: This application provides a valve member that includes a diaphragm portion and a valve head attachable to the diaphragm portion. The valve head includes an engagement portion configured to engage with a valve seat defined in the valve. The engagement portion is formed of a melt processable material that contains at least one fluoropolymer. The diaphragm portion is formed of a material that is non-melt processable and contains at least one fluoropolymer. This application also provides a valve that includes the valve member and a passageway with the valve seat. The valve head is configured to be moveable relative to the valve seat.
    Type: Grant
    Filed: December 9, 2019
    Date of Patent: March 22, 2022
    Assignee: ENTEGRIS, INC.
    Inventor: John A. Leys
  • Grafted polysulfone membranes
    Patent number: 11273436
    Abstract: A polysulfone membrane is modified so that monomers are grafted onto the surface of the membrane. The polysulfone membranes can be grafted by contacting the membrane with a grafting solution and exposing the membrane to electromagnetic radiation, typically within the ultraviolet portion of the spectrum. The monomers that are grafted are typically anionic or cationic. The grafted membranes can be used for filtering impurities, such as positively and negatively charged particles, from a liquid. Anionic membranes provide improved filtration of negatively charged impurities, while cationic membranes provide improved filtration of positively charged impurities.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: March 15, 2022
    Assignee: ENTEGRIS, INC.
    Inventors: Jad Ali Jaber, Alketa Gjoka, Saksatha Ly
  • Sintered porous material having nodes and fibers of different materials, with different sintering points, and related methods of preparation and use
    Patent number: 11273492
    Abstract: Described are porous sintered metal bodies, methods of making and using the porous sintered metal bodies, and methods of using the porous sintered metal bodies for commercial applications that include filtering a fluid, including in applications requiring high efficiency (high LRV) filtration.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: March 15, 2022
    Assignee: ENTEGRIS, INC.
    Inventor: Robert S. Zeller
  • Active wet scrubbing filtration system
    Patent number: 11260336
    Abstract: An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: March 1, 2022
    Assignee: ENTEGRIS, INC.
    Inventors: Tyler Moulton, James Britto, Thomas Leblanc, John C. Gaudreau
  • Latching mechanism for a substrate container
    Patent number: 11211274
    Abstract: A substrate container that utilizes a rocker linkage or a linear cam arrangement in latch mechanism that is actuated by a rotary cam. The rocker linkage or linear cam is mounted to an interior panel of a door of the substrate container and may be disposed proximate an edge portion of the interior panel. The rocker linkage or linear cam may be configured to exert an axial force component on a housing of the substrate container to seat the door against a seal member. The rocker linkage or linear cam also transfers the axial latching forces to the door to reduce transfer of forces to the cam. The rocker linkage or linear cam may be arranged to transfer axial forces in a radially outward direction when the latch mechanism is engaged, to prevent push back on the rotary cam.
    Type: Grant
    Filed: May 26, 2017
    Date of Patent: December 28, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Russ V. Raschke, Jason Steffens
  • Preparation of triiodosilanes
    Patent number: 11203604
    Abstract: Provided is a process for preparing certain silane precursor compounds, e.g., triiodosilane from trichlorosilane utilizing lithium iodide in powder form and catalyzed by tertiary amines. The process provides triiodosilane in high yields and high purity. Triiodosilane is a precursor compound useful in the atomic layer deposition of silicon onto various microelectronic device structures.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: December 21, 2021
    Assignee: Entegris, Inc.
    Inventors: David Kuiper, Manish Khandelwal, Thomas M. Cameron, Thomas H. Baum, John Cleary
  • Compositions and methods for removing ceria particles from a surface
    Patent number: 11164738
    Abstract: A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, or tungsten-containing materials.
    Type: Grant
    Filed: January 18, 2018
    Date of Patent: November 2, 2021
    Assignee: Entegris, Inc.
    Inventors: Daniela White, Thomas Parson, Michael White, Emanuel I. Cooper, Atanu Das
  • Gas filter
    Patent number: 11154811
    Abstract: A gas filter includes a housing including a mounting portion and a main portion. The mounting portion is configured to mount the gas filter on a surface of a device. The main portion is configured to be positioned apart from the surface of the device and extends from the mounting portion in a horizontal direction. The housing has an inlet and an outlet and defines a flow channel between the inlet and the outlet. The flow channel has first and second channel portions, the first channel portion extending from the inlet to the second channel portion, the second channel portion extending in a direction substantially parallel to the horizontal direction. A filter member is positioned in the flow channel between the inlet and the outlet.
    Type: Grant
    Filed: April 3, 2017
    Date of Patent: October 26, 2021
    Assignee: Entegris, Inc.
    Inventor: Yuki Nakamura
  • Selectively etching materials
    Patent number: 11152219
    Abstract: A method of selectively removing aluminium oxide or nitride material from a microelectronic substrate, the method comprising contacting the material with an aqueous etching composition comprising: an etchant comprising a source of fluoride; and a metal corrosion inhibitor; wherein the composition has a pH in the range of from 3 to 8. Aqueous etching compositions and uses are also described.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: October 19, 2021
    Assignee: Entegris, Inc.
    Inventors: Chieh Ju Wang, Hsing-Chen Wu, Chia-Jung Hsu
  • Cleaning composition with corrosion inhibitor
    Patent number: 11149235
    Abstract: A cleaning composition and process for cleaning an in-process microelectronic device substrate, e.g., by post-chemical mechanical polishing (CMP) cleaning, to remove residue from a surface thereof, wherein the cleaning composition may be especially effective for cleaning a substrate surface that includes exposed metal such as cobalt, copper, or both, along with dielectric or low k dielectric material, and wherein the cleaning composition includes corrosion inhibitor to inhibit corrosion of the exposed metal.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: October 19, 2021
    Assignee: Entegris, Inc.
    Inventors: Daniela White, Elizabeth Thomas, Jun Liu, Michael White, Chao-Yu Wang, Donald Frye
  • Valve system with position indicator
    Patent number: 11143329
    Abstract: A valve system having a valve position indicator is disclosed. The valve position indicator allows for viewing of the valve position from one or more viewing locations. In one example, the valve position indicator includes a side valve open/close indicator and a top valve open/close indicator on a valve assembly. An indicator locking mechanism securely locks the valve position indicator in alignment with a position of a control valve.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: October 12, 2021
    Assignee: Entegris, Inc.
    Inventors: Christopher Scannell, Joseph R. Despres, Pascal Chir, Paul Muzzo
  • Tamper-resistant chemical reagent package
    Patent number: 11136169
    Abstract: A tamper-resistant containment package is described, including a container; a cover configured to engage with the container so that the container and cover form an enclosed volume; and at least one tamper-resistant mechanical fastener that is cooperative with the cover and container to render the containment package tamper-resistant when the container and cover are engaged in a sealed state isolating the enclosed volume from an ambient environment surrounding the containment package. Such containment package is usefully employed for storage and transport of chemical reagents that pose a health, safety, and/or environmental risk if released to an exterior environment of the containment package.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: October 5, 2021
    Assignee: Entegris, Inc.
    Inventors: Thomas B. Chatterton, Jacob Thomas
  • Ion implantation system with mixture of arc chamber materials
    Patent number: 11139145
    Abstract: A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.
    Type: Grant
    Filed: June 17, 2020
    Date of Patent: October 5, 2021
    Assignee: Entegris, Inc.
    Inventors: Ying Tang, Sharad N. Yedave, Joseph R. Despres, Joseph D. Sweeney, Oleg Byl
  • Fluidized granular absorbent bed filter
    Patent number: 11123681
    Abstract: Described are filter products and methods of using filter products, wherein the filter products include multiple cells, each cell containing an individual circulating fluidized beds during use.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: September 21, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Tyler Moulton, James Britto
  • Non-amine post-CMP compositions and method of use
    Patent number: 11127587
    Abstract: An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The compositions achieve highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material, copper interconnect material, or cobalt-containing materials.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: September 21, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Jun Liu, Elizabeth Thomas, Donald Frye
  • Post chemical mechanical polishing cleaning compositions
    Patent number: 11124740
    Abstract: A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, or tungsten-containing materials.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: September 21, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Atanu K. Das, Michael White, Daniela White
  • Post CMP cleaning composition
    Patent number: 11124746
    Abstract: The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: September 21, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Daniela White, Michael White, Jun Liu, Elizabeth Thomas
  • Ceria removal compositions
    Patent number: 11124741
    Abstract: The present invention generally relates to a removal composition and process, particularly useful for cleaning ceria particles and CMP contaminants from microelectronic devices having said particles and CMP contaminants thereon, in particular microelectronic devices having PETEOS, Silicon Nitride, and Poly-Si substrates. In one aspect, the invention provides treatment of the microelectronic substrate having ceria particles thereon utilizing complexing agents free of Sulfur and Phosphorous atoms.
    Type: Grant
    Filed: February 5, 2020
    Date of Patent: September 21, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Atanu K. Das, Michael White, Daniela White