Abstract: A memory erasing method and a driving circuit thereof are introduced, when cells are selected to be erased, the method includes setting gates of cells which are not selected to be erased and are located at a selected block, drains of all the cells in a selected bank, and the gate of the unselected cells to be floating; supplying a positive voltage to all the sources in a selected bank and their shared P well and N well; and supplying a negative voltage to the gates of the cells located in a selected block and selected to be erased. Accordingly, a positive coupling voltage from P wells is received whenever gates are floating, so as to inhibit erasure of unselected blocks and thereby streamline decoding, thus making it easy to attain further expansion of blocks or banks with a small layout area and partition of sectors in the blocks.

Abstract: A method of identifying a damaged bitline address in a non-volatile memory device is introduced. The non-volatile memory device includes a memory cell array and a plurality of bit lines crossing the memory cell array. Each bit line has a first end and a second end. The bit lines are divided into a first group and a second group. The method includes applying a source voltage (charging) or ground voltage (discharging) to a specific group of bit lines, testing the bit lines in two testing stages (open-circuit testing and short-circuit testing) by the principle that no damaged bit line can be charged or discharged, and acquiring an address data of a damaged bit line according to a status data stored in a page buffering circuit and related to whether a bit line is damaged, thereby dispensing with a calculation process for estimating the address of the damaged bit line.

Abstract: A semiconductor device and a method for accelerating erase verification process thereof are introduced, in which a correction unit of erase verification is connected between broken bit lines of the semiconductor device and a page buffer. Grounding switches in the correction unit of erase verification are allowed to connect the broken bit lines to ground during an erase verification process by means of a specific circuit arrangement with respect to the broken lines. Thereby, the earth voltage is received, and further, that the broken bit lines pass the erase verification is identified by the page buffer, further saving time consumed in repeated verifications in the conventional technology significantly.

Abstract: A non-volatile memory having discrete isolation structures and SONOS memory cells, a method of operating the same, and a method of manufacturing the same are introduced. Every isolation structure on a semiconductor substrate having an array region has a plurality of gaps so as to form discrete isolation structures and thereby implant source lines in the gaps of the semiconductor substrate. Since the source lines are not severed by the isolation structures, the required quantity of barrier pins not connected to the source line is greatly reduced, thereby reducing the space required for the barrier pins in the non-volatile memory.

Abstract: In a local word line driver of an NOR flash memory and its flash memory array device, the local word line driver is provided for driving a local word line in a sector of a memory array, and the local word line driver has two transistors including a first transistor and a second transistors, and the first and second transistors are NMOS transistors, and thus achieving the effects of reducing the area occupied by circuits on the local word line driver and the die size, and saving the area for the use by memory units.

Abstract: A power reset circuit with zero standby current consumption includes a power storage unit, first, second, and third voltage detection units, a switching unit, and a power reset unit. The power storage unit stores electric power by a supply voltage source. The first, second, and third voltage detection units are connected to the supply voltage source to start a switching circuit of the first, second, and third voltage detection units in accordance with a change in a normal supply stage, a shutdown stage, and a voltage ramp-up stage of the supply voltage source, control a voltage level of the power reset unit, and thereby generate the power reset signal. Accordingly, the power reset circuit does not consume current in a standby state (the normal supply stage of the supply voltage source) and thus is characterized by zero current consumption.

Abstract: A method of testing bitlines in a non-volatile memory device is introduced. The non-volatile memory device includes a memory cell array and a plurality of bitlines crossing the memory cell array. Each of the bitlines has a first end and a second end. The bitlines are divided into a first group and a second group. The testing method includes applying a supply voltage (for charging) or a ground voltage (for discharging) to a specific group of bitlines. The bitlines are tested in two testing stages, namely an open-circuit bitline test and a short-circuit bitline test, based on the feature that a defective bitline cannot be charged or discharged. The open-circuit bitline test and the short-circuit bitline test are quick and dispense with a lengthy programmed/erasing process.

Abstract: In a manufacturing method of a flash memory structure with a stress area, a better stress effect can be achieved by controlling the manufacturing process of a tunneling oxide layer formed in a gate structure and contacted with a silicon substrate, so that an L-shaped spacer (or a first stress area) and a contact etch stop layer (or a second stress area) of each L-shaped spacer are formed between two gate structures and aligned towards each other to enhance the carrier mobility of the gate structure, so as to achieve the effects of improving a read current, obtaining the required read current by using a lower read voltage, reducing the possibility of having a stress-induced leakage current, and enhancing the data preservation of the flash memory.

Abstract: A multi-level cell NOR flash memory device includes a plurality of gate lines, a plurality of source regions, a plurality of drain regions, a plurality of source lines, a plurality of bitlines, and a plurality of power lines. The bitlines each have a specific sheet resistance. A specific number of the bitlines are disposed between two adjacent ones of the power lines. Accordingly, the multi-level cell NOR flash memory device is of a high transconductance and uniformity and thereby features an enhanced conforming rate.

Abstract: A wordline internal current leakage self-detection method, system and a computer-readable storage medium thereof employ the originally existed high voltage supply unit and the voltage detector connected to the wordline in the flash memory device, in which the high voltage supply unit applies the test signal to the selected wordline, and the voltage detector detects the voltage signal of the wordline. By comparing the test signal with the voltage signal, the wordline will be indicated as current leakage when the voltage signal is lower than the test signal.

Abstract: A multi-level cell NOR flash memory device includes a plurality of gate lines, a plurality of source regions, a plurality of drain regions, a plurality of source lines, a plurality of bitlines, and a plurality of power lines. The bitlines each have a specific sheet resistance. A specific number of the bitlines are disposed between two adjacent ones of the power lines. Accordingly, the multi-level cell NOR flash memory device is of a high transconductance and uniformity and thereby features an enhanced conforming rate.

Abstract: A manufacturing method of a multi-level cell NOR flash memory includes the steps of forming a memory cell area and a peripheral circuit area with the same depth of a shallow trench isolation structure, and the depth ranges from 2400 ? to 2700 ?; forming a non-self-aligned gate structure; performing a self-alignment source manufacturing process; and forming a common source area and a plurality of drain areas. The manufacturing method achieves a high integration density between components and provides a better thermal budget and a better dosage control to the multi-level cell NOR flash memory to improve the production yield rate.

Abstract: In a method of manufacturing a non-volatile memory cell, a self-aligned metal silicide is used in place of a conventional tungsten metal layer to form a polysilicon gate, and the self-aligned metal silicide is used as a connection layer on the polysilicon gate. By using the self-aligned metal silicide to form the polysilicon gate, the use of masks in the etching process may be saved to thereby enable simplified manufacturing process and accordingly, reduced manufacturing cost. Meanwhile, the problem of resistance shift caused by an oxidized tungsten metal layer can be avoided.

Abstract: A flash memory apparatus includes a plurality of memory sectors and a plurality of path transistors, and each memory sector has a local low voltage line, and each path transistor corresponds to one of the memory sectors, and the path transistors are installed in an alignment direction of the memory sectors. One of the path transistors is installed between two adjacent memory sectors, whose gate is connected to a sector select signal line, and whose drain is connected to the local low voltage line of the corresponding memory sector, and whose source is connected to a global low voltage line, and the global low voltage line is installed at an angle substantially equal to 90 degrees across the gate, so as to save the area occupied by peripheral circuits in the path transistors, and lower the manufacturing cost of the flash memory apparatus.

Abstract: A manufacturing method of a NOR flash memory with phosphorous and arsenic ion implantations mainly implants both phosphorous and arsenic ions on a drain area of a transistor memory unit, and controls specific energy and dosage for the implantation to reduce the defects of a memory device and improve the yield rate of the NOR flash memory.

Abstract: In a method of manufacturing a double-implant NOR flash memory structure, a phosphorus ion implantation process is performed, so that a P-doped drain region is formed in a semiconductor substrate between two gate structures to overlap with a highly-doped drain (HDD) region and a lightly-doped drain (LDD) region. Therefore, the electric connection at a junction between the HDD region and the LDD region is enhanced and the carrier mobility in the memory is not lowered while the problems of short channel effect and punch-through of LDD region are solved.

Abstract: A semiconductor memory structure with stress regions includes a substrate defining a first and a second device zone; a first and a second stress region formed in each of the first and second device zone to yield stress different in level; a barrier plug separating the two device zones from each other; and a plurality of oxide spacers being located between the first stress regions and the barrier plug while in direct contact with the first stress regions. Due to the stress yielded at the stress regions, increased carrier mobility and accordingly, increased reading current can be obtained, and only a relatively lower reading voltage is needed to obtain an initially required reading current. As a result, the probability of stress-induced leakage current is reduced to enhance the data retention ability.

Abstract: A non-volatile semiconductor manufacturing method comprises the steps of making element isolation/insulation films that partitions element-forming regions in a semiconductor substrate; stacking a floating gate on the semiconductor substrate via a first gate insulating film; stacking a second gate insulating film formed on the floating gate, and stacking a control gate formed on the floating gate via the second gate insulating film, and self-aligning source and drain diffusion area with the control gate. In the process of stacking a floating gate by partially etching a field oxide film in a select gate area, followed by floating gate formed in a element-forming region and select gate region, and followed by a chemical mechanical polish(CMP) process, both floating gate and select gate is hereby formed simultaneously. Thereby, when memory cells are miniaturized, the invention allows the process to be simple and reduce the defect density.

Abstract: A manufacturing method of a NOR flash memory with phosphorous and arsenic ion implantations mainly implants both phosphorous and arsenic ions on a drain area of a transistor memory unit, and controls specific energy and dosage for the implantation to reduce the defects of a memory device and improve the yield rate of the NOR flash memory.

Abstract: A method for fabricating a NOR semiconductor memory structure includes: performing a deeply doped source ion implantation process and a lightly doped drain ion implantation process; forming oxide layer walls on two said sides of a gate structure, respectively; performing a pocket implant process with control of an incident angle thereof; and performing a deeply doped drain ion implantation process. Characteristics of the NOR semiconductor memory structure are improved by controllably changing the position of a pocket implant region.