Patents Assigned to Etec Systems, Inc.
  • Patent number: 5180230
    Abstract: A linear bearing assembly comprising sets of guides (ways) for guiding rolling elements (ball bearings or rollers) constrained within a cage. Typically, two sets of rolling elements and cages are used between a moving part and a stationary part. Each set has four resilient elements (springs) with one end of each spring anchored to the cage and with the other ends of two springs anchored to the stationary way or part and the other ends of the other two springs are anchored to the movable way or part. This arrangement provides a restoring spring force that gradually forces the cage to its correct tracking position. If the cage is tracking properly, the spring forces cancel out and there is no inherent rubbing in the restoring mechanism.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: January 19, 1993
    Assignee: ETEC Systems, Inc.
    Inventors: Donald J. McCarthy, deceased, Manuel Pastor
  • Patent number: 5177402
    Abstract: An arc suppressor is provided for an electron gun of the type used e.g. in semiconductor lithography equipment. The arc suppressor prevents damaging emission properties of the electron gun either due to variation of the cathode work function or any damage to the emitter apex. The arc suppressor includes a resistance and an inductor in series with each electrode lead providing voltage or current to the various electrodes of the electron gun. The inductance is provided by a ferrite toroid which contains a plurality of holes in addition to the main central hole. The leads for each electrode are wrapped around the toroid through the various holes, with one hole being provided for each lead. Thus advantageously each lead is isolated magnetically from the others, reducing the transformer and capacitive effects that couple one lead to another.
    Type: Grant
    Filed: January 3, 1992
    Date of Patent: January 5, 1993
    Assignee: ETEC Systems, Inc.
    Inventors: Glen E. Howard, Mark A. Gesley
  • Patent number: 5136166
    Abstract: A thermally stable magnetic deflection assembly for use in an electron or particle beam machine with several separately potted magnetic coils spaced apart and arranged in a particular vertical position on a central pipe. Non metallic, low coefficient of thermal expansion, highly thermally conductive materials are used throughout and means are provided for maintaining the entire assembly at a desired temperature. Also disclosed is a method of making a thermally stable magnetic deflection assembly.
    Type: Grant
    Filed: January 31, 1991
    Date of Patent: August 4, 1992
    Assignee: ETEC Systems, Inc.
    Inventor: Lydia J. Young
  • Patent number: 5103101
    Abstract: A method for a raster scan particle or light beam lithography system for writing in multiple passes interleaved in such a manner as to achieve a composite result nearly identical to normal single pass raster scan writing with overlapped spots. Multiple pass writing, achieved with little or no degradation or throughput or lithography quality, provides an ideal platform for implementation of known image averaging techniques to improve lithography quality. This technique is combined with the known writing technique of "Virtual Addressing" to improve resolution with little or no degradation of throughput.
    Type: Grant
    Filed: March 4, 1991
    Date of Patent: April 7, 1992
    Assignee: Etec Systems, Inc.
    Inventors: C. Neil Berglund, John R. Thomas, John T. Poreda
  • Patent number: 5012104
    Abstract: A thermally stable magnetic deflection assembly for use in an electron or particle beam machine with several separately potted magnetic coils spaced apart and arranged in a particular vertical position on a central pipe. Non metallic, low coefficient of thermal expansion, highly thermally conductive materials are used throughout and means are provided for maintaining the entire assembly at a desired temperature. Also disclosed is a method of making a thermally stable magnetic deflection assembly.
    Type: Grant
    Filed: May 17, 1990
    Date of Patent: April 30, 1991
    Assignee: Etec Systems, Inc.
    Inventor: Lydia J. Young
  • Patent number: 4987311
    Abstract: Disclosed is a biassing scheme for a beam position location apparatus (50) which comprises electron detector diodes (52) in an electron beam lithography machine (10) such that the detector diodes (52) deposit fewer secondary electrons (62) on a substrate (16) being processed by the electron beam (22) and thus reduce or eliminate any charge buildup on said substrate which deflect the electron beam (22) causing pattern distortion.
    Type: Grant
    Filed: August 8, 1989
    Date of Patent: January 22, 1991
    Assignee: Etec Systems, Inc.
    Inventor: William J. Devore