Patents Assigned to Everlight USA, Inc.
  • Patent number: 6955693
    Abstract: A dye composition is disclosed, which comprises a blue anthraquinone dye of the following formula (I) wherein Y is —CH?CH2, —CH2CH2Cl or —CH2CH2OSO3H; and a gray-black azo dye of the following formula (II) wherein Y is defined as the above. The dye compositions of the present invention have good stability and build-up property. The dye compositions are suitable for dyeing and printing materials that contain either cellulose fibers, such as cotton, artificial cotton, linen, and artificial linen, or synthetic polyamide, such as wool, silk, and nylon. The materials obtained through treatment with the dye compositions aforementioned show excellent properties, especially in wash-off, level-dyeing, build-up, light fastness and perspiration-light fastness.
    Type: Grant
    Filed: June 24, 2003
    Date of Patent: October 18, 2005
    Assignee: Everlight USA, Inc.
    Inventors: Bao-Kun Lai, Cheng-Hsiang Hsu, Ya-Chi Tseng
  • Publication number: 20050203286
    Abstract: An environmental protection reactive dyestuff of the following formula (I) is disclosed, wherein R1, R2, D, M are defined as in the specification. The dyestuff of the invention is distinguished by a high fixation and a very good build-up. It is distinguished also by a green environmental protection and a low salt, a low base, a high exhaustion, non-contain heavy metal and halogen atoms, and it has fiber-reactive properties and is very highly suitable for dyeing and printing of materials containing either cellulose fibers, such as cotton, synthetic cotton, hemp, and synthetic hemp, or amide containing fibers such as wool and nylon.
    Type: Application
    Filed: August 2, 2004
    Publication date: September 15, 2005
    Applicant: Everlight USA, Inc.
    Inventors: Hsiao-San Chen, Jia-Cheng Hsu, Chia-Huei Yu
  • Publication number: 20050183217
    Abstract: A dye composition, which comprising: a monoazo dye of the formula and a disazo dye of the formula (II) wherein R, R1, R2, R3, R4, Y, K, D are defined in this document ; these kinds of dye composition have good stability and build-up. The dye composition are suitable for dyeing and printing of materials containing cellulose fibers, such as cotton, artificial cotton, linen, and artificial linen, or synthetic polyamide, such as wool, silk, and nylon etc.
    Type: Application
    Filed: June 24, 2004
    Publication date: August 25, 2005
    Applicant: Everlight USA, Inc.
    Inventors: Huei-Chin Huang, Sheue-Rong Lee, Hsiao-San Chen
  • Patent number: 6878504
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: wherein R1 is H, C1-C4 alkyl, or CF3; Q is C4-C12 cycloalkyl; R2 is H, C1-C4 alkyl, or CF3; R3 is C4-C12 branched or cyclic alkyl; and x+y+z equals to 1. The chemically-amplified resist compositions of the present invention not only can be applied maturely to general lithographic processes, especially to 193 nm lithographic process, but also have excellent photo-sensitivity, and can form a well-resolved pattern and profile.
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: April 12, 2005
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
  • Publication number: 20040261200
    Abstract: A dye composition is disclosed, which comprises a blue anthraquinone dye of the following formula (I) 1
    Type: Application
    Filed: June 24, 2003
    Publication date: December 30, 2004
    Applicant: Everlight USA, Inc.
    Inventors: Bao-Kun Lai, Cheng-Hsiang Hsu, Ya-Chi Tseng
  • Publication number: 20040241569
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: 1
    Type: Application
    Filed: May 28, 2003
    Publication date: December 2, 2004
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
  • Patent number: 6815536
    Abstract: A monoazo reactive red dyestuff of the formula (I), wherein the R1, R2, R3, X, D, Z and n are as defined in the description. These kinds of dyestuffs are suitable for dyeing and printing of materials containing either cellulose fibers, such as cotton, artificial cotton, linen, and artificial linen, or synthetic polyamide, such as wool, silk, and nylon etc., as well as on mixed or cross-linked cellulose fibers and other fibers. Dyed materials with excellent properties can be obtained, showing especially outstanding performance in of wash-off, level-dyeing, light fastness and perspiration-light fastness.
    Type: Grant
    Filed: October 17, 2002
    Date of Patent: November 9, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Huei-Chin Huang, Chia-Huei Yu
  • Publication number: 20040167255
    Abstract: A stabilizer composition which includes (a) a UV absorber of foramidine derivative, (b) a UV absorber of benzotriazole derivative, and (c) an antioxidant is disclosed. The stabilizer composition disclosed here are suitable for improving the stabilization of the organic polymers to against the degradation by light.
    Type: Application
    Filed: February 24, 2003
    Publication date: August 26, 2004
    Applicant: Everlight USA, Inc.
    Inventors: Chung-In Lee, Ming-Ho Chiu
  • Patent number: 6780204
    Abstract: Reactive dye mixtures comprising a black or navy reactive dye and a reactive disazo dye. The reactive dye mixtures of the present invention are suitable for exhaust dyeing, printing, continuous dyeing or discharge printing of a blended or interwoven fabric of cellulose fibres or cellulose nylon blends. The compounds of the present invention display good level dyeing properties, good build up and excellent low nylon cross-dyeing.
    Type: Grant
    Filed: February 26, 2003
    Date of Patent: August 24, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Huei Ching Huang, Mao Cheng Hsu, Bao-Kun Lai, Ya-Chi Tseng
  • Publication number: 20040087780
    Abstract: A monoazo reactive red dyestuff of the formula (I), 1
    Type: Application
    Filed: October 17, 2002
    Publication date: May 6, 2004
    Applicant: EVERLIGHT USA, INC.
    Inventors: Huei-Chin Huang, Chia-Huei Yu
  • Patent number: 6720430
    Abstract: The present invention discloses a compound having the following formula (I), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. This compound is a monomer and suitable for synthesis to form polymers with good hydrophilicity, adhesion and dry-etch resistance. Particularly, this compound can form photosensitive polymers or copolymers by reacting with suitable photosensitive monomers.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: April 13, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Patent number: 6703178
    Abstract: The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The chemical amplified photoresist composition of the present invention can be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light sources, and exhibit excellent resolution, figures and photosensitivity.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: March 9, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Patent number: 6673132
    Abstract: An SiO2/Al2O3 composite abrasive is disclosed, which has positive surface charges when dispersed in an alkaline water solution. This SiO2/Al2O3 composite abrasive includes an Al2O3 core and SiO2 coated thereon. The abrasive of the present invention is suitable for polishing metal, compact disks, optical lenses, and semiconductors etc in a high-pH environment. A method for producing the SiO2/Al2O3 composite abrasive is also disclosed in the present invention.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: January 6, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Ru-Shi Liu, Sung-Chun Chang
  • Publication number: 20030232270
    Abstract: The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), 1
    Type: Application
    Filed: May 28, 2002
    Publication date: December 18, 2003
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Publication number: 20030229234
    Abstract: The present invention discloses a compound having the following formula (I), 1
    Type: Application
    Filed: May 28, 2002
    Publication date: December 11, 2003
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Patent number: 6639035
    Abstract: The present invention discloses a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The polymer of the present invention can be used to form the chemical amplified photoresist composition, which can then be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light source, and exhibit excellent resolution, figures and photosensitivity.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: October 28, 2003
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Publication number: 20030189186
    Abstract: The present invention discloses a composition for chemical mechanical polishing of a metal layer at a high rate, which includes at least an oxidizing agent, a polishing promoter, an organic diproticic acid and deionized water. The polishing composition of the present invention can be applied alone or with an abrasive, and effectively improves the planarity of metal layers polished at high rates.
    Type: Application
    Filed: March 29, 2002
    Publication date: October 9, 2003
    Applicant: Everlight USA, Inc.
    Inventors: Yen Heng Chen, Yaun-Shin Li
  • Publication number: 20030177945
    Abstract: Disclosed herein is an ink composition for ink-jet textile printing, which primarily includes (a) at least a reactive dye, (b) water, and (c) at least an organic solvent that is a C4-C6 polyhydric alcohol having one or less primary alcohol groups. The ink composition of the present invention is suitable for dyeing and printing of materials containing either cellulose fibers such as cotton, synthetic cotton, hemp, and synthetic hemp, or amide fibers such as wool and nylon.
    Type: Application
    Filed: May 6, 2002
    Publication date: September 25, 2003
    Applicant: Everlight USA, Inc.,
    Inventors: Chuan-hsi Li, Chien-wen Li, Hong-Chang Huang
  • Publication number: 20030172476
    Abstract: Reactive dye mixtures comprising a black or navy reactive dye and a reactive disazo dye. The reactive dye mixtures of the present invention are suitable for exhaust dyeing, printing, continuous dyeing or discharge printing of a blended or interwoven fabric of cellulose fibres or cellulose nylon blends. The compounds of the present invention display good level dyeing properties, good build up and excellent low nylon cross-dyeing.
    Type: Application
    Filed: February 26, 2003
    Publication date: September 18, 2003
    Applicant: EVERLIGHT USA, INC.
    Inventors: Huei Ching Huang, Mao Cheng Hsu, Bao-Kun Lai, Ya-Chi Tseng
  • Publication number: 20030167965
    Abstract: The present invention discloses a magenta ink for ink-jet printing, which primarily includes red 184 and a carrier. The present invention also discloses a color ink set for ink-jet printing, which primarily includes (a) a magenta ink including red 184 and a carrier, (b) a yellow ink and (c) a cyan ink. According to the color ink set of the present invention, an excellent image and broad color gamut can be easily generated. Furthermore, the present invention provides good outdoorfastness and lightfastness.
    Type: Application
    Filed: March 5, 2002
    Publication date: September 11, 2003
    Applicant: Everlight USA, Inc.
    Inventor: Jen Fang Lin