Patents Assigned to FUJITSU SEMICONDUCTOR
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Patent number: 11876500Abstract: A receiver includes a first matching circuit configured to receive antenna input power through a branch point in accordance with a radio signal received by an antenna and input a portion of the received antenna input power to a first circuit as first input power, the antenna input power being input from the antenna, and an impedance of the first matching circuit decreasing as the antenna input power increases, and a second matching circuit configured to receive the antenna input power through the branch point and input another portion of the received antenna input power to a second circuit as second input power, an impedance of the second matching circuit increasing as the antenna input power increases.Type: GrantFiled: December 7, 2021Date of Patent: January 16, 2024Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Tetsuya Maruyama
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Patent number: 11574678Abstract: A resistive random access memory includes a memory cell including a resistive element having a resistance which varies according to a write operation and stores data according to the resistance of the resistive element, a reference resistive element having a resistance set to a first value, a voltage line set to a first voltage during a first write operation in which the resistance of the resistive element is varied from a second value higher than the first value to the first value, and a voltage control circuit arranged between first ends of the two resistive elements. The voltage control circuit adjusts a value of the first voltage supplied from the voltage line so as to reduce a difference between currents flowing through the two resistive elements during the first write operation, and supply the adjusted first voltage to the first ends of the two resistive elements.Type: GrantFiled: July 13, 2021Date of Patent: February 7, 2023Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Tetsuro Tamura
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Publication number: 20220239272Abstract: A receiver includes a first matching circuit configured to receive antenna input power through a branch point in accordance with a radio signal received by an antenna and input a portion of the received antenna input power to a first circuit as first input power, the antenna input power being input from the antenna, and an impedance of the first matching circuit decreasing as the antenna input power increases, and a second matching circuit configured to receive the antenna input power through the branch point and input another portion of the received antenna input power to a second circuit as second input power, an impedance of the second matching circuit increasing as the antenna input power increases.Type: ApplicationFiled: December 7, 2021Publication date: July 28, 2022Applicant: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Tetsuya Maruyama
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Publication number: 20220084592Abstract: A resistive random access memory includes a memory cell including a resistive element having a resistance which varies according to a write operation and stores data according to the resistance of the resistive element, a reference resistive element having a resistance set to a first value, a voltage line set to a first voltage during a first write operation in which the resistance of the resistive element is varied from a second value higher than the first value to the first value, and a voltage control circuit arranged between first ends of the two resistive elements. The voltage control circuit adjusts a value of the first voltage supplied from the voltage line so as to reduce a difference between currents flowing through the two resistive elements during the first write operation, and supply the adjusted first voltage to the first ends of the two resistive elements.Type: ApplicationFiled: July 13, 2021Publication date: March 17, 2022Applicant: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Tetsuro Tamura
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Patent number: 11164936Abstract: A first-layer insulating film having a barrier property against a determined element contained in a ferroelectric capacitor as well as an oxygen permeability, a hydrogen permeability, and a water permeability is formed over a surface of the ferroelectric capacitor formed over a substrate. After that, heat treatment is performed in an oxidizing atmosphere. After the heat treatment, a second insulating film having a hydrogen permeability and a water permeability lower than those of the first-layer insulating film respectively is formed over a surface of the first-layer insulating film in a non-reducing atmosphere. A third-layer insulating film is formed over a surface of the second-layer insulating film. By doing so, degradation of a ferroelectric film under and after the formation of a semiconductor device having the ferroelectric capacitor is suppressed and deterioration in the characteristics of the ferroelectric capacitor is suppressed.Type: GrantFiled: January 3, 2020Date of Patent: November 2, 2021Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventors: Youichi Okita, Wensheng Wang, Kazuaki Takai
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Patent number: 11158362Abstract: Each pre-sense amplifier produces, in a read operation, an output potential obtained by resistively dividing a power supply voltage based on a potential of one of two first bit lines or one of a plurality of second bit lines. The two first bit lines are connected to a first memory cell holding data of a first and a second logic values. The second bit lines are individually connected to one of a plurality of second memory cells each holding data of the first or the second logic value. Each twin sense amplifier outputs, in the read operation, data determination results based on two reference potentials and a data potential. The two reference potentials are the output potentials produced based on the potentials of the two first bit lines. The data potential is the output potential produced based on the potential of one of the second bit lines.Type: GrantFiled: September 16, 2020Date of Patent: October 26, 2021Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Hiroshi Yoshioka
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Patent number: 11043252Abstract: A first pre-sense amplifier connected to reference cells that hold data of logical value “1” via a first bit line outputs a signal that is obtained by delaying a first amplified signal that is obtained by amplifying a voltage of the first bit line when a memory cell is read. A second pre-sense amplifier connected to memory cells via a second bit line generates a second amplified signal by amplifying a voltage of the second bit line when a memory cell is read. The second pre-sense amplifier receives a signal. When a voltage of the signal reaches a threshold or more, the second pre-sense amplifier drops the voltage of the second bit line to a ground potential.Type: GrantFiled: June 30, 2020Date of Patent: June 22, 2021Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Keizo Morita
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Publication number: 20210118481Abstract: Each pre-sense amplifier produces, in a read operation, an output potential obtained by resistively dividing a power supply voltage based on a potential of one of two first bit lines or one of a plurality of second bit lines. The two first bit lines are connected to a first memory cell holding data of a first and a second logic values. The second bit lines are individually connected to one of a plurality of second memory cells each holding data of the first or the second logic value. Each twin sense amplifier outputs, in the read operation, data determination results based on two reference potentials and a data potential. The two reference potentials are the output potentials produced based on the potentials of the two first bit lines. The data potential is the output potential produced based on the potential of one of the second bit lines.Type: ApplicationFiled: September 16, 2020Publication date: April 22, 2021Applicant: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventor: Hiroshi Yoshioka
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Patent number: 10847522Abstract: A semiconductor device includes a substrate; a transistor formed on a surface of the substrate; a first insulating film formed above the transistor; a second semiconductor film formed on the first semiconductor film; a third semiconductor film formed on the second semiconductor film; a fourth semiconductor film formed on the third semiconductor film; and a ferroelectric capacitor formed on the fourth insulating film, wherein a hydrogen permeability of the third insulating film is higher than a hydrogen permeability of the first insulating film, and a hydrogen permeability and an oxygen permeability of the second insulating film and of the fourth insulating film are higher than the hydrogen permeability and an oxygen permeability of the first insulating film and of the third insulating film.Type: GrantFiled: January 3, 2019Date of Patent: November 24, 2020Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITEDInventors: Kouichi Nagai, Ko Nakamura, Mitsuhiro Nakamura, Akio Ito
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Patent number: 10840130Abstract: A multilayer wiring in a semiconductor device includes a first lower wiring formed in a first insulating layer, a via which is formed in a second insulating layer over the first insulating layer and which is connected to the first lower wiring, and an upper wiring connected to the via. The upper wiring has an outer edge at which a nick portion is formed beside a portion of the upper wiring to which the via is connected. The formation of the nick portion at the outer edge of the upper wiring prevents the via from enlarging.Type: GrantFiled: August 27, 2019Date of Patent: November 17, 2020Assignee: FUJITSU SEMICONDUCTOR LIMITEDInventors: Yasunori Uchino, Kenichi Watanabe
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Publication number: 20200335148Abstract: A first pre-sense amplifier connected to reference cells that hold data of logical value “1” via a first bit line outputs a signal that is obtained by delaying a first amplified signal that is obtained by amplifying a voltage of the first bit line when a memory cell is read. A second pre-sense amplifier connected to memory cells via a second bit line generates a second amplified signal by amplifying a voltage of the second bit line when a memory cell is read. The second pre-sense amplifier receives a signal. When a voltage of the signal reaches a threshold or more, the second pre-sense amplifier drops the voltage of the second bit line to a ground potential.Type: ApplicationFiled: June 30, 2020Publication date: October 22, 2020Applicant: FUJITSU SEMICONDUCTOR LIMITEDInventor: Keizo Morita
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Patent number: 10803910Abstract: A first pre-sense amplifier connected to reference cells that hold data of logical value “1” via a first bit line outputs a signal that is obtained by delaying a first amplified signal that is obtained by amplifying a voltage of the first bit line when a memory cell is read. A second pre-sense amplifier connected to memory cells via a second bit line generates a second amplified signal by amplifying a voltage of the second bit line when a memory cell is read. The second pre-sense amplifier receives a signal. When a voltage of the signal reaches a threshold or more, the second pre-sense amplifier drops the voltage of the second bit line to a ground potential.Type: GrantFiled: July 12, 2019Date of Patent: October 13, 2020Assignee: FUJITSU SEMICONDUCTOR LIMITEDInventor: Keizo Morita
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Patent number: 10740225Abstract: A radio communication processor receives first received data including first write data, a first address within a first area of a nonvolatile memory, and error detection information or second received data including second write data whose data amount is larger than a data amount of the first write data and a second address within a second area of the nonvolatile memory. If the radio communication processor receives the first received data, then a controller stores the first write data in a volatile buffer. If there is no error in the first write data, then the controller reads out the first write data from the volatile buffer and stores the first write data in the first area. If the radio communication processor receives the second received data, then the controller stores the second write data in the second area without storing the second write data in the volatile buffer.Type: GrantFiled: July 18, 2018Date of Patent: August 11, 2020Assignee: FUJITSU SEMICONDUCTOR LIMITEDInventor: Takahiko Sato
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Publication number: 20200251551Abstract: A first-layer insulating film having a barrier property against a determined element contained in a ferroelectric capacitor as well as an oxygen permeability, a hydrogen permeability, and a water permeability is formed over a surface of the ferroelectric capacitor formed over a substrate. After that, heat treatment is performed in an oxidizing atmosphere. After the heat treatment, a second insulating film having a hydrogen permeability and a water permeability lower than those of the first-layer insulating film respectively is formed over a surface of the first-layer insulating film in a non-reducing atmosphere. A third-layer insulating film is formed over a surface of the second-layer insulating film. By doing so, degradation of a ferroelectric film under and after the formation of a semiconductor device having the ferroelectric capacitor is suppressed and deterioration in the characteristics of the ferroelectric capacitor is suppressed.Type: ApplicationFiled: January 3, 2020Publication date: August 6, 2020Applicant: FUJITSU SEMICONDUCTOR LIMITEDInventors: Youichi Okita, Wensheng Wang, Kazuaki Takai
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Publication number: 20200127107Abstract: A semiconductor device includes a semiconductor substrate, a first semiconductor area of a first conductive type disposed in a surface layer portion of the semiconductor substrate, a gate electrode disposed over the first semiconductor area and extending in a first direction, a dummy gate electrode disposed over the semiconductor substrate away from the gate electrode and extending in the first direction, a second semiconductor area of a second conductive type disposed, in the surface layer portion of the semiconductor substrate, between the gate electrode and the dummy gate electrode, and an interconnect connected to the second semiconductor area, wherein a concentration of carrier of a first carrier type in the semiconductor substrate under the dummy gate electrode and alongside the second semiconductor area is lower than a concentration of majority carrier in the first semiconductor area, the first carrier type being a same carrier type as the majority carrier.Type: ApplicationFiled: October 18, 2019Publication date: April 23, 2020Applicant: MIE FUJITSU SEMICONDUCTOR LIMITEDInventor: Masaya Katayama
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Patent number: 10573644Abstract: An integrated circuit can include a plurality of first transistors formed in a substrate and having gate lengths of less than one micron and at least one tipless transistor formed in the substrate and having a source-drain path coupled between a circuit node and a first power supply voltage. In addition or alternatively, an integrated circuit can include minimum feature size transistors; a signal driving circuit comprising a first transistor of a first conductivity type having a source-drain path coupled between a first power supply node and an output node, and a second transistor of a second conductivity type having a source-drain path coupled between a second power supply node and the output node, and a gate coupled to a gate of the first transistor, wherein the first or second transistor is a tipless transistor.Type: GrantFiled: March 27, 2018Date of Patent: February 25, 2020Assignee: Mie Fujitsu Semiconductor LimitedInventor: David A. Kidd
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Publication number: 20200035273Abstract: A first pre-sense amplifier connected to reference cells that hold data of logical value “1” via a first bit line outputs a signal that is obtained by delaying a first amplified signal that is obtained by amplifying a voltage of the first bit line when a memory cell is read. A second pre-sense amplifier connected to memory cells via a second bit line generates a second amplified signal by amplifying a voltage of the second bit line when a memory cell is read. The second pre-sense amplifier receives a signal. When a voltage of the signal reaches a threshold or more, the second pre-sense amplifier drops the voltage of the second bit line to a ground potential.Type: ApplicationFiled: July 12, 2019Publication date: January 30, 2020Applicant: FUJITSU SEMICONDUCTOR LIMITEDInventor: Keizo Morita
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Patent number: 10546773Abstract: A multilayer wiring in a semiconductor device includes a first lower wiring formed in a first insulating layer, a via which is formed in a second insulating layer over the first insulating layer and which is connected to the first lower wiring, and an upper wiring connected to the via. The upper wiring has an outer edge at which a nick portion is formed beside a portion of the upper wiring to which the via is connected. The formation of the nick portion at the outer edge of the upper wiring prevents the via from enlarging.Type: GrantFiled: March 13, 2018Date of Patent: January 28, 2020Assignee: FUJITSU SEMICONDUCTOR LIMITEDInventors: Yasunori Uchino, Kenichi Watanabe
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Publication number: 20190385905Abstract: A multilayer wiring in a semiconductor device includes a first lower wiring formed in a first insulating layer, a via which is formed in a second insulating layer over the first insulating layer and which is connected to the first lower wiring, and an upper wiring connected to the via. The upper wiring has an outer edge at which a nick portion is formed beside a portion of the upper wiring to which the via is connected. The formation of the nick portion at the outer edge of the upper wiring prevents the via from enlarging.Type: ApplicationFiled: August 27, 2019Publication date: December 19, 2019Applicant: FUJITSU SEMICONDUCTOR LIMITEDInventors: Yasunori Uchino, Kenichi Watanabe
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Patent number: 10510824Abstract: A semiconductor device includes as a resistance element a first polycrystalline silicon and a second polycrystalline silicon containing impurities, such as boron, of the same kind and having different widths. The first polycrystalline silicon contains the impurities at a concentration CX. The second polycrystalline silicon has a width larger than a width of the first polycrystalline silicon and contains the impurities of the same kind at a concentration CY lower than the concentration CX. A sign of a temperature coefficient of resistance (TCR) of the first polycrystalline silicon changes at the concentration CX. A sign of a TCR of the second polycrystalline silicon changes at the concentration CY.Type: GrantFiled: May 30, 2018Date of Patent: December 17, 2019Assignee: Mie Fujitsu Semiconductor LimitedInventors: Taiji Ema, Nobuhiro Misawa, Kazuyuki Kumeno, Makoto Yasuda