Patents Assigned to Gelest, Inc.
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Patent number: 11702434Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.Type: GrantFiled: March 24, 2021Date of Patent: July 18, 2023Assignee: GELEST, INC.Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
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Patent number: 11667655Abstract: Silicon-based tetrahydrocannabinol derivatives and methods for their synthesis are provided, in which the derivatives contain a tetrahydrocannabinol molecule and at least one silicon-based group containing Si—O—Si bonds. The derivatives are useful in topical and dermatological compositions, have potential beneficial topical properties, and enhance solubility and compatibility in topical and dermatological formulations containing the silicon-based materials.Type: GrantFiled: December 10, 2020Date of Patent: June 6, 2023Assignee: GELEST, INC.Inventors: Barry C. Arkles, Taewoo Min, Jonathan D. Goff
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Patent number: 11634811Abstract: A method for deposition of a thin film onto a substrate is provided. The method includes providing a source precursor containing on or more of elements constituting the thin film, generating a transient species from the source precursor, and depositing a thin film onto the substrate from the transient species. The transient species being a reactive intermediate that has a limited lifetime in a condensed phase at or above room temperature.Type: GrantFiled: December 28, 2021Date of Patent: April 25, 2023Assignee: GELEST, INC.Inventors: Barry C. Arkles, Alain E. Kaloyeros
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Patent number: 11542284Abstract: A new class of compounds known as chalcogenosilacyclopentanes is described. These compounds are five-membered ring structures containing a silicon-selenium or silicon-tellurium bond, as shown in Formulas (I) and (II). In these compounds, the substituents on the silicon and on the ring carbons may be hydrogen, alkyl, alkoxy, aromatic, or ether groups. The chalcogenosilacyclopentane compounds undergo ring-opening reactions with hydroxyl and other protic functionalities and may be used to prepare substrates that are amenable to thin film deposition techniques such as ALD and CVD.Type: GrantFiled: March 23, 2020Date of Patent: January 3, 2023Assignee: GELEST, INC.Inventors: Barry C. Arkles, Richard J. Liberatore, Youlin Pan
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Patent number: 11459656Abstract: A method for forming a fluorinated oxostannate film involves vaporizing a volatile fluorinated alkyltin compound having at least two hydrolytically sensitive functional groups or at least two reactive functional groups which are sensitive to oxidation at a temperature greater than 200° C.; providing a substrate; physisorbing or chemisorbing the fluorinated alkyltin compound onto the substrate; and exposing the physisorbed or chemisorbed fluorinated alkyltin compound to a sequence of hydrolysis, irradiation, and/or oxidation steps to form the fluorinated oxostannate thin film on the substrate. Fluorinated alkyltin compounds having formula (I) are also described, in which Rf is a fluorinated or partially fluorinated linear or branched alkyl group having about 1 to about 5 carbon atoms, X is a dialkylamino group having about 1 to about 4 carbon atoms, and n is 1 or 2: (RfCH2)nSnX(4-n)??(I).Type: GrantFiled: October 28, 2021Date of Patent: October 4, 2022Assignee: GELEST, INCInventors: Barry C. Arkles, Youlin Pan, Jonathan D. Goff, Li Yang
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Patent number: 11434252Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.Type: GrantFiled: September 16, 2019Date of Patent: September 6, 2022Assignee: GELEST, INC.Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
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Patent number: 11318083Abstract: Compositions and methods for reshaping keratin-rich substrates while forming adherent flexible films contain emulsified or soluble mixtures of silanols and hemiaminals or the reaction products of silanols and hemiaminals including silylated hemiaminals. A method for treating split-ends in hair is also described.Type: GrantFiled: March 9, 2020Date of Patent: May 3, 2022Assignee: GELEST, INC.Inventors: Barry C. Arkles, Jonathan D. Goff, Alison Ane Phillips, Kerry Campbell Demella
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Patent number: 11248291Abstract: A method for deposition of a thin film onto a substrate is provided. The method includes providing a source precursor containing on or more of elements constituting the thin film, generating a transient species from the source precursor, and depositing a thin film onto the substrate from the transient species. The transient species being a reactive intermediate that has a limited lifetime in a condensed phase at or above room temperature.Type: GrantFiled: January 19, 2021Date of Patent: February 15, 2022Assignee: GELEST, INC.Inventors: Barry C. Arkles, Alain E. Kaloyeros
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Patent number: 11236200Abstract: A heterofunctional poly(alkyleneoxide) according to the invention contains a first polymer terminus containing a protected, unprotected, or derivatized amine or aminoalkyl functionality and a second polymer terminus containing an unsaturated functionality. Reaction products, derivatives, and methods of making these materials are also described.Type: GrantFiled: December 12, 2019Date of Patent: February 1, 2022Assignee: GELEST, INC.Inventors: Barry C. Arkles, Jonathan D. Goff, Ferdinand Gonzaga
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Publication number: 20100298591Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.Type: ApplicationFiled: August 4, 2010Publication date: November 25, 2010Applicant: GELEST, INC.Inventors: Barry C. ARKLES, Edward KIMBLE
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Patent number: 7799888Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.Type: GrantFiled: October 30, 2007Date of Patent: September 21, 2010Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Edward Kimble
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Publication number: 20080269429Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.Type: ApplicationFiled: October 30, 2007Publication date: October 30, 2008Applicant: GELEST, INC.Inventors: Barry C. Arkles, Edward Kimble
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Publication number: 20070232822Abstract: A class of volatile cyclic and acyclic azasilanes is provided as well as methods for their preparation which comprise heating aminoalkoxysilanes in the presence of an ammonium salt, sulfuric acid, or phosphonium salt. The cyclic azasilanes may be used for the treatment of inorganic surfaces, particularly nanoparticles, by a ring-opening reaction when non-hydrolytic deposition methods are required.Type: ApplicationFiled: March 9, 2007Publication date: October 4, 2007Applicant: Gelest, Inc.Inventors: Barry Arkles, Youlin Pan, Gerald Larson
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Publication number: 20070204412Abstract: Colored silicone polymers and elastomers are described herein wherein the colorants used in the composition provide tint to the polymer, but are capable of retaining transparency of the substrate if desired. The colorants include curcumin and/or a derivative thereof.Type: ApplicationFiled: March 1, 2007Publication date: September 6, 2007Applicant: Gelest, Inc.Inventor: Barry C. Arkles
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Patent number: 7265236Abstract: A polypodal silane compounds are provided for use as a bonded phase and which have embedded hydrophilicity. The compounds have at least two podal branches bonded via an ether linkage or alkoxy group to a hydrophilic group. Each podal branch has a silicon atom which is bonded to each podal branch through a Si—C bond and each of the podal branches is capable of bonding to a siliceous substrate through at least one hydrolyzable functional group capable of being displaced by a Si—O bond. Bonded phases using such compounds and substrates having such compounds bonded to their surface are also described, as well as a method for preparing a bonded phase.Type: GrantFiled: February 22, 2005Date of Patent: September 4, 2007Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan
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Patent number: 7235683Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.Type: GrantFiled: October 31, 2006Date of Patent: June 26, 2007Assignee: Gelest Inc.Inventors: Benigno A. Janeiro, Barry C. Arkles
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Patent number: 7235682Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.Type: GrantFiled: May 28, 2004Date of Patent: June 26, 2007Assignee: Gelest Inc.Inventors: Benigno A. Janeiro, Barry C. Arkles
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Publication number: 20070060765Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis (trichlorosilyl)decane or 1,2-bis (trimethoxysilyl)decane.Type: ApplicationFiled: October 31, 2006Publication date: March 15, 2007Applicant: GELEST, INC.Inventors: Benigno Janeiro, Barry Arkles
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Patent number: 6884466Abstract: Processes for producing tungsten nitride and tungsten nitride films are provided in which a tungsten carbonyl compound and a nitrogen-containing reactant gas are reacted at a temperature below about 600° C. Tungsten nitride precursors are also included which comprise a tungsten carbonyl compound capable of forming a tungsten nitride film in the presence of a nitrogen-containing reactant gas at a temperature of less than about 600° C.Type: GrantFiled: April 28, 2003Date of Patent: April 26, 2005Assignees: Gelest, Inc., The Research Foundation of State University of New YorkInventors: Alain E. Kaloyeros, Barry C. Arkles
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Patent number: 6881849Abstract: The invention includes a sulfolane functional silane comprising a sulfolane ring, an alkoxy group, a hydrocarbon backbone, and a silyl moiety. An oxygen atom of the alkoxy group is bound to the sulfolane ring, and the hydrocarbon backbone has one to fifty carbon atoms and is bound by its first terminal carbon atom to a carbon of the alkoxy group and by its second terminal carbon atom to the silicone atom of the silyl moiety. The silyl moiety comprises at least one hydrolyzable group and/or a non-hydrolyzable group that is a substituted or unsubstituted siloxane group. A method to stabilize a silane solution is described and includes adding the sulfolane functional silane of the invention to a solution containing silane hydrosylates.Type: GrantFiled: July 12, 2002Date of Patent: April 19, 2005Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan