Patents Assigned to Gelest, Inc.
  • Publication number: 20100298591
    Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.
    Type: Application
    Filed: August 4, 2010
    Publication date: November 25, 2010
    Applicant: GELEST, INC.
    Inventors: Barry C. ARKLES, Edward KIMBLE
  • Patent number: 7799888
    Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.
    Type: Grant
    Filed: October 30, 2007
    Date of Patent: September 21, 2010
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Edward Kimble
  • Publication number: 20080269429
    Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.
    Type: Application
    Filed: October 30, 2007
    Publication date: October 30, 2008
    Applicant: GELEST, INC.
    Inventors: Barry C. Arkles, Edward Kimble
  • Publication number: 20070232822
    Abstract: A class of volatile cyclic and acyclic azasilanes is provided as well as methods for their preparation which comprise heating aminoalkoxysilanes in the presence of an ammonium salt, sulfuric acid, or phosphonium salt. The cyclic azasilanes may be used for the treatment of inorganic surfaces, particularly nanoparticles, by a ring-opening reaction when non-hydrolytic deposition methods are required.
    Type: Application
    Filed: March 9, 2007
    Publication date: October 4, 2007
    Applicant: Gelest, Inc.
    Inventors: Barry Arkles, Youlin Pan, Gerald Larson
  • Publication number: 20070204412
    Abstract: Colored silicone polymers and elastomers are described herein wherein the colorants used in the composition provide tint to the polymer, but are capable of retaining transparency of the substrate if desired. The colorants include curcumin and/or a derivative thereof.
    Type: Application
    Filed: March 1, 2007
    Publication date: September 6, 2007
    Applicant: Gelest, Inc.
    Inventor: Barry C. Arkles
  • Patent number: 7265236
    Abstract: A polypodal silane compounds are provided for use as a bonded phase and which have embedded hydrophilicity. The compounds have at least two podal branches bonded via an ether linkage or alkoxy group to a hydrophilic group. Each podal branch has a silicon atom which is bonded to each podal branch through a Si—C bond and each of the podal branches is capable of bonding to a siliceous substrate through at least one hydrolyzable functional group capable of being displaced by a Si—O bond. Bonded phases using such compounds and substrates having such compounds bonded to their surface are also described, as well as a method for preparing a bonded phase.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: September 4, 2007
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan
  • Patent number: 7235683
    Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: June 26, 2007
    Assignee: Gelest Inc.
    Inventors: Benigno A. Janeiro, Barry C. Arkles
  • Patent number: 7235682
    Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: June 26, 2007
    Assignee: Gelest Inc.
    Inventors: Benigno A. Janeiro, Barry C. Arkles
  • Publication number: 20070060765
    Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis (trichlorosilyl)decane or 1,2-bis (trimethoxysilyl)decane.
    Type: Application
    Filed: October 31, 2006
    Publication date: March 15, 2007
    Applicant: GELEST, INC.
    Inventors: Benigno Janeiro, Barry Arkles
  • Patent number: 6884466
    Abstract: Processes for producing tungsten nitride and tungsten nitride films are provided in which a tungsten carbonyl compound and a nitrogen-containing reactant gas are reacted at a temperature below about 600° C. Tungsten nitride precursors are also included which comprise a tungsten carbonyl compound capable of forming a tungsten nitride film in the presence of a nitrogen-containing reactant gas at a temperature of less than about 600° C.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: April 26, 2005
    Assignees: Gelest, Inc., The Research Foundation of State University of New York
    Inventors: Alain E. Kaloyeros, Barry C. Arkles
  • Patent number: 6881849
    Abstract: The invention includes a sulfolane functional silane comprising a sulfolane ring, an alkoxy group, a hydrocarbon backbone, and a silyl moiety. An oxygen atom of the alkoxy group is bound to the sulfolane ring, and the hydrocarbon backbone has one to fifty carbon atoms and is bound by its first terminal carbon atom to a carbon of the alkoxy group and by its second terminal carbon atom to the silicone atom of the silyl moiety. The silyl moiety comprises at least one hydrolyzable group and/or a non-hydrolyzable group that is a substituted or unsubstituted siloxane group. A method to stabilize a silane solution is described and includes adding the sulfolane functional silane of the invention to a solution containing silane hydrosylates.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: April 19, 2005
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan
  • Patent number: 6800777
    Abstract: The invention includes a trialkylsilane comprising a hydrocarbon backbone including one to ten carbon atoms; a terminal trialkylsilyl moiety having at least two alkyl groups independently comprising at least six carbon atoms; and a terminal silyl moiety that has at least one hydrolyzable group bound to a silicon of the silyl moiety. At least one of the alkyl groups of the trialkylsilyl moiety may substituted with at least one halogen, and is preferably a perfluoroalkyl group. The invention also provides methods of producing the trialysilane and substrates including the trialkysilane of the invention, as well as columns and substrates for use in chromatographic applications.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: October 5, 2004
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Gerald L. Larson, Youlin Pan
  • Publication number: 20040176561
    Abstract: A continuous polymerization process produces hydride-functional siloxane and organofunctional siloxane polymers, copolymers and terpolymers. The cationic polymerization takes place in a plug flow catalytic reactor packed with a heterogeneous acid catalyst. The siloxane polymers produced are optically clear, homogeneous and free of catalyst residues.
    Type: Application
    Filed: December 31, 2003
    Publication date: September 9, 2004
    Applicant: Gelest, Inc.
    Inventor: Benigno A. Janeiro
  • Patent number: 6770726
    Abstract: Silsesquioxane polymers that are useful for preparing SiO2-rich ceramic coatings are obtained as the polymeric reaction products from the hydrolysis and condensation of organosilanes having a &bgr;-substituted alkyl group. A preferred silsesquioxane polymer is the polymeric reaction product obtained from &bgr;-chloroethyltrichlorosilane. More preferred silsesquioxones are those with non-halogenated alkyl groups, such as the &bgr;-acetoxyethyl- and &bgr;-hydroxyethyl-silsesquioxones. Coating compositions containing such silsesquioxane polymers dissolved in organic solvent may be applied to a substrate and converted to SiO2-rich ceramic thin layers by evaporating the solvent and heating the coated substrate at moderate temperatures.
    Type: Grant
    Filed: December 28, 1998
    Date of Patent: August 3, 2004
    Assignees: Gelest, Inc., University of Pennsylvania
    Inventors: Barry C. Arkles, Donald H. Berry
  • Publication number: 20040077892
    Abstract: A class of volatile cyclic and acyclic azasilanes is provided as well as methods for their preparation which comprise heating aminoalkoxysilanes in the presence of an ammonium salt, sulfuric acid, or phosphonium salt. The cyclic azasilanes may be used for the treatment of inorganic surfaces, particularly nanoparticles, by a ring-opening reaction when non-hydrolytic deposition methods are required.
    Type: Application
    Filed: April 23, 2003
    Publication date: April 22, 2004
    Applicant: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Gerald L. Larson
  • Patent number: 6642403
    Abstract: This invention relates to a series of fluoroalkylsilane compounds of formula I. These compounds are silylation reagents which enhance the solubility of the silylated products in fluorocarbon solvents for preferred use in fluorous phase synthesis. Use of these compounds protects fragile hydrogen groups and also provides for the straightforward separation of the ultimate reaction products though fluorous phase extraction. This invention also relates to a two-step process for making compounds of formula I. The process comprises reacting an alkyldialkoxysilane with a perfluoroalkyl-substituted silane to produce a perfluoroalkyl-substituted dialkylsiloxyalkylsilane intermediate; and reacting the intermediate with halogen.
    Type: Grant
    Filed: November 6, 2002
    Date of Patent: November 4, 2003
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Gerald L. Larson
  • Publication number: 20030198587
    Abstract: Processes for producing tungsten nitride and tungsten nitride films are provided in which a tungsten carbonyl compound and a nitrogen-containing reactant gas are reacted at a temperature below about 600° C. Tungsten nitride precursors are also included which comprise a tungsten carbonyl compound capable of forming a tungsten nitride film in the presence of a nitrogen-containing reactant gas at a temperature of less than about 600° C.
    Type: Application
    Filed: April 28, 2003
    Publication date: October 23, 2003
    Applicants: Gelest, Inc., The Research Foundation of State University of New York
    Inventors: Alain E. Kaloyeros, Barry C. Arkles
  • Patent number: 6586056
    Abstract: A method for near atmospheric pressure chemical vapor deposition of a silicon based film onto a substrate includes introducing into a deposition chamber at about atmospheric pressure: (i) a substrate; (ii) an iodosilane precursor in the vapor state having at least three iodine atoms bound to silicon; and (iii) at least one reactant gas; and maintaining a deposition temperature within the chamber from about 250° C. to about 650° C. for a period of time sufficient to deposit a silicon based film on the substrate. Silicon based films formed by near atmospheric pressure chemical vapor deposition using an iodosilane precursor in a vapor state and methods for forming silicon-based films using ultraviolet assisted chemical vapor deposition are also included.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: July 1, 2003
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Alain E. Kaloyeros
  • Publication number: 20030092927
    Abstract: This invention relates to a series of fluoroalkylsilane compounds of formula I.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 15, 2003
    Applicant: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Gerald L. Larson
  • Publication number: 20030060636
    Abstract: The invention includes a sulfolane functional silane comprising a sulfolane ring, an alkoxy group, a hydrocarbon backbone, and a silyl moiety. An oxygen atom of the alkoxy group is bound to the sulfolane ring, and the hydrocarbon backbone has one to fifty carbon atoms and is bound by its first terminal carbon atom to a carbon of the alkoxy group and by its second terminal carbon atom to the silicone atom of the silyl moiety. The silyl moiety comprises at least one hydrolyzable group and/or a non-hydrolyzable group that is a substituted or unsubstituted siloxane group. A method to stabilize a silane solution is described and includes adding the sulfolane functional silane of the invention to a solution containing silane hydrosylates.
    Type: Application
    Filed: July 12, 2002
    Publication date: March 27, 2003
    Applicant: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan