Patents Assigned to Gelest, Inc.
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Publication number: 20100298591Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.Type: ApplicationFiled: August 4, 2010Publication date: November 25, 2010Applicant: GELEST, INC.Inventors: Barry C. ARKLES, Edward KIMBLE
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Patent number: 7799888Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.Type: GrantFiled: October 30, 2007Date of Patent: September 21, 2010Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Edward Kimble
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Publication number: 20080269429Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.Type: ApplicationFiled: October 30, 2007Publication date: October 30, 2008Applicant: GELEST, INC.Inventors: Barry C. Arkles, Edward Kimble
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Publication number: 20070232822Abstract: A class of volatile cyclic and acyclic azasilanes is provided as well as methods for their preparation which comprise heating aminoalkoxysilanes in the presence of an ammonium salt, sulfuric acid, or phosphonium salt. The cyclic azasilanes may be used for the treatment of inorganic surfaces, particularly nanoparticles, by a ring-opening reaction when non-hydrolytic deposition methods are required.Type: ApplicationFiled: March 9, 2007Publication date: October 4, 2007Applicant: Gelest, Inc.Inventors: Barry Arkles, Youlin Pan, Gerald Larson
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Publication number: 20070204412Abstract: Colored silicone polymers and elastomers are described herein wherein the colorants used in the composition provide tint to the polymer, but are capable of retaining transparency of the substrate if desired. The colorants include curcumin and/or a derivative thereof.Type: ApplicationFiled: March 1, 2007Publication date: September 6, 2007Applicant: Gelest, Inc.Inventor: Barry C. Arkles
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Patent number: 7265236Abstract: A polypodal silane compounds are provided for use as a bonded phase and which have embedded hydrophilicity. The compounds have at least two podal branches bonded via an ether linkage or alkoxy group to a hydrophilic group. Each podal branch has a silicon atom which is bonded to each podal branch through a Si—C bond and each of the podal branches is capable of bonding to a siliceous substrate through at least one hydrolyzable functional group capable of being displaced by a Si—O bond. Bonded phases using such compounds and substrates having such compounds bonded to their surface are also described, as well as a method for preparing a bonded phase.Type: GrantFiled: February 22, 2005Date of Patent: September 4, 2007Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan
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Patent number: 7235683Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.Type: GrantFiled: October 31, 2006Date of Patent: June 26, 2007Assignee: Gelest Inc.Inventors: Benigno A. Janeiro, Barry C. Arkles
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Patent number: 7235682Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.Type: GrantFiled: May 28, 2004Date of Patent: June 26, 2007Assignee: Gelest Inc.Inventors: Benigno A. Janeiro, Barry C. Arkles
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Publication number: 20070060765Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis (trichlorosilyl)decane or 1,2-bis (trimethoxysilyl)decane.Type: ApplicationFiled: October 31, 2006Publication date: March 15, 2007Applicant: GELEST, INC.Inventors: Benigno Janeiro, Barry Arkles
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Patent number: 6884466Abstract: Processes for producing tungsten nitride and tungsten nitride films are provided in which a tungsten carbonyl compound and a nitrogen-containing reactant gas are reacted at a temperature below about 600° C. Tungsten nitride precursors are also included which comprise a tungsten carbonyl compound capable of forming a tungsten nitride film in the presence of a nitrogen-containing reactant gas at a temperature of less than about 600° C.Type: GrantFiled: April 28, 2003Date of Patent: April 26, 2005Assignees: Gelest, Inc., The Research Foundation of State University of New YorkInventors: Alain E. Kaloyeros, Barry C. Arkles
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Patent number: 6881849Abstract: The invention includes a sulfolane functional silane comprising a sulfolane ring, an alkoxy group, a hydrocarbon backbone, and a silyl moiety. An oxygen atom of the alkoxy group is bound to the sulfolane ring, and the hydrocarbon backbone has one to fifty carbon atoms and is bound by its first terminal carbon atom to a carbon of the alkoxy group and by its second terminal carbon atom to the silicone atom of the silyl moiety. The silyl moiety comprises at least one hydrolyzable group and/or a non-hydrolyzable group that is a substituted or unsubstituted siloxane group. A method to stabilize a silane solution is described and includes adding the sulfolane functional silane of the invention to a solution containing silane hydrosylates.Type: GrantFiled: July 12, 2002Date of Patent: April 19, 2005Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan
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Patent number: 6800777Abstract: The invention includes a trialkylsilane comprising a hydrocarbon backbone including one to ten carbon atoms; a terminal trialkylsilyl moiety having at least two alkyl groups independently comprising at least six carbon atoms; and a terminal silyl moiety that has at least one hydrolyzable group bound to a silicon of the silyl moiety. At least one of the alkyl groups of the trialkylsilyl moiety may substituted with at least one halogen, and is preferably a perfluoroalkyl group. The invention also provides methods of producing the trialysilane and substrates including the trialkysilane of the invention, as well as columns and substrates for use in chromatographic applications.Type: GrantFiled: May 3, 2002Date of Patent: October 5, 2004Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Gerald L. Larson, Youlin Pan
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Publication number: 20040176561Abstract: A continuous polymerization process produces hydride-functional siloxane and organofunctional siloxane polymers, copolymers and terpolymers. The cationic polymerization takes place in a plug flow catalytic reactor packed with a heterogeneous acid catalyst. The siloxane polymers produced are optically clear, homogeneous and free of catalyst residues.Type: ApplicationFiled: December 31, 2003Publication date: September 9, 2004Applicant: Gelest, Inc.Inventor: Benigno A. Janeiro
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Patent number: 6770726Abstract: Silsesquioxane polymers that are useful for preparing SiO2-rich ceramic coatings are obtained as the polymeric reaction products from the hydrolysis and condensation of organosilanes having a &bgr;-substituted alkyl group. A preferred silsesquioxane polymer is the polymeric reaction product obtained from &bgr;-chloroethyltrichlorosilane. More preferred silsesquioxones are those with non-halogenated alkyl groups, such as the &bgr;-acetoxyethyl- and &bgr;-hydroxyethyl-silsesquioxones. Coating compositions containing such silsesquioxane polymers dissolved in organic solvent may be applied to a substrate and converted to SiO2-rich ceramic thin layers by evaporating the solvent and heating the coated substrate at moderate temperatures.Type: GrantFiled: December 28, 1998Date of Patent: August 3, 2004Assignees: Gelest, Inc., University of PennsylvaniaInventors: Barry C. Arkles, Donald H. Berry
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Publication number: 20040077892Abstract: A class of volatile cyclic and acyclic azasilanes is provided as well as methods for their preparation which comprise heating aminoalkoxysilanes in the presence of an ammonium salt, sulfuric acid, or phosphonium salt. The cyclic azasilanes may be used for the treatment of inorganic surfaces, particularly nanoparticles, by a ring-opening reaction when non-hydrolytic deposition methods are required.Type: ApplicationFiled: April 23, 2003Publication date: April 22, 2004Applicant: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan, Gerald L. Larson
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Patent number: 6642403Abstract: This invention relates to a series of fluoroalkylsilane compounds of formula I. These compounds are silylation reagents which enhance the solubility of the silylated products in fluorocarbon solvents for preferred use in fluorous phase synthesis. Use of these compounds protects fragile hydrogen groups and also provides for the straightforward separation of the ultimate reaction products though fluorous phase extraction. This invention also relates to a two-step process for making compounds of formula I. The process comprises reacting an alkyldialkoxysilane with a perfluoroalkyl-substituted silane to produce a perfluoroalkyl-substituted dialkylsiloxyalkylsilane intermediate; and reacting the intermediate with halogen.Type: GrantFiled: November 6, 2002Date of Patent: November 4, 2003Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan, Gerald L. Larson
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Publication number: 20030198587Abstract: Processes for producing tungsten nitride and tungsten nitride films are provided in which a tungsten carbonyl compound and a nitrogen-containing reactant gas are reacted at a temperature below about 600° C. Tungsten nitride precursors are also included which comprise a tungsten carbonyl compound capable of forming a tungsten nitride film in the presence of a nitrogen-containing reactant gas at a temperature of less than about 600° C.Type: ApplicationFiled: April 28, 2003Publication date: October 23, 2003Applicants: Gelest, Inc., The Research Foundation of State University of New YorkInventors: Alain E. Kaloyeros, Barry C. Arkles
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Patent number: 6586056Abstract: A method for near atmospheric pressure chemical vapor deposition of a silicon based film onto a substrate includes introducing into a deposition chamber at about atmospheric pressure: (i) a substrate; (ii) an iodosilane precursor in the vapor state having at least three iodine atoms bound to silicon; and (iii) at least one reactant gas; and maintaining a deposition temperature within the chamber from about 250° C. to about 650° C. for a period of time sufficient to deposit a silicon based film on the substrate. Silicon based films formed by near atmospheric pressure chemical vapor deposition using an iodosilane precursor in a vapor state and methods for forming silicon-based films using ultraviolet assisted chemical vapor deposition are also included.Type: GrantFiled: February 19, 2002Date of Patent: July 1, 2003Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Alain E. Kaloyeros
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Publication number: 20030092927Abstract: This invention relates to a series of fluoroalkylsilane compounds of formula I.Type: ApplicationFiled: November 6, 2002Publication date: May 15, 2003Applicant: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan, Gerald L. Larson
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Publication number: 20030060636Abstract: The invention includes a sulfolane functional silane comprising a sulfolane ring, an alkoxy group, a hydrocarbon backbone, and a silyl moiety. An oxygen atom of the alkoxy group is bound to the sulfolane ring, and the hydrocarbon backbone has one to fifty carbon atoms and is bound by its first terminal carbon atom to a carbon of the alkoxy group and by its second terminal carbon atom to the silicone atom of the silyl moiety. The silyl moiety comprises at least one hydrolyzable group and/or a non-hydrolyzable group that is a substituted or unsubstituted siloxane group. A method to stabilize a silane solution is described and includes adding the sulfolane functional silane of the invention to a solution containing silane hydrosylates.Type: ApplicationFiled: July 12, 2002Publication date: March 27, 2003Applicant: Gelest, Inc.Inventors: Barry C. Arkles, Youlin Pan