Abstract: Monolithic semiconductor structures having at least two pairs of two lateral semiconductor devices combined on a first surface of a single semiconductor substrate. Embodiments include connected source terminals defining common source terminals.

Abstract: A bi-directional power switch is formed as a monolithic semiconductor device. The power switch has two MOSFETs formed with separate source contacts to the external package and a common drain. The MOSFETs have first and second channel regions formed over a well region above a substrate. A first source is formed in the first channel. A first metal makes electrical contact to the first source. A first gate region is formed over the first channel. A second source region is formed in the second channel. A second metal makes electrical contact to the second source. A second gate region is formed over the second channel. A common drain region is disposed between the first and second gate regions. A local oxidation on silicon region and field implant are formed over the common drain region. The metal contacts are formed in the same plane as a single metal layer.

Abstract: A semiconductor device includes a substrate. The substrate includes a semiconductor material. An electrically isolated region is formed over the substrate. A metal-oxide-semiconductor field-effect transistor (MOSFET) is formed over the substrate within the electrically isolated region. The electrically isolated region includes a trench formed around the electrically isolated region. An insulative material such as silicon dioxide (SiO2) may be deposited into the trench. A diode is formed over the substrate within the electrically isolated region. In one embodiment, the diode is a Schottky diode. A metal layer may be formed over a surface of the substrate to form an anode of the diode. A first electrical connection is formed between a source of the MOSFET and an anode of the diode. A second electrical connection is formed between a drain of the MOSFET and a cathode of the diode.

Abstract: Provided herein is an exemplary embodiment of a semiconductor chip for directly connecting to a carrier. The chip includes a metal layer applied to a top surface of the chip; a passivation layer applied over the metal layer such that portions of the passivation layer is selectively removed to create one or more openings (“bond pads”) exposing portions of the metal layer and one or more solderable metal contact regions formed on each of the one or more openings. The solderable metal contact regions electrically connect to the carrier when the chip is positioned face down on the carrier, supplied with a thin layer of solder and heated.

Abstract: Provided herein, in accordance with one aspect of the present invention, are exemplary embodiments of semiconductor chips having low metallization series resistance. In one embodiment, the semiconductor chip comprises a semiconductor substrate and a metallization structure formed on the semiconductor substrate; an under bump metallurgy (“UBM”) structure layer formed over the metallization structure; and a bump formed over said UBM layer; wherein the largest linear dimension of said UBM layer is larger than the diameter of said bump.

Abstract: A bi-directional power switch is formed as a monolithic semiconductor device. The power switch has two MOSFETs formed with separate source contacts to the external package and a common drain. The MOSFETs have first and second channel regions formed over a well region above a substrate. A first source is formed in the first channel. A first metal makes electrical contact to the first source. A first gate region is formed over the first channel. A second source region is formed in the second channel. A second metal makes electrical contact to the second source. A second gate region is formed over the second channel. A common drain region is disposed between the first and second gate regions. A local oxidation on silicon region and field implant are formed over the common drain region. The metal contacts are formed in the same plane as a single metal layer.

Abstract: A power MOSFET is provided on a semiconductor die to withstand radiation exposure. The semiconductor die is mounted on a die flag of a leadframe. The MOSFET includes a substrate and epitaxial layer formed over the substrate. A source region is formed in a surface of the semiconductor die. The source region is coupled to the die flag. A contact pad is formed on the source region. A base region is formed in the surface of the semiconductor die adjacent to the source region. The base region is electrically connected to the contact pad. A drain region is formed in the surface of the semiconductor die. The drain region is coupled to a first wire bond pad on the leadframe. A gate structure is formed over a channel between the source region and drain region. The gate structure is coupled to a second wire bond pad on the leadframe.

Abstract: A lateral power semiconductor device has a substrate and an isolation layer formed over the substrate for reducing minority carrier storage in the substrate. A well region is formed over the isolation layer. A source region, drain region, and channel region are formed in the well. A first region is formed on a surface of the lateral power semiconductor device adjacent to the source region. The lateral power semiconductor device has a body diode between the first region and drain region. The isolation layer confines the minority carrier charge from the body diode to a depth of less than 20 ?m from the surface of the lateral power semiconductor device. In one embodiment, the isolation layer is a buried oxide layer and the substrate is an n-type or p-type handle wafer. Alternatively, the isolation layer is an epitaxial layer and the substrate is made with N+ or P+ semiconductor material.

Abstract: There is provided herein exemplary embodiments of a semiconductor device constructed in accordance with the present invention. The device comprises: a semiconductor chip having a lateral power transistor device formed therein. The chip has an upper surface and source, drain and gate contact terminals on the upper surface thereof. Each of the source, drain and gate contact terminals have a conductive ball or pillar bump thereon. A metal lead frame spans the upper surface of the chip, the metal lead frame being in electrical contact with the conductive balls or pillar bumps. A capsule encases the chip and at least a portion of the metal lead frame such that opposite ends of the metal lead frame protrudes from opposite sides of the capsule.

Abstract: Provided herein, in accordance with one aspect of the present invention, are exemplary embodiments of semiconductor chips having low metallization series resistance. In one embodiment, the semiconductor chip comprises a semiconductor substrate and a metallization structure formed on the semiconductor substrate; an under bump metallurgy (“UBM”) structure layer formed over the metallization structure; and a bump formed over said UBM layer; wherein the largest linear dimension of said UBM layer is larger than the diameter of said bump.

Abstract: A system of interconnecting regions on an integrated semiconductor device or discrete components. As first connectivity layer has first and second runners to interconnect a plurality of first and second regions. A second connectivity layer has third runners to interconnect the first runners and fourth runners to interconnect the second runners. A third connectivity layer has first pads connected to the third runners and second pads connected to the fourth runners. Solder bumps are used on the first and second pads to connect the pads to other circuits.