Patents Assigned to Headway Technologies, Inc.
  • Patent number: 10230044
    Abstract: A laminated seed layer stack with a smooth top surface having a peak to peak roughness of 0.5 nm is formed by sequentially sputter depositing a first seed layer, a first amorphous layer, a second seed layer, and a second amorphous layer where each seed layer may be Mg and has a resputtering rate 2 to 30× that of the amorphous layers that are TaN, SiN, or a CoFeM alloy. A template layer that is NiCr or NiFeCr is formed on the second amorphous layer. As a result, perpendicular magnetic anisotropy in an overlying magnetic layer that is a reference layer, free layer, or dipole layer is substantially maintained during high temperature processing up to 400° C. and is advantageous for magnetic tunnel junctions in embedded MRAMs, spintronic devices, or in read head sensors. The laminated seed layer stack may include a bottommost Ta or TaN buffer layer.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: March 12, 2019
    Assignee: Headway Technologies, Inc.
    Inventors: Jian Zhu, Guenole Jan, Yuan-Jen Lee, Huanlong Liu, Ru-Ying Tong, Po-Kang Wang
  • Patent number: 10203379
    Abstract: A method of forming a sensor array comprising a series connection of parallel GMR sensor stripes that provides a sensitive mechanism for detecting the presence of magnetized particles bonded to biological molecules that are affixed to a substrate. The adverse effect of hysteresis on the maintenance of a stable bias point for the magnetic moment of the sensor free layer is eliminated by a combination of biasing the sensor along its longitudinal direction rather than the usual transverse direction and by using the overcoat stress and magnetostriction of magnetic layers to create a compensatory transverse magnetic anisotropy. By making the spaces between the stripes narrower than the dimension of the magnetized particle and by making the width of the stripes equal to the dimension of the particle, the sensitivity of the sensor array is enhanced.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: February 12, 2019
    Assignee: Headway Technologies, Inc.
    Inventors: Po-Kang Wang, Xizeng Shi, Chyu-Jiuh Torng
  • Publication number: 20190035558
    Abstract: A capacitor includes a dielectric structure formed of a sintered dielectric, and a first electrode and a second electrode each formed of a conductor. The dielectric structure includes a wall. The first electrode and the second electrode are insulated from each other by the wall. The wall has a height which is a dimension in a first direction, and a thickness which is a dimension in a second direction orthogonal to the first direction, the height being greater than the thickness. The wall has a non-straight shape when seen in the first direction. A manufacturing method for the capacitor includes forming the dielectric structure, and forming the first electrode and the second electrode simultaneously after the formation of the dielectric structure.
    Type: Application
    Filed: October 2, 2018
    Publication date: January 31, 2019
    Applicants: HEADWAY TECHNOLOGIES, INC., TDK CORPORATION
    Inventors: Yoshitaka SASAKI, Hiroyuki ITO, Hironori ARAKI, Seiichiro TOMITA, Atsushi IIJIMA
  • Patent number: 10193056
    Abstract: A synthetic antiferromagnetic (SAF) structure for a spintronic device is disclosed and has an FL2/AF coupling/CoFeB configuration where FL2 is a ferromagnetic free layer with intrinsic PMA. In one embodiment, AF coupling is improved by inserting a Co dusting layer on top and bottom surfaces of a Ru AF coupling layer. The FL2 layer may be a L10 ordered alloy, a rare earth-transition metal alloy, or an (A1/A2)n laminate where A1 is one of Co, CoFe, or an alloy thereof, and A2 is one of Pt, Pd, Rh, Ru, Ir, Mg, Mo, Os, Si, V, Ni, NiCo, and NiFe, or A1 is Fe and A2 is V. A method is also provided for forming the SAF structure.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: January 29, 2019
    Assignee: Headway Technologies, Inc.
    Inventors: Robert Beach, Guenole Jan, Yu-Jen Wang, Ru-Ying Tong
  • Patent number: 10193062
    Abstract: A magnetic tunnel junction (MTJ) is disclosed wherein first and second interfaces of a free layer (FL) with a first metal oxide (Hk enhancing layer) and second metal oxide (tunnel barrier), respectively, produce perpendicular magnetic anisotropy (PMA) to increase thermal stability. In some embodiments, a continuous or discontinuous metal (M) or MQ alloy layer within the FL reacts with scavenged oxygen to form a partially oxidized metal or alloy layer that enhances PMA and maintains acceptable RA. M is one of Mg, Al, B, Ca, Ba, Sr, Ta, Si, Mn, Ti, Zr, or Hf, and Q is a transition metal, B, C, or Al. Methods are also provided for forming composite free layers where interfacial perpendicular anisotropy is generated therein by contact of the free layer with oxidized materials.
    Type: Grant
    Filed: May 7, 2018
    Date of Patent: January 29, 2019
    Assignee: Headway Technologies, Inc.
    Inventors: Jodi Mari Iwata, Guenole Jan, Ru-Ying Tong, Po-Kang Wang
  • Patent number: 10186288
    Abstract: A method of forming a TAMR (thermally assisted magnetic recording) write head that uses weakly plasmonic materials that are mechanically strong and thermally stable to create plasmon near field energy. The replacement of highly plasmonic materials like Au with a weakly plasmonic material like Rh avoids the thermal deformations of softer metals like Au. To maintain the performance of the head, it includes pre-focusing structures that concentrate plasmon energy as it moves towards the air bearing surface (ABS). A waveguide blocker at the distal end of the waveguide enhances the plasmons at the interface between the blocker and the dielectric material at the distal end of the waveguide. A pair of symmetrically disposed optical side shields (OSS) are formed to either side of the pole tip and a weakly plasmonic optical field enhancer of sharply defined line-width further strengthens the optical field at its point of application.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: January 22, 2019
    Assignee: Headway Technologies, Inc.
    Inventors: Weihao Xu, Cherng-Chyi Han, Weisheng Hu, Shengyuan Wang, Wen-Ding Huang, Ittetsu Kitajima
  • Publication number: 20190019623
    Abstract: A capacitor includes a dielectric structure formed of a sintered dielectric, and a first electrode and a second electrode each formed of a conductor. The dielectric structure includes a wall. The first electrode and the second electrode are insulated from each other by the wall. The wall has a height which is a dimension in a first direction, and a thickness which is a dimension in a second direction orthogonal to the first direction, the height being greater than the thickness. The wall has a non-straight shape when seen in the first direction.
    Type: Application
    Filed: July 17, 2017
    Publication date: January 17, 2019
    Applicants: HEADWAY TECHNOLOGIES, INC., TDK CORPORATION
    Inventors: Yoshitaka SASAKI, Hiroyuki ITO, Hironori ARAKI, Seiichiro TOMITA, Atsushi IIJIMA
  • Patent number: 10157634
    Abstract: A process flow is disclosed for forming a MR sensor having an antiferromagnetic (AFM) layer recessed behind a bottom shield to reduce reader shield spacing and improve pin related noise. An AP2/AFM coupling layer/AP1 stack that extends from an air bearing surface to the MR sensor backside is formed above the AFM layer. The AP2 layer is pinned by the AFM layer, and the AP1 layer serves as a reference layer to an overlying free layer during a read operation. The AP1 and AP2 layers have improved resistance to magnetization flipping because back portions thereof have a full cross-track width “w” between MR sensor sides thereby enabling greater pinning strength from the AFM layer. Front portions of the AP1/AP2 layers lie under the free layer and have a track width less than “w”. The bottom shield may have an anti-ferromagnetic coupling structure.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: December 18, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Ruhang Ding, Yewhee Chye, Wenyu Chen, Kunliang Zhang, Yan Wu, Min Li
  • Patent number: 10152991
    Abstract: A method for manufacturing a TAMR (thermal assisted magnetic recording) write head. The write head has a metal blocker formed against a distal end of a waveguide. The waveguide focuses optical radiation on an adjacent plasmon generator where it excites plasmon modes that heat the recording medium. Although the plasmon generator typically heats the recording medium using the plasmon near field to supply the required Joule heating, an unblocked waveguide would also send optical radiation to the medium and surrounding structures producing unwanted heating and device unreliability. The role of the blocker is to block the unwanted optical radiation and, thereby, to limit the heating to that supplied by the plasmon near field.
    Type: Grant
    Filed: December 11, 2017
    Date of Patent: December 11, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Tsutomu Chou, Kouji Shimazawa, Tobias Maletzky, Weihao Xu, Shinji Hara, Yoshihiro Tsuchiya, Yiming Wang, Cherng-Chyi Han, Xuhui Jin
  • Patent number: 10153427
    Abstract: A process flow for forming magnetic tunnel junctions (MTJs) with minimal sidewall residue and reduced low tail population is disclosed wherein a pattern is first formed in a hard mask that is an uppermost MTJ layer. Thereafter, the hard mask pattern is etch transferred through the underlying MTJ layers including a reference layer/tunnel barrier/free layer stack. The etch transfer may be completed in a single RIE step based on a first flow rate of O2 and a second flow rate of an oxidant such as CH3OH where the CH3OH/O2 ratio is at least 7.5:1. The RIE may also include a flow rate of a noble gas. In other embodiments, a chemical treatment with an oxidant such as CH3OH, and a volatilization at 50° C. to 450° C. may follow an etch transfer through the MTJ stack when the ion beam etch or plasma etch involves noble gas ions.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: December 11, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Dongna Shen, Yu-Jen Wang
  • Patent number: 10134430
    Abstract: A thermally-assisted magnetic recording head includes a main pole, a plasmon generator and a heat sink. The main pole includes a first narrow portion and a first wide portion. The plasmon generator includes a second narrow portion and a second wide portion. The first narrow portion has a first side surface and a second side surface. The second narrow portion has a third side surface and a fourth side surface. The heat sink includes a first portion adjacent to the first side surface and the third side surface, and a second portion adjacent to the second side surface and the fourth side surface.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: November 20, 2018
    Assignee: HEADWAY TECHNOLOGIES, INC.
    Inventors: Yoshitaka Sasaki, Hiroyuki Ito, Hironori Araki, Shigeki Tanemura, Hideo Mamiya, Masakazu Okada
  • Patent number: 10134981
    Abstract: A magnetic tunnel junction (MTJ) that avoids electrical shorts and has improved data retention is disclosed. An uppermost capping layer has a first sidewall that is coplanar with an interface between outer oxidized portions and a center ferromagnetic portion of a free layer (FL) that has a FL width (FLW). A dielectric spacer is formed on the first sidewall and oxidized outer FL portions. The pinned layer (PL) has a width (PLW) substantially greater than FLW, and a second sidewall thereon is formed by a self-aligned etch using the dielectric spacer and capping layer as an etch mask. A sidewall layer may be formed on the second sidewall and dielectric spacer but does not degrade MTJ properties since the sidewall layer does not contact the FL and PL center portions responsible for device performance. PL width>FLW ensures greater capability for data retention especially for FLW<60 nm.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: November 20, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Yi Yang, Dongna Shen, Yu-Jen Wang
  • Patent number: 10115892
    Abstract: A seed layer stack with a uniform top surface having a peak to peak roughness of 0.5 nm is formed by sputter depositing an amorphous layer on a smoothing layer such as Mg where the latter has a resputtering rate 2 × to 30 × that of the amorphous layer. The uppermost seed (template) layer is NiW, NiMo, or one or more of NiCr, NiFeCr, and Hf while the bottommost seed layer is Ta or TaN, for example. Accordingly, perpendicular magnetic anisotropy in an overlying magnetic layer is maintained during high temperature processing up to 400° C. and is advantageous for magnetic tunnel junctions in embedded memory devices, or read head sensors. The amorphous seed layer is SiN, TaN, or CoFeM where M may be B.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: October 30, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Jian Zhu, Guenole Jan, Yuan-Jen Lee, Huanlong Liu, Ru-Ying Tong, Jodi Mari Iwata, Vignesh Sundar, Luc Thomas, Yu-Jen Wang, Sahil Patel
  • Patent number: 10115415
    Abstract: A magnetic pulse recording method is disclosed wherein a magnetic field is turned off for a portion (tOFF) of a bit duration before or after total recording time is completed for each bit. Typical bit lengths of 10 nm to 50 nm must be less than the main pole down-track length, and total recording time (tREC) must be less than the bit duration such that bit duration equals (tREC+tOFF). In a random bit sequence, tREC may be maintained for each bit while tOFF increases as bit duration increases. The method applies to mobile hard disk drives (HDD) with 2.5 inch disks, and to nearline HDD with 3.5 inch disks where bit durations vary from 0.3 to 1.2 ns for recording velocities between 10 and 47 m/sec. The time required to turn off the field may be <10 picoseconds, and comprise a linear or non-linear waveform.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: October 30, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Yuhui Tang, Ying Liu
  • Patent number: 10115418
    Abstract: A hard magnet stabilization scheme is disclosed for a top shield and junction shields for double or triple dimension magnetic reader structures. In one design, the hard magnet (HM) adjoins a top or bottom surface of all or part of a shield domain such that the HM is recessed from the air bearing surface to satisfy reader-to-reader spacing requirements and stabilizes a closed loop magnetization in the top shield. Alternatively, the HM may replace a shield domain. The top shield may have various shapes including a ring shape in which the HM stabilizes a vortex magnetization. In a whole shield coupling design, the HM contacts all of the top shield bottom surface except over the sensor and junction shield. HM magnetization is set or reset from room temperature to 100° C. to maintain a desired magnetization direction in the top shield, junction shield, and free layer in the sensor.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: October 30, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Junjie Quan, Glen Garfunkel, Yewhee Chye, Kunliang Zhang, Min Li
  • Patent number: 10109304
    Abstract: A PMR (perpendicular magnetic recording) head includes a tapered main write pole (MP) with a beveled face and thin, laterally disposed side shields (SS) that do not fully extend along the sides on the write pole in the down-track direction. Denoting the down-track thickness of the side shields as SSt, that thickness satisfies 0<SSt<(MPt+LGt), where MPt is the thickness of the main pole and LGt is the thickness of the leading edge gap beneath the leading edge of the write pole. The thin side shields maintain the write bubble while producing a better Bits Per Inch-Tracks Per Inch (BPI-TPI) tradeoff line.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: October 23, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Ying Liu, Yuhui Tang, Jiun-Tlng Lee, Yue Liu
  • Patent number: 10103322
    Abstract: A method for etching a magnetic tunneling junction (MTJ) structure is described. A stack of MTJ layers on a bottom electrode on a wafer is provided. A hard mask layer is provided on the MTJ stack. The hard mask layer is patterned to form a hard mask. The MTJ stack is patterned to form a MTJ device wherein sidewall damage is formed on sidewalls of the MTJ device. The sidewall damage is removed by applying a CMP slurry which physically attacks and removes the sidewall damage on the MTJ device.
    Type: Grant
    Filed: March 22, 2017
    Date of Patent: October 16, 2018
    Assignee: Headway Technologies Inc.
    Inventors: Zhongjian Teng, Tom Zhong, Jesmin Haq
  • Patent number: 10102896
    Abstract: A circuit and method for adaptive trimming of the reference signal for sensing data during a read operation of magnetic memory cells to improve read margin for the magnetic memory cells. The circuit has a trim one-time programmable memory array programmed with offset trim data applied to magnetic memory array sense amplifiers. Sense amplifier trimming circuits receive and decode the trim data to determine offset trim signal magnitude to adjust the reference signal to improve the read margin. The method sets the offset trim level to each increment of the offset trim level. Data is written and read to the magnetic memory array, the number of errors in the array is accumulated for each setting of the offset trim level. The error levels are compared and the appropriate trim level is programmed to the trim memory cells such that a read margin of the sense amplifier is improved.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: October 16, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Guenole Jan, Po-Kang Wang, John De Brosse, Yuan-Jen Lee
  • Patent number: 10068596
    Abstract: An optically shielded TAMR (thermally assisted magnetic recording) write head has a metal waveguide blocker formed against a distal end of a waveguide and a pair of symmetrically disposed optical side shields formed to either side of a plasmon generator formed above the waveguide. The waveguide focuses optical radiation on the adjacent plasmon generator where it excites plasmon modes that heat the recording medium with near-field energy and the waveguide blocker prevents excess optical radiation from blurring the spot on the recording region. The optical side shields further restrict loosely coupled optical radiation from reaching the recording region and blurring the optical spot and improves down-track and cross-track thermal gradients.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: September 4, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Matteo Staffaroni, Tobias Maletzky, Xuhui Jin, Weihao Xu, Kenichi Takano
  • Patent number: 10069064
    Abstract: A process flow for forming a magnetic tunnel junction (MTJ) cell that is self-aligned to an underlying bottom electrode (BE) is disclosed. The BE is comprised of a lower BE layer having a first width (w1), and an upper (second) BE layer with a second width (w2) where w2>w1. Preferably, the BE has a T shape. A stack of MTJ layers including an uppermost hard mask is deposited on the BE and has width w2 because of a self-aligned deposition process. A dummy MTJ stack is also formed around the first BE layer. An ion beam etch where ions are at an incident angle <90° with respect to the substrate is used to remove extraneous material on the sidewall. Thereafter, an encapsulation layer is deposited to insulate the MTJ cell, and to fill a gap between the first BE layer and dummy MTJ stack.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: September 4, 2018
    Assignee: Headway Technologies, Inc.
    Inventors: Jesmin Haq, Tom Zhong, Zhongjian Teng