Abstract: An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a detector, and a controller. The detector includes a photomultiplier and has a detector controller and an input unit. The photomultiplier has voltage dividing resistors, which make an amplification factor not to become constant immediately due to a change in an application voltage applied to the photomultiplier, but the detector controller controls an idle voltage and an idle voltage application time so that a multiplication factor becomes constant, during a period from when analysis conditions are input to the input unit in advance until a sample containing an analysis-targeted element is introduced into the inductively coupled plasma generation unit.

Abstract: The present invention provides an X-ray generator including an X-ray tube 2 radiating primary X-rays X1 to a specimen S, a housing 3 accommodating the X-ray tube 2, an X-ray radiation area controller 4 limiting the radiation area of the primary X-rays X1 from the X-ray tube 2 to the specimen S, and a device holder 5 holding the X-ray radiation area controller 4 with respect to the housing 3. The X-ray tube includes a case 6, an electron ray source 7 generating electron rays, and a target unit 8 having a base fixed to the case and receiving electron rays through a protruding free end. The device holder has a fixed-base 5a fixed to the housing, directly under the base of the target unit, and a supporting extension 5b extending from the fixed-base in the protrusion direction of the target unit and supporting the X-ray radiation area controller.

Abstract: A sample plate is for X-ray analysis to which a sample is fixed in performing an analysis using an X-ray fluorescent analyzer, and includes: a plate-like body that supports the sample; and a code-indicated portion provided on the plate-like body in which information on the sample is encoded and indicated.

Abstract: Disclosed herein is a scanning probe microscope including a cantilever, a three-dimensional moving mechanism moving a sample stage in three dimensions, and a measurement chamber sealed not to be exposed to external air. At least the cantilever, the sample stage, and the three-dimensional moving mechanism are accommodated in the measurement chamber. The measurement chamber is provided with a pair of guide rails used to transport the sample stage. The sample stage has an engagement portion. The three-dimensional moving mechanism is disposed in the vicinity of a predetermined position and between the guide rails. The three-dimensional moving mechanism can be moved to above the guide rails and below the guide rails. When the sample stage is transported to the predetermined position in a horizontal direction, the three-dimensional moving mechanism is lifted up to the bottom surface of the sample stage so that the scanning probe microscope can perform measurement.

Abstract: A sample holder for X-ray analysis is provided with: a first annular member; a second annular member configured to be inserted and fitted into the first annular member in a state where a first film is sandwiched between the first annular member and the second annular member while the first film is being stretched to cover a lower opening portion of the second annular member; and a third annular member configured to be inserted and fitted into the second annular member in a state where a second film is sandwiched between the second annular member and the third annular member while the second film is being stretched to cover a lower opening portion of the third annular member. The first film and the second film are configured to hold a sample for X-ray analysis by sandwiching the sample between the first film and the second film.

Abstract: A sample processing evaluation apparatus includes a charged particle beam column that irradiates a sample with charged particle beam, a sample holder that holds both ends of the sample, and a sample stage on which the sample holder is placed, in which the sample holder is configured to rotate the sample about a rotation axis between the sample stage and the charged particle beam column.

Abstract: A wave height analyzer generates pre-sensitivity correction data using a radiation pulse signal transmitted from a room temperature amplifier, a heater value acquired from a temperature control section, a base line of a current flowing to a TES acquired from a base line monitor mechanism. The wave height analyzer outputs the pre-sensitivity correction data to a sensitivity correction arithmetic operation unit and receives post-sensitivity correction data, on which sensitivity correction is performed. The wave height analyzer generates composite data of a combination of the pre-sensitivity correction data and the post-sensitivity correction data. A spectrum display section receives pieces of composite data sequentially created by the wave height analyzer and displays at least one of a spectrum before sensitivity correction and a spectrum after sensitivity correction, in response to receiving an operator's request.

Abstract: A superconductive transition edge sensor detects radiation. A wave height analyzer generates an energy spectrum of radiation using a detection signal which is output from the superconductive transition edge sensor. A temperature control section and a base line monitor mechanism acquire a physical quantity of data having correlation with detection sensitivity of the superconductive transition edge sensor. A sensitivity correction arithmetic operation unit associates the physical quantity of a plurality of pieces of the acquired data at a plurality of different timings over a predetermined period of time with the detection signal at a certain timing and corrects the detection signal at the certain timing in accordance with the detection sensitivity of the superconductive transition edge sensor by using information regarding the correlation between the physical quantity of the plurality of pieces of data and the detection sensitivity of the superconductive transition edge sensor.

Abstract: A scanning probe microscope capable of controlling a decrease of the resolution of an objective lens disposed in the scanning probe microscope, and capable of easily carrying out the adjustment of an optical axis of an optical lever using the objective lens. The scanning probe microscope includes: a cantilever having a probe; a light source part radiating beams; a first reflective part reflecting an incident beam (L0) and guiding the incident beam to a reflective surface; a light receiving part receiving the beams; a second reflective part reflecting a reflected beam (L1) and guiding the reflected beam to the light receiving part; and an objective lens disposed to face the cantilever and adopted to observe and capture an area around the cantilever, the objective lens having the number of openings of NA, wherein the first reflective part is disposed at a position between the objective lens and the cantilever.

Abstract: Disclosed herein is an evolved gas analyzer and a method for analyzing evolved gas, the apparatus enhancing detection accuracy for gas component without providing the apparatus in a large size. The apparatus includes a heating unit evolving a gas component by heating a sample, a detecting means detecting the gas component, a gas channel connecting the heating unit to the detecting means, the gas channel through which mixed gas of the gas component and carrier gas flows, wherein the gas channel includes a branching channel being open to outside and including a discharge flow rate controlling device, and a flow rate control device controlling the discharge flow rate controlling device based on a detection signal received from the detecting means so as to control the detection signal to be within a predetermined range.

Abstract: Disclosed herein are an evolved gas analyzer and a method for analyzing evolved gas, the apparatus cooling a sample holder in a short time without using excessive cooling performance and without providing the entire apparatus in an excessively large size, thereby enhancing analysis work efficiency. The apparatus 200 includes: a sample holder 20 holding a sample S; a heating unit 10 receiving the sample holder therein, and evolving a gas component G by heating the sample; a detecting means 110 detecting the gas component; a sample holder supporting unit 204L movably supporting the sample holder to move the sample holder to predetermined outer and inner positions of the heating unit; and a cooling unit 30 provided at an outside of the heating unit, and cooling the sample holder by being in direct or indirect contact with the sample holder, when the sample holder is moved to a discharging position.

Abstract: Disclosed herein is a method for analyzing evolved gas and an evolved gas analyzer, the method correcting detection sensitivity differences in analysis devices, day-to-day variations thereof, thereby quantifying a measurement target with high accuracy. The method for analyzing evolved gas of the apparatus including: a sample holder; a heating unit evolving a gas component; an ion source generating ions by ionizing the gas component; a mass spectrometer detecting the gas component; and a gas channel through which mixed gas flows, the method including: operating a discharged flow rate controlling process of controlling a flow rate of the mixed gas discharged to outside; operating a sample holder cooling process of cooling the sample holder by bringing the sample holder into contact with a cooling unit; and operating a correction process including: correcting a mass spectrum position; calculating a sensitivity correction factor; and calculating a heating correction factor.

Abstract: Disclosed herein is a method for correcting an evolved gas analyzer and the evolved gas analyzer. The method includes: correcting a mass spectrum position to be located at a reference spectrum position, the mass spectrum position corresponding to a mass-to-charge ratio m/z of a mass spectrum of a gas component of a reference sample; calculating a sensitivity correction factor Cs=Ss/S by using an area S and a reference area Ss of a chromatogram, the sensitivity correction factor being used to measure an area of a chromatogram of the gas component of a test sample; and calculating a heating correction factor H=t/ts by using a time t and a reference time is indicating a maximum peak of the chromatogram about the reference sample, the heating correction factor being used to correct a heating rate of the test sample when measuring the gas component of the test sample.

Abstract: An X-ray analyzer is provided with: a sample stage on which a sample is disposed; an X-ray source configured to irradiate the sample with a primary X-ray at a first angle; a detector configured to detect a secondary X-ray generated from the sample; a position adjustment mechanism configured to adjust a relative position between the sample stage and the primary X-ray; a first light source configured to emit a first light beam at a second angle toward a focal position of the primary X-ray or toward a predetermined position; and a second light source configured to emit a second light beam at a third angle toward the focal position or toward the predetermined position, wherein the first light beam and the second light beam are configured to have visibility sufficient for enabling visual distinction.

Abstract: A scanning probe microscope includes a cantilever that has a first attachment surface and a cantilever attachment portion that has a second attachment surface to which the first attachment surface of the cantilever is attached. Columnar elements including nanofibers or nanotubes are formed on the second attachment surface, and the second attachment surface adheres to the first attachment surface by using the columnar element.

Abstract: An X-ray fluorescence analysis apparatus is provided with: an excitation source configured to excite an analysis target sample to emit a characteristic X-ray; an X-ray detector configured to detect the characteristic X-ray emitted from the analysis target sample; and an electromagnetic wave shield and a heat shield that are sequentially arranged from the analysis target sample toward the X-ray detector. The electromagnetic wave shield is provided with a through hole portion on which a through hole through which the characteristic X-ray passes is formed, the through hole having a size equal to or smaller than 50 ?m. The heat shield is provided with a window portion through which the characteristic X-ray is passed through.

Abstract: A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

Abstract: A charged particle beam apparatus automatically prepares a sample piece from a sample and includes a charged particle beam irradiation optical system that irradiates a charged particle beam to a sample placed on a movable sample stage. A sample piece transferring unit holds and transfers a sample piece separated and extracted from the sample, and a holder support holds a sample piece holder to which the sample piece is transferred. A computer controls a position of an object based on a template prepared from an image of the object acquired by irradition with the charged particle beam and position information acquired from the image of the object. The sample piece transferring unit includes a needle that transfers the sample piece separated and extrated from the sample, and a needle actuting mechanism that actuates the needle.

Abstract: An X-ray fluorescence analyzer includes: a measurement device having: an X-ray source that emits an X-ray; an irradiation area restricting member that restricts an area of a measurement sample to be irradiated with the X-ray as a primary X-ray; and a detector that detects a secondary X-ray generated from the measurement sample. The analyzer further includes: a sample stage that holds and moves the measurement sample between a measurement position at which the measurement sample is irradiated with the primary X-ray to detect the secondary X-ray by the detector and a first retracted position at which the measurement sample is retracted from the measurement position; and a calibration sample moving mechanism that holds a calibration sample for calibrating the measurement device and moves the calibration sample between the measurement position and a second retracted position at which the calibration sample is retracted from the measurement position.