Patents Assigned to Hitachi Tokyo Electronics Co.
  • Patent number: 5173719
    Abstract: The present invention relates to a technique, in the inspection of a defect of a semiconductor memory or the like, in which chip comparison is separated from repetitive pattern comparison in a region of a wafer to be inspected whereby both the comparisons are rendered possible to perform in parallel in one and the same scanning.
    Type: Grant
    Filed: December 19, 1990
    Date of Patent: December 22, 1992
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Yuzo Taniguchi, Tooru Fukui, Mikihito Saito, Yoshiichi Hori, Takahiro Kamagata
  • Patent number: 5080039
    Abstract: A processing apparatus includes a processing chamber and an insertion jig for inserting an object to be processed into the processing chamber. The processing chamber and the insertion jig are adapted to be individually movable relative to a heating section, so that the operation of loading and unloading the object into and from the processing chamber effected by the insertion jig is conducted outside the heating section, thereby preventing the outside air from being induced to enter the heated processing chamber, together with the object of the processing, and thus avoiding the occurrence of various problems, for example, the object of processing being disorderly oxidized by the oxygen contained in the outside air, and the foreign matter contained in the outside air being undesirably attached to the surface of the object, so as to obtain excellent processing results.
    Type: Grant
    Filed: June 8, 1990
    Date of Patent: January 14, 1992
    Assignees: Hitachi, Ltd., Hitachi VLSI Engineering Corp., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Masatomo Kanegae, Takayoshi Kogano, Fumio Ito
  • Patent number: 5062771
    Abstract: This invention concerns a production method and a processing apparatus for semiconductor devices, as well as an evacuating apparatus used for the processing apparatus. According to this invention, since the evacuation system of pressure-reduction processing apparatus for conducting various wafer processings during production steps of semiconductor devices is constituted only with oil-free vacuum pump, deleterious oil contaminations or carbonation products of oils produced from oils upon heating are not present in the pressure-reducing processing chamber as compared with conventional pressure-reducing processing apparatus using a vacuum oil pump as an evacuation pump and the production method of semiconductor devices using such apparatus.
    Type: Grant
    Filed: March 20, 1989
    Date of Patent: November 5, 1991
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co. Ltd.
    Inventors: Akihiko Satou, Tadao Kusaka, Shigeo Tomiyama, Kouzi Aoki, Ichiro Gyobu, Kimio Muramatsu, Hiroaki Sakamoto, Shinjiroo Ueda, Masahiro Mase, Takashi Nagaoka
  • Patent number: 5060841
    Abstract: A wire bonding method and apparatus comprising a comparator wherein a difference between a position command signal for displacing a moving member such as, for example, a wire bonding tool, and a position signal obtained from a sensor for detecting the position of the moving member is compared with a predetermined threshold or reference value so that a stopping of the moving member, caused by an external force such as a contact therewith with another member can be rapidly and accurately electrically detected. A wire bonding method and apparatus is useable for producing a semiconductor device.
    Type: Grant
    Filed: October 2, 1990
    Date of Patent: October 29, 1991
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Yoshio Oshima, Yasushi Ishii, Hideki Hidaka, Kunihiro Tsuchiya
  • Patent number: 5031821
    Abstract: The present invention is characterized in that, in a ball wedge bonding using a fine bonding wire precoated with a thin insulating layer, ultrasonic vibration is applied to a capillary to effect the delivery of the wire smoothly during movement of the capillary to a second bonding point while delivering the wire after ball bonding at a first bonding point.
    Type: Grant
    Filed: August 16, 1989
    Date of Patent: July 16, 1991
    Assignees: Hitachi, Ltd., Hitachi Microcomputer Engineering Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Tsuyoshi Kaneda, Susumu Okikawa, Hiroshi Mikino, Hiroshi Watanabe, Toshihiro Satou, Atsushi Onodera, Michio Tanimoto
  • Patent number: 5027107
    Abstract: A small-sized thin frequency sensor developed for prevention of theft of an article. The frequency sensor comprises a receiving antenna portion to receive high frequency waves, and a transmitting antenna portion which is shaped into a closed loop with a diode incorporated therein and is disposed linearly to the receiving antenna portion to form an oblong rectangular contour as a whole.
    Type: Grant
    Filed: June 27, 1989
    Date of Patent: June 25, 1991
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Yasuhiro Matsuno, Hajime Terakado, Masaru Mochizuki, Heiji Moroshima, Hiroyuki Kamei
  • Patent number: 4996422
    Abstract: A mass spectrometer, including an evacuable vessle, mass separation means provided in the evacuable vessel for separating ions in accordance with the mass thereof, and ion detection means provided in the evacuable vessel for detecting ions emitted from the mass separation means to convert the emitted ions into an electric signal, in which the ion detection means includes an electron-multiplier for detecting positive ions and a photo-multiplier for detecting negative ions. According to this mass spectrometer, positive ions can be detected at high sensitivity, and negative ions are readily detected.
    Type: Grant
    Filed: June 1, 1989
    Date of Patent: February 26, 1991
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Yasuhiro Mitsui, Keiji Hasumi, Shinichiro Watase, Katsumi Kuriyama, Kazuo Nakano
  • Patent number: 4957781
    Abstract: A processing apparatus includes a processing chamber and an insertion jig for inserting an object to be processed into the processing chamber. The processing chamber and the insertion jig are adapted to be individually movable relative to a heating section, so that the operation of loading and unloading the object into and from the processing chamber effected by the insertion jig is conducted outside the heating section, thereby preventing the outside air from being induced to enter the heated processing chamber, together with the object of the processing, and thus avoiding the occurrence of various problems, for example, the object of processing being disorderly oxidized by the oxygen contained in the outside air, and the foreign matter contained in the outside air being undesirably attached to the surface of the object, so as to obtain excellent processing results.
    Type: Grant
    Filed: June 2, 1988
    Date of Patent: September 18, 1990
    Assignees: Hitachi, Ltd., Hitachi VLSI Engineering Corp., Hitachi Tokyo Electronics Co.
    Inventors: Masatomo Kanegae, Takayoshi Kogano, Fumio Ito
  • Patent number: 4835114
    Abstract: This invention concerns a production method and a processing apparatus for semiconductor devices, as well as an evacuating apparatus used for the processing apparatus. According to this invention, since the evacuation system of pressure-reduction processing apparatus for conducting various wafer processings during production steps of semi-conductor devices is constituted only with oil-free vacuum pump, deleterious oil contaminations or carbonation products of oils produced from oils upon heating are not present in the pressure-reducing processing chamber as compared with conventional pressure-reducing processing apparatus using a vacuum oil pump as an evacuation pump and the production method of semiconductor devices using such apparatus.
    Type: Grant
    Filed: February 19, 1987
    Date of Patent: May 30, 1989
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Akihiko Satou, Tadao Kusaka, Shigeo Tomiyama, Kouzi Aoki, Ichiro Gyobu, Kimio Muramatsu, Hiroaki Sakamoto, Shinjiroo Ueda, Masahiro Mase, Takashi Nagaoka
  • Patent number: 4702371
    Abstract: A container for electrical components is formed of an elongated tube of a plastic material. A top wall of the tube consists of a lengthwise-extending transparent window, and electrically conductive portions sandwiching the transparent window. In order to prevent the electrostatic breakdown of the electrical components, which occurs when the electrical components contact the transparent window, the window is made thinner than the electrically conductive portions of the top wall of the tube so that the plane including the lower surface of the window and the plane including the lower surfaces of the conductive portions are spaced at a predetermined distance.
    Type: Grant
    Filed: June 26, 1986
    Date of Patent: October 27, 1987
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Akio Hoshi, Toshiyuki Oura
  • Patent number: 4701608
    Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.
    Type: Grant
    Filed: January 29, 1986
    Date of Patent: October 20, 1987
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa