Abstract: An endoscope with a distal housing element which has a lens element, and with a nozzle element for cleaning the surface of the lens element. The lens element is a curved lens element, the curvature of which protrudes from the housing element in a distal direction. The nozzle element is arranged at the distal side of the distal housing element adjacent to the curved lens element. The nozzle element has a distal nozzle opening in the form of an elongated medium outlet slit directed toward the curved lens element.

Abstract: A mask blank includes a substrate having a main surface on which a multilayer reflective film and the pattern-forming thin film are provided in this order. The thin film contains tantalum, niobium, and nitrogen. An X-ray diffraction pattern obtained by analyzing the thin film by Out-of-Plane measurement of X-ray diffraction satisfies the relationship of at least one of Imax1/Iavg1?7.0 and Imax2/Iavg2?1.0, where Imax1 is a maximum value of diffraction intensity at a diffraction angle 2? in a range of 34 to 36 degrees, Iavg1 is an average value of diffraction intensity at a diffraction angle 2? in a range 32 to 34 degrees, Imax2 is a maximum value of diffraction intensity at a diffraction angle 2? of 40 to 42 degrees, and Iavg2 is an average value of diffraction intensity at a diffraction angle 2? in a range of 38 to 40 degrees.

Abstract: The invention relates to a method for manufacturing an endoscope insertion tube (2). The insertion tube (2) has a proximal passive flexible section (20) and a distal angled section (A). The passive flexible section (20) and the angled section (A) are integrally formed. Individual cuts (201, 202) are made in the flexible section (20), provided as a tube-like element, in such a way that adjacent individual cuts (201, 202) are equidistant from one another.

Abstract: An endoscope includes a phosphor layer, and a light output layer; wherein the light output layer emits a first excitation light and a second excitation light to illuminate an object space, through the phosphor layer, with first and second combined light, an intensity of the first excitation light has an absolute maximum at a first peak wavelength, an intensity of the second excitation light has an absolute maximum at a second peak wavelength different from the first peak wavelength, the phosphor layer comprises one or more phosphors, each of the one or more phosphors is configured to be excited by the first excitation light to generate first excited light of the respective phosphor, each of the one or more phosphors is configured to be excited by the second excitation light to generate second excited light of the respective phosphor.

Abstract: An aspect of the present invention is a processor for an electronic endoscope that acquires a captured image of a living tissue and performs enhancement processing. The processor includes: a region detection unit configured to detect an enhancement processing target region in the captured image from pixel information of the captured image of the living tissue; and an enhancement processing unit configured to perform enhancement processing on the enhancement processing target region detected by the region detection unit. The region detection unit detects the enhancement processing target region based on a difference in signal level between a pixel of interest in the captured image and a pixel surrounding the pixel of interest, and the enhancement processing unit performs enhancement processing on the enhancement processing target region such that enhancement is weakened as the difference in signal level is larger and enhancement is strengthened as luminance is higher.

Abstract: A program causes a computer to perform processing of acquiring an image captured by an endoscope, in a case where the image captured by the endoscope is input, inputting the acquired image to a learned model learned to output a position of a region of interest included in the image, acquiring a position of a region of interest included in the acquired image from the learned model, and outputting an enlarged image in which a portion of the image including the region of interest is enlarged on the basis of the acquired position of the region of interest.

Abstract: A reflective mask blank includes a multilayer reflective film, a first thin film, and a second thin film in this order on a main surface of a substrate, a relative reflectance R2 of the second thin film with respect to a reflectance of the multilayer reflective film in the light of 13.5 nm wavelength is 3% or more, and an extinction coefficient k1 of the first thin film in the light of 13.5 nm wavelength and a thickness d1 [nm] of the first thin film satisfy a relationship of (Formula 1). 21.5×k12×d12?52.5×k1×d1+32.

Abstract: A lens includes: an optical-functioning portion that is a glass press-molded product and has both lens surfaces in an optical axis direction and a volume absorption portion allowing a shape error due to press-molding around the lens surfaces; and a flange portion made of a material different from the glass of the optical-functioning portion, fixed to the optical-functioning portion to surround the volume absorption portion, and having a position reference surface serving as a reference of a lens position. An outer diameter D in an orthogonal direction to the optical axis defined by the flange portion and a thickness t of the flange portion satisfy the following condition (1) or (2). when 2 mm?D?5 mm, 0.15?t?0.35??(1) when D>5 mm, 0.15+(D?5)×0.03?t?0.15+(D?5)×0.

Abstract: A reflective mask blank comprises a substrate; a multilayer reflective film which is formed on the substrate and reflects EUV light; and a layered film which is formed on the multilayer reflective film. The layered film has an absolute reflectance of 2.5% or less with respect to EUV light, and comprises a first layer and a second layer formed on the first layer; and the first layer comprises a phase shift film which shifts the phase of EUV light. Alternatively, the layered film is a phase shift film which comprises a first layer and a second layer formed on the first layer, and which shifts the phase of EUV light; and the first layer comprises an absorption layer that has an absolute reflectance of 2.5% or less with respect to EUV light.

Abstract: An endoscopic treatment tool includes a tubular portion; a rod that protrudes from a distal end surface of the tubular portion, and has a variable protrusion amount from the distal end surface; a first connection port to which a tool for water supply or suction is connectable; a first distal end opening in a distal end surface of the rod; a first channel that extends in an axial direction of the tubular portion, and has a distal end communicating with the first distal end opening and a proximal end communicating with the first connection port; a second connection port to which the tool is connectable; a second distal end opening in the distal end surface of the tubular portion; and a second channel, and has a distal end communicating with the second distal end opening and a proximal end communicating with the second connection port.

Abstract: An imaging module includes: an image sensor; and a mounting board on which the image sensor is mounted together with a plurality of passive components. The mounting board includes: a first surface on which the image sensor is surface-mounted; a second surface that is located on an opposite side to the first surface and on which the passive component is mounted; a third surface that is continuous with the second surface via a step and on which the passive component is mounted; and a columnar cable connection block that rises from the second and third surfaces and to which a cable is connected.

Abstract: Provided is a small-sized circuit board fixing structure capable of enabling a circuit board on a base to be easily replaced. A circuit board fixing structure configured to fix a circuit board onto a surface of a base includes a wire pattern formed on a surface of the circuit board, a first through hole penetrating from a front surface to a rear surface of the circuit board, a second through hole penetrating from a front surface to a rear surface of the base so as to communicate with the first through hole, an electrode penetratively inserted into the second through hole, and a fixing member engaged with the electrode mounted on the surface of the circuit board and configured to fix the circuit board to the base, in which when the fixing member and the electrode are engaged, the wire pattern and the electrode are electrically connected through the fixing member.

Abstract: A mask blank has a substrate and a pattern-forming thin film formed on the substrate. The pattern-forming thin film is one of a single-layer film containing chromium and nitrogen or a multi-layer film comprising at least one chromium nitride-based layer. An arithmetic mean roughness Sa is 1.0 nm or less and a ratio of a maximum height Sz to the arithmetic mean roughness Sa Sz/Sa is 14 or less in a 1-?m square positioned in a central region on a surface of the pattern-forming thin film with respect to a center of the substrate.

Abstract: A reflective film coated substrate includes a substrate having two main surfaces opposite to each other and end faces connected to outer edges of the two main surfaces; and a reflective film formed on one of the main surfaces and extending onto at least part of the end faces. The reflective film on the main surface has a multilayer structure including low refractive index layers and high refractive index layers alternately formed. The reflective film which extends onto the end faces has a single-layer structure containing a first element higher in content than any other element in the low refractive index layers and a second element higher in content than any other element in the high refractive index layers.

Abstract: Provided is a reflective mask blank that can reduce the shadowing effect of a reflective mask and form a fine and high-precision absorbent body pattern.

Abstract: Provided is an endoscope tip or capsule endoscope comprising an illumination device configured to illuminate a scene; wherein the illumination device includes a first light source configured to emit light with a first spectral distribution and a second light source configured to emit light with a second spectral distribution; the first spectral distribution is different from the second spectral distribution; a clearance between the first light source and the second light source is smaller than twice a dimension among the dimensions of the first light source and the dimensions of the second light source; the clearance between the first light source and the second light source indicates the length of a shortest straight line segment which connects a point on the first light source with a point on the second light source.

Abstract: Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the following order on a substrate, a multilayer reflective film and a phase-shift film that shifts the phase of EUV light, said reflective mask blank characterized in that: the phase-shift film has a first layer and a second layer; the first layer comprises a material that contains at least one element from among tantalum (Ta) and chromium (Cr); and the second layer comprises a metal-containing material that contains ruthenium (Ru) and at least one element from among chromium (Cr), nickel (Ni), cobalt (Co), vanadium (V), niobium (Nb), molybdenum (Mo), tungsten (W), and rhenium (Re).

Abstract: Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the following order on a substrate, a multilayer reflective film and a phase-shift film that shifts the phase of EUV light, said reflective mask blank characterized in that the phase-shift film has a thin film comprising a metal-containing material that contains: ruthenium (Ru); and at least one element from among chromium (Cr), nickel (Ni), (Co), aluminum (Al), silicon (Si), titanium (Ti), vanadium (V), germanium (Ge), niobium (Nb), molybdenum (Mo), tin (Sn), tellurium (Te), hafnium (Hf), tungsten (W), and rhenium (Re).

Abstract: A method for manufacturing an annular glass plate that has an outer circumferential edge surface, an inner circumferential edge surface, and a thickness not larger than 0.6 mm includes processing for manufacturing an annular glass plate by irradiating each of the outer circumferential edge surface and the inner circumferential edge surface of an annular glass blank with a laser beam to melt the outer circumferential edge surface and the inner circumferential edge surface and form molten surfaces such that the molten surfaces in the outer circumferential edge surface and the inner circumferential edge surface each have an arithmetic average surface roughness Ra not larger than 0.1 ?m, and the surface roughness of the molten surface in the inner circumferential edge surface becomes larger than the surface roughness of the molten surface in the outer circumferential edge surface.

Abstract: A glass, which is a glass for a magnetic recording medium substrate or for a glass spacer for a magnetic recording and reproducing apparatus, is an amorphous oxide glass. An SiO2 content ranges from 56 mol % to 80 mol %, an Li2O content ranges from 1 mol % to 10 mol %, a B2O3 content ranges from 0 mol % to 4 mol %, a Na2O content is 0 mol %, a total content of MgO and CaO (MgO+CaO) ranges from 9 mol % to 40 mol %, and the oxide glass has a specific gravity of 2.75 g/cm3 or less, a glass transition temperature of 650° C. or higher, and a Young's modulus of 90 GPa or more.