Abstract: A current supply system includes one or more, or a plurality of current supply modules that each includes an input terminal and an output terminal and that each has a maximum output power. Multiple current supply modules are electrically combined to form a current supply unit having a maximum output power that is greater than the maximum output power of the individual current supply modules, and a control unit is connected to the current supply unit. A data connection connects the control unit to all the current supply modules of the current supply unit.

Abstract: Disclosed is a method for limiting the voltage applied to a component in a radio frequency path (RF path) of a radio frequency excitation system. According to the method, a radio frequency signal (RF signal) is tapped at a first random point of the RF path, and energy is withdrawn from the RF path when the RF signal tapped at the first point or a value proportional to the tapped RF signal exceeds a reference value, resulting in the component being protected against excess voltages due to disturbances.

Abstract: A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.

Abstract: A high frequency power supply, in particular a plasma supply device, for generating an output power greater than 1 kW at a basic frequency of at least 3 MHz with at least one switch bridge, which has two series connected switching elements, wherein one of the switching elements is connected to a reference potential varying in operation, and is activated by a driver, and wherein the driver has a differential input with two signal inputs and is connected to the reference potential varying in operation.

Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.

Abstract: For determining a wave running time between a RF source in a plasma power supply device and a load connected to the plasma power supply device, an RF pulse is transmitted forwards from the RF source to the load. The pulses are reflected by the load and transmitted backwards to the power source. A return time measured on arrival of the pulse(s) at the inverter is used to determine a wave running time.

Abstract: An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network.

Abstract: A power module is adapted to be connected to a voltage source and to supply power to a load. The power module includes a power transistor; and a gate controller for driving the power transistor. The gate controller includes a gate transformer, and an impulse generator that extends a negative drive phase of a gate voltage to the power transistor relative to a positive drive phase of the gate voltage to the power transistor.

Abstract: A 3 dB coupler includes at least one first and one second electric conductor that are spaced apart from each other and are capacitively and inductively coupled to each other in a coupling region. The first conductor represents the primary side of a transformer, and the second conductor represents the secondary side of the transformer. The first and second conductors each have a winding number of n>1.

Abstract: A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.

Abstract: A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.

Abstract: For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed.

Abstract: A power module is adapted to be connected to a voltage source and to supply power to a load. The power module includes a switching bridge that includes a first power transistor and a second power transistor, a first gate controller for driving the first power transistor and a second gate controller for driving the second power transistor. The first gage controller includes a first gate transformer, and a leakage inductance of the first gate transformer forms a resonant circuit with an input capacitance of the first power transistor. The second gate controller includes a second gate transformer, and a leakage inductance of the second gate transformer forms a resonant circuit with an input capacitance of the second power transistor.

Abstract: For suppressing arc discharges in a plasma process, a method includes monitoring of at least one parameter of the plasma process, determining a temporal feature of a first countermeasure and performing the first countermeasure. The temporal feature is determined as a function of, for example, at least one of an interval in time from at least one previous countermeasure, a development of the at least one parameter since a relevant time of introduction of the countermeasure, or since a variable period of time ahead of the relevant time of introduction of the countermeasure, and a differentiation as to whether a previous countermeasure was triggered based on the behavior of the at least one parameter, or based on the interval in time from at least one previous countermeasure.

Abstract: A sealing device for inductive sealing of containers is provided. The sealing device includes at least one induction coil made from an at least partially flexible conductor. The induction coil has two coil halves arranged at a distance (d) apart between which the containers can be moved, in which the conductor in each case extends essentially parallel to a direction of motion (B) of the containers. The coil halves are connected to the induction coil via at least one flexible conductor loop, which extends perpendicular to the direction of motion (B) of the containers.

Abstract: A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.

Abstract: A plasma power supply controller jointly monitors a plurality of plasma power supply devices of one or more electrical loads. The controller includes at least one signal input, at least one signal output connected to at least one first logic switching device configured to actuate a first power interrupter of at least one of the plasma power supply devices, and a safety switching device. The at least one signal input is configured to receive indication signals of at least one indication device. The safety switching device is configured to detect a state or a state change of at least one of the indication devices and to interrupt the current supply of at least one of the plasma power supply devices using the first logic switching device upon a detection of a predetermined state or upon a detection of a state change of at least one of the indication devices.

Abstract: For exciting a gas laser arrangement with a plurality of HF signals, at least two pulsed HF signals are generated and at least two electrodes or pairs of electrodes of the gas laser arrangement are supplied with the pulsed HF signals, respectively. At least two of the electrodes or pairs of electrodes are supplied with pulsed HF signals that are phase-shifted with respect to each other.

Abstract: For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.

Abstract: A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control.