Patents Assigned to ICT Integrated Circuit Testing Gesellschaft
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Patent number: 8101922Abstract: A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.Type: GrantFiled: July 3, 2008Date of Patent: January 24, 2012Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Dieter Winkler, Thomas Jasinski, Udo Weigel
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Patent number: 8101911Abstract: A charged particle gun alignment assembly for emitting a charged particle beam along an optical axis of a charged particle beam device is described. The charged particle gun alignment assembly is configured to compensate for misalignment of the charged particle beam and includes a charged particle source having an emitter with a virtual source defining a virtual source plane substantially perpendicular to the optical axis; a condenser lens for imaging the virtual source; a final beam limiting aperture adapted for shaping the charged particle beam; and a double stage deflection assembly positioned between the condenser lens and the final beam limiting aperture, wherein the working distance of the condenser lens is 15 mm or less.Type: GrantFiled: November 4, 2008Date of Patent: January 24, 2012Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Pavel Adamec
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Publication number: 20120006997Abstract: An electron beam device 100 includes: a beam emitter 102 for emitting a primary electron beam 101; an objective electron lens 127 for focusing the primary electron beam 101 onto a specimen 130, the objective lens defining an optical axis 126; a beam tilting arrangement 103 configured to direct the primary electron beam 101 to the electron lens 127 at an adjustable offset from the optical axis 126 such that the objective electron lens 127 directs the electron beam 101 to strike the specimen 130 at an adjustable oblique beam landing angle, whereby a chromatic aberration is caused; a beam separator 115 having a first dispersion for separating a signal electron beam 135 from the primary electron beam 101; and a dispersion compensation element 104 adapted to adjust a compensation dispersion of the primary electron beam 101 so as to compensate for a beam aberration resulting from the first dispersion and from the chromatic aberration.Type: ApplicationFiled: July 7, 2011Publication date: January 12, 2012Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik GmbHInventor: Jürgen Frosien
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Publication number: 20110272577Abstract: An electron beam device comprises: a beam emitter for emitting a primary electron beam; an objective electron lens for focusing the primary electron beam onto a specimen, the objective lens defining an optical axis; a beam separator having a first dispersion for separating a signal electron beam from the primary electron beam; and a dispersion compensation element. The dispersion compensation element has a second dispersion, the dispersion compensation element being adapted for adjusting the second dispersion independently of an inclination angle of the primary beam downstream of the dispersion compensation element, such that the second dispersion substantially compensates the first dispersion. The dispersion compensation element is arranged upstream, along the primary electron beam, of the beam separator.Type: ApplicationFiled: May 10, 2010Publication date: November 10, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik GmbHInventors: Stefan LANIO, Gerald SCHOENECKER
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Patent number: 8049180Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.Type: GrantFiled: October 26, 2007Date of Patent: November 1, 2011Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik MBHInventors: Juergen Frosien, Helmut Banzhof
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Patent number: 8044368Abstract: A magnetic lens for a charged particle beam device and a charged particle beam device are provided. The magnetic lens includes a coil with coil windings to be excited for generation of a magnetic field, a pole piece to guide the magnetic field, a heat shield, which is connected to a cooling system, and a thermal insulation layer provided between the heat shield and the coil.Type: GrantFiled: March 13, 2008Date of Patent: October 25, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftecknik mbHInventor: Pavel Adamec
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Patent number: 8044370Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.Type: GrantFiled: August 27, 2008Date of Patent: October 25, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Dieter Winkler, Thomas Jasinski
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Publication number: 20110253893Abstract: A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.Type: ApplicationFiled: April 18, 2011Publication date: October 20, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik mbHInventor: Helmut BANZHOF
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Patent number: 8026492Abstract: A focused ion beam device is provided, including: an ion beam column adapted to house a gas field ion source emitter with an emitter tip and an emitter area for generating ions, a heating means adapted to heat the emitter tip, one or more gas inlets adapted to introduce a first gas and at least one second gas to the emitter area, an objective lens adapted to focus the ion beam generated from the first gas or the second gas, and a controller adapted to switch between a first emitter tip temperature and a second emitter tip temperature for generating an ion beam of ions of the first gas or an ion beam of ions of the at least one second gas.Type: GrantFiled: November 4, 2008Date of Patent: September 27, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Juergen Frosien, Dieter Winkler
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Publication number: 20110221360Abstract: A method and a device for stabilizing the emission current of an emitter of a charged particle beam device are provided. In the method, the emitter is operated under predetermined operation parameters including at least one voltage with a predetermined value. The method includes determining a first value of the emission current under the predetermined operation parameters and flash cleaning the emitter while a first electric field is applied to the emitter. The first electric field is generated by the at least one voltage having a first value of the at least one voltage, wherein the first value of the at least one voltage is provided in dependence of the determined first value of the emission current.Type: ApplicationFiled: October 22, 2010Publication date: September 15, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Pavel ADAMEC
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Patent number: 8008629Abstract: A charged particle beam device is provided. The device includes a primary objective lens for focusing a primary charged particle beam, the primary objective lens defining an optical axis, a specimen stage defining a specimen location area, a deflection unit for deflecting the primary charged particle beam between the primary objective lens and the specimen location area, towards a beam path for impingement on the specimen, wherein the deflection unit is movable with respect to the optical axis.Type: GrantFiled: July 23, 2007Date of Patent: August 30, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Pavel Adamec, Shemesh Dror
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Patent number: 7968855Abstract: A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.Type: GrantFiled: February 5, 2009Date of Patent: June 28, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Juergen Frosien
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Publication number: 20110147605Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.Type: ApplicationFiled: October 28, 2010Publication date: June 23, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventor: Roland JANZEN
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Publication number: 20110139978Abstract: A charged particle beam device is provided, including a primary beam source for generating a primary charged particle beam, an objective lens for focusing the primary charged particle beam onto a specimen, and an achromatic beam separator adapted to separate the primary charged particle beam from a secondary charged particle beam originating from the specimen. The achromatic beam separator is adapted to separate the primary charged particle beam and the secondary charged particle beam earliest practicable after generation of the secondary charged particle beam.Type: ApplicationFiled: December 7, 2010Publication date: June 16, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventor: Jürgen FROSIEN
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Patent number: 7947953Abstract: A detection apparatus for use in a charged particle beam device is provided. The detection apparatus includes a separation field generating portion adapted to generate a separation field separating positively and negatively charged secondary particles, at least one first detector for detecting positively charged particles, at least one second detector for detecting negatively charged particles, wherein the detection apparatus is adapted to simultaneously detect the positively charged secondary particles in the at least one first detector and the negatively charged secondary particles in the at least one second detector. Further, a method of simultaneously detecting negatively and positively charged particles is provided.Type: GrantFiled: October 8, 2008Date of Patent: May 24, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Juergen Frosien
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Patent number: 7939800Abstract: The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter. Further, the apparatus includes an emitter location-measuring device for repeatedly measuring the location of the emitter; and a deflector system for compensating variations in the location of the emitter.Type: GrantFiled: September 11, 2008Date of Patent: May 10, 2011Assignee: ICT, Integrated Circuit Testing, Gesellschaft fur Halbleiterpruftechnik mbHInventor: Juergen Frosien
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Patent number: 7932495Abstract: A charged particle beam device is provided including a particle source emitting a primary particle beam, a secondary particle beam generated by the impingement of the primary particle beam on the sample, a detection unit for detecting the secondary particle beam, the detector having at least two detector channels, and a distribution deflecting device for deflecting the secondary particle beam in a chronological sequence. Further, a detection assembly for a fast wafer inspection system is provided including a distribution deflecting device for distributing a secondary particle beam in a chronological sequence and a detector for detecting the secondary particle beam, the detector having multiple detector channels. Further, a method of operating a particle beam device with chronological resolution is provided.Type: GrantFiled: September 2, 2008Date of Patent: April 26, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Pavel Adamec
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Publication number: 20110089322Abstract: An achromatic beam separator device for separating a primary charged particle beam from another charged particle beam and providing the primary charged particle beam on an optical axis (142) is provided, including a primary charged particle beam inlet (134), a primary charged particle beam outlet (132) encompassing the optical axis, a magnetic deflection element (163) adapted to generate a magnetic field, and an electrostatic deflection element (165) adapted to generate an electric field overlapping the magnetic field, wherein at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned and/or positionable to compensate an octopole influence.Type: ApplicationFiled: October 15, 2009Publication date: April 21, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Gerald SCHOENECKER, Stefan LANIO
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Patent number: 7928405Abstract: A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a connecting portion of the second pole piece and a gap portion of the second pole piece, wherein the first pole piece and the second pole piece provide a gap at the respective gap portions, a coil for exciting the magnetic lens assembly, a centering element comprising a material that has a smaller Young's modulus than the material of the first and the material of the second pole piece, wherein the pole pieces are connected with each other at the respective connecting portions and have a centering element receiving portion towards the respective gap portion ends of the pole pieces.Type: GrantFiled: July 28, 2008Date of Patent: April 19, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Pavel Adamec, Carlo Salvesen, Ivo Liska
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Patent number: 7928403Abstract: The invention provides a multiple-lens assembly 1 for a charged particle beam device which comprises at least two lens sub units 2, each sub unit having an optical axis 3, wherein at least two of the optical axes of the lens sub units are inclined to each other. Further, the invention provides a charged particle beam device which comprises at least one multiple-lens assembly and a method for operating a charged particle beam device.Type: GrantFiled: December 30, 2005Date of Patent: April 19, 2011Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Pavel Adamec