Patents Assigned to ICT Integrated Circuit Testing Gesellschaft
  • Dual mode gas field ion source
    Patent number: 8026492
    Abstract: A focused ion beam device is provided, including: an ion beam column adapted to house a gas field ion source emitter with an emitter tip and an emitter area for generating ions, a heating means adapted to heat the emitter tip, one or more gas inlets adapted to introduce a first gas and at least one second gas to the emitter area, an objective lens adapted to focus the ion beam generated from the first gas or the second gas, and a controller adapted to switch between a first emitter tip temperature and a second emitter tip temperature for generating an ion beam of ions of the first gas or an ion beam of ions of the at least one second gas.
    Type: Grant
    Filed: November 4, 2008
    Date of Patent: September 27, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Juergen Frosien, Dieter Winkler
  • FEEDBACK LOOP FOR EMITTER FLASHING
    Publication number: 20110221360
    Abstract: A method and a device for stabilizing the emission current of an emitter of a charged particle beam device are provided. In the method, the emitter is operated under predetermined operation parameters including at least one voltage with a predetermined value. The method includes determining a first value of the emission current under the predetermined operation parameters and flash cleaning the emitter while a first electric field is applied to the emitter. The first electric field is generated by the at least one voltage having a first value of the at least one voltage, wherein the first value of the at least one voltage is provided in dependence of the determined first value of the emission current.
    Type: Application
    Filed: October 22, 2010
    Publication date: September 15, 2011
    Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Pavel ADAMEC
  • TWIN BEAM CHARGED PARTICLE COLUMN AND METHOD OF OPERATING THEREOF
    Publication number: 20110220795
    Abstract: A column for a charged particle beam device is described. The column includes a charged particle emitter for emitting a primary charged particle beam as one source of the primary charged particle beam; a biprism adapted for acting on the primary charged particle beam so that two virtual sources are generated; and a charged particle beam optics adapted to focus the charged particle beam simultaneously on two positions of a specimen corresponding to images of the two virtual sources.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUR HALBLEITERPRUFTECHNIK MBH
    Inventor: Jürgen FROSIEN
  • Charged particle beam device and method for inspecting specimen
    Patent number: 8008629
    Abstract: A charged particle beam device is provided. The device includes a primary objective lens for focusing a primary charged particle beam, the primary objective lens defining an optical axis, a specimen stage defining a specimen location area, a deflection unit for deflecting the primary charged particle beam between the primary objective lens and the specimen location area, towards a beam path for impingement on the specimen, wherein the deflection unit is movable with respect to the optical axis.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: August 30, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Pavel Adamec, Shemesh Dror
  • Dual mode gas field ion source
    Patent number: 7968855
    Abstract: A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: June 28, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Juergen Frosien
  • ELECTROSTATIC CORRECTOR
    Publication number: 20110147605
    Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.
    Type: Application
    Filed: October 28, 2010
    Publication date: June 23, 2011
    Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventor: Roland JANZEN
  • CHARGED PARTICLE BEAM DEVICE, METHOD OF OPERATING A CHARGED PARTICLE BEAM DEVICE
    Publication number: 20110139978
    Abstract: A charged particle beam device is provided, including a primary beam source for generating a primary charged particle beam, an objective lens for focusing the primary charged particle beam onto a specimen, and an achromatic beam separator adapted to separate the primary charged particle beam from a secondary charged particle beam originating from the specimen. The achromatic beam separator is adapted to separate the primary charged particle beam and the secondary charged particle beam earliest practicable after generation of the secondary charged particle beam.
    Type: Application
    Filed: December 7, 2010
    Publication date: June 16, 2011
    Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventor: Jürgen FROSIEN
  • Charged particle detection apparatus and detection method
    Patent number: 7947953
    Abstract: A detection apparatus for use in a charged particle beam device is provided. The detection apparatus includes a separation field generating portion adapted to generate a separation field separating positively and negatively charged secondary particles, at least one first detector for detecting positively charged particles, at least one second detector for detecting negatively charged particles, wherein the detection apparatus is adapted to simultaneously detect the positively charged secondary particles in the at least one first detector and the negatively charged secondary particles in the at least one second detector. Further, a method of simultaneously detecting negatively and positively charged particles is provided.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: May 24, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Juergen Frosien
  • Arrangement and method for compensating emitter tip vibrations
    Patent number: 7939800
    Abstract: The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter. Further, the apparatus includes an emitter location-measuring device for repeatedly measuring the location of the emitter; and a deflector system for compensating variations in the location of the emitter.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: May 10, 2011
    Assignee: ICT, Integrated Circuit Testing, Gesellschaft fur Halbleiterpruftechnik mbH
    Inventor: Juergen Frosien
  • Fast wafer inspection system
    Patent number: 7932495
    Abstract: A charged particle beam device is provided including a particle source emitting a primary particle beam, a secondary particle beam generated by the impingement of the primary particle beam on the sample, a detection unit for detecting the secondary particle beam, the detector having at least two detector channels, and a distribution deflecting device for deflecting the secondary particle beam in a chronological sequence. Further, a detection assembly for a fast wafer inspection system is provided including a distribution deflecting device for distributing a secondary particle beam in a chronological sequence and a detector for detecting the secondary particle beam, the detector having multiple detector channels. Further, a method of operating a particle beam device with chronological resolution is provided.
    Type: Grant
    Filed: September 2, 2008
    Date of Patent: April 26, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Pavel Adamec
  • ACHROMATIC BEAM DEFLECTOR, ACHROMATIC BEAM SEPARATOR, CHARGED PARTICLE DEVICE, METHOD OF OPERATING AN ACHROMATIC BEAM DEFLECTOR, AND METHOD OF OPERATING AN ACHROMATIC BEAM SEPARATOR
    Publication number: 20110089322
    Abstract: An achromatic beam separator device for separating a primary charged particle beam from another charged particle beam and providing the primary charged particle beam on an optical axis (142) is provided, including a primary charged particle beam inlet (134), a primary charged particle beam outlet (132) encompassing the optical axis, a magnetic deflection element (163) adapted to generate a magnetic field, and an electrostatic deflection element (165) adapted to generate an electric field overlapping the magnetic field, wherein at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned and/or positionable to compensate an octopole influence.
    Type: Application
    Filed: October 15, 2009
    Publication date: April 21, 2011
    Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventors: Gerald SCHOENECKER, Stefan LANIO
  • Magnetic lens assembly
    Patent number: 7928405
    Abstract: A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a connecting portion of the second pole piece and a gap portion of the second pole piece, wherein the first pole piece and the second pole piece provide a gap at the respective gap portions, a coil for exciting the magnetic lens assembly, a centering element comprising a material that has a smaller Young's modulus than the material of the first and the material of the second pole piece, wherein the pole pieces are connected with each other at the respective connecting portions and have a centering element receiving portion towards the respective gap portion ends of the pole pieces.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: April 19, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Pavel Adamec, Carlo Salvesen, Ivo Liska
  • Multiple lens assembly and charged particle beam device comprising the same
    Patent number: 7928403
    Abstract: The invention provides a multiple-lens assembly 1 for a charged particle beam device which comprises at least two lens sub units 2, each sub unit having an optical axis 3, wherein at least two of the optical axes of the lens sub units are inclined to each other. Further, the invention provides a charged particle beam device which comprises at least one multiple-lens assembly and a method for operating a charged particle beam device.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: April 19, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Pavel Adamec
  • METHOD AND APPARATUS OF PRETREATMENT OF AN ELECTRON GUN CHAMBER
    Publication number: 20110084219
    Abstract: A method of pre-treating an ultra high vacuum charged particle gun chamber by ion stimulated desorption is provided. The method includes generating a plasma for providing a plasma ion source, and applying a negative potential to at least one surface in the gun chamber, wherein the negative potential is adapted for extracting an ion flux from the plasma ion source to the at least one surface for desorbing contamination particles from the at least one surface by the ion flux impinging on the at least one surface.
    Type: Application
    Filed: September 23, 2010
    Publication date: April 14, 2011
    Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventors: Pavel ADAMEC, Ivo LISKA, Gennadij GLUCHMAN, Milan SNABL
  • Energy filter for cold field emission electron beam apparatus
    Patent number: 7919749
    Abstract: An electron beam apparatus and a method for providing an energy-filtered primary electron beam are described. Therein, a primary electron beam having an asymmetric first energy distribution is generated by means of an electron source. The primary electron beam is high-pass energy filtered using a retarding lens.
    Type: Grant
    Filed: September 19, 2008
    Date of Patent: April 5, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Fang Zhou, Juergen Frosien, Pavel Adamec
  • Electrostatic lens assembly
    Patent number: 7872239
    Abstract: A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: January 18, 2011
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Pavel Adamec, Carlo Salvesen, Ivo Liska
  • Ultra high precision measurement tool with control loop
    Patent number: 7851768
    Abstract: A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a beam current measurement device. Furthermore, the focused ion beam device may have a sample charge control comprising measuring the sample charge. A method of operating a focused ion beam device is provided comprising applying a voltage between an emitter an electrode, applying gas to the emitter, emitting ions of a gas from the emitter and controlling a beam current by measuring the beam current with a beam current measurement device.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: December 14, 2010
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Juergen Frosien
  • Device and method for selecting an emission area of an emission pattern
    Patent number: 7847266
    Abstract: A charged particle beam apparatus and a method for measuring an emission pattern of such an apparatus are provided. The apparatus comprises an emitter with an emission pattern including at least two emission peaks, a gun lens, and a diaphragm, wherein the gun lens comprises a deflector unit and the deflector unit is adapted to direct an emission peak of the at least two emission peaks to an opening of the diaphragm to thereby select the emission peak of the at least two emission peaks from the emission pattern.
    Type: Grant
    Filed: September 1, 2006
    Date of Patent: December 7, 2010
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Fang Zhou, Jürgen Frosien
  • Charged particle detector assembly, charged particle beam apparatus and method for generating an image
    Patent number: 7842930
    Abstract: A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: November 30, 2010
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterpruftechnik mbH
    Inventors: Gilad Almogy, Dror Shemesh, Pavel Adamec
  • Charged particle beam apparatus and method for operating a charged particle beam apparatus
    Patent number: 7838830
    Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: November 23, 2010
    Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventors: Juergen Frosien, Helmut Banzhof, Jacob Levin, Dror Shemesh