Patents Assigned to Iwatani Corporation
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Publication number: 20230276789Abstract: A cell freezing composition according to the present invention includes a medium, an antifreezing agent, and dissolved hydrogen.Type: ApplicationFiled: October 8, 2020Publication date: September 7, 2023Applicant: IWATANI CORPORATIONInventors: Yasuhiko Tabata, Koji Kimura
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Patent number: 11542585Abstract: A method for treating an inner wall surface of a treatment object uses a treatment object that is at least one of a container housing an ozone gas, a treatment container housing an object to be subjected to a surface treatment using an ozone gas and a pipe configured to supply an ozone gas. The method for treating an inner wall surface of a treatment object includes the steps of: determining whether an abnormal part is present in the inner wall surface of the treatment object or not; and distributing an ozone gas having a concentration of 10% by volume or more and 30% by volume or less and a temperature of 60° C. or less such that the ozone gas contacts the inner wall surface of the treatment object after the step of determining whether an abnormal part is present or not.Type: GrantFiled: July 27, 2018Date of Patent: January 3, 2023Assignee: IWATANI CORPORATIONInventors: Koichi Izumi, Masahiro Furutani, Tsuyoshi Yamamoto
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Patent number: 11482455Abstract: A cutting method includes: forming a reformed region in a workpiece; and after forming the reformed region in the workpiece, cutting the workpiece along an intended cut line. In the cutting the workpiece, a dry etching process is performed from a front surface toward a rear surface of the workpiece while the workpiece is fixed on a support member at least under its own weight or by suction, to form a groove from the front surface to reach the rear surface of the workpiece.Type: GrantFiled: July 18, 2018Date of Patent: October 25, 2022Assignees: IWATANI CORPORATION, HAMAMATSU PHOTONICS K.K.Inventors: Toshiki Manabe, Takehiko Senoo, Koichi Izumi, Tadashi Shojo, Takafumi Ogiwara, Takeshi Sakamoto
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Patent number: 11380586Abstract: A cutting method includes: forming a reformed region in a workpiece; and after forming the reformed region in the workpiece, forming a groove in the workpiece along an intended cut line. In the forming a groove, a first dry etching process is performed from a front surface toward a rear surface of the workpiece. After the first dry etching process, a first pressure-reducing process is performed in which the workpiece is placed under an atmosphere of reduced pressure as compared to pressure during the first dry etching process. After the first pressure-reducing process, a second dry etching process is performed from the front surface toward the rear surface of the workpiece.Type: GrantFiled: July 18, 2018Date of Patent: July 5, 2022Assignees: IWATANI CORPORATION, HAMAMATSU PHOTONICS K.K.Inventors: Toshiki Manabe, Takehiko Senoo, Koichi Izumi, Tadashi Shojo, Takafumi Ogiwara, Takeshi Sakamoto
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Patent number: 11371656Abstract: An inspection apparatus A for a hydrogen gas dispenser includes a receiving-side gas flowing unit 1 including a receptacle 11 configured to be connected to a nozzle C1 of a hydrogen gas dispenser C and an inspection unit including a rate-of-pressure-rise inspection unit 2 configured to measure a rate of pressure rise of hydrogen gas from the hydrogen gas dispenser C and a dispensed-amount inspection unit 3 configured to measure a dispensed amount of the hydrogen gas. The inspection apparatus A for a hydrogen gas dispenser is capable of measuring a dispensed amount and a rate of pressure rise of the hydrogen gas dispenser.Type: GrantFiled: February 28, 2019Date of Patent: June 28, 2022Assignee: IWATANI CORPORATIONInventors: Masaru Ito, Goichi Inoue, Koichi Tsuda
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Patent number: 11267021Abstract: There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.Type: GrantFiled: February 9, 2018Date of Patent: March 8, 2022Assignees: TOKYO ELECTRON LIMITED, IWATANI CORPORATIONInventors: Kazuya Dobashi, Takehiko Orii, Yukimasa Saito, Kunihiko Koike, Takehiko Senoo, Koichi Izumi, Yu Yoshino, Tadashi Shojo, Keita Kanehira
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Patent number: 11130092Abstract: Provided is method for concentrating ozone gas the method including the steps of: allowing ozone gas to be adsorbed onto the adsorbent by introducing ozone gas-containing raw material mixed gas into an adsorption vessel (20) that houses an adsorbent for adsorbing ozone gas; reducing a pressure in a concentration vessel (30) in a state where the concentration vessel (30) does not communicate with the adsorption vessel (20), the concentration vessel (30) being configured to be connected to the adsorption vessel (20) so as to be interswitchable between a state where the concentration vessel (30) communicates with the adsorption vessel (20) and a state where the concentration vessel does not communicate with the adsorption vessel (20); and introducing concentrated mixed gas including ozone gas with a higher ozone gas concentration than the ozone gas concentration in the raw material mixed gas into the concentration vessel (30) by desorbing the ozone gas adsorbed onto the adsorbent using a pressure difference betwType: GrantFiled: March 3, 2017Date of Patent: September 28, 2021Assignee: IWATANI CORPORATIONInventors: Sadaki Nakamura, Koichi Izumi, Naohisa Makihira
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Patent number: 11123679Abstract: Provided is a method for concentrating ozone gas, including the steps of: allowing ozone gas to be adsorbed onto an adsorbent in a first adsorption vessel; reducing pressure in a concentration vessel in a state where the concentration vessel does not communicate with the first adsorption vessel; discharging part of gas in the first adsorption vessel; introducing first concentrated mixed gas in the concentration vessel by desorbing ozone gas in the first concentrated mixed gas and delivering the desorbed ozone gas into the concentration vessel; allowing ozone gas to be adsorbed onto an adsorbent in a second adsorption vessel; and introducing second concentrated mixed gas into the concentration vessel in a state where the concentration vessel into which the first concentrated mixed gas is introduced and the second adsorption vessel that houses an adsorbent. Also provided is an apparatus for concentrating ozone gas for implementing the method.Type: GrantFiled: March 3, 2017Date of Patent: September 21, 2021Assignee: IWATANI CORPORATIONInventors: Sadaki Nakamura, Koichi Izumi, Naohisa Makihira
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Publication number: 20200386369Abstract: An inspection apparatus A for a hydrogen gas dispenser includes a receiving-side gas flowing unit 1 including a receptacle 11 configured to be connected to a nozzle C1 of a hydrogen gas dispenser C and an inspection unit including a rate-of-pressure-rise inspection unit 2 configured to measure a rate of pressure rise of hydrogen gas from the hydrogen gas dispenser C and a dispensed-amount inspection unit 3 configured to measure a dispensed amount of the hydrogen gas. The inspection apparatus A for a hydrogen gas dispenser is capable of measuring a dispensed amount and a rate of pressure rise of the hydrogen gas dispenser.Type: ApplicationFiled: February 28, 2019Publication date: December 10, 2020Applicants: Iwatani Corporation, Iwatani CorporationInventors: Masaru Ito, Goichi Inoue, Koichi Tsuda
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Publication number: 20200365461Abstract: A cutting method includes: forming a reformed region in a workpiece; and after forming the reformed region in the workpiece, cutting the workpiece along an intended cut line. In the cutting the workpiece, a dry etching process is performed from a front surface toward a rear surface of the workpiece while the workpiece is fixed on a support member at least under its own weight or by suction, to form a groove from the front surface to reach the rear surface of the workpiece.Type: ApplicationFiled: July 18, 2018Publication date: November 19, 2020Applicants: IWATANI CORPORATION, HAMAMATSU PHOTONICS K.K.Inventors: Toshiki MANABE, Takehiko SENOO, Koichi IZUMI, Tadashi SHOJO, Takafumi OGIWARA, Takeshi SAKAMOTO
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Publication number: 20200365460Abstract: A cutting method includes: forming a reformed region in a workpiece; and after forming the reformed region in the workpiece, forming a groove in the workpiece along an intended cut line. In the forming a groove, a first dry etching process is performed from a front surface toward a rear surface of the workpiece. After the first dry etching process, a first pressure-reducing process is performed in which the workpiece is placed under an atmosphere of reduced pressure as compared to pressure during the first dry etching process. After the first pressure-reducing process, a second dry etching process is performed from the front surface toward the rear surface of the workpiece.Type: ApplicationFiled: July 18, 2018Publication date: November 19, 2020Applicants: Iwatani Corporation, Hamamatsu Photonics K.K.Inventors: Toshiki MANABE, Takehiko SENOO, Koichi IZUMI, Tadashi SHOJO, Takafumi OGIWARA, Takeshi SAKAMOTO
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Publication number: 20200239995Abstract: A method for treating an inner wall surface of a treatment object uses a treatment object that is at least one of a container housing an ozone gas, a treatment container housing an object to be subjected to a surface treatment using an ozone gas and a pipe configured to supply an ozone gas. The method for treating an inner wall surface of a treatment object includes the steps of: determining whether an abnormal part is present in the inner wall surface of the treatment object or not; and distributing an ozone gas having a concentration of 10% by volume or more and 30% by volume or less and a temperature of 60° C. or less such that the ozone gas contacts the inner wall surface of the treatment object before the step of determining whether an abnormal part is present or not.Type: ApplicationFiled: July 27, 2018Publication date: July 30, 2020Applicant: IWATANI CORPORATIONInventors: Koichi IZUMI, Masahiro FURUTANI, Tsuyoshi YAMAMOTO
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Patent number: 10597296Abstract: A method for supplying an ozone gas includes the steps of: supplying an ozone gas from an ozone gas source through a second channel; and switching the ozone gas to a state where the ozone gas is supplied through a first channel and supplying the ozone gas having a reduced concentration of nitrogen oxide. The step of supplying the ozone gas through the second channel includes the step of introducing a part of the ozone gas to a first vessel so that ozone adsorbability of a first adsorbent is reduced. In the step of supplying the ozone gas to the object through the first channel, the ozone gas passes through the first vessel holding the first adsorbent having reduced ozone adsorbability.Type: GrantFiled: June 29, 2016Date of Patent: March 24, 2020Assignee: IWATANI CORPORATIONInventors: Naohisa Makihira, Koichi Izumi, Masahiro Furutani
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Publication number: 20190126191Abstract: Provided is a method for concentrating ozone gas, including the steps of: allowing ozone gas to be adsorbed onto an adsorbent in a first adsorption vessel; reducing pressure in a concentration vessel in a state where the concentration vessel does not communicate with the first adsorption vessel; discharging part of gas in the first adsorption vessel; introducing first concentrated mixed gas in the concentration vessel by desorbing ozone gas in the first concentrated mixed gas and delivering the desorbed ozone gas into the concentration vessel; allowing ozone gas to be adsorbed onto an adsorbent in a second adsorption vessel; and introducing second concentrated mixed gas into the concentration vessel in a state where the concentration vessel into which the first concentrated mixed gas is introduced and the second adsorption vessel that houses an adsorbent. Also provided is an apparatus for concentrating ozone gas for implementing the method.Type: ApplicationFiled: March 3, 2017Publication date: May 2, 2019Applicant: IWATANI CORPORATIONInventors: Sadaki NAKAMURA, Koichi IZUMI, Naohisa MAKIHIRA
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Publication number: 20190111379Abstract: Provided is method for concentrating ozone gas the method including the steps of: allowing ozone gas to be adsorbed onto the adsorbent by introducing ozone gas-containing raw material mixed gas into an adsorption vessel (20) that houses an adsorbent for adsorbing ozone gas; reducing a pressure in a concentration vessel (30) in a state where the concentration vessel (30) does not communicate with the adsorption vessel (20), the concentration vessel (30) being configured to be connected to the adsorption vessel (20) so as to be interswitchable between a state where the concentration vessel (30) communicates with the adsorption vessel (20) and a state where the concentration vessel does not communicate with the adsorption vessel (20); and introducing concentrated mixed gas including ozone gas with a higher ozone gas concentration than the ozone gas concentration in the raw material mixed gas into the concentration vessel (30) by desorbing the ozone gas adsorbed onto the adsorbent using a pressure difference betwType: ApplicationFiled: March 3, 2017Publication date: April 18, 2019Applicant: IWATANI CORPORATIONInventors: Sadaki NAKAMURA, Koichi IZUMI, Naohisa MAKIHIRA
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Publication number: 20180257934Abstract: A method for supplying an ozone gas includes the steps of: supplying an ozone gas from an ozone gas source through a second channel; and switching the ozone gas to a state where the ozone gas is supplied through a first channel and supplying the ozone gas having a reduced concentration of nitrogen oxide. The step of supplying the ozone gas through the second channel includes the step of introducing a part of the ozone gas to a first vessel so that ozone adsorbability of a first adsorbent is reduced. In the step of supplying the ozone gas to the object through the first channel, the ozone gas passes through the first vessel holding the first adsorbent having reduced ozone adsorbability.Type: ApplicationFiled: June 29, 2016Publication date: September 13, 2018Applicant: IWATANI CORPORATIONInventors: Naohisa MAKIHIRA, Koichi IZUMI, Masahiro FURUTANI
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Patent number: 9869614Abstract: A sampling apparatus includes a pressure-reducing safety unit, which includes a device accommodation chamber that accommodates safety devices and a cylinder connection chamber, and a cylinder unit. The cylinder unit removably accommodates a cylinder, excluding an exposed portion where a front end portion of the cylinder, a mouthpiece, and a cylinder on-off valve are exposed, in an openable/closable casing. The exposed portion of the cylinder is formed so as to be insertable from the open surface portion of the cylinder connection chamber into the cylinder connection chamber, the mouthpiece of the cylinder and a hydrogen outlet of a supply pipe of the device accommodation chamber are connected by using a flexible hose, and thereby a sample of hydrogen gas is taken into the cylinder.Type: GrantFiled: June 8, 2017Date of Patent: January 16, 2018Assignee: IWATANI CORPORATIONInventors: Kazuto Matsumoto, Shinichi Omoteda, Ken Nishida, Goichi Inoue
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Patent number: 9841143Abstract: A suction method that sucks inside of a filling nozzle used for supply of hydrogen by using a suction nozzle that is engaged with the filling nozzle, the suction method comprising: evacuating a vacuum chamber by using a vacuum pump; and sucking inside of the suction nozzle by using the evacuated vacuum chamber.Type: GrantFiled: July 1, 2015Date of Patent: December 12, 2017Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, IWATANI CORPORATIONInventors: Yoshihiro Hori, Yuu Matsuno, Hiroaki Nemoto, Hideyo Omori, Toshiyuki Kondo
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Publication number: 20170268965Abstract: A sampling apparatus includes a pressure-reducing safety unit, which includes a device accommodation chamber that accommodates safety devices and a cylinder connection chamber, and a cylinder unit. The cylinder unit removably accommodates a cylinder, excluding an exposed portion where a front end portion of the cylinder, a mouthpiece, and a cylinder on-off valve are exposed, in an openable/closable casing. The exposed portion of the cylinder is formed so as to be insertable from the open surface portion of the cylinder connection chamber into the cylinder connection chamber, the mouthpiece of the cylinder and a hydrogen outlet of a supply pipe of the device accommodation chamber are connected by using a flexible hose, and thereby a sample of hydrogen gas is taken into the cylinder.Type: ApplicationFiled: June 8, 2017Publication date: September 21, 2017Applicant: Iwatani CorporationInventors: Kazuto MATSUMOTO, Shinichi OMOTEDA, Ken NISHIDA, Goichi INOUE
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Patent number: 9638425Abstract: A structure which performs safety operation with certainty when a gas container is replaced or when an abnormality occurs and is easy to used is provided. A cartridge-type gas grill 11 having a plurality of systems includes two gas container accommodation sections 12; two burners 13; and gas flow paths for connecting the gas container accommodation sections 12and the burners 13 in a one-to-one relationship. All the gas container accommodation sections 12 are each provided with a container attachment switch 19 for detecting that a gas container 15 is connected. Open/close valves 18, provided in the gas flow paths, for adjusting a gas flow are each formed of an electromagnetic valve. Operation knobs 63 each for making an operation on the corresponding open/close valve 18 are each provided with an ignition switch 20, which is turned ON when the corresponding open/close valve 18 is opened and is turned OFF when the corresponding open/close valve 18 is closed.Type: GrantFiled: April 24, 2014Date of Patent: May 2, 2017Assignees: Iwatani Corporation, Asahi Seisakusho Co., Ltd.Inventors: Kenichiro Inada, Akio Wada