Patents Assigned to Kochi Industrial Promotion Center
  • Plasma CVD apparatus and plasma surface treatment method
    Publication number: 20070074664
    Abstract: A substrate is mounted on a mount surface of an anode in a chamber. A flow path is formed in a cathode facing the anode, and cooling water is circulated therethrough. A voltage is applied across the anode and the cathode to form a layer of carbon nanowall on the substrate by plasma, and thereafter the anode is cooled by a cooling member to rapidly cool the substrate to a predetermined temperature.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 5, 2007
    Applicants: KOCHI INDUSTRIAL PROMOTION CENTER, CASIO COMPUTER CO., LTD.
    Inventors: Kazuhito Nishimura, Hideki Sasaoka
  • Field emission electrode, manufacturing method thereof, and electronic device
    Publication number: 20060113891
    Abstract: An electron emission film having a pattern of diamond in X-ray diffraction and formed of a plurality of diamond fine grains having a grain diameter of 5 nm to 10 nm is formed on a substrate. The electron emission film can restrict the field intensity to a low level when it causes an emission current to flow, and has a uniform electron emission characteristic.
    Type: Application
    Filed: November 28, 2005
    Publication date: June 1, 2006
    Applicants: Kochi Industrial Promotion Center, Casio Computer Co., Ltd.
    Inventors: Kazuhito Nishimura, Hideki Sasaoka