Patents Assigned to Korea Kumho Petrochemical Co., Ltd.
  • Patent number: 8357482
    Abstract: A light absorbent for forming an organic anti-reflective layer, represented by the following formula 1 or formula 2, is provided: wherein A represents a substituted or unsubstituted, linear or branched, saturated tetravalent hydrocarbon group, a substituted or unsubstituted, linear or branched, saturated hydrocarbon group and containing one or more heteroatoms, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, a substituted or unsubstituted alicyclic group, a substituted or unsubstituted heteroalicyclic group, a substituted or unsubstituted diaryl ether, a substituted or unsubstituted diaryl sulfide, a substituted or unsubstituted diaryl sulfoxide, a substituted or unsubstituted diaryl ketone, or a substituted or unsubstituted diaryl bisphenol A; R1, R2, and R3 each independently represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted acetal group,
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: January 22, 2013
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Don Lee, Jun-Ho Lee, Shin-Hyo Bae, Seung-Hee Hong, Seung-Duk Cho
  • Patent number: 8333928
    Abstract: Provided is an apparatus for producing carbon nanotubes. The apparatus includes a reaction chamber and a rotating member. The reaction chamber provides a reaction space in which metal catalysts and a source gas react with one another to produce carbon nanotubes. The rotating member increases fluidizing of the metal catalysts in the reaction space to increase productivity and raise the gas conversion rate, thereby reducing the price of carbon nanotubes and preventing adhering of metal catalysts to the sidewall of the reaction chamber.
    Type: Grant
    Filed: November 4, 2008
    Date of Patent: December 18, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Suk-Won Jang, Chung-Heon Jeong, Jong-Kwan Jeon, Ho-Soo Hwang
  • Patent number: 8318401
    Abstract: Disclosed is a photosensitive resin composition, comprising 0.1 to 20 parts by weight of a polygonal oligomeric silsesquioxane derivative, and 5 to 30 parts by weight of a compound generating acid by light, based on 100 parts by weight of a polyamide derivative.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: November 27, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Seok Chan Kang, Jin Han Lee
  • Patent number: 8318402
    Abstract: Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
    Type: Grant
    Filed: December 30, 2009
    Date of Patent: November 27, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Joo Hyeon Park, Seok Chan Kang, Jung Hwan Cho, Kyung Chul Son
  • Publication number: 20120296059
    Abstract: Disclosed are a copolymer for organic antireflective films containing a repeating unit represented by the following formula (1), a monomer for the copolymer, and an organic antireflective film composition including the copolymer: wherein in the formula (1), R1, R2, R3, A, m and n respectively have the same meanings as defined in the detailed description of the invention. The organic antireflective film composition including the copolymer for organic antireflective films has an increased refractive index and exhibits excellent effects when produced into an antireflective film, and hydrophilicity and hydrophobicity of the coating film produced from the composition can be regulated, so that excellent compatibility with resists can be obtained.
    Type: Application
    Filed: April 26, 2012
    Publication date: November 22, 2012
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jin Han Lee, Shin Hyo Bae, Seung Hee Hong, Eun Hee Han
  • Publication number: 20120270982
    Abstract: Disclosed are a novel anti-oxidant for rubber and a synthetic rubber including the same. The disclosed anti-oxidant contains a thio compound. The rubber including the anti-oxidant has excellent thermostability at a temperature of 100° C. or higher, and the anti-oxidant shows a low volatility due to its high molecular weight thus being applicable to manufacture environment-friendly rubber.
    Type: Application
    Filed: April 8, 2011
    Publication date: October 25, 2012
    Applicant: KOREA KUMHO PETROCHEMICAL CO., LTD.
    Inventors: Hyung Jae Lee, Chang Kyo Shin, Jin Eok Kim
  • Patent number: 8283102
    Abstract: Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: October 9, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon Oh, Sang Jin Kim, Jin Ho Kim, Dae Hyeon Shin
  • Patent number: 8283477
    Abstract: The present invention relates to a method of preparing N-substituted maleimide in high purity and high yield, wherein, unlike a conventional method of preparing N-substituted maleimide after preparing N-substituted maleamic acid, an organic solvent, an acid catalyst, a dehydration co-catalyst and a stabilizer are added into a reactor without separately preparing N-substituted maleamic acid, and then a primary amine is added into the reactor to form an amine salt, maleic anhydride is added into the reactor, and the resulting mixture is subjected to a dehydration-cyclization reaction, wherein water produced during the reaction is azeotropically distilled with the organic solvent so as to effectively suppress formation of a maleimide polymer.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: October 9, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jin-Eok Kim, Seung-il Kim, Han-Jin Kwag
  • Publication number: 20120251952
    Abstract: A resist resin composition includes 100 parts by weight of a copolymer represented by Formula 3 below; 0.5 to 1.5 parts by weight of a photoacid generator and 700 to 1,500 parts by weight of a solvent: wherein R1, R2, and R3 are each independently a C1-30 alkyl group or a C3-30 cycloalkyl group that has or does not have hydrogen, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group, R4, R5, and R6 are each independently hydrogen or a methyl group, and l, m, n, and o each independently refer to the number of repeating units in a main backbone and satisfy the conditions: l+m+n+o=1, 0?l/(l+m+n+o)<0.4, 0<m/(l+m+n+o)<0.6, 0?n/(l+m+n+o)<0.6, and 0<o/(l+m+n+o)<0.4.
    Type: Application
    Filed: March 28, 2012
    Publication date: October 4, 2012
    Applicant: KOREA KUMHO PETROCHEMICAL CO., LTD.
    Inventors: Jin Bong SHIN, Jin Ho KIM, Dae Hyeon SHIN, Seung Jae LEE
  • Patent number: 8273821
    Abstract: The present invention relates to an adhesive composition comprising a mixture of multi-block copolymers, in particular, an adhesive composition comprising a block copolymer represented by Formula 1, a hydrocarbon adhesive resin and a plasticizer. The adhesive composition according to the present invention can be easily processed due to its low melting point and shows improved adhesive properties such as loop tack, 180° peel strength and holding power.
    Type: Grant
    Filed: November 27, 2009
    Date of Patent: September 25, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jae Yun Kim, Ok Kil Mun, Eun Kyung Noh
  • Patent number: 8263014
    Abstract: In an apparatus and method of generating a carbon nanotube (CNT), a process chamber is heated to a target temperature and a catalyst powder is supplied into the heated process chamber. The catalyst powder moves in a first direction in the process chamber. A source gas is supplied into the process chamber in a second direction opposite to the first direction, so that the source gas delays the movement of the catalyst powder in the first direction and is reacted with the catalyst powder in the process chamber to thereby produce the CNT in the process chamber. Accordingly, the flow of the source gas against the flow of the catalyst powder reduces the drop velocity of the catalyst powder. Therefore, the source gas and the catalyst powder may be reacted with each other for a sufficiently long time.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: September 11, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Suk-Won Jang, Byung-Yun Kong, Chung-Heon Jeong
  • Patent number: 8261687
    Abstract: According to an exemplary embodiment of the present invention there is provided a catalyst-spreading device comprising: a mesh boat which stores catalyst to be spread on a substrate and includes a bottom having a mesh net, a transportation unit which transports the mesh boat or the substrate, and a vibration unit which vibrates the mesh boat to spread the catalyst on the substrate.
    Type: Grant
    Filed: March 10, 2008
    Date of Patent: September 11, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd
    Inventors: Sung-Soo Kim, Ho-Soo Hwang
  • Patent number: 8241831
    Abstract: An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: August 14, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sung-Do Jung, Jin-Ho Kim, Jung-Hoon Oh, Hyun-Soon Lim
  • Patent number: 8242204
    Abstract: Provided is an organic-inorganic nano composite, and more particularly, an organic-inorganic nano composite which is a product formed by the reaction of a styrene-butadiene copolymer; an acryl-based monomer; a living radical polymerization initiator; silica; and a coupling agent, in which radiality is maximized. The organic-inorganic nano composite has excellent tensile and tear properties, and high wet fraction capability. Thus, if the organic-inorganic nano composite according to the present invention is applied to organic filler for tires, rolling resistance can be decreased and wet traction capability can be increased, and the organic-inorganic nano composite can be efficiently applied to a hard coating material as well.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: August 14, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Gwanghoon Kwag, Hoochae Kim, Seunghwon Lee, Hwieon Park, Hyung Kyu Choi
  • Publication number: 20120203030
    Abstract: A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 9, 2012
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon OH, Dae Kyung Yoon, Yong Hwa Hong, Seung Duk Cho
  • Publication number: 20120203024
    Abstract: A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y1, Y2, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 9, 2012
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon OH, Jin Bong Shin, Tae Gon Kim, Dong Chul Seo
  • Publication number: 20120197044
    Abstract: The present invention relates to a production method for 4,4?-bis(alkylamino)diphenylamine, and more specifically relates to a method in which 4,4?-dinitrodiphenylamine (4,4?-DNDPA) is produced by reacting urea with nitrobenzene in the presence of a polar organic solvent and a base catalyst, and then the 4,4?-bis(alkylamino)diphenylamine (4,4?-BAADA) is produced by subjecting the 4,4?-DNDPA and a ketone to hydrogenation in the presence of a hydrogenation catalyst.
    Type: Application
    Filed: September 30, 2010
    Publication date: August 2, 2012
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jin Eok Kim, Seung Il Kim, Jung Hee Jang, Han Jin Kwag
  • Publication number: 20120189963
    Abstract: A water-soluble resin composition for forming fine patterns comprising water-soluble polymer represented by Chemical Formula 1 as below and the first water-soluble solvent, is coated and heated on a photoresist layer having at least one contact hole to reduce a size of the at least one contact hole. (In Chemical Formula 1, each of R1, R2, R3 and R5 independently represents an alkyl group of C1-30 or an cyclo alkyl group of C3-30 which respectively have one selected from the group consisting of hydrogen, an ether group, an ester group, a carbonyl group, an acetal, an epoxy group, a nitril group, an amine group, and an aldehyde group; each of R4, R6, R7 and R8 independently represents hydrogen or a methyl group; n represents an integer of 0 to 5; a represents a real number of 0.05 to 0.5; each of b, c and d respectively represents a real number of 0 to 0.
    Type: Application
    Filed: June 29, 2011
    Publication date: July 26, 2012
    Applicant: KOREA KUMHO PETROCHEMICAL CO., LTD.
    Inventors: Sang Wook PARK, So Jung PARK, Dong Chul SEO
  • Patent number: 8226902
    Abstract: Provided are an apparatus for manufacturing carbon nanotubes and a method of manufacturing carbon nanotubes with the apparatus. A plurality of carbon-nanotube-synthesizing units are disposed in series to continuously perform a carbon-nanotube-synthesizing process. Thus, carbon nanotubes having a uniform quality can be synthesized.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: July 24, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Suk-Won Jang, Ho-Soo Hwang
  • Publication number: 20120172628
    Abstract: Provided are novel thio compounds and a method for preparing the same. More particularly, there is provided a novel thio compound prepared by reacting an alkylation product of p-cresol and dicyclopentadiene with mercaptan and paraformaldehyde. Unlike existing antioxidants such as 2,6-di-t-butyl-4-methylphenol (BHT) being harmful to the human body due to the high volatility, the novel thio compounds of the present invention, which have the low volatility because of their high molecular weight, give no harm to the human body. Further, with excellent performances, they are suitable to replace the existing antioxidants.
    Type: Application
    Filed: August 31, 2010
    Publication date: July 5, 2012
    Applicant: KOREA KUMHO PETROCHEMICAL CO., LTD.
    Inventors: Hyung Jae Lee, Chang Kyo Shin, Jin Eok Kim