Abstract: A scale remover that efficiently removes scale deposited inside a boiler without corroding a boiler includes polyacrylic acid and polymethacrylic acid and/or salts thereof.

Abstract: A treatment device has: a treatment tank provided with a constant temperature heater on the outer periphery; an electrolytic cell continuing from a pipe provided with a circulation pump; and a pipe for supply to the treatment tank from the electrolytic cell. Within the electrolytic cell are provided an anode and a cathode formed from diamond electrodes and a bipolar electrode disposed between the two. The treatment tank and the electrolytic cell are filled with a prescribed concentration of sulfuric acid. The treatment device is configured such that a persulfate solution such as peroxydisulfuric acid is generated by electrolysis of the sulfuric acid by making a prescribed current flow from a direct current power supply unit to the anode and the cathode, and this persulfate solution can be supplied to the treatment tank via the pipe.

Abstract: An antimicrobial and algicidal agent for cooling water system contains an antimicrobial agent and an isothiazolone-based compound that effectively kill and remove the algae grown in the cooling water system.

Abstract: A chemical solution supply part for supplementing the chemical solution to the chemical solution storage tank and a purge gas supply part for supplying N2 gas as a purge gas to the chemical solution storage tank are in communication with the chemical solution storage tank, and a first manometer serving as a pressure measurement part is arranged on the chemical solution storage tank. In addition, a drain piping is connected to a head portion of the plunger pump, and an automatically controlled air-bleed valve, which is an air-bleed mechanism, is arranged on the drain piping. On the other hand, a second manometer is arranged in the middle of the chemical solution supply pipe, and a front end of the solution supply pipe on the downstream side serves as an injection point for the chemical solution S.

Abstract: A water treatment plant controlling method including: determining whether or not there is a correlation, in water to be treated, between a water quality index and a concentration of a pollution component having no causal relationship with the water quality index, from a result of sample analysis of the water to be treated performed periodically; and (a) under a condition that there is a correlation, statistically analyzing a distribution of measurement values of the water quality index in a previous certain period of the water to be treated, and based on a result of the statistical analysis and the correlation, estimating the concentration of the pollution component of the water to be treated; and determining an operating condition of a water treatment plant for treating the water to be treated, based on the estimated concentration of the pollution component of the water to be treated; or (b) on a condition that a correlation is absent, statistically analyzing a distribution of concentration of the pollution

Abstract: The present invention provides a RO membrane or a FO membrane comprising a coating layer made of a phospholipid bilayer membrane and formed on a surface of a porous membrane body, having a high water permeate flow rate and salt rejection performance, the membrane being a permselective membrane comprising a porous membrane having a pore size of 5 nm to 50 nm and a coating layer made of a phospholipid bilayer and formed on a surface of the porous membrane, wherein (i) the phospholipid bilayer comprises phospholipid, amphotericin B, and ergosterol; (ii) a content of the amphotericin B is 3 to 20 mol % based on the phospholipid bilayer; (iii) a total content of the ergosterol and the amphotericin B in the phospholipid bilayer is 10 to 30 mol %.

Abstract: An object of the present technology is to provide a chlorine-concentration-measuring composition that can reduce staining by reagents, a measurement method using the chlorine-concentration-measuring composition and a method for reducing staining by chlorine-concentration-measuring composition using an aromatic sulfonic acid-based polymer or the salt thereof. Provided are a chlorine-concentration-measuring composition comprising an aromatic sulfonic acid-based polymer or the salt thereof; a chlorine-concentration-measuring composition comprising component (a) a color reagent for detection of residual chlorine and component (b) an aromatic sulfonic acid-based polymer or the salt thereof; a chlorine-concentration-measuring method comprising using the composition; and a method for reducing or preventing staining by using the chlorine-concentration-measuring composition comprising an aromatic sulfonic acid-based polymer or the salt thereof.

Abstract: A flocculation monitoring apparatus and a flocculation monitoring method are provided, and the flocculation monitoring apparatus and the flocculation monitoring method are capable of stably measuring a flocculation state of water to be treated even when the number (density) of flocs has increased. A measurement-light applying part (laser-light applying part 10) applies a measurement light to a measurement region (18) in the water to be treated (8) and a scattered-light receiving part (12) receives a scattered light due to particles of the water to be treated. A measurement value arithmetic part (arithmetic circuit 48) calculates an index related to flocculation of the water to be treated, by using an amplitude of a light reception signal acquired in the scattered-light receiving part.

Abstract: An object of the present invention is to increase the accuracy of water quality measurement of ballast waters with different oxidant concentrations. A ballast water measurement apparatus (2 or 62) is provided with: a first measuring unit (6-1 or 64-1) for measuring an oxidant concentration of ballast water after addition of an oxidant or ballast water before addition of a neutralizing agent; a second measuring unit (6-2 or 64-2) for measuring an oxidant concentration of ballast water after neutralization of the oxidant; and a casing (4) that accommodates the first measuring unit and the second measuring unit. Oxidant concentration measurement ranges of the first measuring unit and the second measuring unit are different.

Abstract: An apparatus has a platinum group metal carrying resin column provided in a supply line of ultrapure water, and has a pH adjuster injection device and a redox potential adjuster injection device provided in a later stage thereof. The apparatus has a membrane-type deaeration apparatus and a gas dissolving membrane apparatus sequentially provided in a later stage of the devices, and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are each provided at some midpoint in the discharge line, and the pH meter and the ORP meter are connected to a control device. Then, the control device controls the amount of adjusters to be injected from the pH adjuster injection device and the redox potential adjuster injection device, on the basis of the measurement results of the pH meter and the ORP meter.

Abstract: A method for treating ammonia-containing water containing ammonia, metal ions that form a complex with ammonia, and a reducing substance includes a first step of oxidizing the reducing substance by adding hydrogen peroxide to the ammonia-containing water; a second step of aerating the resultant water treated in the first step to remove the ammonia; a third step of forming an insoluble solid at a pH of 7 to 12 by adding at least one compound selected from the group consisting of iron salts, aluminum salts, calcium salts, and calcium hydroxide to the water treated in the second step; and a fourth step of separating the insoluble solid formed in the third step by solid-liquid separation.

Abstract: Wastewater containing scale components, organic substances, inorganic ions, and the like, such as human effluent, generated in a closed system space, such as a nuclear shelter, a hazardous shelter, a space station or a moon-Mars mission manned spacecraft, or a lunar base is efficiently treated by a simple structural apparatus, so that water is recovered. After a hardness component is removed from water to be treated, such as human effluent, by a softening device, and heat exchange is performed between softening treated water and electrolysis treated water by a heat exchanger, by a high-temperature and high-pressure electrolysis device, organic substances, urea, ammonia, and the like are removed by electrolysis performed under high-temperature and high-pressure conditions. After the electrolysis treated water is processed by a deaeration treatment using a deaeration membrane device, a desalting treatment is performed by acid/alkali manufacturing electrodialysis devices and provided in series at two stages.

Abstract: A diluted chemical liquid production apparatus has a structure that has a platinum group metal carrying resin column 2, a membrane-type deaeration apparatus 3 and a gas dissolving membrane apparatus 4, which are sequentially provided in a supply line 1 of ultrapure water W; and has a pH adjuster injection device 5A and an oxidation-reduction potential adjuster injection device 5B, which are provided between the platinum group metal carrying resin column 2 and the membrane-type deaeration apparatus 3. An inert gas source 6 is connected to a gaseous phase side of the membrane-type deaeration apparatus 3, and an inert gas source 7 is also connected to the gaseous phase side of the gas dissolving membrane apparatus 4; and a discharge line 8 communicates with the gas dissolving membrane apparatus 4. A pH meter 10A and an ORP meter 10B are provided in the discharge line 8. Such a diluted chemical liquid production apparatus can control a pH and an oxidation-reduction potential.

Abstract: The present invention provides an apparatus and method for producing ultrapure water of extremely high purity that sufficiently meets the requirement for its quality at low production cost with reduced footprint. The apparatus for producing ultrapure water includes a pretreatment system, a primary water purification system, and a subsystem, wherein the primary water purification system includes a high-pressure reverse osmotic membrane separation unit, a degassing unit, an ultraviolet oxidation unit, and an ion-exchange unit in this order.

Abstract: Provided are a pitch-formation suppressor and the like which can be widely applied independently of the substance that causes a pitch and of the situation to generate a pitch in a paper manufacturing process, and which can effectively suppress and prevent the troubles due to the pitch, such as foreign spots and defects in a paper, breakage of a paper, and lowering of workability. This pitch-formation suppressor comprises an alkaline solution in which a phenol resin and/or a modified phenol resin is dissolved, or an acid solution in which a phenol resin and/or a modified phenol resin is dissolved.

Abstract: The present invention provides a sludge dehydrating agent having excellent dehydrating effects, particularly, an excellent floc formation ability and gravity filtration property even if the amount to be added is small and a sludge dehydrating method using the sludge dehydrating agent. The sludge dehydrating agent comprises at least one crosslinked polymer selected from the group consisting of a polymer A, a polymer B, and a polymer C each comprising a monomer represented by a particular structural formula, wherein the crosslinked polymer has an intrinsic viscosity of 0.5 to 5.0 dL/g, the intrinsic viscosity measured with 1.0N sodium nitrate, and the sludge dehydrating method uses the sludge dehydrating agent.

Abstract: A cleaning apparatus (10) for a semiconductor substrate that cleans a semiconductor substrate by using ozone water, including cooling means (3) for cooling ozone water (W2) of 20° C. or more to a predetermined temperature, and cleaning means (4) for cleaning a substrate by using ozone water (W3) cooled by the cooling means (3). The cleaning means (4) has a cleaning tank (41) for cleaning the substrate by immersing the substrate in the ozone water (W3) cooled by the cooling means (3). According to a cleaning method using the semiconductor substrate cleaning apparatus (10), by immersing a semiconductor substrate in ozone water, organic substances, such as resist, and metal foreign materials remaining on the substrate surface are cleaned and removed, and the loss of substrate material in a cleaning step can be reduced.

Abstract: An ammonia solution production device produces a dilute ammonia solution by supplying ammonia from an ammonia supply device to ultrapure water supplied from an ultrapure water production device and dissolving the ammonia, and supplies the ammonia solution to a use point. Here, the ultrapure water production device has the ability to supply ultrapure water having a resistance value of 18 M?·cm or more, and a metal ion concentration of 1 ng/L or less, particularly 0.1 ng/L or less. Ammonia is added to the ultrapure water from the ammonia supply device to produce the dilute ammonia water. The ammonia solution production device is suitable for the production of dilute ammonia water having an ammonia concentration of 100 mg/L or less. Such an ammonia solution production device is capable of producing an ammonia solution with a stable concentration, and achieves excellent follow-up performance with respect to a change in the concentration.

Abstract: A residual chlorine measuring apparatus includes: a detection electrode that is immersed in a sample solution, the detection electrode being made of gold or platinum; a counter electrode that is immersed in the sample solution, the counter electrode being made of silver/silver chloride; a voltage applying device that applies an applied voltage between the detection electrode and the counter electrode; an ammeter that measures an oxidation-reduction current flowing between the detection electrode and the counter electrode; and an arithmetic controller that controls the voltage applying device and acquires the oxidation-reduction current measured by the ammeter.

Abstract: Provided are a cleaning agent and a cleaning liquid that prevent a reduction in the rejection rate of an RO membrane which may occur when the RO membrane is cleaned and a method for cleaning an RO membrane with the cleaning liquid. The agent for cleaning an RO membrane includes a urea derivative. The urea derivative preferably includes urea (H2N—CO—NH2) and/or biuret (H2N—CO—NH—CO—NH2). The cleaning liquid is an aqueous solution produced by diluting the cleaning agent. The method for cleaning an RO membrane uses the cleaning liquid. Urea and biuret have a structure analogous to amide bonds included in aromatic polyamide RO membranes, and have a strong affinity for amide bond portions. Urea and biuret adsorb onto the amide bond portions, and prevent the amide bonds from being broken by the cleaning liquid.