Patents Assigned to Kyowa Yuka Co., Ltd.
  • Patent number: 7417162
    Abstract: The present invention provides oils for cosmetics comprising a dibasic acid diester represented by general formula (I) (wherein R1, R2, R3 and R4, which are the same or different, each represent lower alkyl) and excellent in solubility of a long-wave ultraviolet light absorber or the like, and so forth.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: August 26, 2008
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Yukitoshi Fukuda, Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tomoya Takahashi
  • Patent number: 7358030
    Abstract: The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: April 15, 2008
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Patent number: 7223521
    Abstract: Squarylium-metal chelate compounds as recording materials for optical recording media, and optical recording media using these compounds, which have excellent recording properties, light resistance and storage stability. The squarylium-metal chelate compound is represented by following Structural Formulas (1) and (2): In the formula (1), M represents a metal atom capable of coordinating; “a”, “b” and “c” each represents a squarylium dye ligand of formula (2), where “a” is different from “b”; and “c” may be the same as or different from “a” or “b”; and “m” represents 0 or 1. In the formula (2), R1 and R2 are the same or different and each represents an alkyl group, aralkyl group, aryl group or heterocyclic group, each of which may be substituted; and X represents an aryl group which may be substituted, a heterocyclic group which may be substituted, or Z3=CH—, wherein Z3 represents a heterocyclic group which may be substituted.
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: May 29, 2007
    Assignees: Ricoh Company, Ltd., Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd.
    Inventors: Tohru Yashiro, Tomomi Ishimi, Tatsuo Mikami, Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda
  • Publication number: 20060074262
    Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.
    Type: Application
    Filed: November 30, 2005
    Publication date: April 6, 2006
    Applicant: KYOWA YUKA CO., LTD.
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Patent number: 7015363
    Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: March 21, 2006
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Patent number: 6818262
    Abstract: The present invention provides filters for an electronic display device comprising a squarylium compound represented by the general formula (I): wherein X represents a nitrogen atom or an oxygen atom; Q represents a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom; and R1, R2, R3, R4, R5, R6 and m are as defined in the specification. The filters for an electronic display device of the present invention can selectively shield the light having such a wavelength that reduces the color purity, and thereby can provide clear images.
    Type: Grant
    Filed: January 22, 2003
    Date of Patent: November 16, 2004
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Shiho Yamada
  • Publication number: 20040225065
    Abstract: An object of the present invention is to provide a softening agent for a thermoplastic resin that gives flexibility, impact-resistance, etc. to a thermoplastic resin.
    Type: Application
    Filed: June 15, 2004
    Publication date: November 11, 2004
    Applicant: Kyowa Yuka Co., Ltd.
    Inventors: Toshihiro Inayama, Shigeru Murata, Tatsuo Niimi
  • Patent number: 6794005
    Abstract: An optical recording medium having a substrate, and a recording layer provided on the substrate and containing: (a) a formazan metal chelate including a formazan compound and a metal component, (b) a squarylium metal chelate including a squarylium compound and a metal component; and (c) at least one additional dye selected from phthalocyanine compounds and pentamethine cyanine compounds. Alternatively, the recording layer contains (a) a first formazan metal chelate including a first formazan compound and a first metal component and having the maximum absorption wavelength in the range of 500 to 650 nm, (b) a squarylium metal chelate including a squarylium compound and a metal component; and (c) a second formazan metal chelate including a second formazan compound and a second metal component and having the maximum absorption wavelength different from that of the first formazan metal chelate and in the range of 650 to 750 nm.
    Type: Grant
    Filed: February 4, 2003
    Date of Patent: September 21, 2004
    Assignees: Ricoh Company, Ltd., Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd.
    Inventors: Soh Noguchi, Tsutomu Satoh, Tatsuya Tomura, Yasunobu Ueno, Tohru Yashiro, Tomomi Ishimi, Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Shiho Yamada
  • Patent number: 6770709
    Abstract: The present invention provides a resin composition comprising: (1) a vinyl copolymer obtained from a starting material containing vinyl monomer (a) which comprises at least one carbonyl group or aldehyde group and vinyl monomer (b) which is different from vinyl monomer (a) and capable of copolymerization; (2) a hydrazide derivative represented by general formula (I):  (wherein R1 represents substituted or unsubstituted phenylene, substituted or unsubstituted cyclohexylene or alkylene; and R2 and R3, which may be the same or different, each represent a single bond or alkylene) or a hydrazide derivative in which the amino group(s) of the hydrazide derivative represented by general formula (I) are protected with a low molecular carbonyl compound; and (3) a polyamine compound represented by general formula (II):  (wherein R4 represents substituted or unsubstituted phenylene, substituted or unsubstituted cyclohexylene or alkylene; and R5 and R6, which may be the sam
    Type: Grant
    Filed: December 27, 2002
    Date of Patent: August 3, 2004
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Yoshio Nakano, Shigeru Murata, Shohei Konishi, Iwao Hotta
  • Patent number: 6759484
    Abstract: By allowing a compound having an epoxy group in a composition containing at least a polymer or compound having a five-membered ring dithiocarbonate group represented by the following general formula (I) and a nucleophilic reagent, or in a cured article obtained by curing the composition, it is possible to inhibit emission of odors from the composition or the cured article, wherein R1, R2 and R3 are the same or different and each represents a hydrogen atom or a lower alkyl group.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: July 6, 2004
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Toshikazu Murayama, Harufumi Hagino, Akihiro Gonno, Nobuko Kinoshita
  • Patent number: 6734151
    Abstract: A process for efficiently producing a high purity compound having oxygen which has a high volume specific resistance and a lubricating oil comprising the high purity compound having oxygen are provided. The process for producing a high purity compound having oxygen selected from a group consisting of high purity polyvinyl ether compounds, high purity polyalkylene glycol compounds, high purity polyol ester compounds, high purity cyclic polyether compounds and high purity carbonate compounds comprises a step of treating with an adsorbent at least one crude compound having oxygen selected from a group consisting of crude polyvinyl ether compounds, crude polyalkylene glycol compounds, crude polyol ester compounds, crude cyclic polyether compounds and crude carbonate compounds. The lubricating oil comprises the high purity compound having oxygen obtained in accordance with this process.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: May 11, 2004
    Assignees: Idemitsu Kosan Co., Ltd., Kyowa Yuka Co., Ltd.
    Inventors: Minoyuki Kubota, Kazuhiko Suzuki, Hirotaka Yamazaki, Tokuyuki Yoshimoto, Akihisa Ogawa, Shigeru Kamimori
  • Patent number: 6660867
    Abstract: An object of the present invention is to provide a material having spectroscopic properties, light resistance, solubility and thermal decomposition properties suitable for recording for DVD-R. More specifically, the present invention provides squarylium compounds in a state of a metal complex represented by the general formula (I): wherein, R1 and R2 are the same or different, and represent an alkyl group optionally having a substituent, an aralkyl group optionally;,having a substituent, an aryl group optionally having a substituent, or a heterocyclic group optionally having a substituent; Q represents a metal atom with a coordination ability; q represents 2 or 3; and A represents an aryl group optionally having a substituent, a heterocyclic group optionally having a substituent, or Y═CH— wherein Y represents an aryl group optionally having a substituent or a heterocyclic group optionally having a substituent.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: December 9, 2003
    Assignees: Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd., Ricoh Company, Ltd.
    Inventors: Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Soh Noguchi, Tsutomu Satoh, Tatsuya Tomura
  • Patent number: 6649693
    Abstract: The present invention provides a polyurethane exhibiting a superior adhesive property, bonding property, weather resistance, water resistance, and the like, and comprising in a molecule: an acidic group which is neutralized by a basic compound; and a structural unit represented by general formula (I): (in the formula, R1 and R2 are identical or different, and represent a lower alkyl group).
    Type: Grant
    Filed: November 14, 2002
    Date of Patent: November 18, 2003
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Shohei Konishi, Shigeru Murata, Toshio Yamauchi
  • Publication number: 20030165640
    Abstract: The present invention provides filters for an electronic display device comprising a squarylium compound represented by the general formula (I): 1
    Type: Application
    Filed: January 22, 2003
    Publication date: September 4, 2003
    Applicant: Kyowa Yuka Co., Ltd.
    Inventors: Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Shiho Yamada
  • Patent number: 6599605
    Abstract: An object of the present invention is to provide novel squarylium compounds having the spectroscopic properties, light resistance, solubility and thermal decomposition properties suitable for a recording material for DVD-R, and optical recording media using the same. More particularly, the present invention provides novel squarylium compounds represented by the general formula (I). In addition, the present invention provides optical recording media having a recording layer containing said squarylium compound.
    Type: Grant
    Filed: November 28, 2001
    Date of Patent: July 29, 2003
    Assignees: Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd., Ricoh Company, Ltd.
    Inventors: Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Masanori Ikuta, Kenji Mutoh, Tsutomu Satoh, Tatsuya Tomura
  • Patent number: 6596364
    Abstract: Squarylium compounds having spectroscopic properties, light resistance, solubility and thermal decomposition properties suitable for a recording material for DVD-R represented by the general formula (I), having pyrazole and indoline skeletons in the molecule and optical recording media having a recording layer comprising an asymmetric squarylium compound of formula (I).
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: July 22, 2003
    Assignees: Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd., Ricoh Company, Ltd.
    Inventors: Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Masanori Ikuta, Kenji Mutoh, Tsutomu Satoh, Tatsuya Tomura
  • Publication number: 20030119959
    Abstract: An object of the present invention is to provide a softening agent for a thermoplastic resin that gives flexibility, impact-resistance, etc. to a thermoplastic resin.
    Type: Application
    Filed: November 1, 2002
    Publication date: June 26, 2003
    Applicant: Kyowa Yuka Co., Ltd.
    Inventors: Toshihiro Inayama, Shigeru Murata, Tatsuo Niimi
  • Patent number: 6558768
    Abstract: An optical recording medium has a substrate and a recording layer formed thereon, the recording layer containing at least one squarylium compound and one azo metal chelate compound including an azo moiety of formula (I-1) or (I-2) and a metal: wherein A, B, A′, and X are the same as those previously defined in the specification. Writing and reading steps are performed by the application of a semiconductor laser beam with a wavelength in a range from 600 to 720 nm.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: May 6, 2003
    Assignees: Ricoh Company, Ltd., Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd.
    Inventors: Soh Noguchi, Tsutomu Satoh, Tatsuya Tomura, Noboru Sasa, Yasunobu Ueno, Yasuhiro Higashi, Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Masanori Ikuta, Kenji Mutoh
  • Publication number: 20030065056
    Abstract: An object of the present invention is to provide a composition which affords a hardened product exhibiting superior electrical insulating properties, adhesiveness, or the like at the time of hardening the composition.
    Type: Application
    Filed: May 14, 2002
    Publication date: April 3, 2003
    Applicant: Kyowa Yuka Co., Ltd.
    Inventors: Iwao Hotta, Toshikazu Murayama, Harufumi Hagino, Satoshi Moriyama, Shigeru Murata, Ikuo Shimizu
  • Patent number: 6512057
    Abstract: The object of the present invention is to provide resin compositions conferring cured materials (a coating or the like) with excellent appearance, excellent mechanical properties, or the like. The present invention provides resin compositions containing a vinyl copolymer with an epoxy group and a branched glutaric acid.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: January 28, 2003
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Toshikazu Murayama, Shigeru Murata, Shohei Konishi, Junichi Yamada, Makoto Goto