Patents Assigned to Kyowa Yuka Co., Ltd.
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Patent number: 7417162Abstract: The present invention provides oils for cosmetics comprising a dibasic acid diester represented by general formula (I) (wherein R1, R2, R3 and R4, which are the same or different, each represent lower alkyl) and excellent in solubility of a long-wave ultraviolet light absorber or the like, and so forth.Type: GrantFiled: August 21, 2002Date of Patent: August 26, 2008Assignee: Kyowa Yuka Co., Ltd.Inventors: Yukitoshi Fukuda, Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tomoya Takahashi
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Patent number: 7358030Abstract: The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.Type: GrantFiled: November 30, 2005Date of Patent: April 15, 2008Assignee: Kyowa Yuka Co., Ltd.Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
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Patent number: 7223521Abstract: Squarylium-metal chelate compounds as recording materials for optical recording media, and optical recording media using these compounds, which have excellent recording properties, light resistance and storage stability. The squarylium-metal chelate compound is represented by following Structural Formulas (1) and (2): In the formula (1), M represents a metal atom capable of coordinating; “a”, “b” and “c” each represents a squarylium dye ligand of formula (2), where “a” is different from “b”; and “c” may be the same as or different from “a” or “b”; and “m” represents 0 or 1. In the formula (2), R1 and R2 are the same or different and each represents an alkyl group, aralkyl group, aryl group or heterocyclic group, each of which may be substituted; and X represents an aryl group which may be substituted, a heterocyclic group which may be substituted, or Z3=CH—, wherein Z3 represents a heterocyclic group which may be substituted.Type: GrantFiled: February 11, 2004Date of Patent: May 29, 2007Assignees: Ricoh Company, Ltd., Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd.Inventors: Tohru Yashiro, Tomomi Ishimi, Tatsuo Mikami, Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda
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Publication number: 20060074262Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.Type: ApplicationFiled: November 30, 2005Publication date: April 6, 2006Applicant: KYOWA YUKA CO., LTD.Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
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Patent number: 7015363Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.Type: GrantFiled: July 12, 2002Date of Patent: March 21, 2006Assignee: Kyowa Yuka Co., Ltd.Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
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Patent number: 6818262Abstract: The present invention provides filters for an electronic display device comprising a squarylium compound represented by the general formula (I): wherein X represents a nitrogen atom or an oxygen atom; Q represents a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom; and R1, R2, R3, R4, R5, R6 and m are as defined in the specification. The filters for an electronic display device of the present invention can selectively shield the light having such a wavelength that reduces the color purity, and thereby can provide clear images.Type: GrantFiled: January 22, 2003Date of Patent: November 16, 2004Assignee: Kyowa Yuka Co., Ltd.Inventors: Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Shiho Yamada
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Publication number: 20040225065Abstract: An object of the present invention is to provide a softening agent for a thermoplastic resin that gives flexibility, impact-resistance, etc. to a thermoplastic resin.Type: ApplicationFiled: June 15, 2004Publication date: November 11, 2004Applicant: Kyowa Yuka Co., Ltd.Inventors: Toshihiro Inayama, Shigeru Murata, Tatsuo Niimi
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Patent number: 6794005Abstract: An optical recording medium having a substrate, and a recording layer provided on the substrate and containing: (a) a formazan metal chelate including a formazan compound and a metal component, (b) a squarylium metal chelate including a squarylium compound and a metal component; and (c) at least one additional dye selected from phthalocyanine compounds and pentamethine cyanine compounds. Alternatively, the recording layer contains (a) a first formazan metal chelate including a first formazan compound and a first metal component and having the maximum absorption wavelength in the range of 500 to 650 nm, (b) a squarylium metal chelate including a squarylium compound and a metal component; and (c) a second formazan metal chelate including a second formazan compound and a second metal component and having the maximum absorption wavelength different from that of the first formazan metal chelate and in the range of 650 to 750 nm.Type: GrantFiled: February 4, 2003Date of Patent: September 21, 2004Assignees: Ricoh Company, Ltd., Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd.Inventors: Soh Noguchi, Tsutomu Satoh, Tatsuya Tomura, Yasunobu Ueno, Tohru Yashiro, Tomomi Ishimi, Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Shiho Yamada
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Patent number: 6770709Abstract: The present invention provides a resin composition comprising: (1) a vinyl copolymer obtained from a starting material containing vinyl monomer (a) which comprises at least one carbonyl group or aldehyde group and vinyl monomer (b) which is different from vinyl monomer (a) and capable of copolymerization; (2) a hydrazide derivative represented by general formula (I): (wherein R1 represents substituted or unsubstituted phenylene, substituted or unsubstituted cyclohexylene or alkylene; and R2 and R3, which may be the same or different, each represent a single bond or alkylene) or a hydrazide derivative in which the amino group(s) of the hydrazide derivative represented by general formula (I) are protected with a low molecular carbonyl compound; and (3) a polyamine compound represented by general formula (II): (wherein R4 represents substituted or unsubstituted phenylene, substituted or unsubstituted cyclohexylene or alkylene; and R5 and R6, which may be the samType: GrantFiled: December 27, 2002Date of Patent: August 3, 2004Assignee: Kyowa Yuka Co., Ltd.Inventors: Yoshio Nakano, Shigeru Murata, Shohei Konishi, Iwao Hotta
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Patent number: 6759484Abstract: By allowing a compound having an epoxy group in a composition containing at least a polymer or compound having a five-membered ring dithiocarbonate group represented by the following general formula (I) and a nucleophilic reagent, or in a cured article obtained by curing the composition, it is possible to inhibit emission of odors from the composition or the cured article, wherein R1, R2 and R3 are the same or different and each represents a hydrogen atom or a lower alkyl group.Type: GrantFiled: March 27, 2002Date of Patent: July 6, 2004Assignee: Kyowa Yuka Co., Ltd.Inventors: Toshikazu Murayama, Harufumi Hagino, Akihiro Gonno, Nobuko Kinoshita
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Patent number: 6734151Abstract: A process for efficiently producing a high purity compound having oxygen which has a high volume specific resistance and a lubricating oil comprising the high purity compound having oxygen are provided. The process for producing a high purity compound having oxygen selected from a group consisting of high purity polyvinyl ether compounds, high purity polyalkylene glycol compounds, high purity polyol ester compounds, high purity cyclic polyether compounds and high purity carbonate compounds comprises a step of treating with an adsorbent at least one crude compound having oxygen selected from a group consisting of crude polyvinyl ether compounds, crude polyalkylene glycol compounds, crude polyol ester compounds, crude cyclic polyether compounds and crude carbonate compounds. The lubricating oil comprises the high purity compound having oxygen obtained in accordance with this process.Type: GrantFiled: March 11, 2002Date of Patent: May 11, 2004Assignees: Idemitsu Kosan Co., Ltd., Kyowa Yuka Co., Ltd.Inventors: Minoyuki Kubota, Kazuhiko Suzuki, Hirotaka Yamazaki, Tokuyuki Yoshimoto, Akihisa Ogawa, Shigeru Kamimori
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Patent number: 6660867Abstract: An object of the present invention is to provide a material having spectroscopic properties, light resistance, solubility and thermal decomposition properties suitable for recording for DVD-R. More specifically, the present invention provides squarylium compounds in a state of a metal complex represented by the general formula (I): wherein, R1 and R2 are the same or different, and represent an alkyl group optionally having a substituent, an aralkyl group optionally;,having a substituent, an aryl group optionally having a substituent, or a heterocyclic group optionally having a substituent; Q represents a metal atom with a coordination ability; q represents 2 or 3; and A represents an aryl group optionally having a substituent, a heterocyclic group optionally having a substituent, or Y═CH— wherein Y represents an aryl group optionally having a substituent or a heterocyclic group optionally having a substituent.Type: GrantFiled: November 27, 2002Date of Patent: December 9, 2003Assignees: Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd., Ricoh Company, Ltd.Inventors: Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Soh Noguchi, Tsutomu Satoh, Tatsuya Tomura
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Patent number: 6649693Abstract: The present invention provides a polyurethane exhibiting a superior adhesive property, bonding property, weather resistance, water resistance, and the like, and comprising in a molecule: an acidic group which is neutralized by a basic compound; and a structural unit represented by general formula (I): (in the formula, R1 and R2 are identical or different, and represent a lower alkyl group).Type: GrantFiled: November 14, 2002Date of Patent: November 18, 2003Assignee: Kyowa Yuka Co., Ltd.Inventors: Shohei Konishi, Shigeru Murata, Toshio Yamauchi
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Publication number: 20030165640Abstract: The present invention provides filters for an electronic display device comprising a squarylium compound represented by the general formula (I): 1Type: ApplicationFiled: January 22, 2003Publication date: September 4, 2003Applicant: Kyowa Yuka Co., Ltd.Inventors: Ikuo Shimizu, Motoharu Kinugasa, Hiroshi Toyoda, Shiho Yamada
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Patent number: 6599605Abstract: An object of the present invention is to provide novel squarylium compounds having the spectroscopic properties, light resistance, solubility and thermal decomposition properties suitable for a recording material for DVD-R, and optical recording media using the same. More particularly, the present invention provides novel squarylium compounds represented by the general formula (I). In addition, the present invention provides optical recording media having a recording layer containing said squarylium compound.Type: GrantFiled: November 28, 2001Date of Patent: July 29, 2003Assignees: Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd., Ricoh Company, Ltd.Inventors: Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Masanori Ikuta, Kenji Mutoh, Tsutomu Satoh, Tatsuya Tomura
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Patent number: 6596364Abstract: Squarylium compounds having spectroscopic properties, light resistance, solubility and thermal decomposition properties suitable for a recording material for DVD-R represented by the general formula (I), having pyrazole and indoline skeletons in the molecule and optical recording media having a recording layer comprising an asymmetric squarylium compound of formula (I).Type: GrantFiled: December 5, 2001Date of Patent: July 22, 2003Assignees: Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd., Ricoh Company, Ltd.Inventors: Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Masanori Ikuta, Kenji Mutoh, Tsutomu Satoh, Tatsuya Tomura
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Publication number: 20030119959Abstract: An object of the present invention is to provide a softening agent for a thermoplastic resin that gives flexibility, impact-resistance, etc. to a thermoplastic resin.Type: ApplicationFiled: November 1, 2002Publication date: June 26, 2003Applicant: Kyowa Yuka Co., Ltd.Inventors: Toshihiro Inayama, Shigeru Murata, Tatsuo Niimi
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Patent number: 6558768Abstract: An optical recording medium has a substrate and a recording layer formed thereon, the recording layer containing at least one squarylium compound and one azo metal chelate compound including an azo moiety of formula (I-1) or (I-2) and a metal: wherein A, B, A′, and X are the same as those previously defined in the specification. Writing and reading steps are performed by the application of a semiconductor laser beam with a wavelength in a range from 600 to 720 nm.Type: GrantFiled: March 2, 2001Date of Patent: May 6, 2003Assignees: Ricoh Company, Ltd., Kyowa Hakko Kogyo Co., Ltd., Kyowa Yuka Co., Ltd.Inventors: Soh Noguchi, Tsutomu Satoh, Tatsuya Tomura, Noboru Sasa, Yasunobu Ueno, Yasuhiro Higashi, Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Shiho Yamada, Masanori Ikuta, Kenji Mutoh
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Publication number: 20030065056Abstract: An object of the present invention is to provide a composition which affords a hardened product exhibiting superior electrical insulating properties, adhesiveness, or the like at the time of hardening the composition.Type: ApplicationFiled: May 14, 2002Publication date: April 3, 2003Applicant: Kyowa Yuka Co., Ltd.Inventors: Iwao Hotta, Toshikazu Murayama, Harufumi Hagino, Satoshi Moriyama, Shigeru Murata, Ikuo Shimizu
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Patent number: 6512057Abstract: The object of the present invention is to provide resin compositions conferring cured materials (a coating or the like) with excellent appearance, excellent mechanical properties, or the like. The present invention provides resin compositions containing a vinyl copolymer with an epoxy group and a branched glutaric acid.Type: GrantFiled: September 25, 2001Date of Patent: January 28, 2003Assignee: Kyowa Yuka Co., Ltd.Inventors: Toshikazu Murayama, Shigeru Murata, Shohei Konishi, Junichi Yamada, Makoto Goto