Abstract: A method and devices for preionizing the main discharge gas volume of a gas discharge laser are described. The method and devices provide a preionizing discharge to the main gas discharge volume from above or below the main gas discharge volume. In combination with a shielding arrangement which reduces the spread of the preionization discharge other than to the main gas discharge volume, the exposure of other laser components and gas volumes to said preionization discharge is thereby minimized.

Abstract: A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.

Abstract: A technique for testing the quality of optical components of a line-narrowing module is performed on-line. As the wavelength tends to drift from a desired value when the optical components of the line-narrowing module are heated due to absorption, one or more optical components is adjusted such as by rotation to tune the wavelength back to the desired wavelength using a feedback loop. The amount of adjustment of these optical components is monitored for indirectly measuring, and thereby testing, the absorption or quality of the optical components.

Abstract: A detector for use with an EUV photon source emitting around 11-15 nm includes at least one multilayer mirror for reflecting the beam along an optical path include a detector element, a filter for reducing the bandwidth of the beam, and the detector element. The detector element preferably comprises a Si pn diodes with doped dead region and zero surface recombination or PtSi-nSi barrier for increasing the long term stability of the detector.

Abstract: A beam parameter monitoring unit is provided for use with a F2 laser system including means for filtering the red light from the VUV light of a beam portion split off from the mainbeam of the F2 laser before the beam portion reaches a detector. The filtering means includes a mirror that is highly reflective of VUV light (“VUV HR mirror”), particularly around 157 nm, and transparent to red light. The VUV HR mirror reflects the VUV light to a detector such that the properties and parameters of the main beam can be monitored, adjusted, controlled and/or stabilized. The VUV HR mirror is preferably surrounded by a shield for absorbing the red light transmitted through or around the VUV HR mirror. Also preferably, an aperture is provided that is just wide enough to permit the VUV radiation to substantially pass through, and to block the outer portions of the incident beam portion including substantially only red light.

Abstract: An efficient and practical means and method is provided for monitoring the F2 concentration in an F2 excimer laser. The F2 concentration is monitored by measuring the concentration F atoms and more specifically by measuring the amount of red laser light emitted during discharge. The amount of red laser light emitted during discharge is a function of the concentration of F atoms because such red laser light is emitted by excited F atoms. There is also a relationship between the concentration of F atoms and the concentration of molecular F2 in the discharge chamber. Accordingly, the concentration of F2 gas may be monitored by measuring the amount of red laser light emitted during discharge.

Abstract: A method is provided for determining the status of a gas mixture of a laser system including a gas discharge laser which generates an output beam and has a discharge chamber containing a gas mixture within which energy is supplied to the gas mixture by a power supply via application of a driving voltage to a discharge circuit. A master data set of an output parameter such as any of output beam energy, bandwidth, spectrum width, long axial beam profile, short axial beam profile, beam divergence, energy stability, energy efficiency, width of the discharge, temporal beam coherence, spatial beam coherence, spatial pulse width, amplified spontaneous emission and temporal pulse width versus an input parameter such as driving voltage is generated corresponding to an optimal gas mixture status, preferably after a new fill and typically at the factory, and alternatively following a new fill at the fab.

Abstract: A laser is disclosed for generating radiation having narrow band width and high spectral purity. The laser comprises a cavity (10) containing a lasing medium (12) in between two reflective elements (14, 16) and at least one wavelength-selective element (16) for extracting (coupling-out) radiation from the resonator. In one embodiment, said element for extracting radiation from the resonator comprises a prism (30; 60; 70) which is wavelength-selective on the basis of interference. According to another embodiment, the element (16′) for extracting radiation from the resonator comprises two transparent plates (40, 42) each of which is, at one side, partly reflective. According to another embodiment, said wavelength-selective element (50, 52) for extracting radiation from the resonator comprises an angled mirror (50) and a plate (52) arranged in front of that mirror.

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity.

Abstract: An apparatus and method for testing the quality of a line narrowing and/or selection module that has been particularly assembled for use with a line-narrowed excimer or molecular fluorine laser is described. The method includes providing a test beam which has been previously line-narrowed using an installed line-narrowing and/or selection module. Then, the test beam is directed into the test module. Next, the one or more properties of the retroreflected beam are measured, i.e., after the beam has traversed the test module. The quality of the test module and one or more of its components may be determined based on the measurements. Such properties as wavefront distortions, excessive scattering, total reflectivity, total dispersion and aging of components of the test module may be measured for making this quality determination.

Abstract: An energy stabilization method and system includes an energy detector and simulating optics before the detector for forming a diagnostic portion of an output beam to simulate the beam profile of the working beam incident at the workpiece. Preferably, the simulating optics before the detector are selected to be identical or similar to beam transforming optics that the working beam traverses after the diagnostic portion is split off from the working beam, but before the working beam reaches the workpiece. The diagnostic beam portion is thus formed to have an identical or similar beam profile as the working beam at the workpiece. Alternatively, instead of providing transforming optics along the diagnostic beam path that are the same or similar to those encountered by the working beam, a processor configures the data received at the detector to simulate the beam profile of the working beam at the workpiece, after it traverses the transforming optics described above.

Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.

Abstract: A line-narrowed excimer or molecular fluorine laser system includes a gain medium surrounded by a resonator for generating a laser beam, a discharge circuit including a plurality of electrodes for energizing the gain medium and a line-narrowing unit within the resonator for narrowing the bandwidth of the laser system. The resonator includes a deformable resonator reflector. A technique for adjusting the bandwidth of the laser system includes adjusting a surface contour of the deformable resonator reflector. A desired bandwidth may be selected manually or using a processor which automatically controls the surface contour adjustment.

Abstract: A device for flushing the optical path of a UV laser beam has a casing (18) with which the optical path is separated from the external atmosphere (26). In order to maximize the life of the optical components (24, 26) in the optical path, a noble gas, in particular argon, is used for flushing the optical path.

Abstract: An excimer or molecular fluorine laser system generates a laser output bandwidth of less than 0.6 pm, and preferably 0.5-0.4 pm or less. The laser resonator has a line-narrowing unit preferably including a grating, and preferably also a beam expander, and may include one or more etalons or other interferometric devices. The grating may be preferably a blazed grating having a blaze angle greater than 76°, and is preferably around 80°. The grating structure is preferably defined by the surface of the grating substrate. The substrate is preferably aluminum. The system may further include an amplifier for increasing the energy of the sub-0.6 nm output beam.

Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.

Abstract: A beam shutter apparatus designed to handle high powered UV radiation is disclosed. The shutter includes a high reflectivity mirror mounted on a plate which can be rotated between a first position where the beam is reflected and redirected to a tool such as a beam dump and a second position where the beam is free to pass out of the laser, where the beam is free to pass out of the laser The shutter includes a support base with an angled upper surface upon which the mirror plate rests when in the second position. The support base has a beam path channel designed so that a beam can pass through the support base and out of the shutter when the mirrored plate is in the first position. The mirrored plate is rotated by a linkage, which is driven by an electrically powered actuator on a rotational magnet. The support base is machined out of a monolithic piece of metal allowing very high precision without the need for cumbersome alignment procedures.

Abstract: A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.

Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.

Abstract: A laser, especially an excimer laser, is designed to generate narrow-band radiation and comprises a laser resonator, including two reflecting elements (12, 14) between which there is disposed a laser active medium (10), and further comprises a group of several refractive dispersive elements (32, 34) arranged in the laser beam path and each deflecting, incident light at an angle &ggr;a,&ggr;b) which is specific of the wavelength of the incident light. It is provided to reduce variations of the emission wavelength which are temperature responsive and time dependent during burst operation by giving at least one of the refractive dispersive elements (32) a refractive index which increases as the temperature goes up and at least one of these elements (34) a refractive index which drops as the temperature rises.