Patents Assigned to Lambda Physik AG
  • Patent number: 6298080
    Abstract: A line-narrowed excimer or molecular fluorine laser system includes a gain medium surrounded by a resonator for generating a laser beam, a discharge circuit including a plurality of electrodes for energizing the gain medium and a line-narrowing unit within the resonator for narrowing the bandwidth of the laser system. The resonator includes a deformable resonator reflector. A technique for adjusting the bandwidth of the laser system includes adjusting a surface contour of the deformable resonator reflector. A desired bandwidth may be selected manually or using a processor which automatically controls the surface contour adjustment.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: October 2, 2001
    Assignee: Lambda Physik AG
    Inventors: Peter Heist, Jürgen Kleinschmidt
  • Patent number: 6285701
    Abstract: An apparatus and method are provided for bandwidth narrowing of an excimer laser to &Dgr;&lgr;≈6 pm or less with high spectral purity and minimized output power loss. Output stability with respect to pulse energy, beam pointing, beam size and beam output location is also provided. The excimer laser includes an active laser medium for generating a spectral beam at an original wavelength, means for selecting and narrowing the broadband output spectrum of the excimer laser, a resonator having at least one highly reflecting surface, and an output coupler. Means for adapting a divergence of the resonating band within the resonator is further included in the apparatus of the invention. The divergence adapting causes the spectral purity to improve by between 20% and 50% and the output power to reduce by less than 10%. A method according to the invention includes selecting and aligning the divergence adapting means.
    Type: Grant
    Filed: August 6, 1998
    Date of Patent: September 4, 2001
    Assignee: Lambda Physik AG
    Inventors: Hans-Stephan Albrecht, Peter Heist, Klaus Wolfgang Volger
  • Patent number: 6272158
    Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: August 7, 2001
    Assignee: Lambda Physik AG
    Inventors: Jürgen Kleinschmidt, Uwe Stamm, Klaus Vogler, Peter Lokai
  • Patent number: 6269110
    Abstract: A laser is provided having a gain medium including a laser gas and a photoabsorbing species. The photoabsorbing species has at least one photoabsorption line within an output emission spectrum of the laser. When the laser is an ArF-excimer laser, the photoabsorbing species is preferably either atomic carbon or molecular oxygen, which are formed after carbon- or oxygen-containing molecules introduced into the gain medium with the laser gas interact within the gain medium. An absolute wavelength of a narrowed emission of the laser can be calibrated when a narrowed output emission of the laser is tuned through at least one photoabsorption line of the photoabsorbing species. Preferably, a processor communicates with a detector and a wavelength selection unit, as well as a power supply when output beam energy is held constant, to automatically perform the calibration.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: July 31, 2001
    Assignee: Lambda Physik AG
    Inventors: Uwe Leinhos, Jürgen Kleinschmidt, Wolfgang Zschocke, Uwe Stamm
  • Patent number: 6243405
    Abstract: A technique of stabalizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amount of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.
    Type: Grant
    Filed: January 18, 2000
    Date of Patent: June 5, 2001
    Assignee: Lambda Physik AG
    Inventors: Stefan Borneis, Klaus Brunwinkel, Uwe Stamm, Frank Voss
  • Patent number: 6212214
    Abstract: A method is provided for determining the status of a gas mixture of a laser system including a gas discharge laser which generates an output beam and has a discharge chamber containing a gas mixture within which energy is supplied to the gas mixture by a power supply via application of a driving voltage to a discharge circuit. A master data set of an output parameter such as any of output beam energy, bandwidth, spectrum width, long axial beam profile, short axial beam profile, beam divergence, energy stability, energy efficiency, width of the discharge, temporal beam coherence, spatial beam coherence, spatial pulse width, amplified spontaneous emission and temporal pulse width versus an input parameter such as driving voltage is generated corresponding to an optimal gas mixture status, preferably after a new fill and typically at the factory, and alternatively following a new fill at the fab.
    Type: Grant
    Filed: August 23, 1999
    Date of Patent: April 3, 2001
    Assignee: Lambda Physik AG
    Inventors: Klaus Wolfgang Vogler, Peter Heist