Abstract: A light source apparatus according to the present embodiment includes: a target holding unit including a holding region configured to hold a target material that generates light by excitation light being provided; a rotary shaft configured to support the target holding unit; and an axial rotation drive unit that is connected to the rotary shaft and configured to rotate, the target holding unit around a central axis of the rotary shaft, wherein the target holding unit is rotated by a predetermined target rotational angular velocity, and the target holding unit has a mass such that a critical angular velocity during rotation is equal to or lower than 85% of the target rotational angular velocity.

Abstract: An optical apparatus according to the present embodiment is an optical apparatus that illuminates an object with illumination light, the optical apparatus including: a first mirror unit configured to reflect a first portion of generated light including the illumination light generated from a light-emitting point; a second mirror unit configured to reflect a second portion of the generated light; an optical element configured to reflect the generated light; a first detection unit configured to detect the first portion reflected by the first mirror unit; and a second detection unit configured to detect the second portion reflected by the second mirror unit, in which the generated light includes the first portion, the second portion, and a main portion, and at least a part of the main portion reflected by the optical element is the illumination light that illuminates the object.

Abstract: An image processing apparatus according to this embodiment includes: a specifying unit configured to specify, when parameter values of illumination parameters at a plurality of points corresponding to pixels of a photographed image obtained by photographing an object at a predetermined sampling time are compared with each other, a plurality of peak points each of which is a peak with respect to surrounding parameter values; a generation unit configured to generate, based on respective peak values of the parameter values at the specified plurality of peak points, the parameter values at a plurality of points between the peak points, and thereby generate a distribution of the parameter values; and a correction unit configured to correct the photographed image obtained at the predetermined sampling time by correcting the parameter values of at least one pixel of the photographed image.

Abstract: A light source apparatus according to the present disclosure includes an input optical system including a first optical member configured to irradiate a target material with excitation light, an output optical system including a second optical member configured to extract light generated by irradiating the target material with the excitation light, a target holding unit configured to hold the target material, an acquiring unit configured to acquire displacement of a surface position of the target material, a driving unit configured to cause relative positions of an optical member and the target holding unit to vary, the optical member including at least one of the first optical member and the second optical member, and a control unit configured to drive the driving unit based on the displacement.

Abstract: A light source apparatus according to the present disclosure includes an input optical system including a first optical member configured to irradiate a target material with excitation light, an output optical system including a second optical member configured to extract light generated by irradiating the target material with the excitation light, a target holding unit configured to hold the target material, an acquiring unit configured to acquire a surface position of the target material, a driving unit configured to cause a position of a focusing point of at least one of the first optical member and the second optical member to vary, and a control unit configured to drive the driving unit based on the surface position.

Abstract: An inspection apparatus according to an embodiment includes pulsed light generation means for generating pulsed light having a wavelength longer than a wavelength of light corresponding to a bandgap of a sample, the pulsed light subjecting the sample to multiphoton excitation, light focusing means including an objective lens, for focusing the pulsed light on the sample through the objective lens, and for passing, through the objective lens, light including photoluminescence light and Raman scattered light produced from the sample by irradiation with the pulsed light, first detection means for detecting the photoluminescence light passed through the objective lens, and second detection means for detecting the Raman scattered light passed through the objective lens.

Abstract: To provide an optical apparatus and a method of preventing contamination of the optical apparatus that can more effectively prevent contamination. An optical apparatus according to an embodiment includes a light source configured to generate irradiation light including EUV light, an optical system chamber in which a target object to be irradiated with the irradiation light is disposed, a drop-in mirror provided in the optical system chamber in order to guide the irradiation light, an introducing unit configured to introduce argon into the optical system chamber, a power supply configured to apply a negative voltage to the drop-in mirror in the optical system chamber, an ammeter configured to measure an ion current flowing to the drop-in mirror, and a control unit configured to control an introduction amount of the argon according to a measurement result of the ammeter.

Abstract: A defect inspection apparatus according to the present embodiment includes: an irradiation optical system configured to irradiate a sample including a SiC substrate, a buffer layer formed on the SiC substrate, and a drift layer formed on the buffer layer with excitation light; a filter unit configured to control a wavelength band to transmit photoluminescence light generated from the sample; a detection optical system configured to detect the photoluminescence light transmitted through the filter unit; and an image processing unit configured to form an image from the detected photoluminescence light and to discriminate a defect captured in the formed image, and the image processing unit discriminates the defect based on whether a length of the defect is L1=(D1+D2)/tan ? or L2=D2/tan ?.

Abstract: Provided are an illumination apparatus and an illumination method capable of uniformly illuminating a visual field region detected by a detector. The present disclosure provides an illumination apparatus including: a drive unit configured to drive an optical member such that illumination light scans, in one direction, a visual field region that is a region extending in the one direction on a sample; and a control unit configured to control the drive unit to cause the illumination light to scan in synchronization with a transfer of a sensor that receives light from the visual field region illuminated by the illumination light.

Abstract: A position detection apparatus according to the present disclosure includes a first optical system configured to focus, among light including first light and second light generated along with EUV light from plasma generated by causing a condenser lens to focus laser light on a target, the first light by the condenser lens, a first position detector configured to detect the first light focused by the first optical system, a second optical system configured to focus the second light, a second position detector configured to detect the second light focused by the second optical system, and a position detection processing unit configured to detect change of a position of the plasma from change of a spot of the first light and change of the spot of the second light.

Abstract: An optical apparatus according to the present embodiment includes a detector for detecting detection light of illumination light reflected by a sample, an optical system for illuminating the sample with the illumination light and guiding the detection light reflected by the sample to the detector, a displacement measurement unit for measuring a displacement drift indicating the amount of drift in the position of an optical element included in the optical system, a storage unit for storing the correlation between the displacement drift and a focus drift indicating the amount of drift in the distance between the sample and the optical system when the detection light detected by the detector is brought into focus, and a prediction unit for predicting a focus drift from the measured displacement drift by using the correlation.

Abstract: An image pickup apparatus includes a stage configured to support a sample at a plurality of support points, a bending data acquisition unit configured to acquire bending data corresponding to a bending of the sample supported on the stage, a height information detection unit configured to detect a height of the sample supported on the stage, a difference value calculation unit configured to calculate a difference value between a height indicated by height information and a height indicated by the bending data at each of a plurality of points on the sample, a correction data calculation unit configured to calculate correction data based on the difference value, and an estimation unit configured to calculate estimation data for estimating the height of the sample by correcting the bending data using the correction data.

Abstract: A measurement apparatus and a measurement method capable of speedily and accurately measuring an edge shape are provided. A measurement apparatus according to an aspect of the present disclosure includes an objective lens positioned so that its focal plane cuts across an edge part of a substrate, a detector including a plurality of pixels and configured to detect a reflected light from the edge part of the substrate through a confocal optical system, an optical head in which the objective lens and the detector are disposed, a moving mechanism configured to change a relative position of the optical head with respect to the substrate so that an inclination of the focal plane with respect to the substrate is changed, and a processing unit configured to measure a shape of the edge part.

Abstract: A confocal microscope includes a data acquisition unit configured to acquire a rough-shape data indicating a rough shape of a sample, an illumination light source configured to generate illumination light for illuminating the sample, an objective lens configured to concentrate the illumination light on the sample, an optical scanner configured to scan an illuminated place on the sample in a field of view of the objective lens, a stage configured to scan the illuminated place along the rough shape of the sample by changing a position of the objective lens relative to the sample, and an optical detector configured to detect reflected light through a confocal optical system, the reflected light being light that has been reflected on the sample and has passed through the objective lens.

Abstract: Provided are an optical device capable of effectively preventing contamination and a method for preventing contamination of the same. An optical device according to an embodiment includes a light source that generates light containing EUV (Extreme UltraViolet) light or VUV (Vacuum UltraViolet) light, a chamber in which an object to be irradiated with the light is placed, an optical element placed inside the chamber to guide the light, an introduction unit that introduces hydrogen or helium into the chamber, a power supply that applies a negative voltage to the optical element in the chamber, an ammeter that measures an ion current flowing through the optical element, and a control unit that adjusts the amount of the hydrogen or the helium introduced according to a measurement result of the ammeter.

Abstract: An inspection device according to the present disclosure includes a spheroidal mirror configured to reflect illumination light as convergent light, a plane mirror configured to reflect the illumination light incident as the convergent light and cause the reflected illumination light to be incident on an object of inspection as incident light, a projection optical system configured to focus reflected light of the incident light reflected by the object of inspection, and a detector configured to detect reflected light focused by the projection optical system, wherein an angle of incidence of an incident optical axis being an optical axis of the incident light on the object of inspection is greater than 6 [deg], an angle of reflection of a reflected optical axis being an optical axis of the reflected light on the object of inspection is greater than 6 [deg].

Abstract: An optical apparatus and its vibration removing method capable of stabilizing a place where light is applied are provided. An optical apparatus according to an aspect of the present disclosure includes a light source chamber, an EUV light source, an optical system chamber, an optical system configured to guide light entering the optical system chamber to an object through a bellows, an optical sensor configured to detect EUV light L2 emitted from the EUV light source, a position sensor disposed to detect a relative position of the optical system chamber with respect to the light source chamber, and a second vibration removal unit configured to remove vibrations from the light source chamber based on detection results of the optical sensor and the position sensor.

Abstract: A detection method, an inspection method, a detection apparatus, and an inspection apparatus capable of preventing an error in a luminance unevenness correction and thereby accurately inspecting an object to be inspected are provided. A detection method according to the present disclosure includes illuminating an object to be inspected by using illumination light including pulsed light, acquiring image data of the object to be inspected by concentrating light from the object to be inspected illuminated by the illumination light and detecting the concentrated light by an inspection detector, acquiring image data of a luminance distribution of the illumination light, the luminance distribution being detected by illuminating a correction detector by using part of the illumination light, and detecting inspection image data by correcting the image data of the object to be inspected based on the image data of the luminance distribution.

Abstract: An inspection apparatus according to an aspect of the present invention includes an EUV light source 11, an illumination optical system 10 provided to apply the EUV light to an EUV mask 60, a concave mirror and a convex mirror 22 configured to reflect the EUV light reflected on the EUV mask 60, a camera 32 configured to detect EUV light reflected on the convex mirror 22 and thereby take an image of the EUV mask 60, an AF light source 16 configured to generate AF light having a wavelength of 450 nm to 650 nm, first and second detectors 27 and 30 configured to detect the AF light reflected on the EUV mask 60 through the concave mirror with the hole 21 and the convex mirror 22, and an processing device 31 configured to adjust a focus point of the EUV light on the EUV mask 60.

Abstract: Provided are a mask inspection apparatus and a mask inspection method that can prevent a reduction in a reflectance of a drop-in mirror, which is caused by carbon contaminants. A mask inspection apparatus according to the present invention includes a drop-in mirror including multi-layer film and a reflective surface. The drop-in mirror is configured to reflect illumination light incident on the reflective surface and illuminate the mask. An area of the reflective surface is configured to be greater than an area of an illuminated spot irradiated with the illumination light on the reflective surface. The drop-in mirror is configured to be movable. A position of the illuminated spot on the reflective surface is configured to be moved when the drop-in mirror is moved.