Abstract: An image pickup apparatus includes a stage configured to support a sample at a plurality of support points, a bending data acquisition unit configured to acquire bending data corresponding to a bending of the sample supported on the stage, a height information detection unit configured to detect a height of the sample supported on the stage, a difference value calculation unit configured to calculate a difference value between a height indicated by height information and a height indicated by the bending data at each of a plurality of points on the sample, a correction data calculation unit configured to calculate correction data based on the difference value, and an estimation unit configured to calculate estimation data for estimating the height of the sample by correcting the bending data using the correction data.

Abstract: A measurement apparatus and a measurement method capable of speedily and accurately measuring an edge shape are provided. A measurement apparatus according to an aspect of the present disclosure includes an objective lens positioned so that its focal plane cuts across an edge part of a substrate, a detector including a plurality of pixels and configured to detect a reflected light from the edge part of the substrate through a confocal optical system, an optical head in which the objective lens and the detector are disposed, a moving mechanism configured to change a relative position of the optical head with respect to the substrate so that an inclination of the focal plane with respect to the substrate is changed, and a processing unit configured to measure a shape of the edge part.

Abstract: A confocal microscope includes a data acquisition unit configured to acquire a rough-shape data indicating a rough shape of a sample, an illumination light source configured to generate illumination light for illuminating the sample, an objective lens configured to concentrate the illumination light on the sample, an optical scanner configured to scan an illuminated place on the sample in a field of view of the objective lens, a stage configured to scan the illuminated place along the rough shape of the sample by changing a position of the objective lens relative to the sample, and an optical detector configured to detect reflected light through a confocal optical system, the reflected light being light that has been reflected on the sample and has passed through the objective lens.

Abstract: Provided are an optical device capable of effectively preventing contamination and a method for preventing contamination of the same. An optical device according to an embodiment includes a light source that generates light containing EUV (Extreme UltraViolet) light or VUV (Vacuum UltraViolet) light, a chamber in which an object to be irradiated with the light is placed, an optical element placed inside the chamber to guide the light, an introduction unit that introduces hydrogen or helium into the chamber, a power supply that applies a negative voltage to the optical element in the chamber, an ammeter that measures an ion current flowing through the optical element, and a control unit that adjusts the amount of the hydrogen or the helium introduced according to a measurement result of the ammeter.

Abstract: An inspection device according to the present disclosure includes a spheroidal mirror configured to reflect illumination light as convergent light, a plane mirror configured to reflect the illumination light incident as the convergent light and cause the reflected illumination light to be incident on an object of inspection as incident light, a projection optical system configured to focus reflected light of the incident light reflected by the object of inspection, and a detector configured to detect reflected light focused by the projection optical system, wherein an angle of incidence of an incident optical axis being an optical axis of the incident light on the object of inspection is greater than 6 [deg], an angle of reflection of a reflected optical axis being an optical axis of the reflected light on the object of inspection is greater than 6 [deg].

Abstract: A mask inspection apparatus according to the present disclosure includes: a field stop unit capable of switching between a field stop for an optical mask configured to emit an incident illumination light while maintaining the polarization state thereof and a field stop for an EUV mask configured to change the polarization state of a part of the incident illumination light and to cause an illumination light including an S-polarized light and a P-polarized light; a beam splitter unit capable of switching between a PBS for an optical mask and a non-polarized BS; an objective lens configured to collect an illumination light reflected in the beam splitter unit in a mask to be inspected and collect a reflected light obtained by reflecting an illumination light in the mask to be inspected; and a ?/4 plate that can be provided in an optical path of an illumination light and a reflected light.

Abstract: A wavelength conversion apparatus and a wavelength conversion method that can stably output wavelength converted light for a long time are provided. A wavelength conversion apparatus 100 according to an aspect of the present disclosure includes a casing 10, a wavelength conversion element 25 disposed inside the casing 10 and configured to convert a wavelength of incident light and output light with the converted wavelength, a first port 11 that introduces a first gas containing 99.9% or more of a nitrogen gas inside the casing 10, and a second port 12 that introduces a second gas containing 1% or more of an oxygen gas.

Abstract: An inspection device according to the present disclosure includes a detector for inspection that includes a plurality of pixels arranged on a light receiving surface and acquires image data by transferring charge produced by light received by the plurality of pixels in a transfer direction at a specified transfer timing, a light source that emits illumination light including pulsed light, a pulse enable circuit that controls emission timing for the light source to emit the illumination light based on the transfer timing, an illumination optical system that illuminates an object to be inspected with the illumination light, a condensing optical system that condenses, on the detector for inspection, light from the object to be inspected illuminated with the illumination light, and a processing unit that inspects the object to be inspected by using the image data of the object to be inspected.

Abstract: A correction method according to an embodiment includes illuminating an object to be inspected by using critical illumination by illumination light L11 generated by a light source 11, concentrating light from the object to be inspected illuminated by the illumination light L11 and acquiring image data of the object to be inspected by detecting the concentrated light by a first detector 23, concentrating part of the illumination light L11, and acquiring image data of a brightness distribution of the illumination light L11 by detecting the concentrated illumination light L11 by a second detector 33, and correcting the image data of the object to be inspected based on the image data of the brightness distribution.

Abstract: An optical apparatus and its vibration removing method capable of stabilizing a place where light is applied are provided. An optical apparatus according to an aspect of the present disclosure includes a light source chamber, an EUV light source, an optical system chamber, an optical system configured to guide light entering the optical system chamber to an object through a bellows, an optical sensor configured to detect EUV light L2 emitted from the EUV light source, a position sensor disposed to detect a relative position of the optical system chamber with respect to the light source chamber, and a second vibration removal unit configured to remove vibrations from the light source chamber based on detection results of the optical sensor and the position sensor.

Abstract: A detection method, an inspection method, a detection apparatus, and an inspection apparatus capable of preventing an error in a luminance unevenness correction and thereby accurately inspecting an object to be inspected are provided. A detection method according to the present disclosure includes illuminating an object to be inspected by using illumination light including pulsed light, acquiring image data of the object to be inspected by concentrating light from the object to be inspected illuminated by the illumination light and detecting the concentrated light by an inspection detector, acquiring image data of a luminance distribution of the illumination light, the luminance distribution being detected by illuminating a correction detector by using part of the illumination light, and detecting inspection image data by correcting the image data of the object to be inspected based on the image data of the luminance distribution.

Abstract: An inspection apparatus according to an aspect of the present invention includes an EUV light source 11, an illumination optical system 10 provided to apply the EUV light to an EUV mask 60, a concave mirror and a convex mirror 22 configured to reflect the EUV light reflected on the EUV mask 60, a camera 32 configured to detect EUV light reflected on the convex mirror 22 and thereby take an image of the EUV mask 60, an AF light source 16 configured to generate AF light having a wavelength of 450 nm to 650 nm, first and second detectors 27 and 30 configured to detect the AF light reflected on the EUV mask 60 through the concave mirror with the hole 21 and the convex mirror 22, and an processing device 31 configured to adjust a focus point of the EUV light on the EUV mask 60.

Abstract: Provided are a mask inspection apparatus and a mask inspection method that can prevent a reduction in a reflectance of a drop-in mirror, which is caused by carbon contaminants. A mask inspection apparatus according to the present invention includes a drop-in mirror including multi-layer film and a reflective surface. The drop-in mirror is configured to reflect illumination light incident on the reflective surface and illuminate the mask. An area of the reflective surface is configured to be greater than an area of an illuminated spot irradiated with the illumination light on the reflective surface. The drop-in mirror is configured to be movable. A position of the illuminated spot on the reflective surface is configured to be moved when the drop-in mirror is moved.

Abstract: A measurement apparatus 1 according to the present invention includes a table 10 that has an axis of rotation 14 and supports a disc-shaped object 40, a first driving unit that rotates the table 10 around the axis of rotation 14, a light source 50 that produces illumination light with which an end portion 45 of the disc-shaped object 40 is illuminated, an objective lens 60 that collects the illumination light reflected from the end portion 45, a second driving unit that moves the objective lens 60 along an optical axis 64, an imaging unit 70 that captures an image of the end portion 45 by detecting the reflected light collected by the objective lens 60, and an autofocus optical system 80 that determines a position of the objective lens 60 where the image of the end portion 45 is brought into focus in the imaging unit 70.

Abstract: A laser light source device having a simple configuration and an inspection device are provided. A laser light source device 200 according to an exemplary embodiment in accordance with the present invention has a repetition frequency of 1 MHz or higher, and includes fundamental wave generation means 201 for oscillating laser light including a fundamental wave with its center wavelength being included in one of first to fourth wavelength bands, and means 205 for generating a sixth harmonic of pulsed laser light extracted from the fundamental wave generation means 201. The first wavelength band is 1064.326 nm to 1064.511 nm. The second wavelength band is 1064.757 nm to 1064.852 nm. The third wavelength band is 1063.805 nm to 1063.878 nm. Further, the fourth wavelength band is 1063.962 nm to 1064.031 nm.

Abstract: An inspection apparatus and an inspection method capable of performing an inspection more accurately are provided. An inspection apparatus according to the present invention includes a light source 10 that illuminates a sample 30 in which a pattern is formed, a detector 11 that detects light reflected from the sample 30 illuminated by the light source, and a processing device 50 that performs an inspection based on a correlation between a brightness value of a sample image obtained by the detector and a size in a surface shape or a size in a width direction of the pattern of the sample 30. The processing device 50 performs the inspection based on a summation value obtained by adding up brightness values of sample images with weights, the sample images being obtained under a plurality of shooting conditions.

Abstract: The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.

Abstract: Provided are a light source apparatus and an inspection apparatus that can stably output a wavelength converted light beam. A light source apparatus includes a laser light source that generates a first fundamental light beam, at least one nonlinear optical crystal that generates a wavelength converted light beam using the fundamental light beam or a harmonic laser beam of the fundamental light beam as an incident light beam, a detector that detects the wavelength converted light beam, an acousto-optic modulator that is disposed in an optical path of the incident light beam in such a way that a zero-order light beam enters the nonlinear optical crystal, and a controller that controls an output intensity of the wavelength converted light beam according to a detection signal from the detector.

Abstract: Provided are an analysis apparatus and an analysis method which are capable of recognizing a local state change of an internal structure of a secondary battery. The analysis apparatus includes: an observation cell that houses a secondary battery; a charging and discharging controller that controls charging and discharging of the secondary battery; an image pickup device that captures color images of the secondary battery at a predetermined time interval; and a charging and discharging data detection unit that acquires charging and discharging data on the secondary battery during charging and discharging. Color image signals output from the image pickup device and charging and discharging data signals output from the charging and discharging data detection unit are supplied to a signal processing device. The signal processing device outputs a unit that temporally links time-series color image signals and time-series charging and discharging data signals, and designated analysis data.

Abstract: A defect coordinates measurement method includes a step of detecting detected coordinates of a fiducial mark and a defect of a mask blank placed on support pins, a step of detecting detected coordinates of the alignment mark of a reference mask placed on the support pins, a step of extracting a reference mark near the detected coordinates of the defect among the plurality of reference marks based on the detected coordinates of the defect of the mask blank and the alignment mark of the reference mask, a step of detecting detected coordinates of the extracted reference mark, and a step of calculating coordinates of the defect based on the detected coordinates of the reference mark and the detected coordinates of the defect.