Abstract: A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerization of an organic silicon compound, is provided by means of a plasma in the same processing chamber, under uninterrupted vacuum conditions, with a second, hydrophilic layer substantially composed of a hydrocarbon skeleton and polar functional groups linked thereto, use is made of an apparatus which comprises a plurality of treatment stations (8, 9, 10) held by a fixed, circular cylindrical vacuum chamber wall (16) and a rotatable inner wall cylinder (17) which is enclosed by said vacuum chamber wall (16) and which holds four substrate chambers (12 through 15) and where the wall of the vacuum chamber (16) is provided with four openings (3 through 6) with which the substrate chambers (3 through 6) can be aligned and through which openings the treatment material c

Abstract: A vacuum treatment system for depositing thin coatings on substrates, with several stationary treating chambers that are held by the annular or frame-like side wall of the vacuum chamber and display the treatment tools and with treatment chamber openings aligned peripherally inward on the center of the vacuum chamber and extending in planes parallel to each other, a shaft, extending parallel to the opening planes and mounted in the vacuum chamber lid and/or in the vacuum chamber bottom plate of the vacuum chamber, is provided that moves the plates for closing the treatment chamber openings and is supplied with actuators for moving the closing plates from a radially inner opening position to a radially outer closing position, whereby the actuators working together with the shaft are designed as lever pinions.

Abstract: A random number generator based on naturally occurring events in which directional randomness of radioactivity is exploited to generate a random number sequence. Radiation emissions from a radiation source are detected at different spatial locations about the radiation source. A unique numerical value is assigned to radiation detected at the different spatial locations. A random number sequence comprising numerical values is generated depending upon which spatial location radiation is detected.

Abstract: In a vacuum coating apparatus for an allover coating of a substrate by rotation of the substrate (3) in a stream of material, comprising a vacuum chamber with a material source (13), a substrate holder (6) with a point of attachment (19) for the holding of the substrate (3) in front of the material source (13) and a drive (10, 11, 21) provided for the substrate holder (6) for generating a rotating and shifting motion of the substrate (3), the substrate holder (6) is composed of three legs manufactured from hollow sections (7, 8, 9), disposed at angles to each other, where the first leg (7) and the second leg (8) form an obtuse angle (.alpha.) and the second and third legs (8 and 9) form an approximately right-angle knee, and the substrate (3) is held at the end of the third leg (9), where the substrate holder (6) is rotatable about the longitudinal axis (1) of the first leg (7) by a motor drive and in addition is shiftable axially to and from along this longitudinal axis (1).

Abstract: A system for coating a substrate with a thin film which has a high transmissivity in the visible spectrum and a high reflectivity in the thermal radiation spectrum. The film coating has at least one carbon layer crystallized with a diamond structure and doped with foreign atoms, the carbon layer being electrically conductive depending upon the doping concentration cA of the foreign atoms and having low radiation emissivity in the thermal radiation spectrum.

Abstract: In an apparatus for the sputter deposition of thin electrically insulating layers on substrates (33, 33', . . . ) there is provided in an evacuable chamber which is connected to a treatment gas source, a first pair of tubular magnetron cathodes (5, 5' or 31) and at least one additional pair of magnetron cathodes (6, 6' or 25, 26 or 30, 32), a medium frequency generator (10) connected in series with a transformer (9), where the two secondary winding outputs (11, 12) of said transformer are each connected with the cathodes of a second pair (6, 6' or 25, 26 or 30, 32) and where direct current can be fed into the supply lines for the first cathode pair (31) via a center tap (15) of the transformer (9) and a network (17 or 13, 14).

Abstract: In a device for lifting, pivoting and rotating the cover (5) of a vacuum container (14) of a crystal drawing apparatus, the device being equipped with a bolt (26) held by a stationary part (15) of the apparatus and extending vertically upward, a sleeve (24) being provided with projections (34,34'), which are permanently attached to it and which extend horizontally from it, the device also being provided with a pair of bolts (34,34'), and with a sleeve component (28), which is pivoted on the bolts (36,36'), whereby parallel to the sleeve component (28) a screw bolt (37) is sustained in the housing (35). A hand lever (21) is fixed on the screw bolt (37), which is connected with a screw nut (38), which supports itself on the rotary sleeve (24), where the sleeve component (28) surrounds a journal (27), which is permanently connected to the device part or to the cover (5).

Abstract: In a lifting unit for a device for pulling monocrystals, a frame that extends in the horizontal direction and surrounds a pulling shaft and/or a crystal is provided with at least two bearings as well as two-armed grippers that are held in the aforementioned bearings and can be pivoted in vertical planes. The respective gripping arms are aligned with the rotational axis of the frame and have such a length that the end surfaces of the gripping arms which face one another tightly adjoin one another in the closed position and only allow a limited pivoting movement. The respective free ends of the two-armed grippers are coupled to tie rods that approximately extend in the vertical direction. The upper ends of the tie rods are connected in articulated fashion via a horizontally extending crossbeam, where the crossbeam with a spindle nut can be adjusted along the pulling shaft via a threaded spindle. The frame is suspended on cables that serve for pivoting the gripping arms.

Abstract: In an apparatus for the production of single crystals (103) by the Czochralski melt drawing method, a gripping device (125a, 125b) is provided, by means of which the crystal (103) is held during the growing process by a pressure which is exerted radially on its lateral surface and which exceeds the frictional resistance, as a result of which the weight of the growing crystal is completely supported. The gripping device (125a, 125b) has at least two holding devices (128a, 128b) arranged opposite each other, which, during the crystal growth phase, initially move parallel to the crystal and then, after a certain desired crystal diameter has been reached, are laid against the crystal by means of the holding devices (128a, 128b) in such a way that the growth the crystal in the area of the melting zone is not disturbed.

Abstract: In an apparatus for the deposition of polycrystalline diamond on large, flat substrates (3) by the plasma method, with a vacuum chamber (4); with locks for the inward and outward transfer of the substrates; with a device installed in the chamber (4) for conveying the substrates (3) through at least one, preferably through two treatment stations; with hot-filament sources (5, 5', . . . ) forming a first group, installed above the plane of the substrates; with microwave plasma sources (8, 8', . . . ) forming a second group; with an electrode (11) fed with radio frequency underneath the plane of the substrates for generating a bias voltage; and with gas feed pipes (6, 9) opening into the vacuum chamber (4), the hot-filament arrangements (5, 5', . . . ), designed as linear sources, are arranged transversely to the substrate transport direction (a) and form a first coating zone (Z.sup.1), where the microwave plasma sources (8, 8', . . .

Abstract: A cover fitted about the periphery of an opening in a chamber wall is provided with a channel having therein both high frequency sealing elements which prevent escape of electromagnetic radiation, and a vacuum sealing element. The HF sealing elements are spaced apart by less than 1/4 of the minimum wavelength .lambda. to be shielded against, and are preferably held in the channel by a profiled element which also holds the vacuum sealing element. Alternatively, the channel may be provided in the chamber wall, or the sealing elements may he held in place without any channel.

Abstract: In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations (20) supported on a stationary vacuum chamber wall (16, 16', . . . ) and with a rotatably supported internal cylinder (14), which is enclosed by the vacuum chamber wall and carries the substrate chambers (3-6), openings (24-27) are provided in the vacuum chamber wall (16, 16', . . . ), with which the substrate chambers (3-6) can be aligned and through which the treatment agents can be allowed to act on the substrates (2, 2', . . .