Patents Assigned to Merck Patent GmbH
  • FLUORINATED IMIDE SALT COMPOUND AND SURFACTANT
    Publication number: 20210355080
    Abstract: A fluorinated imide salt compound of the present invention is a compound represented by General Formula (1). In General Formula (1), m represents 1 or 2, n represents an integer from 1 to 4, ? represents 1 or 2, and X?+ represents an ?-valent metal ion, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, a quaternary ammonium ion, or NH4+.
    Type: Application
    Filed: August 1, 2019
    Publication date: November 18, 2021
    Applicants: Mitsubishi Materials Electronic Chemicals Co., Ltd., Merck Patent GmbH
    Inventors: Masato FUJITA, Takeshi KAMIYA, Kazuma YAMAMOTO
  • LC-based optical display system
    Patent number: 11175536
    Abstract: An optically active structure and a display device are presented. The device utilized an optically active structure comprising liquid crystal material and a plurality of nanorods configured to emit light in one or more predetermined ranges in response to pumping light. Variation in orientation of the liquid crystal varies orientation of the nanorods and modulated light emission therefrom.
    Type: Grant
    Filed: September 20, 2015
    Date of Patent: November 16, 2021
    Assignees: Yissum Research Development Company Of The Hebrew University of Jerusalem Ltd., Merck Patent GmbH
    Inventors: Uri Banin, Hagai Arbell, Bernhard Rieger, Ming-Chou Wu
  • Glycine particles
    Patent number: 11174218
    Abstract: The present invention relates to compacted glycine granules, where at least 75% of the granules have a particle size of above 0.7 mm, and to a process for the preparation and use of granules of this type.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: November 16, 2021
    Assignee: Merck Patent GmbH
    Inventors: Harald Benk, Gudrun Birk, Melina Decker, Dieter Lubda, Guenter Moddelmog, Harald Muessig, Tanino Scaramuzza, Michael Schleehahn
  • Fluorine compounds
    Patent number: 11174339
    Abstract: The present invention relates to fluorine compounds (I), (II) and (III), to processes for the preparation thereof, and to the use thereof.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: November 16, 2021
    Assignee: Merck Patent GmbH
    Inventors: Reiner Friedrich, Fabian Koch
  • 2,3-dihydrobenzothiophene derivatives
    Patent number: 11174432
    Abstract: The present invention relates to 2,3-dihydrobenzothiophene derivatives of the general formula I In which the occurring groups and parameters have the meanings indicated in claim 1, to the use thereof in liquid-crystalline or mesogenic media, to liquid-crystalline or mesogenic media comprising these derivatives, and to electro-optical display elements containing these liquid-crystalline or mesogenic media.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: November 16, 2021
    Assignee: MERCK PATENT GMBH
    Inventors: Dmitry Ushakov, Helga Haas, Thorsten Vom Stein
  • Quinolin-2-one derivatives
    Patent number: 11174241
    Abstract: Compounds of the formula I in which X1, X2, X3, X4, R1, R2, R3, Q and Y have the meanings indicated in Claim 1, are inhibitors of c-Kit kinase, and can be employed for the treatment of cancer.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: November 16, 2021
    Assignee: MERCK PATENT GMBH
    Inventors: Dieter Dorsch, Mathilde Muzerelle, Lars Burgdorf, Margarita Wucherer-Plietker, Paul Czodrowski, Christina Esdar, Christos Tsaklakidis
  • Polymerisable Compounds and the Use thereof in Liquid-Crystal Displays
    Publication number: 20210348056
    Abstract: The present invention relates to polymerisable compounds, to processes and intermediates for the preparation thereof, to liquid-crystal (LC) media comprising them, and to the use of the polymerisable compounds and LC media for optical, electro-optical and electronic purposes, in particular in LC displays, especially in LC displays of the polymer sustained alignment type.
    Type: Application
    Filed: September 3, 2019
    Publication date: November 11, 2021
    Applicant: Merck Patent GmbH
    Inventors: Qiong TONG, Matthias BREMER, Patricia BECKER, Elizabeth Lekha KIETZKE, Marcel SCHMIDT
  • Gap filling composition and pattern forming method using low molecular weight compound
    Patent number: 11169443
    Abstract: There is provided a gap filling composition which can reduce pattern collapse and a pattern forming method using the composition. There is provided a gap filling composition including a gap filling compound, an organic solvent, and as required, water, the gap filling compound having a certain structure and containing hydroxyl groups, carboxyl groups, or amino groups intramolecularly. There is provided a pattern forming method using a low molecular weight compound.
    Type: Grant
    Filed: April 3, 2017
    Date of Patent: November 9, 2021
    Assignee: Merck Patent GmbH
    Inventors: Xiaowei Wang, Tatsuro Nagahara
  • Thiophene compound, liquid-crystalline medium and liquid-crystal display comprising the same
    Patent number: 11168255
    Abstract: A liquid-crystalline medium, preferably having a nematic phase and dielectric anisotropy of 0.5 or more, which comprises one or more compounds of formula T in which denotes and the use thereof in an electro-optical display, particularly in an active-matrix display based on the IPS or FFS effect, to displays of this type which contain a liquid-crystalline medium of this type, and to the compounds of formula T and their use for the improvement of the transmission and/or response times of a liquid-crystalline medium which contains one or more additional mesogenic compounds.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: November 9, 2021
    Assignee: Merck Patent GmbH
    Inventors: Atsutaka Manabe, Constanze Brocke, Sven Baran, Sebastian Hofmeyer, Alexander Hahn
  • Photoresist remover compositions
    Patent number: 11168288
    Abstract: The present invention relates to a remover composition comprising, tetraalkylammonium hydroxide, a benzylic alcohol, a glycol component comprising at least one glycol compound, and a and an alkyl amine component, wherein said alkyl amine component is selected from the group consisting of a dialkyl amine, a mono-alkyl amine having structure having structure (I), and combinations thereof wherein, in said di-alkyl amine, one of the alkyl groups is a C-1 to C-4 n-alkyl and the other alkyl group is a C-16 to C-20 n-alkyl, and for said mono-alkyl amine m? and m are independently chosen from an integer ranging from 4 to 8. This invention also pertains to the process of using these compositions to remove a patterned photoresist from a substrate.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: November 9, 2021
    Assignee: Merck Patent GmbH
    Inventor: Hengpeng Wu
  • Liquid crystalline medium
    Patent number: 11168257
    Abstract: The present invention relates to liquid crystalline media comprising one or more benzothiadiazol derivatives of formula I, in which R11, R12, A11, A12, A21, A22, Z11, Z12, Z21, Z22, W, X11, X12, r and s have the meanings indicated in claim 1, to the use of such liquid crystal media for optical, electro-optical and electronic purposes, in particular in devices for regulating the passage of energy from an outside space into an inside space, for example in windows.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: November 9, 2021
    Assignee: Merck Patent GmbH
    Inventors: Peer Kirsch, Andreas Ruhl, Michael Junge, Ursula Patwal, Mila Fischer
  • Direct injection moldable and rapidly disintegrating tablet matrix
    Patent number: 11166917
    Abstract: The present invention relates to a novel directly compressible matrix for the production of tablets which disintegrate rapidly in the presence of moisture, in particular in the mouth.
    Type: Grant
    Filed: May 25, 2009
    Date of Patent: November 9, 2021
    Assignee: Merck Patent GmbH
    Inventors: Daniela Kleinwaechter, Guenter Moddelmog, Roberto Ognibene
  • Esters containing aromatic groups as solvents for organic electronic formulations
    Patent number: 11171294
    Abstract: The present invention relates to formulations for the preparation of organic electronic devices (OLEDs) which comprise (A) at least one specific ester solvent containing an aromatic group and (B) at least one organic functional material selected from organic conductors, organic semiconductors, organic fluorescent compounds, organic phosphorescent compounds, organic light-absorbent compounds, organic light-sensitive compounds, organic photosensitisation agents and other organic photoactive compounds, selected from organometallic complexes of transition metals, rare earth metals, lanthanides and actinides.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: November 9, 2021
    Assignee: Merck Patent GmbH
    Inventors: Gaëlle Béalle, Christoph Leonhard, Hsin-Rong Tseng, Irina Martynova, Aurélie Ludemann, Edgar Kluge, Anja Jatsch, Manuel Hamburger, Li Wei Tan, Pawel Miskiewicz, Philip Edward May, Daniel Walker
  • FLUORINE COMPOUNDS
    Publication number: 20210340383
    Abstract: The present invention relates to novel compounds containing fluorinated end groups and to the use thereof in, for example, dirt-repellent coatings.
    Type: Application
    Filed: July 16, 2021
    Publication date: November 4, 2021
    Applicant: Merck Patent GmbH
    Inventor: Reiner FRIEDRICH
  • Method and apparatus for filling liquid crystal cells with a medium comprising at least one liquid crystalline material
    Publication number: 20210341773
    Abstract: A method for filling liquid crystal cells (40) with a medium (30) comprising at least one liquid crystalline material. In the method at least one liquid crystal cell (40) is placed inside a vacuum chamber (12), the vacuum chamber is evacuated, at least one fill opening (46) of the at least one liquid crystal cell (40) is contacted with the medium, and the pressure in the vacuum chamber is raised causing the medium to fill the cavity inside the liquid crystal cell. A signal indicating the amount of oxygen remaining inside the vacuum chamber is provided by an oxygen sensor (20) mounted inside the vacuum chamber and completion of the evacuation of the vacuum chamber is determined based on said signal. Further disclosed is an apparatus for carrying out the process.
    Type: Application
    Filed: August 27, 2019
    Publication date: November 4, 2021
    Applicant: Merck Patent GmbH
    Inventors: Ronald VAN DEN HEUVEL, Martin BIJKER
  • Film forming composition and film forming method using the same
    Patent number: 11161982
    Abstract: [Problem] To provide a film forming composition and a film forming method capable of forming a film excellent in gas barrier properties. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and an additive having a specific structure, and a film forming method comprising applying the composition on a substrate and exposing the composition to light. This specific additive is represented by a specific general formula among those having a nonconjugated cyclic structure composed of atoms selected from the group consisting of carbon, nitrogen and oxygen in the structure.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: November 2, 2021
    Assignee: Merck Patent GmbH
    Inventors: Yuki Ozaki, Go Noya, Masakazu Kobayashi
  • Chemically amplified positive type photoresist composition and pattern forming method using the same
    Patent number: 11163233
    Abstract: [Problem] To provide a chemically amplified positive type photoresist composition capable of forming a pattern having an excellent cross-sectional shape, and a pattern forming method using the same. [Means for Solution] A chemically amplified positive type photoresist composition comprising (A) a polymer which reacts with an acid to increase its solubility in an alkaline aqueous solution, (B) an organic solvent, (C) a first photo acid generator containing a cation having no polar group, and (D) a second photoacid generator containing a cation having a polar group, and a pattern forming method using the same.
    Type: Grant
    Filed: January 2, 2018
    Date of Patent: November 2, 2021
    Assignee: Merck Patent GmbH
    Inventors: Masato Suzuki, Shunji Kawato, Tetsumasa Takaichi, Kazumichi Akashi
  • Polymerisable Liquid Crystal Material and Polymerised Liquid Crystal Film
    Publication number: 20210332297
    Abstract: The invention relates to a polymerisable LC material comprising one or more di- or multireactive mesogenic compounds and one or more compounds of formula TRI, wherein the individual radicals have one of the meaning as given in the claims. Furthermore, the present invention relates also to a method for its preparation, a polymer film with improved thermal durability and UV stability obtainable from the corresponding polymerisable LC material, to a method of preparation of such polymer film, and to the use of such polymer film and said polymerisable LC material for optical, electro-optical, decorative or security devices.
    Type: Application
    Filed: August 9, 2019
    Publication date: October 28, 2021
    Applicant: Merck Patent GmbH
    Inventors: Yong-Hyun CHOI, Jae-Hyun KANG, Hyun-Jin YOON
  • 6,9,15,18-tetrahydro-s-indaceno[1,2-b:5,6-b?]difluorene derivatives and use thereof in electronic devices
    Patent number: 11158816
    Abstract: The present application relates to a compound of a formula (I) or formula (II) which is suitable for use as functional material in an electronic device, especially as emitter material in an organic electroluminescent device.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: October 26, 2021
    Assignee: Merck Patent GmbH
    Inventors: Holger Heil, Beate Burkhart, Lara-Isabel Rodriguez, Sebastian Meyer, Rouven Linge, Amandine Darsy
  • Lithography composition, a method for forming resist patterns and a method for making semiconductor devices
    Patent number: 11156920
    Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: October 26, 2021
    Assignee: Merck Patent GmbH
    Inventors: Kazuma Yamamoto, Maki Ishii, Tomoyasu Yashima, Tatsuro Nagahara