Abstract: A measuring apparatus (1) for measuring physiological and/or chemical and/or physical properties of at least one living cell (3) contains, in addition to further sensors (4.1, 4.2), a plurality of optical sensors (4) on a support (2), particularly a support made of semiconductor material. By means of a controller (6) and a switching facility (8) which are integrated on the same support (2), the individual optical sensors (4) and the further sensors (4.1, 4.2) can be selectively interrogated. An external signal-analyzing facility (7) with a screen represents a sort of near-field microscope.

Abstract: An interconnecting structure for a semiconductor integrated circuit and a method for manufacturing said interconnecting structure. The interconnecting structure comprises a top layer, a bottom layer, and a dielectric isolation layer. The top layer completely covers and encloses the bottom layer. The dielectric isolation layer is disposed between the top layer and the bottom layer. At least one contact opening is formed through the top layer of the structure, thereby exposing a selected region of said bottom layer. A contact is formed on the selected region of the bottom layer.

Abstract: A measuring device for measuring or examining physiological parameters on biocomponents includes an FET sensor 5 whose electrical protective layer 12 is roughened or has a structured coating 15. The structuring of the active sensor contact surface 12 is adapted to the outer contour and topography of the biocomponent in question, so that a better possibility is available for anchoring the biocomponents to the contact surface 24 forming the FET protective layer of the sensor 5.

Abstract: A process is disclosed for fabricating a device with a cavity formed at one end thereof. A body is provided with a depression, and mask layer is applied to the surface of the body and the depression, the mask layer having a lower etch rate than the body. Near the depression, an opening is formed in the mask layer. Starting from the opening, the body is subjected to an isotropic etching process to form the cavity below the mask layer, with the mask layer being essentially preserved and forming in the area of the depression a structure extending into the cavity.

Abstract: The invention relates to a process for manufacturing a sensor with a metal electrode in an MOS structure. During the MOS process, a sensing region with a structure for the metal electrode is formed, this structure being made of a material having predetermined adhesion properties for metals, the sensing region being uncovered by etching the passivating layer, and a metallization of the surface of the MOS structure being carried out in which the metal layer adheres only to the structure for the metal electrode.

Abstract: An apparatus for dry-leaning dust-contaminated auxiliary objects for handling and storing semiconductor wafers is disclosed and comprises a housing having a receiving opening and a closable lid for closing the opening. The housing further includes a receiving space for receiving an auxiliary object and a collecting space spatially separated therefrom, gas inlet nozzles having corresponding gas outlet openings in the receiving space for injecting a cleaning gas into the receiving space, and a gas draw-off opening in the collecting space for receiving the injected cleaning gas flowing from the receiving space to the collecting space. As the injected cleaning gas flows over the auxiliary object from the receiving space to the collecting space, the dust particles are removed from the auxiliary object by the flow of injected cleaning gas over the auxiliary object and delivered to said gas draw-off opening for disposal.

Abstract: A process for forming adjacent moats or holes in an electrically non-insulating substrate wherein an electrically insulating masking layer is deposited on the substrate. To form two adjacent moats or holes, the masking layer has an opening whose width is chosen so that it extends over a part of the overall width of the two moats or holes to be formed, and whose shape corresponds to the shape of the moats or holes to be formed. The surface of the masked substrate is then subjected to an anodic oxidation, with the oxidation voltage chosen to be so high that two adjacent moats or holes are formed per opening in the masking layer.

Abstract: There is disclosed a method for automatically checking position data of J-leads at a semiconductor component enclosed in a housing with respect to a plane parallel to the bottom side of the housing. The bottom side of the housing is illuminated by light from an illuminator at at least one reproducible angle. The light reflected from the bottom side of the housing and the leads at essentially right angles is picked up by a camera with high resolution. The image signals of the camera are fed to an image signal processing device, and at least one data record with an indicator assigned to the semiconductor component is stored. From the image signals, position data of the leads are determined. Any deviation of the position data from predetermined nominal values is determined by comparing the position data with reference data.

Abstract: A process for manufacturing discrete electronic devices with active structures in an SOI (silicon-on-insulator) substrate which is thickened by an epitaxial layer and whose surface has a <100> orientation, said process comprising the steps of: anisotropically etching the first silicon layer to form a moat having a diameter tapering in the direction of the insulator layer, said moat extending to the insulator layer; forming an insulating layer on the sidewalls of the moat; removing a portion of the insulator layer adjoining the moat to expose a portion of the second silicon layer, which is separated from the first silicon layer by the insulator layer; forming the active structure in the second silicon layer below the portion of the insulator layer which was removed; and depositing a contact layer on the insulating layer and the active element for making contact to the active structure.

Abstract: A process is disclosed for producing spatially patterned components from a body. On the backside of the body, a retardation layer with openings is provided for retarding a removal of the material of the body, and areas of migration-capable material are deposited. The body is subjected to a thermal migration process to form migration regions. Then, in a single material removal step, the components are separated from the body and the migration regions are exposed.

Abstract: A specimen slide (1) for a microscope, camera or other such observation device has a receiving area (2) for cell or tissue samples or other such organic material and a smaller observation area (3) for the organic material. The specimen slide (1) at least in the observation area is made of transparent material. Within the receiving area (2) the specimen slide (1) is provided with thin-film sensors (6 to 12) adjacent to the observation area (3) for measuring physiological parameters of the organic material. The chemical and physical characteristics of the organic material under observation can be picked up by the sensors while it is observed, for example under a microscope. Sensors of differing types can be provided, such as interdigital capacitors (6), NO sensors (8), O.sub.2 sensors (9) or temperature sensors (11), thereby making available important physiological measurement and/or control parameters.

Abstract: An apparatus 1 serves for treating tumors in particular. This apparatus has, for example, a sensor-actuator head 3 with at least one sensor 10 for determining the acidification of the immediate surroundings of the tumor cells. An active ingredient dispensing device for exerting chemical influence and/or electrodes for exerting physical influence through electrical and/or electromagnetic fields on the tumorous tissue area to be treated are provided on the sensor-actuator head. The sensor(s) 10 as well as the active ingredient dispensing facility and/or the treatment electrodes are connected with a control facility for controlling chemical and/or physical treatment of the tumorous tissue area as a function of measured values.