Patents Assigned to Micronic Mydata AB
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Patent number: 8122846Abstract: Devices and methods for manufacturing displays, solar panels and other devices using larger size workpieces are provided. The workpiece is rolled into a cylinder, thereby reducing the physical size by a factor of 3 in one dimension. The stages on which the workpieces are rolled have a cylindrical shape, which allows a more robust and/or compact movement of the glass, reduced machine weight. The workpieces are relatively thin, more flexible, and are rolled onto a cylinder with a diameter of about 1 meter.Type: GrantFiled: February 28, 2007Date of Patent: February 28, 2012Assignee: Micronic Mydata ABInventors: Lars Stiblert, Torbjörn Sandström, Jarek Luberek, Tomas Lock
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Patent number: 8102410Abstract: Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing.Type: GrantFiled: October 26, 2006Date of Patent: January 24, 2012Assignee: Micronic Mydata ABInventor: Torbjörn Sandström
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Patent number: 8077377Abstract: The invention relates to methods to improve SLMs, in particular to reflecting micromechanical SLMs, for applications with simple system architecture, high precision, high power handling capability, high throughput, and/or high optical processing capability. Applications include optical data processing, image projection, lithography, image enhancement, holography, optical metrology, coherence and wavefront control, and adaptive optics. A particular aspect of the invention is the achromatization of diffractive SLMs so they can be used with multiple wavelengths sequentially, simultaneously or as a result of spectral broadening in very short pulses.Type: GrantFiled: April 24, 2009Date of Patent: December 13, 2011Assignee: Micronic MyData ABInventor: Torbjorn Sandstrom
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Patent number: 8067134Abstract: The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and Fresnel prisms, computer-generated holograms, lenslet arrays, etc, or to be used as masters for the fabrication of such components by replication. Replication can be done by molding, pressing, embossing, electroplating, etching, as known in the art. This disclosure includes descriptions of using passive absorbing components in thin resist, using high gamma thick resists with high resolution pattern generators, using multiple focal planes including at least one focal plane in the bottom half of the resist, and iterative simulation of patterning and adjustment of an exposure map.Type: GrantFiled: October 22, 2009Date of Patent: November 29, 2011Assignee: Micronic MyData ABInventors: Torbjörn Sandström, Mikael Wahlsten, Mats Ekberg, Anders Svensson
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Patent number: 8057971Abstract: The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and Fresnel prisms, computer-generated holograms, lenslet arrays, etc, or to be used as masters for the fabrication of such components by replication. Replication can be done by molding, pressing, embossing, electroplating, etching, as known in the art. This disclosure includes descriptions of using passive absorbing components in thin resist, using high gamma thick resists with high resolution pattern generators, using multiple focal planes including at least one focal plane in the bottom half of the resist, and iterative simulation of patterning and adjustment of an exposure map.Type: GrantFiled: October 22, 2009Date of Patent: November 15, 2011Assignee: Micronic MyData ABInventors: Torbjörn Sandström, Mikael Wahlsten, Mats Ekberg, Anders Svensson
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Publication number: 20110257777Abstract: A method for patterning a second layer of a work piece in a direct write machine in the manufacturing of a multilayer system-in-package stack. The work piece having a first layer with a plurality of electrical components in the form of dies arbitrarily placed. Each component having connection points where some need to be connected between the components. A first pattern wherein different zones comprising connection points of dies distributed in the first layer are associated with different requirements on alignment. The method comprising the steps of: a. Detecting sacred zones in first pattern that have a high requirement on alignment to selected features of the system-in-package stack or to the placed components; b. Detecting stretch zones of the first pattern that are allowed to have a lower requirement on alignment to other features of the system-in-package stack; c.Type: ApplicationFiled: February 28, 2011Publication date: October 20, 2011Applicant: Micronic Mydata ABInventors: Mikael Wahlsten, Per-Erik Gustafsson
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Publication number: 20110222074Abstract: A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coordinate system of the writing tool and a coordinate system of a calibration plate on one of the stage and the workpiece. The calibration system is also configured to determine the correlation at least partly based on an optical correlation signal, or pattern, in a form of at least one optical beam being reflected from at least one reflective pattern on the surface of the calibration plate.Type: ApplicationFiled: March 3, 2011Publication date: September 15, 2011Applicant: Micronic Mydata ABInventors: Anders Svensson, Fredrick Jonsson
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Publication number: 20110213487Abstract: A method of patterning a plurality of layers of a work piece in a series of write machines, wherein errors due to different transformation capabilities of different machines are compensated by distributing the errors over the plurality of layers.Type: ApplicationFiled: February 28, 2011Publication date: September 1, 2011Applicant: Micronic Mydata ABInventors: Mikael Wahlsten, Per-Erik Gustafsson
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Publication number: 20110213484Abstract: A method for patterning a workpiece in a direct write machine in the manufacturing of a multilayer stack, wherein a first circuit pattern comprising patterns for connection points is transformed according to determined fitting tolerances to fit to connection points of a second circuit pattern and to circuit pattern(s) of specific features such as random placed dies, or group of dies, on or in the workpiece. The second layer may be a previously formed layer or a layer to be formed on the same workpiece or on a different workpiece for the stack. Pattern data associated with selected die is transformed into adjusted circuit pattern data using the transformation defined by the transformed positions such that the circuit pattern is fitted to the selected die(s).Type: ApplicationFiled: February 28, 2011Publication date: September 1, 2011Applicant: Micronic Mydata ABInventors: Mikael Wahlsten, Per-Erik Gustafsson
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Publication number: 20110210104Abstract: A method of patterning a plurality of layers of a work piece in a series of writing cycles in one or a plurality of write machines, the workpiece being deviced to have a number of N layers and layers of the workpiece having one or a plurality of boundary condition(s) for pattern position, the method comprising the steps of: determining the boundary conditions of layers 1 to N, calculating deviations due to the boundary conditions and calculating a compensation for the deviation of the first transformation added with the assigned part of the deviation due to the boundary conditions.Type: ApplicationFiled: February 28, 2011Publication date: September 1, 2011Applicant: Micronic Mydata ABInventors: Mikael Wahlsten, Per-Erik Gustafsson
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Publication number: 20110213479Abstract: In a method for patterning a workpiece provided with dies in a direct write machine, pattern data associated with a selected die, or group of dies, is transformed into adjusted circuit pattern data dependent both on the original pattern data and the transformed positions, wherein the adjusted circuit pattern data represents the circuit pattern of the plurality of dies, or group of dies, such that the adjusted circuit pattern is fitted to a plurality of sub-areas of the workpiece area, and wherein each sub-area is associated with a die, or group of dies, among the plurality of dies distributed on the workpiece. A pattern is then written on the workpiece according to the adjusted circuit pattern data.Type: ApplicationFiled: February 28, 2011Publication date: September 1, 2011Applicant: Micronic Mydata ABInventors: Mikael Wahlsten, Per-Erik Gustafsson
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Patent number: 7981303Abstract: A novel silicon micromirror structure for improving image fidelity in laser pattern generators is presented. In some embodiments, the micromirror is formed from monocrystalline silicon. Analytical- and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror-surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.Type: GrantFiled: September 19, 2008Date of Patent: July 19, 2011Assignee: Micronic MyData ABInventors: Martin Bring, Peter Enoksson
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Patent number: 7957055Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.Type: GrantFiled: April 28, 2010Date of Patent: June 7, 2011Assignee: Micronic Mydata ABInventor: Torbjorn Sandstrom
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Publication number: 20110051211Abstract: A pattern generation system includes an optical system and a rotor. The optical system is configured to project a laser image onto an optical scanner. The rotor has a plurality of optical arms arranged at a first angle relative to one another, and further includes the optical scanner. The laser image is sequentially reflected by the optical scanner into each of the plurality of optical arms of the rotor to generate a pattern on a workpiece.Type: ApplicationFiled: September 1, 2010Publication date: March 3, 2011Applicant: Micronic Mydata ABInventors: Jonas Walther, Torbjöm Hedeväm
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Patent number: 7842525Abstract: A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.Type: GrantFiled: October 31, 2007Date of Patent: November 30, 2010Assignee: Micronic Mydata ABInventor: Torbjorn Sandstrom