Patents Assigned to Mitsubishi Gas Chemical Co. Inc.
  • Patent number: 5543482
    Abstract: The present invention provides a composition comprising a vinylbenzylthio compound represented by the following general formula ##STR1## in which m is an integer of 2-3, n is an integer of 1 and R is a hydrocarbon group of 3-6 carbon atoms or a hydrocarbon group of 3-6 carbon atoms containing a bivalent sulfur atom, and a monomer radical-copolymerizable with said vinylbenzylthio compound.Said composition is useful for producing a plastic lens having a high refractive index, a small specific gravity, excellent heat resistance and excellent processability.
    Type: Grant
    Filed: March 13, 1995
    Date of Patent: August 6, 1996
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Masanori Shimuta, Toru Takahashi, Hisato Abe, Kenichi Takahashi, Akira Kurata, Osamu Aoki
  • Patent number: 5540905
    Abstract: An optically anisotropic pitch, which is suited for manufacturing particularly high compressive strength carbon fibers in a stable fashion, with satisfactory productivity and continuously, and also a method of manufacturing high compressive strength carbon fibers using the optically anisotropic pitch.The optically anisotropic pitch for manufacturing high compressive strength carbon fibers is composed of a benzene soluble component (BS) and a benzene insoluble component (BI) and has a Q value (i.e., weight-average molecular weight divided by number-average molecular weight) of 1.6 or below, a number-average molecular weight ratio of the benzene soluble component to the benzene insoluble component of 2.5 or below, an aromatic carbon fraction factor (fa) of 0.8 or below, a C/H atomic ratio of 1.85 or below and an optically anisotropic phase of 90% or more.
    Type: Grant
    Filed: September 15, 1994
    Date of Patent: July 30, 1996
    Assignees: Tonen Corporation, Mitsubishi Gas Chemical Co., Inc.
    Inventors: Tsutomu Naito, Takashi Hino, Masaru Miura, Kazuyuki Murakami
  • Patent number: 5456898
    Abstract: Proposed is an improvement in a method for the preparation of an enriched and purified aqueous hydrogen peroxide solution from a crude aqueous hydrogen peroxide solution comprising the steps of evaporating the crude aqueous hydrogen peroxide solution in an evaporator into vapor with accompanying liquid in the form of a mist, separating the vapor from the mist of liquid in a gas-liquid separator and subjecting the vapor to fractionating distillation in a fractionating distillation column in order to greatly upgrade the product solution relative to the impurity content.
    Type: Grant
    Filed: September 9, 1994
    Date of Patent: October 10, 1995
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Shigeki Shimokawa, Yoshitsugu Minamikawa, Seishi Murakami
  • Patent number: 5428090
    Abstract: A polycarbonate derived from a novel dihydroxy compound having a triphenylamine structure, and a process for producing the polycarbonate are disclosed. The polycarbonate is obtained by reacting a dihydroxy compound having a triphenylamine structure described hereinbefore and a carbonate precursor, or by reacting the dihydroxy compound, a dihydric phenol compound and the carbonate precursor. The polycarbonate is useful as a plastic molding material or as a material for forming a polymer alloy with other resin.
    Type: Grant
    Filed: February 9, 1994
    Date of Patent: June 27, 1995
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Noriyoshi Ogawa, Toshiaki Takata, Satoshi Kanayama
  • Patent number: 5396008
    Abstract: There is disclosed a process for producing dimethyltetralin consisting of 1,5-, 1,6- and 2,6-dimethyltetralin which comprises cyclizing 5-tolyl-penta-2-ene in gaseous state in the presence of diluent by the use of a catalyst comprising a crystalline aluminosilicate and a carrier and optionally a molding assistant. The abovementioned process is capable of producing industrially useful dimethyltetralin as the starting raw material for dimethylnaphthalene with high yield and high selectivity with minimized side reactions over a long stabilized period.
    Type: Grant
    Filed: July 9, 1993
    Date of Patent: March 7, 1995
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Shinji Ozawa, Makoto Takagawa, Kenji Dnamasa
  • Patent number: 5395909
    Abstract: The present invention provides a composition comprising, as the essential components, an aromatic compound represented by the following general formula ##STR1## (m is an integer of 2-3, n is an integer of 1-3 and R is a hydrocarbon group of 3-6 carbon atoms or a hydrocarbon group of 3-6 carbon atoms containing a bivalent sulfur atom), an isocyanate compound and a radical polymerization initiator.Said composition is useful for producing a plastic lens having a high refractive index, a small specific gravity, excellent heat resistance and excellent processability.
    Type: Grant
    Filed: October 13, 1993
    Date of Patent: March 7, 1995
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Masanori Shimuta, Toru Takahashi, Hisato Abe, Kenichi Takahashi, Akira Kurata, Osamu Aoki
  • Patent number: 5374375
    Abstract: A liquid crystal compound represented by formula (I), ##STR1## wherein A represents --C.sub.3 H.sub.7, --C.sub.4 H.sub.9 or --C.sub.8 H.sub.17 ; when A is --C.sub.3 H.sub.7, m is an integer of 8, 10, 12 or 14; and when A is --C.sub.4 H.sub.9 or --C.sub.8 H.sub.17, m is an integer of 7 to 14,said compound having an antiferroelectric phase.
    Type: Grant
    Filed: June 26, 1992
    Date of Patent: December 20, 1994
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Tomoyuki Yui, Masahiro Johno, Toshio Watanabe, Masamichi Mizukami, Yoshihisa Arai
  • Patent number: 5367391
    Abstract: A method for driving an antiferroelectric liquid crystal cell suitable for a simple-matrix display, "utilizing" third state .fwdarw.uniform state and "uniform state.fwdarw.third state" switchings, in which the uniform state to third state switching is done within a memory time of uniform to third state switching. The uniform states are employed as the light and dark states.
    Type: Grant
    Filed: March 2, 1993
    Date of Patent: November 22, 1994
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Masahiro Johno, Tomoyuki Yui
  • Patent number: 5364560
    Abstract: An antiferroelectric liquid crystal compound which is a compound represented by ##STR1## wherein R denotes a linear aliphatic alkyl group having 6 to 14 carbon atoms; A denotes a single bond or an oxygen atom; X and Y independently denote a hydrogen atom or a fluorine atom but they are not hydrogen atoms at the same time; h and i are independently 1 or 2; m is an integer of 3 to 10; Z denotes CH.sub.3, C.sub.2 H.sub.5 or CF.sub.3 ; k is 0 or an integer of 5 to 8; l is 0 or 1; n is an integer of 1 to 6; W denotes CH.sub.3 or CF.sub.3 ; when W is CH.sub.3, p and q are both 0 and r is 8; when W is CF.sub.3, p is 5 to 8, q is 1 and r is 1 to 4; and C* denotes an asymmetric carbon atom,and a liquid crystal display device using same.
    Type: Grant
    Filed: January 29, 1992
    Date of Patent: November 15, 1994
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Masamichi Mizukami, Tomoyuki Yui, Masahiro Johno, Yoshihisa Arai, Hiroshi Mineta
  • Patent number: 5352382
    Abstract: Antiferroelectric liquid crystal composition comprising at least one of antiferroelectric liquid crystal substances, and at least one of optically active substances.
    Type: Grant
    Filed: June 4, 1992
    Date of Patent: October 4, 1994
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Masahiro Johno, Tomoyuki Yui, Yoshihisa Arai
  • Patent number: 5344768
    Abstract: Pyrrolo-quinoline quinone (PQQ) is microbiologically produced by culturing a bacterium in a medium containing methanol, methylamine or a mixture thereof as a carbon source and recovering PQQ from the culture medium. The bacteria are strains of Methylobacterium, Ancylobacter, Hyphomicrobium, Xanthobacter, Thiobacillus, Microcyclus and Achromobacter.
    Type: Grant
    Filed: July 14, 1993
    Date of Patent: September 6, 1994
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventor: Teizi Urakami
  • Patent number: 5331011
    Abstract: Disclosed is an N-benzyl-N-phenoxyethylamine selected from the group consisting of the N-benzyl-N-phenoxyethylamine represented by the following formula (I): ##STR1## and an agriculturally acceptable acid addition salt represented by the following formula (II): ##STR2## wherein m represents a number of 1 or 2 with a proviso that when m is 1 and a chlorine atom in the ring A is present at para(4)-position of the ring A, two chlorine atoms in the ring B are present at 2,3-, 2,5-, 2,6-, 3,4- or 3,5-positions of the ring B, and HX represents an acid.
    Type: Grant
    Filed: April 7, 1993
    Date of Patent: July 19, 1994
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Mitsunori Oda, Kazutoshi Kikkawa, Akinori Tanaka, Satoko Imaruoka, Shigeo Yoshinaka
  • Patent number: 5279777
    Abstract: A process for producing a friction material under low-temperature conditions using, as a reinforcement, one or more fibers selected from a metal fiber, an organic fiber and an inorganic fiber and, as a binder, a compounded pitch that consists of a mesophase pitch and sulfur and/or an aromatic nitro compound. The content of an optically anisotropic phase in the mesophase pitch is at least 80% and the softening point of the mesophase pitch is not higher than 270.degree. C. The friction material produced exhibits consistent friction characteristics over a broad temperature range.
    Type: Grant
    Filed: October 28, 1992
    Date of Patent: January 18, 1994
    Assignees: Mitsubishi Gas Chemical Co., Inc., Akebono Research and Development Centre, Ltd.
    Inventors: Takashi Kojima, Hitoshi Sakamoto, Nobuo Kamioka, Hiroshi Tokumura
  • Patent number: 5273685
    Abstract: A thermoplastic resin composition comprising (a) 100 parts by weight of thermoplastic copolycarbonate comprising 0.1 to 50% by weight of structural unit of the following general formula (1) and 99.9 to 50% by weight of structural unit of the following general formula (2): ##STR1## and (b) 0.1 to 30 parts by weight of electroconductive carbon black can produce a molding product having good mechanical properties and surface smoothness with good moldability.
    Type: Grant
    Filed: February 21, 1992
    Date of Patent: December 28, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Toshiaki Takata, Tadami Kinugawa, Hideo Otaki
  • Patent number: 5259999
    Abstract: A process for producing a resin molded article having a diminished residual stress, which includes heating an injection-molded article of a thermoplastic resin by means of a combination of far infrared radiation with far infrared ray having a frequency of from 10.sup.11 to 10.sup.14 Hz and hot-air flow, thereby to diminish a residual stress in the molded article in a short period of time.
    Type: Grant
    Filed: January 8, 1992
    Date of Patent: November 9, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Tsuneaki Iwakiri, Toshiaki Izumida, Masanori Iwaki, Chikara Sadano
  • Patent number: 5252355
    Abstract: A process for producing a multilayered printed circuit board which comprises using, as an intermediate layer, an inner-layer board obtained by chemically oxidizing the surface of a copper foil constituting an outermost layer of an inner-layer board having a printed circuit formed in the copper foil, thereby to form on the surface a finely roughened layer constituted by a copper oxide of a brown to black color, and then reducing the copper oxide constituting the finely roughened layer in an atmosphere in which a reducing gas is present.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: October 12, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Kazuhiro Ando, Takamasa Kawakami, Yasuhiro Shouji, Yasuo Tanaka, Takeo Kanaoka, Norio Sayama
  • Patent number: 5244487
    Abstract: Disclosed are novel adenine derivatives represented by the formula I and agriculturally acceptable acid addition salts thereof represented by the formula: ##STR1## wherein n is an integer of 2-4. Compositions for increasing yield of crops such as leguminous crops and gramineous crops which contain the above adenine derivatives or salts thereof as an active ingredient and methods for increasing yield of crops using these compositions are also disclosed.
    Type: Grant
    Filed: February 11, 1991
    Date of Patent: September 14, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Takashi Oritani, Mitsunori Oda, Taketo Maruyama, Takashi Suzuki, Akinori Tanaka, Toshio Kajita, Shigeo Yoshinaka, Masakazu Furushima
  • Patent number: 5244605
    Abstract: In a process for producing a halogenated polycarbonate molded article from a powder or pellets of a halogenated polycarbonate resin or composition thereof by means of injection molding using an injection molding machine, the improvement wherein the injection molding machine comprises a cylinder whose inner circumferential wall being made of a corrosion-resistant and abrasion-resistant alloy comprising alloy component (1), (2), or (3) given below, and a screw part made of a steel having a metal coating formed by hard chromium plating or hard nickel plating or made of SUS420, SUS440, Hastelloy C, or a steel comprising alloy component (4) given below:______________________________________ Alloy component (1): C: 0.5-2 wt % Si: 1-5 wt % B: 0.5-5 wt % Ni: 10-25 wt % Cr: 20-35 wt % W: 10-25 wt % Cu: 0.5 -5 wt % Remainder: Co and unavoidable impurities, Alloy component (2): Si: 0.2-4 wt % Mn: 0.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: September 14, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Toshikazu Umemura, Toshiaki Asoh
  • Patent number: 5242540
    Abstract: A process for producing a thin copper foil-clad circuit board substrate which comprises subjecting a copper foil-clad circuit board substrate (a) comprising an electrically insulating support overlaid on one or both sides with a copper foil having an average thickness of 12 .mu.m or more to etching with a copper-etching solution thereby to etch the whole surface of the copper foil at a predetermined etching rate selected from the range of from 0.01 to 0.4 .mu.m/sec, thereby to reduce the thickness of the copper foil on at least one side of the insulating support to 10 to 80% of its original thickness with the thickness variation of the remaining etched copper foil being within .+-.1.0 .mu.m on the basis of a desired thickness, wherein said copper foil-clad circuit board substrate (a) is one in which the surface of the copper foil is substantially free of adherent dust particles having an average particle diameter of 3 .mu.m or more.
    Type: Grant
    Filed: February 6, 1992
    Date of Patent: September 7, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Kenji Ishii, Takamasa Nakai, Hiroyuki Matsumoto, Kenichi Moriyama
  • Patent number: 5211738
    Abstract: A denine derivatives represented by the following formula: ##STR1## (wherein n is 1 or 2 and R and R' represent hydrogen or a methyl, ethyl, allyl, or propargyl group) and agriculturally acceptable acid addition salts thereof, which have cytokinin activity and besides, excellent rooting action, is applied to as plant growth regulators.
    Type: Grant
    Filed: April 2, 1992
    Date of Patent: May 18, 1993
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Yoshinori Sasaki, Takashi Oritani, Akinori Tanaka, Taketo Maruyama, Mitsunori Oda, Takashi Suzuki, Yoshiaki Suzuki, Masakazu Furushima