Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
  • MUSCLE ENHANCER
    Publication number: 20230125271
    Abstract: A muscle enhancer containing a polyamine and a branched-chain amino acid as active ingredients. The polyamine may be one or more of putrescine, spermidine, and spermine, and may be derived from a yeast belonging to the genus Saccharomyces. The muscle enhancer may also comprise a crystalline polysaccharide. The muscle enhancer may be present in a food or a drink.
    Type: Application
    Filed: March 18, 2021
    Publication date: April 27, 2023
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kenji NAKAMURA, Masayuki FURUTANI, Tomokazu TACHIKAWA
  • Optical resin material for chromatic aberration correction
    Patent number: 11634558
    Abstract: An optical resin material for chromatic aberration correction is provided including at least 5% by mass of a compound (component A) represented by formula (1) or formula (3), in which R1 to R6 each independently represent a structure represented by formula (2), in which the broken line represents a binding site; n1 represents an integer of 0 to 3; n2 represents an integer of 0 or 1; n3 represents an integer of 0 to 4; R7 represents hydrogen, an acryl group, a methacryl group, a cyanoacryl group, a cyclic ether group, an allyl group, a propargyl group, a hydroxy group, an isocyanate group, chlorine, or an optionally branched alkyl group having 1 to 8 carbon atoms; and X represents an alkylene glycol chain having 2 to 7 carbon atoms or a lactone-modified ketone chain, in which R1 to R6 each independently represent a structure represented by formula (2).
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: April 25, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kosuke Namiki, Sunao Nojima, Shoko Suzuki, Noriyuki Kato, Hiroshi Horikoshi
  • Polycarbonate resin and method for producing same
    Patent number: 11634538
    Abstract: The purpose of the present invention is to provide: a polycarbonate resin which has a narrow molecular weight distribution and in which the formation of low molecular weight oligomers is suppressed; and a method for producing the polycarbonate resin. According to the present invention, provided are a polycarbonate resin containing a structural unit represented by general formula (1), wherein the molecular weight distribution value (Mw/Mn) is 6.0 or less, and the content of oligomers having a molecular weight of less than 1,000 is suppressed to 0.50 mass % or less; and a method for producing the polycarbonate. (In general formula (1), R1-26 represent hydrogen, fluorine, chlorine, bromine, iodine, a C1-9 alkyl group, a C6-12 aryl group, a C1-5 alkoxy group, a C2-5 alkenyl group, or a C7-17 aralkyl group).
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: April 25, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Shun Ishikawa
  • OXYMETHYLENE COPOLYMER RESIN COMPOSITION AND METHOD FOR PRODUCING SAME
    Publication number: 20230120116
    Abstract: An oxymethylene copolymer resin composition, which includes (i) an oxymethylene copolymer, (ii) a derivative of an aryl boron fluoride compound, and (iii) a layered double hydroxide; and a method for producing the same.
    Type: Application
    Filed: May 31, 2021
    Publication date: April 20, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takuya OKADA, Daisuke SUNAGA
  • BODY FAT REDUCER
    Publication number: 20230122937
    Abstract: A body fat reducer containing a polyamine and a branched-chain amino acid as active ingredients. The polyamine may be one or more of putrescine, spermidine, and spermine, and may be derived from yeast. The body fat reducer may also comprise a crystalline polysaccharide. The body fat reducer may be present in a food or a drink.
    Type: Application
    Filed: March 18, 2021
    Publication date: April 20, 2023
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kenji NAKAMURA, Masayuki FURUTANI, Tomokazu TACHIKAWA
  • Aqueous composition and cleaning method using same
    Patent number: 11629315
    Abstract: An aqueous composition includes (A) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 50 mass % of an acid other than the C4-13 alkylphosphonic acid, the C4-13 alkylphosphonate ester and the C4-13 alkyl phosphate or a salt thereof, with respect to the total amount of the aqueous composition.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: April 18, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toshiyuki Oie, Takahiro Kikunaga, Akinobu Horita, Kenji Yamada
  • METHOD FOR PRODUCING PURIFIED PHTHALONITRILE AND METHOD FOR PURIFYING PHTHALONITRILE
    Publication number: 20230111802
    Abstract: A method for producing a purified phthalonitrile is described. The method involves reacting ammonia, oxygen, and xylene in the presence of a catalyst to obtain a product gas containing a phthalonitrile and a cyanobenzamide and then contacting the reaction product gas with an organic solvent to obtain a collection liquid. The collection liquid is distilled by a high boiling point fraction-separating column to obtain a gas that contains the phthalonitrile and the organic solvent from the column top, and to obtain a bottom liquid that contains a cyanobenzamide from the column bottom. The bottom liquid has a phthalonitrile content of 90% by mass or less. The bottom liquid is subjected to combustion, while being kept in a liquid state, and the purified phthalonitrile is obtained by removing the organic solvent from the gas that has been obtained from the column top.
    Type: Application
    Filed: February 26, 2021
    Publication date: April 13, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Kuniaki MUNEYASU
  • RESIN COMPOSITION, OPTICAL LENS CONTAINING THIS, AND OPTICAL FILM
    Publication number: 20230109138
    Abstract: A resin composition contains: a resin containing a constituent unit (A) represented by general formula (1); and a resin containing a constituent unit (B) represented by formula (2) and/or a constituent unit (C) represented by formula (3). (R1 represents a methyl group or an ethyl group, R2 and R3 represent a hydrogen atom or a methyl group, and n represents 0 or 1.) (Ra and Rb represent a hydrogen atom, etc., Rh represents an aryl group of 6-20 carbons, X represents a single bond or a fluorene group, A and B represent an alkylene group of 1-4 carbons, m and n represent integers 0-6, and a and b represent integers 0-10.) (Rc and Rd represent a hydrogen atom, etc., Y represents a fluorene group, A and B represent an alkylene group of 1-4 carbons, p and q represent integers 0-4, and a and b represent integers 0-10.
    Type: Application
    Filed: March 26, 2021
    Publication date: April 6, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasuaki YOSHIMURA, Mitsuteru KONDO, Noriyuki KATO, Eiichi HONDA, Manabu HIRAKAWA, Yuichiro SATAKE, Katsushi NISHIMORI, Shoko MURATA SUZUKI, Tatsuki NYUUI, Mitsutake SUEMATSU
  • COMPOSITION FOR OPTICAL MATERIAL
    Publication number: 20230100848
    Abstract: A composition for an optical material contains (a) an episulfide compound, (b) a polymerization catalyst, and (c) an ester compound having a halogen at the ? position. The (c) ester compound having a halogen at the a position is preferably at least one compound selected from the group consisting of dimethyl chloromalonate, diethyl chloromalonate, dimethyl bromomalonate, and diethyl bromomalonate.
    Type: Application
    Filed: May 21, 2021
    Publication date: March 30, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Mariko SADO, Kouhei TAKEMURA, Hiroshi HORIKOSHI
  • RESIN COMPOSITION, RESIN SHEET, PREPREG AND PRINTED WIRING BOARD
    Publication number: 20230098357
    Abstract: [Problem] Provided is a resin composition, resin sheet, prepreg and printed wiring board capable of obtaining excellent low permittivity, low dielectric loss tangent, flexibility and peel strength. [Solution Means] A resin composition containing (A) a maleimide compound exhibiting a relative permittivity of lower than 2.7, (B) a polyphenylene ether compound represented by general formula (1) below and having a number-average molecular weight of 1000 to 7000, and (C) a block copolymer with a styrene skeleton. In general formula (1), X represents an aryl group, —(Y—O)n2- represents a polyphenylene ether portion, R1, R2 and R3 each independently represent a hydrogen atom or an alkyl, alkenyl or alkynyl group, n2 represents an integer of 1 to 100, n1 represents an integer of 1 to 6 and n3 represents an integer of 1 to 4.
    Type: Application
    Filed: January 20, 2021
    Publication date: March 30, 2023
    Applicants: Mitsubishi Gas Chemical Company, Inc., MGC Electrotechno Co., Ltd.
    Inventors: Shunsuke Hirano, Yoshihiro Kato, Meguru Ito, Takeshi Nobukuni, Noriaki Sugimoto, Takashi Kubo, Shouta Koga, Yoshitaka Ueno
  • POLYIMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE
    Publication number: 20230094840
    Abstract: A modified polyimide resin containing a structure represented by general formula (I) below. A polyimide resin containing: a structural unit A derived from a tetracarboxylic dianhydride; and a structural unit B derived from a diamine compound, wherein the structural unit A contains a structural unit derived from a compound having a specific structure in a proportion of 60 mol % or greater.
    Type: Application
    Filed: December 15, 2020
    Publication date: March 30, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Daichi MIYAHARA, Yumi SATO
  • RESIST COMPOSITION AND METHOD FOR USING RESIST COMPOSITION
    Publication number: 20230096312
    Abstract: Provided is a resist composition which contains a resin (A) and a solvent (B) that contains a compound (B1) represented by general formula (b-1), wherein the content of the active ingredients based on the total amount of the resist composition is 45% by mass or less. (In formula (b-1), R1 represents an alkyl group having from 1 to 10 carbon atoms.
    Type: Application
    Filed: February 17, 2021
    Publication date: March 30, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takumi OKADA, Hideyuki SATO, Masayuki KATAGIRI, Shu SUZUKI
  • Aqueous composition and cleaning method using same
    Patent number: 11613720
    Abstract: An aqueous composition includes (A) from 0.001 to 20 mass % of one or more kinds of fluorine-containing compounds selected from tetrafluoroboric acid, hexafluorosilicic acid, hexafluoroaluminic acid, hexafluorotitanic acid and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: March 28, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toshiyuki Oie, Akinobu Horita, Takahiro Kikunaga, Kenji Yamada
  • THERMOFORMING LAMINATE AND METHOD FOR MOLDING LAMINATE
    Publication number: 20230088428
    Abstract: Provided is a thermoforming laminate, etc., having good thermoforming properties as well as excellent chemical resistance and abrasion resistance. Examples of solutions to the problem include a thermoformable laminate, including: (a) a substrate layer containing a thermoplastic resin; (b) a post-cure type hard coat layer containing an active-energy-ray-curable resin having a (meth)acryloyl group, the hard coat layer also containing a polymerization inhibitor; and (c) a protective film, wherein: (a) the substrate layer, (b) the hard coat layer, and (c) the protective film are layered in this order; and the polymerization inhibitor includes at least one among a quinone-based compound, a sulfur-containing compound, and a nitrogen-containing compound.
    Type: Application
    Filed: February 3, 2021
    Publication date: March 23, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasutaka FUKUNAGA, Shota KAMEI
  • ION CONDUCTOR CONTAINING HIGH-TEMPERATURE PHASE OF LiCB9H10 AND METHOD FOR PRODUCING SAME
    Publication number: 20230083286
    Abstract: A method for producing an ion conductor containing LiCB9H10 and LiCB11H12 includes: preparing a homogeneous solution by mixing LiCB9H10 and LiCB11H12 in a solvent at a LiCB9H10/LiCB11H12 molar ratio of from 1.1 to 20; obtaining a precursor by removing the solvent from the homogeneous solution; and obtaining an ion conductor by subjecting the precursor to a heat treatment.
    Type: Application
    Filed: February 8, 2021
    Publication date: March 16, 2023
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Keita NOGUCHI, Genki NOGAMI, Yutaka MATSUURA, Sangryun KIM, Kazuaki KISU, Shin-ichi ORIMO
  • METHOD FOR PRODUCING SULFIDE SOLID ELECTROLYTE INCLUDING Sn
    Publication number: 20230071336
    Abstract: A method for producing a sulfide solid electrolyte includes: preparing a uniform solution that includes at least elemental lithium (Li), elemental tin (Sn), elemental phosphorus (P), and elemental sulfur (S) in an organic solvent; removing the organic solvent from the uniform solution to obtain a precursor; and heat-treating the precursor to obtain a sulfide solid electrolyte.
    Type: Application
    Filed: January 6, 2021
    Publication date: March 9, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Tomohiro ITO
  • POLYIMIDE RESIN COMPOSITION AND MOLDED BODY
    Publication number: 20230076244
    Abstract: A polyimide resin composition containing a polyimide resin (A) and a polyetherimide sulfone resin (B), wherein the polyimide resin (A) contains a repeating structural unit represented by the following formula (1) and a repeating structural unit represented by the following formula (2), and a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %; and a molded article containing the same. (R1 represents a divalent group having from 6 to 22 carbon atoms containing at least one alicyclic hydrocarbon structure; R2 represents a divalent chain aliphatic group having from 5 to 16 carbon atoms; and X1 and X2 each independently represent a tetravalent group having from 6 to 22 carbon atoms containing at least one aromatic ring.
    Type: Application
    Filed: November 30, 2020
    Publication date: March 9, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi SAKAI, Yuuki SATO
  • Method for regenerating catalyst and method for producing carbonate ester
    Patent number: 11596936
    Abstract: Realized is a method for restoring the activity of a catalyst for producing a carbonate ester by a simple technique with no use of a complicated step such as calcining or the like to allow the catalyst to be reusable, and a method for producing a carbonate ester at a high yield by use of the catalyst thus regenerated. The above-described problem has been solved by a method for regenerating a catalyst containing CeO2, the catalyst being usable for a carbonate ester generation reaction of generating a carbonate ester from carbon dioxide and an alcohol, the method comprising (a) a separation step of separating the catalyst as a crude catalyst from a reaction solution of carbon dioxide and the alcohol; and (b) a catalyst processing step of washing the crude catalyst with a washing alcohol to provide a purified catalyst.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: March 7, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hidefumi Harada, Takehiko Isobe, Hongyu Liu, Yousuke Shinkai, Ryotaro Umezu
  • COMPOUND, METHOD FOR PRODUCING SAME, RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE
    Publication number: 20230062796
    Abstract: The compound (A) is represented by formula (1). R1O—R2—OR1?? (1) (In formula (1), each R1 independently represents a group represented by formula (2), or a hydrogen atom, and R2 represents a linear or branched alkylene group having 1 to 16 carbon atoms, or a linear or branched alkenylene group having 2 to 16 carbon atoms, provided that at least one R1 is a group represented by formula (2).) (In formula (2), -* represents a bonding hand.
    Type: Application
    Filed: December 9, 2020
    Publication date: March 2, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shunsuke KATAGIRI, Takuya SUZUKI, Seiji SHIKA, Yune KUMAZAWA
  • RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE
    Publication number: 20230066153
    Abstract: Provided is a resin composition which has good solubility and photocurability, further has good alkaline-developability when containing a photo initiator and a compound containing one or more carboxyl groups, and in addition, is capable of providing a resin sheet having suppressed tackiness; and a resin sheet, multilayer printed wiring board, and semiconductor device using the same. The resin composition of the present invention contains a particular bismaleimide compound (A), and at least two maleimide compounds (B) selected from the group consisting of six kinds of particular compounds which are different from this bismaleimide compound (A).
    Type: Application
    Filed: December 9, 2020
    Publication date: March 2, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yune KUMAZAWA, Takuya SUZUKI, Seiji SHIKA, Shunsuke KATAGIRI