Abstract: A recess etching solution for recess etching a metal wiring in a semiconductor substrate manufacturing process; and a recess etching method employing the same. The recess etching solution is for applying recess etching to a surface of a cobalt-containing metal layer embedded in a via or a trench formed in a semiconductor substrate, and contains (A) an organic acid, one of or both of (B) a nitrogen-containing heterocyclic compound and (C) an organic solvent, and (D) water. The recess etching method includes applying recess etching to a surface of a cobalt-containing metal layer by bringing the recess etching solution into contact with the surface of the cobalt-containing metal layer embedded in a via or a trench formed in a semiconductor substrate.
Abstract: The problem of the present invention is to provide an aqueous composition with which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good quality (e.g., thickness) of the stainless steel after treatment. The above problem is solved by the following aqueous composition for roughening the surface of stainless steel. Namely, the aqueous composition comprises 0.1% to 10% by mass of hydrogen peroxide based on the total amount of the aqueous composition, 1% to 30% by mass of halide ions based on the total amount of the aqueous composition, and 0% to 3% by mass of copper ions based on the total amount of the aqueous composition.
Abstract: An objective of the present invention is to provide an anti-reflection film laminate which is for manufacturing an anti-reflection film having low surface reflectance and good anti-reflection properties, as well as excellent thermoformability and scratch resistance. The aforementioned problem is resolved by the following anti-reflection film laminate. This anti-reflection film laminate comprises: a first laminate having a base film that has a release surface, and an optical interference layer laminated on the release surface; and a second laminate having a substrate layer that contains a thermoplastic resin, and an uncured hardcoat layer that is laminated on one surface of the substrate layer and comprises a curable hardcoat composition. The first and second laminate bodies are pressure bonded such that the optical interference layer of the first laminate and the uncured hardcoat layer of the second laminate are in contact with each other.
Abstract: It is desired to develop a method of producing hydrogen peroxide, which is capable of producing hydrogen peroxide with high production efficiency. According to the present invention, provided is a palladium-containing composition comprising palladium particles and a coating agent that coats the surface of the palladium particles, wherein a compound having an O?X structure (wherein X represents any of a phosphorus atom, a sulfur atom, and a carbon atom) is comprised as the coating agent.
Type:
Grant
Filed:
September 12, 2019
Date of Patent:
January 30, 2024
Assignees:
MITSUBISHI GAS CHEMICAL COMPANY, INC., KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
Inventors:
Tatsumi Ishihara, Norikazu Okuda, Ken-ichi Kimizuka, Ken Tasaki
Abstract: A method for producing a patterned substrate, including: step (a) of forming a film composed of a photosensitive polyimide resin composition on a substrate; step (b) of exposing the film; and step (c) of developing the exposed film using a developer to form a pattern formed of the film on the substrate, wherein a relative energy difference (RED) between the developer and the film before exposure is 0.50 or greater and 1.4 or less.
Abstract: An oxygen absorbing resin composition containing a polyolefin, an iron powder, titanium oxide, and calcium oxide, a content of the iron powder being from 10 to 50 mass % in the oxygen absorbing resin composition, a mass ratio of the titanium oxide to the iron powder [titanium oxide/iron powder] being from 0.1 to 0.5, and a mass ratio of the calcium oxide to the iron powder [calcium oxide/iron powder] being from 0.1 to 0.5.
Abstract: Provided is a laminate containing a first resin composition layer, a heat-resistant film layer, and a second resin composition layer laminated in the presented order, wherein the first resin composition layer is in a semi-cured state (B stage), and a difference between a maximum thickness and a minimum thickness of the first resin composition layer is 0.5 to 5 ?m; and the second resin composition layer is in a semi-cured state (B stage), and a difference between a maximum thickness and a minimum thickness of the second resin composition layer is 0.5 to 5 ?m.
Abstract: Provided are a multilayered article and a multilayered container excelling in oxygen barrier properties, delamination resistance, and transparency. The multilayered article has a polyester resin layer and a barrier layer. The polyamide resin contained in the barrier layer includes (A) a polyamide resin derived from xylylenediamine and adipic acid, (B) a polyamide resin derived from xylylenediamine, a linear aliphatic dicarboxylic acid, and isophthalic acid, and as necessary, (C) a polyamide resin derived from hexamethylenediamine, isophthalic acid, and terephthalic acid, and (D) an aliphatic polyamide resin. In the barrier layer, a ratio of the mass of the polyamide resin (A) to the total mass of the polyamide resin (B) and the polyamide resin (C) is from 98:2 to 15:85, the total content of the polyamide resin (A) and the polyamide resin (B) is 60 mass % or more, the content of the polyamide resin (B) is from 1 to 65 mass %, and the content of the aliphatic polyamide resin (D) is from 3 to 40 mass %.
Abstract: The present invention provides a carboxylic acid ester compound represented by formula (1) that is useful as a fragrance component or as a formulated fragrance material, wherein R1 is —COOR, wherein R is an alkyl group having 1 to 4 carbon atoms.
Abstract: Provided is a multilayer container including a polyester layer containing a polyester resin (X), and a polyamide layer containing a polyamide resin (Y), a yellowing inhibitor (A), and an oxidation accelerator (B). The content of the polyamide resin (Y) is from 0.05 to 7.0 mass % relative to the total amount of all polyamide layers and all polyester layers. The yellowing inhibitor (A) is a dye, and the content of the yellowing inhibitor (A) is from 1 to 30 ppm relative to the total amount of all polyamide layers and all polyester layers.
Abstract: Provided is a composition for optical materials that gives optical materials which can have at least one improved property selected from among satisfactory mold releasability after polymerization and curing, unsusceptibility to separation from the mold during polymerization and curing, transparency, and low-level striae. The present invention further provides a compound represented by formula (1). The composition for optical materials comprises the compound represented by formula (1) and a compound represented by formula (2). (In formula (1), X1 and X2 represent O or S, provided that both X1 and X2 are O or that X1 is O and X2 is S.
Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains metaxylylenediamine and paraxylylenediamine at a mass ratio of 99/1 to 51/49, an epoxy resin composition, and a paint and an adhesive containing these.
Abstract: According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1): wherein R1 to R4 and R11 to R14 each independently hydrogen, fluorine, chlorine, bromine or iodine, etc., a represents an integer of 1 to 1,000, and X represents —S—, etc.; and a carbonate-based organic solvent, wherein the content of the polycarbonate resin in the resin composition is 0.05% to 50% by mass; the content of the carbonate-based organic solvent in the resin composition is 50% to 99.
Abstract: Provided is a method for producing a methyl-adduct compound, the method including methylating, in the presence of potassium carbonate and dimethyl carbonate, a dinitrile compound represented by Formula (1) below to obtain a methyl-adduct compound represented by Formula (2) below: where in Formula (2), R1˜R4 each independently represent hydrogen or methyl, and from one to three of R1˜R4 are each methyl.
Abstract: An epoxy resin composition containing an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and a polyalkylene glycol, as well as a gas barrier laminate and a packaging material in which the epoxy resin composition is used.
Abstract: A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.
Type:
Grant
Filed:
August 23, 2016
Date of Patent:
December 26, 2023
Assignees:
Mitsubishi Gas Chemical Company, Inc., A School Corporation Kansai University
Inventors:
Hiroto Kudo, Masatoshi Echigo, Takumi Toida, Takashi Sato
Abstract: A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1); and a polyfunctional radically polymerizable compound (B) having radically polymerizable functional groups and oxyalkylene groups, wherein a number of the radically polymerizable functional groups in the polyfunctional radically polymerizable compound (B) is 3 or greater and 100 or less, and wherein a total number of moles of the oxyalkylene groups added in the polyfunctional radically polymerizable compound (B) is 5 or greater and 100 or less.
Abstract: A method for producing fluorenone including a pretreatment step of heating fluorene in the presence of a lower aliphatic carboxylic acid, a bromine compound, and a metal catalyst, and an oxidation step of continuously supplying fluorene and oxygen to perform an oxidation reaction, in the order indicated.
Abstract: An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03.