Patents Assigned to Mitsubishi Gas Chemicals Company, Inc.
  • THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME
    Publication number: 20230399510
    Abstract: A thermoplastic resin including a constituent unit (A) derived from a monomer represented by general formula (1). In general formula (1), R1 and R11 each independently represent a hydrogen atom, an aryl group having 6-12 carbon atoms, or a linear or branched alkyl group having 1-4 carbon atoms, and X represents one of general formulas (a) to (d). In general formulas (a) to (d), R21 to R57 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a linear or branched alkyl group having 1-4 carbon atoms, or a linear or branched alkoxy group having 1-7 carbon atoms.
    Type: Application
    Filed: October 25, 2021
    Publication date: December 14, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Noriyuki KATO, Shinya IKEDA, Atsushi MOTEGI, Tatsunobu OGATA, Yutaro HARADA, Katsushi NISHIMORI, Kentaro ISHIHARA
  • BIOABSORBABLE FIBROUS MEDICAL MATERIAL
    Publication number: 20230398257
    Abstract: An object of the present invention is to provide a bioabsorbable and stretchable fibrous medical material that enables formation of ligation which provides a small and hard-to-unravel knot even with a weak force. The present invention provides a fibrous medical material which is a fibrous material composed of a molded article provided by spinning and drawing a bioabsorbable aliphatic polymer, wherein an elongation at break is 75% or greater, an intermediate elastic modulus in tension at a strain ranging from 0.25% and 10% is lower than an initial elastic modulus in tension at a strain ranging from 0.05% to 0.25%, the intermediate elastic modulus in tension is 400 MPa or less, and a residual strain rate after 100% deformation is 70% or less.
    Type: Application
    Filed: October 25, 2021
    Publication date: December 14, 2023
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., National University Corporation Tokai National Higher Education and Research System
    Inventors: Akira MAEHARA, Hitoshi HIRATA, Atsuhiko MURAYAMA, Yasunobu NAKAGAWA
  • Polyester resin and method for producing polyester resin
    Patent number: 11840603
    Abstract: A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit.
    Type: Grant
    Filed: November 8, 2021
    Date of Patent: December 12, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Katsumi Shinohara, Kazua Sato, Hiroki Ikarashi
  • Urethane resin
    Patent number: 11840598
    Abstract: There is provided a urethane resin that is excellent in adhesive strength, and maintains high adhesive strength even after exposure to high temperature and humidity. A urethane resin obtained by reacting a glycol-modified aromatic hydrocarbon-formaldehyde resin (A) modified with a glycol with a polyisocyanate (B) having two or more free isocyanate groups in a molecule.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: December 12, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Tomohiro Hariu, Yosuke Ota
  • METHOD FOR PRODUCING FLUORENONE
    Publication number: 20230391705
    Abstract: Provided is a method for producing fluorenone comprising an oxidation step of oxidizing fluorene in the presence of an aliphatic carboxylic acid having 2 to 3 carbon atoms, a metal catalyst, a bromine compound, and oxygen, a solvent removal step of removing the aliphatic carboxylic acid, a heating step at 120 to 350° C., and a distillation step in the order indicated.
    Type: Application
    Filed: October 21, 2021
    Publication date: December 7, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroki SUMI, Yuki WATANABE, Hideaki FUJITA, Goh NAKAMURA, Tatsuyuki KUMANO
  • ALICYCLIC ALCOHOL, ALICYCLIC ALCOHOL COMPOSITION, AND PERFUME COMPOSITION
    Publication number: 20230391701
    Abstract: An alicyclic alcohol of Formula (1) and a fragrance composition including the same is described. An alicyclic alcohol composition containing an alicyclic alcohol of Formula (1) and an alicyclic alcohol of Formula (2), is also described, and this composition may also include an alicyclic alcohol of Formula (3). The alicyclic alcohol composition may comprise Formula (1) at a content of 85 mass % to 98 mass %.
    Type: Application
    Filed: October 19, 2021
    Publication date: December 7, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Keisuke TOMAKI, Shinyou SHIRAI
  • TRIARYLMETHANE COMPOUNDS
    Publication number: 20230391704
    Abstract: The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1 , R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH?CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).
    Type: Application
    Filed: August 8, 2023
    Publication date: December 7, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Karl REUTER, Vasyl ANDRUSHKO, Mark KANTOR, Florian STOLZ, Munenori SHIRATAKE, Kentaro ISHIHARA, Koji HIROSE, Shinya IKEDA, Noriyuki KATO, Mitsuteru KONDO, Shoko MURATA, Kensuke OSHIMA
  • Laminate for molding
    Patent number: 11833792
    Abstract: The problem addressed by this invention is to provide a laminate for molding having excellent moldability and post-curing properties of the hard-coat layer, and which can maintain the surface of the hard-coat layer in a satisfactory state while uncured. This problem is solved by a laminate for molding containing a hard-coat layer and a masking film affixed to the surface of the hard-coat layer, having an adhesive surface, which is the hard-coat layer-side surface of the masking film, with a surface free energy of at least 30.0 (mN/m) measured in accordance with the OWRK method, before being affixed. The hard-coat layer is in an uncured state.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: December 5, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasutaka Fukunaga, Fumiaki Kakeya
  • Wound body and method for manufacturing wound body
    Patent number: 11834294
    Abstract: Provided is a wound body of a commingled yarn, the wound body being capable of effectively suppressing fraying and sagging, disorder of a lower layer, or breakage of the commingled yarn during winding or use. Also provided is a method for manufacturing the wound body.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: December 5, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Asami Nakai, Masataka Kaji, Mitsuro Takagi, Toshihiro Motochika, Nobuhiko Matsumoto
  • EPOXY RESIN CURING AGENT, EPOXY RESIN COMPOSITION, AND USE OF AMINE COMPOSITION
    Publication number: 20230383049
    Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A) and a compound (B) represented by the following formula (1), and wherein the content of the component (B) based on 100 parts by mass of the component (A) is from 0.01 to 2.0 parts by mass, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent, wherein R1 represents an alkyl group having 1 to 6 carbon atoms, and p is a number of 1 to 3.
    Type: Application
    Filed: August 19, 2021
    Publication date: November 30, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Kousuke IKEUCHI, Yuma OHNO, Emi OTA, Aoi YOKOO
  • COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME
    Publication number: 20230374191
    Abstract: A composition containing: a compound (a) represented by Formula (1): wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and 1,2,3,5,6-pentathiepane (b).
    Type: Application
    Filed: September 10, 2021
    Publication date: November 23, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke IMAGAWA, Kouhei TAKEMURA, Ryosuke SUGIHARA, Mariko SADO
  • Etchant for selectively etching copper and copper alloy, and method for manufacturing semiconductor substrate using said etchant
    Patent number: 11821092
    Abstract: An etchant capable of selectively etching copper and a copper alloy while suppressing dissolution of nickel, tin, gold, and an alloy thereof. The etchant contains: (A) 5-10.5% by mass of hydrogen peroxide with respect to the total mass of the etchant; (B) 0.3-6% by mass of nitric acid with respect to the total mass of the etchant; (C) at least one nitrogen-containing 5-membered ring compound selected from triazoles and tetrazoles, which may have at least one substituent selected from a C1-6 alkyl group, an amino group, and a substituted amino group having a substituent selected from a C1-6 alkyl group and a phenyl group; and (D) (d1) one or more pH adjusters selected from an alkali metal hydroxide, ammonia, an amine, and an ammonium salt, (d2) a phosphoric acid compound, or (d3) a combination of (d1) and (d2).
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: November 21, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shun Fukazawa, Tomoko Fujii, Hiroshi Matsunaga
  • Method for producing oxymethylene copolymer resin composition, and oxymethylene copolymer resin composition
    Patent number: 11820857
    Abstract: The present invention provides a method for producing an oxymethylene copolymer resin composition, comprising: adding to an oxymethylene copolymer (A), an Mn micromole of an amine-substituted triazine compound (B) per gram of the oxymethylene copolymer (A), an Mc micromole of a choline hydroxide (C) per gram of the oxymethylene copolymer (A), and 0.05 to 1.1 parts by weight of an antioxidant (D) with respect to 100 parts by weight of the oxymethylene copolymer (A), and melt kneading a mixture of the oxymethylene copolymer (A), amine-substituted triazine compound (B), the choline hydroxide (C), and the antioxidant (D), wherein Mn (?mol/g-POM) and Mc (?mol/g-POM) satisfy: 6.5<(Mn+Mc×8)<25, 0.5<Mn<7.0, and 0.0<Mc.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: November 21, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Mika Nakashima, Daisuke Sunaga
  • Material for built-up edge formation and built-up edge formation method
    Patent number: 11819930
    Abstract: The present invention provides a material for built up edge formation having a resin block containing a high molecular weight compound having a weight average molecular weight of 5×104 or higher and 1×106 or lower, a medium molecular weight compound having a weight average molecular weight of 1×103 or higher and lower than 5×104, and a carbon.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 21, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yousuke Matsuyama, Shigeru Horie
  • COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD
    Publication number: 20230365893
    Abstract: A cleaning composition for semiconductor substrates. The cleaning composition comprises hydrogen peroxide, a hydrogen peroxide stabilizing agent, an alkaline compound, and water. The hydrogen peroxide stabilizing agent is oxalic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, potassium oxalate, 5-phenyl-1H-tetrazole, triethylenetetraminehexaacetic acid, trans-1,2-cyclohexanediaminetetraacetic acid, 8-quinolinol, L(+)-isoleucine, DL-valine, L(-)-proline, hydroxyethylethylenediaminetriacetic acid, N,N-di(2-hydroxyethyl)glycine, glycine, L-tryptophan, 2,6-pyridinedicarboxylic acid, benzothiazole, or DL-alanine. The alkaline compound is a quaternary ammonium hydroxide or potassium hydroxide.
    Type: Application
    Filed: September 22, 2021
    Publication date: November 16, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroaki HORIE, Akinobu HORITA, Makoto HAMANAKA, Kenji SHIMADA, Takahiro KIKUNAGA
  • Gas barrier packaging material
    Patent number: 11814471
    Abstract: Provided is a gas barrier packaging material including a base and a cured resin layer, the base having a surface constituted of an inorganic substance. The cured resin layer is a cured product of an epoxy resin composition including an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and an acidic compound, and a ratio (basic nitrogen/acid groups) of a molar equivalent of basic nitrogen in the epoxy resin composition to a molar equivalent of acid groups derived from the acidic compound is from 0.60 to 20.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: November 14, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kouno, Ryoma Hashimoto
  • PRODUCTION METHOD FOR POLYSILOXANE, COMPOSITION INCLUDING POLYSILOXANE, AND MOLDED BODY
    Publication number: 20230357511
    Abstract: The present invention provides, for example, a method for efficiently producing a polysiloxane having a siloxane constituent unit while making it possible to improve safety and reduce environmental burden. The above-mentioned problem is solved by a method comprising a polymerization step of polymerizing a silane-based compound and a diol compound in the presence of a transesterification catalyst including at least a phosphorus compound, in which the silane-based compound is selected from a specific diaryloxysilane compound, a specific dialkoxysilane compound, and a specific silicon compound, and in the polymerization step, a polysiloxane having a siloxane constituent unit represented by any of formula (1-1) to formula (1-4) is produced. (In the formulas, R1-R10, R30-R33, Z1, Z2, J1, K1, A1, A2, L1, L2, and X are as described in the description of the present application.
    Type: Application
    Filed: September 22, 2021
    Publication date: November 9, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hisato AKIMOTO, Kohei KAMATANI, Daisuke TAGUCHI, Kazuyoshi UERA
  • METHOD FOR PRODUCING AROMATIC NITRILE COMPOUND AND METHOD FOR PRODUCING CARBONATE ESTER
    Publication number: 20230348367
    Abstract: The present invention provides a method for producing an aromatic nitrile compound, the method comprising a dehydration reaction wherein a desired compound can be selectively obtained with high yield while suppressing the generation of byproducts during the regeneration of an aromatic amide compound into the corresponding aromatic nitrile compound. In addition, the present invention realizes a method for efficiently producing a carbonate ester by applying the abovementioned production method to a method for producing a carbonate ester. The above are achieved by means of a method for producing an aromatic nitrile compound involving a dehydration reaction wherein an aromatic amide compound is dehydrated, the method having a contact step for bringing the aromatic amide compound into contact with a catalyst in a gas phase during the dehydration reaction.
    Type: Application
    Filed: April 27, 2023
    Publication date: November 2, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hidefumi HARADA, Takehiko ISOBE, Keisuke SHIMOKAWA, Ryotaro UMEZU
  • METHOD FOR PRODUCING CARBONYL HALIDE
    Publication number: 20230348279
    Abstract: The objective of the present invention is to provide a method for producing a carbonyl halide efficiently to the used halogenated methane. The method for producing a carbonyl halide according to the present invention is characterized in comprising the steps of preparing a mixed gas comprising oxygen and a halogenated methane having one or more halogeno groups selected from the group consisting of chloro, bromo and iodo, and flowing the mixed gas and irradiating a high energy light to the flowed mixed gas.
    Type: Application
    Filed: July 11, 2023
    Publication date: November 2, 2023
    Applicants: NATIONAL UNIVERSITY CORPORATION KOBE UNIVERSITY, AGC Inc., MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Akihiko TSUDA, Takashi OKAZOE, Hidefumi HARADA
  • COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME
    Publication number: 20230340177
    Abstract: To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially.
    Type: Application
    Filed: September 22, 2021
    Publication date: October 26, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuyoshi UERA, Kohei KAMATANI, Hisato AKIMOTO, Daisuke TAGUCHI