Patents Assigned to Mitsubishi Gas Chemicals Company, Inc.
  • EPOXY RESIN COMPOSITION, GAS BARRIER LAMINATE, AND PACKAGING MATERIAL
    Publication number: 20230416520
    Abstract: An epoxy resin composition containing an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and a polyalkylene glycol, as well as a gas barrier laminate and a packaging material in which the epoxy resin composition is used.
    Type: Application
    Filed: October 6, 2021
    Publication date: December 28, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Naoko KOBAYASHI, Kazuki KOUNO, Ryoma HASHIMOTO
  • Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
    Patent number: 11852970
    Abstract: A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: December 26, 2023
    Assignees: Mitsubishi Gas Chemical Company, Inc., A School Corporation Kansai University
    Inventors: Hiroto Kudo, Masatoshi Echigo, Takumi Toida, Takashi Sato
  • PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE
    Publication number: 20230407089
    Abstract: A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1); and a polyfunctional radically polymerizable compound (B) having radically polymerizable functional groups and oxyalkylene groups, wherein a number of the radically polymerizable functional groups in the polyfunctional radically polymerizable compound (B) is 3 or greater and 100 or less, and wherein a total number of moles of the oxyalkylene groups added in the polyfunctional radically polymerizable compound (B) is 5 or greater and 100 or less.
    Type: Application
    Filed: November 10, 2021
    Publication date: December 21, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Miho UMEKI, Yumi SATO, Daichi MIYAHARA
  • METHOD FOR PRODUCING FLUORENONE
    Publication number: 20230406800
    Abstract: A method for producing fluorenone including a pretreatment step of heating fluorene in the presence of a lower aliphatic carboxylic acid, a bromine compound, and a metal catalyst, and an oxidation step of continuously supplying fluorene and oxygen to perform an oxidation reaction, in the order indicated.
    Type: Application
    Filed: November 4, 2021
    Publication date: December 21, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yuki WATANABE, Hiroki SUMI, Hideaki FUJITA, Goh NAKAMURA, Tatsuyuki KUMANO
  • ALDEHYDE COMPOSITION
    Publication number: 20230399284
    Abstract: An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03.
    Type: Application
    Filed: November 2, 2021
    Publication date: December 14, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Tatsuya UTAMURA, Junya NISHIUCHI
  • THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME
    Publication number: 20230399510
    Abstract: A thermoplastic resin including a constituent unit (A) derived from a monomer represented by general formula (1). In general formula (1), R1 and R11 each independently represent a hydrogen atom, an aryl group having 6-12 carbon atoms, or a linear or branched alkyl group having 1-4 carbon atoms, and X represents one of general formulas (a) to (d). In general formulas (a) to (d), R21 to R57 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a linear or branched alkyl group having 1-4 carbon atoms, or a linear or branched alkoxy group having 1-7 carbon atoms.
    Type: Application
    Filed: October 25, 2021
    Publication date: December 14, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Noriyuki KATO, Shinya IKEDA, Atsushi MOTEGI, Tatsunobu OGATA, Yutaro HARADA, Katsushi NISHIMORI, Kentaro ISHIHARA
  • BIOABSORBABLE FIBROUS MEDICAL MATERIAL
    Publication number: 20230398257
    Abstract: An object of the present invention is to provide a bioabsorbable and stretchable fibrous medical material that enables formation of ligation which provides a small and hard-to-unravel knot even with a weak force. The present invention provides a fibrous medical material which is a fibrous material composed of a molded article provided by spinning and drawing a bioabsorbable aliphatic polymer, wherein an elongation at break is 75% or greater, an intermediate elastic modulus in tension at a strain ranging from 0.25% and 10% is lower than an initial elastic modulus in tension at a strain ranging from 0.05% to 0.25%, the intermediate elastic modulus in tension is 400 MPa or less, and a residual strain rate after 100% deformation is 70% or less.
    Type: Application
    Filed: October 25, 2021
    Publication date: December 14, 2023
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., National University Corporation Tokai National Higher Education and Research System
    Inventors: Akira MAEHARA, Hitoshi HIRATA, Atsuhiko MURAYAMA, Yasunobu NAKAGAWA
  • Polyester resin and method for producing polyester resin
    Patent number: 11840603
    Abstract: A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit.
    Type: Grant
    Filed: November 8, 2021
    Date of Patent: December 12, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Katsumi Shinohara, Kazua Sato, Hiroki Ikarashi
  • Urethane resin
    Patent number: 11840598
    Abstract: There is provided a urethane resin that is excellent in adhesive strength, and maintains high adhesive strength even after exposure to high temperature and humidity. A urethane resin obtained by reacting a glycol-modified aromatic hydrocarbon-formaldehyde resin (A) modified with a glycol with a polyisocyanate (B) having two or more free isocyanate groups in a molecule.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: December 12, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Tomohiro Hariu, Yosuke Ota
  • METHOD FOR PRODUCING FLUORENONE
    Publication number: 20230391705
    Abstract: Provided is a method for producing fluorenone comprising an oxidation step of oxidizing fluorene in the presence of an aliphatic carboxylic acid having 2 to 3 carbon atoms, a metal catalyst, a bromine compound, and oxygen, a solvent removal step of removing the aliphatic carboxylic acid, a heating step at 120 to 350° C., and a distillation step in the order indicated.
    Type: Application
    Filed: October 21, 2021
    Publication date: December 7, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroki SUMI, Yuki WATANABE, Hideaki FUJITA, Goh NAKAMURA, Tatsuyuki KUMANO
  • ALICYCLIC ALCOHOL, ALICYCLIC ALCOHOL COMPOSITION, AND PERFUME COMPOSITION
    Publication number: 20230391701
    Abstract: An alicyclic alcohol of Formula (1) and a fragrance composition including the same is described. An alicyclic alcohol composition containing an alicyclic alcohol of Formula (1) and an alicyclic alcohol of Formula (2), is also described, and this composition may also include an alicyclic alcohol of Formula (3). The alicyclic alcohol composition may comprise Formula (1) at a content of 85 mass % to 98 mass %.
    Type: Application
    Filed: October 19, 2021
    Publication date: December 7, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Keisuke TOMAKI, Shinyou SHIRAI
  • TRIARYLMETHANE COMPOUNDS
    Publication number: 20230391704
    Abstract: The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1 , R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH?CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).
    Type: Application
    Filed: August 8, 2023
    Publication date: December 7, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Karl REUTER, Vasyl ANDRUSHKO, Mark KANTOR, Florian STOLZ, Munenori SHIRATAKE, Kentaro ISHIHARA, Koji HIROSE, Shinya IKEDA, Noriyuki KATO, Mitsuteru KONDO, Shoko MURATA, Kensuke OSHIMA
  • Laminate for molding
    Patent number: 11833792
    Abstract: The problem addressed by this invention is to provide a laminate for molding having excellent moldability and post-curing properties of the hard-coat layer, and which can maintain the surface of the hard-coat layer in a satisfactory state while uncured. This problem is solved by a laminate for molding containing a hard-coat layer and a masking film affixed to the surface of the hard-coat layer, having an adhesive surface, which is the hard-coat layer-side surface of the masking film, with a surface free energy of at least 30.0 (mN/m) measured in accordance with the OWRK method, before being affixed. The hard-coat layer is in an uncured state.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: December 5, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasutaka Fukunaga, Fumiaki Kakeya
  • Wound body and method for manufacturing wound body
    Patent number: 11834294
    Abstract: Provided is a wound body of a commingled yarn, the wound body being capable of effectively suppressing fraying and sagging, disorder of a lower layer, or breakage of the commingled yarn during winding or use. Also provided is a method for manufacturing the wound body.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: December 5, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Asami Nakai, Masataka Kaji, Mitsuro Takagi, Toshihiro Motochika, Nobuhiko Matsumoto
  • EPOXY RESIN CURING AGENT, EPOXY RESIN COMPOSITION, AND USE OF AMINE COMPOSITION
    Publication number: 20230383049
    Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A) and a compound (B) represented by the following formula (1), and wherein the content of the component (B) based on 100 parts by mass of the component (A) is from 0.01 to 2.0 parts by mass, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent, wherein R1 represents an alkyl group having 1 to 6 carbon atoms, and p is a number of 1 to 3.
    Type: Application
    Filed: August 19, 2021
    Publication date: November 30, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Kousuke IKEUCHI, Yuma OHNO, Emi OTA, Aoi YOKOO
  • COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME
    Publication number: 20230374191
    Abstract: A composition containing: a compound (a) represented by Formula (1): wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and 1,2,3,5,6-pentathiepane (b).
    Type: Application
    Filed: September 10, 2021
    Publication date: November 23, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke IMAGAWA, Kouhei TAKEMURA, Ryosuke SUGIHARA, Mariko SADO
  • Etchant for selectively etching copper and copper alloy, and method for manufacturing semiconductor substrate using said etchant
    Patent number: 11821092
    Abstract: An etchant capable of selectively etching copper and a copper alloy while suppressing dissolution of nickel, tin, gold, and an alloy thereof. The etchant contains: (A) 5-10.5% by mass of hydrogen peroxide with respect to the total mass of the etchant; (B) 0.3-6% by mass of nitric acid with respect to the total mass of the etchant; (C) at least one nitrogen-containing 5-membered ring compound selected from triazoles and tetrazoles, which may have at least one substituent selected from a C1-6 alkyl group, an amino group, and a substituted amino group having a substituent selected from a C1-6 alkyl group and a phenyl group; and (D) (d1) one or more pH adjusters selected from an alkali metal hydroxide, ammonia, an amine, and an ammonium salt, (d2) a phosphoric acid compound, or (d3) a combination of (d1) and (d2).
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: November 21, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shun Fukazawa, Tomoko Fujii, Hiroshi Matsunaga
  • Method for producing oxymethylene copolymer resin composition, and oxymethylene copolymer resin composition
    Patent number: 11820857
    Abstract: The present invention provides a method for producing an oxymethylene copolymer resin composition, comprising: adding to an oxymethylene copolymer (A), an Mn micromole of an amine-substituted triazine compound (B) per gram of the oxymethylene copolymer (A), an Mc micromole of a choline hydroxide (C) per gram of the oxymethylene copolymer (A), and 0.05 to 1.1 parts by weight of an antioxidant (D) with respect to 100 parts by weight of the oxymethylene copolymer (A), and melt kneading a mixture of the oxymethylene copolymer (A), amine-substituted triazine compound (B), the choline hydroxide (C), and the antioxidant (D), wherein Mn (?mol/g-POM) and Mc (?mol/g-POM) satisfy: 6.5<(Mn+Mc×8)<25, 0.5<Mn<7.0, and 0.0<Mc.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: November 21, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Mika Nakashima, Daisuke Sunaga
  • Material for built-up edge formation and built-up edge formation method
    Patent number: 11819930
    Abstract: The present invention provides a material for built up edge formation having a resin block containing a high molecular weight compound having a weight average molecular weight of 5×104 or higher and 1×106 or lower, a medium molecular weight compound having a weight average molecular weight of 1×103 or higher and lower than 5×104, and a carbon.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 21, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yousuke Matsuyama, Shigeru Horie
  • COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD
    Publication number: 20230365893
    Abstract: A cleaning composition for semiconductor substrates. The cleaning composition comprises hydrogen peroxide, a hydrogen peroxide stabilizing agent, an alkaline compound, and water. The hydrogen peroxide stabilizing agent is oxalic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, potassium oxalate, 5-phenyl-1H-tetrazole, triethylenetetraminehexaacetic acid, trans-1,2-cyclohexanediaminetetraacetic acid, 8-quinolinol, L(+)-isoleucine, DL-valine, L(-)-proline, hydroxyethylethylenediaminetriacetic acid, N,N-di(2-hydroxyethyl)glycine, glycine, L-tryptophan, 2,6-pyridinedicarboxylic acid, benzothiazole, or DL-alanine. The alkaline compound is a quaternary ammonium hydroxide or potassium hydroxide.
    Type: Application
    Filed: September 22, 2021
    Publication date: November 16, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroaki HORIE, Akinobu HORITA, Makoto HAMANAKA, Kenji SHIMADA, Takahiro KIKUNAGA