Patents Assigned to Mitsubishi Materials Corporation
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Patent number: 5573591Abstract: A monocrystal pulling apparatus according to the Czochralski technique, provided with a flow controller which guides a carrier gas supplied from the top of a pulling cheer to the surface of a melt of a material forming the monocrystal and exhausts the silicon oxide vaporizing from the surface of the melt to the outside of the pulling chamber and which surrounds the pulled monocrystal near the surface of the melt and is provided partially inside a crucible, wherein the flow controller has a tubular portion which has an outer diameter smaller than the inner diameter of the crucible and extends substantially perpendicularly along the direction of downward flow of the carrier gas, a constricted diameter portion which constricts in diameter from the bottom end of the tubular portion and forms a bottom gap with the pulled monocrystal, and an engagement portion which projects out from the top of the tubular portion and forms a top gap at the outer circumference of the tubular portion of the flow controller by supporType: GrantFiled: April 20, 1995Date of Patent: November 12, 1996Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials CorporationInventors: Kazuhiro Ikezawa, Hiroshi Yasuda, Akira Tanikawa, Hiroyuki Kojima, Koji Hosoda, Yoshifumi Kobayashi
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Patent number: 5572116Abstract: A surge detecting element which is connected to surge invading lines and is composed of a gap type discharge tube and a nonlinear resistor both connected in series with each other and one or more of surge absorbing elements each having an impulse discharge starting voltage higher than an impulse discharge starting voltage of the surge detecting element. A light receiving element is provided for the gap type discharge tube in light receiving relationship therewith for detecting a discharge light thereof, a counter circuit for counting a detected signal from the light receiving element is also provided.Type: GrantFiled: November 28, 1994Date of Patent: November 5, 1996Assignee: Mitsubishi Materials CorporationInventors: Koichi Kurasawa, Yoshiyuki Tanaka, Takaaki Itoh
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Patent number: 5559663Abstract: A gap-type surge absorbing element and a varistor are assembled end to end in an insulating tube to form a compact surge absorber. Electrodes on the two devices contact a intermediate element to provide electrical connection therebetween. End electrodes seal the insulating tube and provide external connection to the outboard ends of the two devices, thereby putting them in series. The interior of the insulating tube is filled with an inert gas. Embodiments are described using microgap-type and gap-type surge absorbing elements.Type: GrantFiled: July 27, 1995Date of Patent: September 24, 1996Assignee: Mitsubishi Materials CorporationInventors: Yoshiyuki Tanaka, Masatoshi Abe, Taka-aki Ito
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Patent number: 5545490Abstract: A cutting tool whose surface is coated with a composite hard layer formed by chemical vapor deposition and having excellent wear resistance and chipping resistance. The cutting tool contains a substrate whose surface is coated with a composite hard layer containing an inner layer including one or more layers of titanium carbide, titanium nitride, titanium carbonitride, titanium carboxide, and titanium oxicarbonitride, and an outer layer including at least one alumina layer. The alumina layer contains K-type alumina such that an X-ray intensity ratio I.sub.A /I.sub.B of two specific crystal faces A and B in X-ray diffraction is not smaller than 2, where the A-face and B-face denote faces of K-type alumina defined as those whose interfacial distances are 2.79.ANG. and 2.57.ANG. in ASTM4-0878, and I.sub.A and I.sub.B denote X-ray intensity of the faces A and B in X-ray diffraction.Type: GrantFiled: June 21, 1994Date of Patent: August 13, 1996Assignee: Mitsubishi Materials CorporationInventor: Takatoshi Oshika
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Patent number: 5542651Abstract: A launder for discharging melt from a metallurgical furnace is disclosed which includes a launder body having one end connected to the furnace. The launder body defines a fluid passageway for allowing the melt, flowing from the metallurgical furnace into the one end to flow therethrough in a direction away from the furnace. The launder body includes a threshold portion for determining the melt level in the furnace, above which the melt in the furnace begins to flow into the launder body. The launder body further includes a closing portion constructed to receive a closing material thereon to close the fluid passageway of the launder body. The closing portion is arranged at a position displaced downstream with respect to the threshold portion and has a bottom lower than the threshold portion. Additionally, a metallurgical furnace installation using the above launder is disclosed, in which a pair of the launders are arranged while ensuring space for casting or removing operations of castable.Type: GrantFiled: May 31, 1995Date of Patent: August 6, 1996Assignee: Mitsubishi Materials CorporationInventors: Hisao Kanazumi, Akiyoshi Yamashiro
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Patent number: 5543070Abstract: This invention relates to a magnetic recording powder having a low Curie temperature and a high saturation magnetization (.sigma.s). The magnetic recording powder of this invention is of a composite oxide having a hexagonal ferrite type crystal structure comprises: (a) between 14 and 20 atomic % of at least one of strontium oxide and barium oxide, (b) between 15 and 40 atomic % of chromium oxide, (c) between 2 and 15 atomic % of at least one member of the group consisting of zinc oxide, magnesium oxide and copper oxide, (d) between 2 and 15 atomic % of at least one member of the group consisting of titanium oxide, zirconium oxide and tin oxide, with substantial remainder being iron oxide and unavoidable impurities. Further, the magnetic recording powder of this invention is of a composite oxide having saturation magnetization (.sigma.s) of 15 emu/g or higher, and a Curie temperature (Tc) of 155.degree. C. or lower.Type: GrantFiled: December 1, 1994Date of Patent: August 6, 1996Assignee: Mitsubishi Materials CorporationInventors: Kouichi Ishiyama, Kazunori Igarashi, Norikazu Komada, Takuo Takeshita, Kiyoyuki Ookubo
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Patent number: 5539245Abstract: A silicon wafer having a low concentration of carbon and a silicon wafer having a high concentration of carbon are joined and polished to prescribed thicknesses to form a semiconductor substrate according to the present invention.Type: GrantFiled: May 25, 1994Date of Patent: July 23, 1996Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials Corporation, Mitsubishi Denki Kabushiki KaishaInventors: Makoto Imura, Kenji Kusakabe
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Patent number: 5534843Abstract: An insulating glass layer covers the surface of a thermistor element except at the two end surfaces. The insulating glass layer is partially or fully composed of crystallized glass. A terminal electrode is integrally formed on both end surfaces. The terminal electrodes include a baked-on electrode layer formed from a conductive paste. Layers of nickel and tin or lead/tin are plated onto the baked-on electrode. The insulating glass layer enhances shape-maintainability of the insulating glass layer and the baked-on electrodes, provides a smoother glass surface, resulting in a more aesthetically pleasing thermistor, prevents resistance variance due to plating of the baked-on electrodes and provides a strong anti-breaking strength thermistor. The coefficient of thermal expansion of the glass layer is less than the coefficient of thermal expansion of the thermistor element. This difference in coefficients of thermal expansion tends to help the thermistor element resist stress breakage.Type: GrantFiled: January 28, 1994Date of Patent: July 9, 1996Assignee: Mitsubishi Materials CorporationInventors: Masakiyo Tsunoda, Hiroaki Nakajima, Masami Koshimura
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Patent number: 5531635Abstract: A truing apparatus for a wafer polishing pad is provided which is capable of obtaining a sufficient truing effect while keeping the polishing amount of a polishing pad to a maximum. The truing apparatus includes a truing grinding wheel having an abrasive grain layer having ultra-abrasive grains electrodeposited thereon, a support arm for rotatably supporting the truing grinding wheel by bringing the polishing surface of an electrodeposition abrasive grain layer into abutment with the polishing pad, a grinding wheel rotary motor for rotating the grinding wheel, a self-aligning bearing disposed between a grinding wheel support plate and a grinding wheel rotation shaft, and pure water supply means for supplying pure water from the inside of the truing grinding wheel.Type: GrantFiled: March 20, 1995Date of Patent: July 2, 1996Assignee: Mitsubishi Materials CorporationInventors: Katsumi Mogi, Osamu Endo
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Patent number: 5528952Abstract: A webbed bevel gear in which webs are formed of a minimal size so that the gear can be downsized, while also improving the mechanical strength of the gear. The webbed bevel gear is made so as to be capable of avoiding losses from the webs and so that the strength of the dedendum can be maintained by the webs, while the strength and the wear resistance of the dedendum and the tooth surface is further improved. The webbed bevel gears (2, 2a-2c) are constructed as follows: each of the webs is formed with a concave curved surface defined by the base cone so that it can connect the two adjacent teeth at the dedendum between the teeth at the radial end of the gear, the value obtained by dividing the height (h) of the webs in relation to the module (m) of the gear meets the equation 0.2.ltoreq.h/m.ltoreq.0.6, and the value obtained by dividing the width (w) of the webs along the generating line of the base cone by the width (W) of the gear along the generating line of the base pitch cone meets the equation 0.04.Type: GrantFiled: July 19, 1994Date of Patent: June 25, 1996Assignee: Mitsubishi Materials CorporationInventors: Kenji Takita, Yasuhiro Suzuki, Toshio Kimura
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Patent number: 5529642Abstract: A nickel-based alloy which is excellent not only in anti-corrosion properties but also in workability is disclosed. The alloy contains 15 to 35 weight % of chromium; 6 to 24 weight % of molybdenum; wherein the sum of chromium plus molybdenum is no greater than 43 weight %; 1.1 to 8 weight % of tantalum; and balance nickel and unavoidable impurities. The alloy may optionally include no greater than 0.1 weight % of nitrogen; no greater than 0.3 weight % of magnesium, no greater than 3 weight % of manganese, no greater than 0.3 weight % of silicon, no greater than 0.1 weight % of carbon, no greater than 6 weight % of iron, no greater than 0.1 weight % of zirconium, no greater than 0.01 weight % of calcium, no greater than 1 weight % of niobium, no greater than 4 weight % of tungsten, no greater than 4 weight % of copper, no greater than 0.8 weight % of titanium, no greater than 0.8 weight % of aluminum, no greater than 5 weight % of cobalt, no greater than 0.Type: GrantFiled: September 19, 1994Date of Patent: June 25, 1996Assignee: Mitsubishi Materials CorporationInventors: Katsuo Sugahara, Hideo Kitamura, Saburo Wakita, Koji Toyokura, Yoshio Takizawa, Tsutomu Takahashi
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Patent number: 5529720Abstract: A low resistance conductive pigment containing indium oxide crystal grains each including a partial amount of Sn. The amount of Sn ranges from about 1 to about 15 mol % relative to the total amount of Sn and In in each of the indium oxide crystal grains. The conductive pigment further includes a specified surface acidity and a specified volume resistivity. The conductive pigment exhibits improved visibility and averages a primary particle size of up to 0.2 .mu.m,. This allows for the manufacture of superior transparent conductive films which can be useful, inter alia, as a transparent electrode in liquid crystal displays and heating elements having transparent surfaces. In one embodiment, ITO crystals undergo an oxygen extraction treatment, while in another embodiment, surface acidity, is increased by a surface modification treatment. The methods of forming conductive pigments, conductive film forming compositions and conductive resin forming compositions are also disclosed.Type: GrantFiled: December 28, 1993Date of Patent: June 25, 1996Assignee: Mitsubishi Materials CorporationInventors: Toshiharu Hayashi, Masahiro Sekiguchi, Akira Nishihara
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Patent number: 5526716Abstract: A cutting tool is disclosed which includes a tool body having a mounting portion to be secured to a machine tool and having a plurality of insert receiving recesses formed therein. A plurality of cutting inserts are releasably attached to the insert receiving recesses, respectively. The tool body has a nitrided hard layer formed on a surface thereof. Furthermore, a clamp member used in the tool preferably has an abutment surface to be held in abutting contact with the insert or other parts and a chip-contacting surface with which cutting chips produced during cutting operation are brought into contact. The chip-contacting surface is defined by a nitriding hard layer formed on a precision-cast unglazed surface, and has a surface which is left without finish-working. Furthermore, a method for producing a cutting tool which includes a tapped hole formed therein and having an inner surface defining an unnitrided portion is disclosed. In this method, a plug is first threaded into the tapped hole.Type: GrantFiled: August 5, 1994Date of Patent: June 18, 1996Assignee: Mitsubishi Materials CorporationInventors: Tatsuo Arai, Takayoshi Saito
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Patent number: 5523634Abstract: A stepping motor having a shaft with a magnet fixed coaxially thereon, a pair of bobbins of soft magnetic material fixed along the shaft at opposite ends of the magnets, A-phase and B-phase coils wound around the bobbins, yokes having bottom plate portions fixed to the end portion of each of the bobbins on the magnet side and having short pole teeth facing part of the outer peripheral surface of the magnet, long pole teeth of soft magnetic material having one end releasably connected to an end portion of each of the bobbins on a side opposite to the magnet and an other end facing an outer portion of an outer peripheral surface of the magnet; and pole-tooth supports of non-magnetic material coaxially placed to surround the outer peripheral surface of the magnet with all of the long pole teeth integrally fixed to the pole-tooth support members and the short pole-teeth releasably inserted into the pole-tooth housing section formed in the pole-tooth support members.Type: GrantFiled: July 7, 1994Date of Patent: June 4, 1996Assignee: Mitsubishi Materials CorporationInventors: Minoru Takahashi, Jouji Matsumoto, Makoto Furuichi
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Patent number: 5518810Abstract: An infrared-ray cutoff material having a structure in which tin-doped indium oxide powder (ITO) powder is dispersed in an inorganic or organic matrix. The material can be in the form of a coating on a substrate available by applying a composition comprising ITO powder, a binder (an organic resin and/or a metal alkoxide) and a solvent (an organic solvent, water and/or alcohol) onto the substrate and drying the same. It may also be in the form of a film, a sheet, a fiber or other shape available by forming a composition made by dispersing ITO powder in an organic polymer. The ITO powder should preferably have an x-value of from 0.220 to 0.295 and a y-value of from 0.235 to 0.352 on the xy chromaticity scale, a lattice constant of from 10.110 to 10.160 .ANG., and a minimum cutoff wavelength of up to 1,000 nm. The infrared-ray cutoff material of the present invention is transparent within the visible region and can totally cut off infrared rays of wavelengths ranging from relatively shorter ones.Type: GrantFiled: June 30, 1994Date of Patent: May 21, 1996Assignee: Mitsubishi Materials CorporationInventors: Akira Nishihara, Toshiharu Hayashi, Masahiro Sekiguchi
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Patent number: 5518822Abstract: A TiCN-based cermet cutting insert superior in toughness with improved wear resistance includes a binding phase and at least two hard dispersion phases. One of the hard dispersion phases includes one of a duplex and triplex structure having a core structure containing at least one of titanium carbonitride and a carbonitride solid solution of Ti and one of a V, Cr, Ti, Nb, Zr, W and Mo (hereinafter referred to as a (Ti,M)CN. The other hard dispersion phase includes a single structure wherein the core structure is composed of at least one of (Ti,M)CN or (Ti,M)CN and TiCN.Type: GrantFiled: October 12, 1994Date of Patent: May 21, 1996Assignee: Mitsubishi Materials CorporationInventors: Kiyohiro Teruuchi, Katsuhiko Yano, Niro Odani
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Patent number: 5516381Abstract: A rotating blade or stationary vane of a gas turbine which is made of a nickel alloy containing Cr, Co, Mo, W, Ta, Al, Ti, C, B, Zr, and one or both of Mg and Ca. Additionally, the alloy may contain Hf, Pt, Rh and Re.Type: GrantFiled: January 25, 1995Date of Patent: May 14, 1996Assignees: Mitsubishi Materials Corporation, Mitsubishi Jukogyo Kabushiki KaishaInventors: Hisataka Kawai, Ikuo Okada, Ichiro Tsuji, Koji Takahashi, Kensho Sahira, Akira Mitsuhashi
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Patent number: 5511767Abstract: A copper smelting apparatus for processing of copper concentrates to produce blister copper requiring relatively low capital cost and land area. The apparatus combines batch smelting processing to produce copper matte with continuous processing to produce blister copper, and all the components of the facility are built above ground level. The apparatus includes a batch operated smelting furnace, a transport facility for transporting molten matte, and a continuous converting furnace for continuous production of blister copper by continuously receiving and processing the matte received from the transport facility. A holding container may be provided for temporarily holding the molten matte transported by the transport facility. The matte is delivered by gravity from the transport facility or the holding container to the continuous converting furnace through a first launder.Type: GrantFiled: October 31, 1994Date of Patent: April 30, 1996Assignee: Mitsubishi Materials CorporationInventors: Nobuo Kikumoto, Osamu Iida
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Patent number: 5509761Abstract: A drill includes a substantially cylindrical bit body 10 having an axis O. The bit body 10 has a flange portion 13 which includes a converging portion 13a which reduces its diameter progressively towards the front end of the bit body and a flange 13b which is provided with a rearwardly facing annular surface 13c. The annular end surface is contactable with the front end surface of a drill holding portion of a machine too. Chip discharging flutes 14A,14B, each having an inner surface constituted by first and second inner surface portions 14a,14b and a third inner surface portion 14c arcuately recessed therefrom, are formed in the front end portion of the tip body 10. An inner peripheral cutting insert 16A and an outer peripheral cutting insert 16B are mounted on the ends of the chip-discharging flutes 14A,14B. The cross-sectional area S.sub.A of the first-mentioned chip-discharging flute 14A is determined to be greater than that S.sub.B of the second-mentioned chip-discharging flute 14B.Type: GrantFiled: September 20, 1993Date of Patent: April 23, 1996Assignee: Mitsubishi Materials CorporationInventors: Gunter Grossman, Yoshikazu Iwata
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Patent number: 5507257Abstract: A valve guide member for internal combustion engines is formed of an Fe-based sintered alloy having excellent wear and abrasion resistance, consisting essentially, by weight %, of 1 to 4% C, 1.5 to 6% Cu, 0.1 to 0.8% P, and if required 0.05 to 1% Mo, and the balance of Fe and inevitable impurities, the Fe-based sintered alloy having a structure having a matrix formed mainly of pearlite, in which are dispersed hard Fe--C--P compounds and free graphite, or alternatively hard Fe--C--P compounds, carbides, and free graphite when the alloy contains Mo, the free graphite including 0.5 to 10 area % coarse free graphite having a particle diameter of 70 to 500 .mu.m.Type: GrantFiled: April 20, 1994Date of Patent: April 16, 1996Assignees: Mitsubishi Materials Corporation, Mitsubishi Jidosha Kogyo Kabushiki KaishaInventors: Masaaki Sakai, Takashi Kobayashi, Kazuyuki Hoshino, Ichiro Tanaka, Masashi Sasaki