Patents Assigned to MKS Instruments
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Patent number: 10666206Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.Type: GrantFiled: December 19, 2017Date of Patent: May 26, 2020Assignee: MKS Instruments, Inc.Inventors: David J. Coumou, Ross Reinhardt, Yuriy Elner, Daniel M. Gill
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Patent number: 10649471Abstract: A fluid control system for pulse delivery of a fluid include a flow channel, an isolation valve to initiate and terminate a pulse of fluid from the flow channel, and a pulse mass flow controller (MFC). The MFC includes a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller to control flow of fluid through the control valve and switching of the isolation valve, to control a mass of fluid delivered during the pulse of fluid. Controlling the flow of fluid through the control valve can be based on feedback from the flow sensor during the pulse initiated and terminated by the isolation valve.Type: GrantFiled: February 2, 2018Date of Patent: May 12, 2020Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Gordon Hill
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Publication number: 20200124457Abstract: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.Type: ApplicationFiled: December 23, 2019Publication date: April 23, 2020Applicant: MKS Instruments, Inc.Inventors: David Brian Chamberlain, Vladislav Davidkovich, Scott Benedict, Gordon Hill
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Patent number: 10606285Abstract: A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold.Type: GrantFiled: January 30, 2017Date of Patent: March 31, 2020Assignee: MKS Instruments, Inc.Inventor: Junhua Ding
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Publication number: 20200099199Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.Type: ApplicationFiled: November 13, 2019Publication date: March 26, 2020Applicant: MKS Instruments, Inc.Inventors: Atul Gupta, Colin Sanford, Joshua Lamontagne, Kevin Wenzel
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Patent number: 10600628Abstract: A system for conveying a time-varying voltage signal from a first subsystem to a second subsystem, and for monitoring and controlling the time-varying voltage signal, comprises a transmission line having a first end and a second end, extending from the first end at the first subsystem to the second end at the second subsystem. The transmission line is configured to be un-terminated, and have an electrical length substantially equal to a multiple of one half wavelength of the time-varying voltage signal. The system may further comprise an adaptive control configured to couple the time-varying voltage signal to the first end, and adjust a generator of the time-varying voltage signal based on a sampling of the time-varying voltage signal at the first end, and at least one transformer at the second subsystem electrically coupled to the second end and configured to increase an amplitude of the time-varying voltage signal.Type: GrantFiled: November 15, 2018Date of Patent: March 24, 2020Assignee: MKS Instruments, Inc.Inventor: William Roger Fletcher
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Publication number: 20200071208Abstract: The present application discloses a ozonated water delivery system which includes at least one contacting device in communication with at least one ultrapure water source configured to provide ultrapure water, at least one ultrapure water conduit coupled to the ultrapure water source, at least one solution in communication with the contacting device and the ultrapure water source via the ultrapure water conduit, one or more gas sources containing at least one gas in communication with at least one of the ultrapure water source, the ultrapure water conduit, and the solution conduit, at least one mixed gas conduit in communication with the at gas source and the contacting device and configured to provide at least one mixed gas to the contacting device, and at least one ozonated water output conduit may be in communication with the contacting device.Type: ApplicationFiled: August 27, 2019Publication date: March 5, 2020Applicant: MKS Instruments, Inc.Inventors: Heinrich Johannes Seiwert, Christiane Le Tiec, Ulrich Alfred Brammer
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Patent number: 10557736Abstract: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.Type: GrantFiled: April 28, 2017Date of Patent: February 11, 2020Assignee: MKS Instruments, Inc.Inventors: David Brian Chamberlain, Vladislav Davidkovich, Scott Benedict, Gordon Hill
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Patent number: 10553403Abstract: A plasma source is provided that includes multiple metallic blocks. A toroidal plasma chamber and a transformer are substantially embedded in the metallic blocks. The toroidal plasma chamber includes a gas inlet configured to receive a process gas and a gas outlet configured to expel at least a portion of the process gas from the plasma chamber. The plasma chamber also includes multiple linear channel segments, multiple joints, an inlet joint, and an outlet joint machined into the metallic blocks. Each of the inlet joint, the outlet joint, and the joints connects a pair of the linear channel segments. The linear channel segments, the joints, the inlet joint and the outlet joint in combination form the toroidal plasma chamber. The gas inlet is disposed on the inlet joint. The gas outlet is disposed on the outlet joint. An inner angle of each of the joints is greater than about 90 degrees.Type: GrantFiled: May 8, 2019Date of Patent: February 4, 2020Assignee: MKS Instruments, Inc.Inventors: Paul Michael Meneghini, Shaun Smith
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Patent number: 10547237Abstract: A power conversion system includes a feedback controller circuit connected between the output of a boost converter and a duty cycle control input of the boost converter. The feedback controller circuit comprises: a first summing node which generates an error signal indicative of a difference between a voltage of the output of the boost converter and a reference voltage, a compensator circuit receiving the error signal and applying a gain to the error signal to generate an amplified error signal, and a scaling circuit for scaling the amplified error signal to generate a scaled signal, which is applied to a duty cycle control input of the boost converter to alter the duty cycle and/or pulse frequency of the boost converter. The feedback controller circuit provides a frequency-dependent impedance transformation looking into the boost converter from the source such that instability due to line impedance is reduced.Type: GrantFiled: January 30, 2019Date of Patent: January 28, 2020Assignee: MKS Instruments, Inc.Inventor: Pericles N. Bakalos
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Patent number: 10546724Abstract: A radio frequency power system includes a master RF generator and an auxiliary RF generator, wherein each generator outputs a respective RF signal. The master RF generator also outputs a RF control signal to the auxiliary RF generator, and the RF signal output by the auxiliary RF generator varies in accordance with the RF control signal. The auxiliary RF generator receives sense signals indicative of an electrical characteristic of the respective RF signals output by the master RF generator and the auxiliary RF generator. The auxiliary RF generator determines a phase difference between the RF signals. The sensed electrical characteristics and the phase are used independently or cooperatively to control the phase and amplitude of the RF signal output by the auxiliary RF generator. The auxiliary generator includes an inductive clamp circuit that returns energy reflected energy back from a coupling network to a variable resistive load.Type: GrantFiled: May 9, 2018Date of Patent: January 28, 2020Assignee: MKS Instruments, Inc.Inventors: Aaron T. Radomski, Ky Luu, Larry J. Fisk, II, Ross Reinhardt, Matthew G. Harrington, Amish Rughoonundon, Jesse N. Klein, Aaron M. Burry
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Patent number: 10541122Abstract: Apparatus (e.g., ion source), systems (e.g., residual gas analyzer), and methods provide extended life and improved analytical stability of mass spectrometers in the presence of contamination gases while achieving substantial preferential ionization of sampled gases over internal background gases. One embodiment is an ion source that includes a gas source, nozzle, electron source, and electrodes. The gas source delivers gas via the nozzle to an evacuated ionization volume and is at a higher pressure than that of the evacuated ionization volume. Gas passing through the nozzle freely expands in an ionization region of the ionization volume. The electron source emits electrons through the expanding gas in the ionization region to ionize at least a portion of the expanding gas. The electrodes create electrical fields for ion flow from the ionization region to a mass filter and are located at distances from the nozzle and oriented to limit their exposure to the gas.Type: GrantFiled: June 13, 2017Date of Patent: January 21, 2020Assignee: MKS Instruments, Inc.Inventors: James E. Blessing, Jonathan Leslie, Jonathan Hugh Batey
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Patent number: 10535506Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.Type: GrantFiled: January 12, 2017Date of Patent: January 14, 2020Assignee: MKS Instruments, Inc.Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Patent number: 10536130Abstract: A single input multiple output plasma control system includes a splitter that receives a single input and generates multiple outputs. Each output from the splitter is provided to a load. The splitter includes branch circuits connected between selected splitter outputs. The branch circuits control voltage, current, power, frequency, or phase between each branch to enable controlling a predetermined relationship between the voltage, current, power, impedance, frequency, or phase measured at each load.Type: GrantFiled: August 24, 2018Date of Patent: January 14, 2020Assignee: MKS Instruments, inc.Inventors: David J. Coumou, Dennis M. Brown, Jeongseok Jang, Jin Huh
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Publication number: 20200003650Abstract: A high-temperature pressure sensor includes a pressure sensor device and a heater shell body external to the pressure sensor device for providing heat to the pressure sensor device. A particle-generating insulation material is encapsulated within an encapsulation material to form an encapsulated insulation structure comprising the particle-generating insulation material within the encapsulation material, such that the encapsulation material substantially contains particles generated by the particle-generating insulation material within encapsulated insulation structure. The encapsulated insulation structure is disposed adjacent to an exterior of the heater shell body.Type: ApplicationFiled: June 27, 2018Publication date: January 2, 2020Applicant: MKS Instruments, Inc.Inventors: Orry Shamash, Alan Ludwiszewski, Clinton L. Percy, Boris Mandadzhiev
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Publication number: 20190391547Abstract: A power supply control system includes a power generator for providing a signal to a load. The power generator includes a power controller controlling a power amplifier. The power generator includes an adaptive controller for varying the output signal controlling the power amplifier. The adaptive controller compares an error between a measured output and a predicted output to determine adaptive values applied to the power controller. The power generator also includes a sensor that generates an output signal that is digitized and processed. The sensor signal is mixed with a constant K. The constant K is varied to vary the processing of the sensor output signal. The value K may be commutated based on the phase, frequency, or both phase and frequency, and the bandwidth of K is determined by coupled power in the sensor output signal.Type: ApplicationFiled: March 11, 2019Publication date: December 26, 2019Applicant: MKS Instruments, Inc.Inventors: David J. COUMOU, Yuriy ELNER, Aung TOE, Daniel M. GILL, Eldridge M. MOUNT, IV, Shaun SMITH
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Patent number: 10514712Abstract: Methods, systems, and apparatus for pressure-based flow measurement are provided. A processor receives, from the pressure-based mass flow controller (MFC), an upstream pressure value Pu. The processor computes, for the pressure-based mass flow controller (MFC), a downstream pressure value Pd based on the received upstream pressure value Pu. The processor computes, for the pressure-based mass flow controller (MFC), a flow rate Q based on the received upstream pressure value Pu and the computed downstream pressure value Pd. The processor controls a flow through the pressure-based mass flow controller (MFC) based on the computed flow rate Q. The methods, systems, and apparatus can be used for flow measurement in non-critical or un-choked flow conditions.Type: GrantFiled: August 23, 2016Date of Patent: December 24, 2019Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi
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Publication number: 20190385829Abstract: The present application discloses a device for radical monitoring a plasma source for a remote plasma source used in a processing system and includes at least one gas source, a plasma source body having at least one passage having at least one passage surface, a first thermal sensor receiver may be formed within the plasma source body proximate to the passage surface of the passage, a first thermal sensor positioned within the first thermal sensor receiver configured to measure a first temperature of the passage surface, a second thermal sensor receiver formed within the plasma source body proximate to the passage surface of the passage and configured to measure a second temperature of the passage surface of the passage at a second location.Type: ApplicationFiled: June 12, 2019Publication date: December 19, 2019Applicant: MKS Instruments, Inc.Inventors: Michael Harris, Chiu-Ying Tai, Atul Gupta
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Patent number: 10505348Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.Type: GrantFiled: September 15, 2017Date of Patent: December 10, 2019Assignee: MKS Instruments, Inc.Inventors: Atul Gupta, Colin Sanford, Joshua Lamontagne, Kevin Wenzel
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Patent number: 10503178Abstract: A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold.Type: GrantFiled: January 30, 2017Date of Patent: December 10, 2019Assignee: MKS Instruments, Inc.Inventor: Junhua Ding