Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

Abstract: A pressure sensor may measure gas or liquid pressure. A chamber may have an inlet that receives the gas or liquid. A flexible diaphragm may be within the chamber that has a surface exposed to the gas or liquid after it flows through the inlet. A pressure sensor system may sense changes in the flexible diaphragm caused by changes in the pressure of the gas or liquid. A pressure-insensitive sensor system may sense changes in the flexible diaphragm that are not caused by changes in the pressure of the gas or liquid. The pressure-insensitive sensor system may be insensitive to changes in the flexible diaphragm caused by changes in the pressure of the gas or liquid.

Abstract: A cooled isolation valve includes a valve body, a stationary element coupled to the valve body, and a movable closure element movable with respect to the stationary element between a closed position in which the movable closure element and the stationary element are brought together and an open position. One of the movable closure element and the stationary element includes a sealing element. In the closed position of the movable closure element, the sealing element provides a seal between the movable closure element and the stationary element. A fluid channel is formed in contact with the movable closure element and movable with the movable closure element with respect to the stationary element, such that a fluid in the fluid channel effects heat transfer in the movable closure element. A bellows of the isolation valve can include a metallic substrate with a ceramic coating.

Abstract: A radio frequency power system is provided that includes bias modules, a switch, a matching network, and a control module. The bias modules are configured to generate respectively DC bias voltages. The switch is configured to (i) receive current from the bias modules, and (ii) control flow of the current from the bias modules to generate a radio frequency bias voltage signal. The matching network is configured to (i) receive the radio frequency bias voltage signal, and (ii) based on the radio frequency bias voltage signal, supply at least a portion of a radio frequency output voltage signal to an electrode of a substrate support in a processing chamber. The control module is connected to the switch and configured to control a state of the switch based on the radio frequency output voltage signal to shape a waveform of the radio frequency bias voltage signal.

Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

Abstract: A gauge having a housing formed of a polymer material and one or more electrical feedthrough pins disposed in the housing. The electrical feedthrough pins can be oriented substantially perpendicular to each other and have complex shapes.

Abstract: A cold cathode ionization vacuum gauge includes an extended anode electrode and a cathode electrode surrounding the anode electrode along its length and forming a discharge space between the anode electrode and the cathode electrode. The vacuum gauge further includes an electrically conductive guard ring electrode interposed between the cathode electrode and the anode electrode about a base of the anode electrode to collect leakage electrical current, and a discharge starter device disposed over and electrically connected with the guard ring electrode, the starter device having a plurality of tips directed toward the anode and forming a gap between the tips and the anode.

Abstract: A pressure sensor includes a piezoelectric substrate having a generally planar structure and an anchor location fixing the piezoelectric substrate at the periphery of the planar structure of the piezoelectric substrate. The planar structure of the piezoelectric substrate has a first region having a first characteristic thickness adjacent to the anchor location, and a second region have a second characteristic thickness at a middle region of the substrate. The second characteristic thickness is less than the first characteristic thickness such that the planar structure in the second region is displaced relative to the neutral axis of the planar structure such that while undergoing bending the second region has either mostly compressive or mostly tensile stress.

Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the dedicated controller is configured and arranged to delivery pulses of gas in accordance with anyone of three different types of pulse gas delivery processes: a time based pulse delivery process, a mole based pulse delivery process and a profile based pulse delivery process.

Abstract: A valve assembly is provided that comprises a vacuum valve including a body and an electrically grounded surface on at least a surface of the body and an electrode extending substantially parallel to the electrically grounded surface and adjacent to the vacuum valve. The vacuum valve assembly also includes a barrier dielectric, a least a portion of which is located between the electrode and the electrically grounded surface. The vacuum valve assembly further includes a dielectric barrier discharge structure formed from the electrically grounded surface, the electrode, and the barrier dielectric. The dielectric barrier discharge structure is adapted to generate a plasma on the electrically grounded surface to clean at least a portion of the vacuum valve.

Abstract: A cold cathode ionization gauge includes multiple cathodes providing different spacings between the cathodes and an anode. The multiple cathodes allow for pressure measurements over wider ranges of pressure. A first cathode with a larger spacing may provide current based on Townsend discharge; whereas, a second cathode having a smaller spacing may provide current based on both Townsend discharge at higher pressures and on Paschen's Law discharge at still higher pressures. A feature on the second cathode may support Paschen's Law discharge. Large resistances between the cathodes and a return to power supply enable control of output profiles to extend the pressure ranges with accurate responses and avoid output minima. Pressure measurements may be made based on currents from respective cathodes dependent on the outputs of the cathodes through the wide pressure range of measurement.

Abstract: The present application is directed to a multi-sensor gas sampling detection system and method for detecting and measuring the radicals in a radical gas stream and includes at least one radical gas generator in communication with at least one gas source. The radical gas generator may be configured to generate at least one radical gas stream which may be used within a processing chamber. As such, the processing chamber is in fluid communication with the radical gas generator. At least one analysis circuit in fluid communication with the radical gas generator may be used in the detection and measurement system. The analysis may be configured to receive a defined volume and/or flow rate of the radical gas stream. In one embodiment, the analysis circuit may be configured to react at least one reagent with radicals within the defined volume of the radical gas stream thereby forming at least one chemical species within at least one compound stream.

Abstract: An RF generator in a dual frequency RF generation system. The RF generator detects IMD components resulting from interaction of the two frequencies. The IMD is reduced by adjusting the phase of the RF signal output by the RF generator. In various configurations, the IMD may also be reduced by applying a power adjustment value.

Abstract: An RF generator in a dual frequency RF generation system. The RF generator detects IMD components resulting from interaction of the two frequencies. The IMD is reduced by adjusting the phase of the RF signal output by the RF generator. In various configurations, the IMD may also be reduced by applying a power adjustment value.

Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.

Abstract: Presented herein are systems and methods for quantifying trace and/or ultra-trace levels of a species—for example, H2S or H2O—in a natural gas line. The systems and methods employ a tunable laser, such as a tunable diode laser, vertical-cavity surface-emitting laser (VCSEL), external cavity diode laser or a vertical external-cavity surface-emitting laser (VECSEL) or a tunable quantum cascade laser (QCL). The laser produces an output beam over a set of one or more relatively narrow, high resolution wavelength bands at a scan rate from about 0.1 Hz to about 1000 Hz. A natural gas sample comprising a trace level of a species of interest passes through a flow cell into which the output beam from the laser is guided. An optical detector receives light from the flow cell, producing a signal indicative of the absorption attenuation from which the concentration of the trace species is determined.

Abstract: An eVC including coarse and fine tuning networks. The coarse tuning network includes a circuit: receiving a RF input signal from a RF generator; outputting a RF output signal to a reference terminal or load; and receiving a DC bias voltage. The circuit is switched between first and second states. A capacitance of the circuit is based on the DC bias voltage while in the first state and is not based on the DC bias voltage while in the second state. The fine tuning network is connected in parallel with the coarse tuning network and includes a varactor. The varactor includes: a first diode receiving the RF input signal; and a second diode connected in a back-to-back configuration with the first diode and outputting a RF output signal to the reference terminal or load. A capacitance of the varactor is based on a second received DC bias voltage.

Abstract: A repeating setpoint generator module selectively varies a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals. A closed-loop module, during a first one of the time intervals, generates N closed-loop values based on N differences between (i) N values of the setpoint at N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively. An adjusting module, during the first one of the time intervals, generates N adjustment values based on N differences between (i) N values of the setpoint at the N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively.

Abstract: Devices and corresponding methods can be provided to test an ionization gauge, such as a hot cathode ionization gauge, for leakage currents and to respond to the leakage currents to improve pressure measurement accuracy. Responding to the leakage current can include applying a correction to a pressure measurement signal generated by the gauge based on the leakage current. Responding to the leakage current can also include removing contamination causing the leakage current, where the contamination is on electrical feedthrough insulators or other gauge surfaces. Testing and correcting for leakage currents and removing contamination can be completed with the ionization pressure gauge in situ in its environment of use, and while the gauge remains under vacuum.

Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode.