Patents Assigned to Mykrolis Corporation
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Patent number: 6964693Abstract: A method for forming dendritic metal powders, comprising the steps of: (1) heating a powder comprising non-dendritic particles, under conditions suitable for initial stage sintering, to form a lightly sintered material; and (2) breaking the lightly sintered material to form a powder comprising dendritic particles. In one embodiment, the lightly sintered material is broken by brushing the material through a screen. Another aspect of the present invention comprises the dendritic particles that are produced by the method described above. These particles can comprise any suitable metal, such as transition metals, rare earth metals, main group metals or metalloids or an alloy of two or more such metals. The particles can also comprise a ceramic material, such as a metal oxide. These particles are characterized by a dendritic, highly anisotropic, morphology arising from the fusion of substantially non-dendritic particles, and by a low apparent density relative to the substantially non-dendritic starting material.Type: GrantFiled: March 31, 2003Date of Patent: November 15, 2005Assignee: Mykrolis CorporationInventors: Robert S. Zeller, Christopher J. Vroman
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Patent number: 6964187Abstract: An apparatus and method for measuring the vapor or gas content of a vacuum chamber (1) by a vapor sensor (21) located in the fore-line of a vacuum system is provide. The gas or vapor content is determined by first providing a zero condition for the sensor using the vacuum pump (25) and them referencing the sensor response to the chamber gas during the evacuation cycle.Type: GrantFiled: January 31, 2002Date of Patent: November 15, 2005Assignee: Mykrolis CorporationInventor: John E. Pillion
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Publication number: 20050229783Abstract: A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.Type: ApplicationFiled: June 8, 2005Publication date: October 20, 2005Applicant: Mykrolis CorporationInventors: Daniel Alvarez, Jeffrey Spiegelman
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Publication number: 20050229947Abstract: Methods of inserting and removing species from substrates utilizing pressure-vent cycling are revealed in embodiments of the invention. Various embodiments introduce a fluid to a vessel containing the substrate while setting pressure at an elevated level. The pressure is maintained at the elevated level for a predetermined period of time, the lowered by removing fluid from the vessel. The steps of introducing fluid, maintaining pressure, and lowering pressure are repeated at least once. Embodiments of the invention may allow a species to be removed from the voids of a substrate, or allow a new species to be inserted into the voids. Particular embodiments also have special application to preconditioning, activating, and/or regenerating gas purification substrates, or removing and/or delivering species with respect to semiconductor substrates. Embodiments of the invention allow faster transport of species to and from substrates with less use of purging or filling fluids.Type: ApplicationFiled: January 13, 2005Publication date: October 20, 2005Applicant: Mykrolis CorporationInventors: Jeffrey Spiegelman, Daniel Alvarez, Joshua Cook
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Publication number: 20050205114Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.Type: ApplicationFiled: April 25, 2005Publication date: September 22, 2005Applicant: Mykrolis CorporationInventors: Daniel Alvarez, Jeffrey Spiegelman
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Patent number: 6942779Abstract: The present invention provides a system and method for selectively removing one or more organic and inorganic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass. Residual organics, if desired and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment. Inorganic contaminants are removed from the electroplating bath by selective ion exchange resins or electrodialysis, while particulate and suspended colloidal particles are removed by filtration before the treated plating bath is recycled.Type: GrantFiled: May 2, 2002Date of Patent: September 13, 2005Assignee: Mykrolis CorporationInventors: Brett Matthew Belongia, Zhen Wu Lin, John E. Pillion, Jieh-Hwa Shyu
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Publication number: 20050173003Abstract: Apparatus and a control system for monitoring (preferably digitally) and/or controlling pressure to a pneumatic load such as a proportional fluid control valve and using a measurement input from a fluid measuremenc device that responds to a flow rate, the liquid measurement input being used to control the pressure to the pneumatic load so that pneumatic load may be increased or decreased (to proportionally open or close the pneumatic valve) to change the flow rate of the fluid to a desired rate. The pneumatic load can also be adjusted (to proportionally open or close the pneumatic valve) to accommodate changes in temperature and viscosity of a fluid.Type: ApplicationFiled: July 18, 2003Publication date: August 11, 2005Applicant: MYKROLIS CORPORATIONInventors: Marc Laverdiere, Robert McLoughlin, George Gonnella, Iraj Gashgaee, Jennifer Marrs
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Patent number: 6921482Abstract: Hollow fiber membranes having a skinned surface on one diameter, and a porous surface on the opposite diameter arm produced from perfluorinated thermoplastic polymers by extruding a heated solution of the polymer having a lower critical solution temperature directly into a cooling bath to form the porous membrane by liquid-liquid phase separation. Extrusion can be conducted either vertically or horizontally. The hollow fiber membranes are useful as ultrafiltration membranes and as membrane contactors.Type: GrantFiled: January 27, 2000Date of Patent: July 26, 2005Assignee: Mykrolis CorporationInventors: Kwok-Shun Cheng, T. Dean Gates, Larry Y. Yen, Rajnikant B. Patel
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Publication number: 20050145577Abstract: The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.Type: ApplicationFiled: December 21, 2004Publication date: July 7, 2005Applicant: Mykrolis CorporationInventors: Marc Laverdiere, Michael Clarke
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Patent number: 6913654Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.Type: GrantFiled: October 10, 2003Date of Patent: July 5, 2005Assignee: Mykrolis CorporationInventors: Daniel Alvarez, Jr., Jeffrey J. Spiegelman
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Patent number: 6910381Abstract: Systems and methods for digitally controlling sensors. In one embodiment, a digital controller for a capacitance diaphragm gauge is embedded in a digital signal processor (DSP). The controller receives digitized input from a sensor AFE via a variable gain module, a zero offset module and an analog-to-digital converter. The controller automatically calibrates the received input by adjusting the variable gain and zero offset modules. The controller also monitors and adjusts a heater assembly to maintain an appropriate temperature at the sensor. The controller utilizes a kernel module that allocates processing resources to the various tasks of a gauge controller module. The kernel module repetitively executes iterations of a loop, wherein in each iteration, all of a set of high priority tasks are performed and one of a set of lower priority tasks are performed. The controller module thereby provides sensor measurement output at precisely periodic intervals, while performing ancillary functions as well.Type: GrantFiled: May 31, 2002Date of Patent: June 28, 2005Assignee: Mykrolis CorporationInventors: David M. Albert, Edwin K. Arrant, Marvin B. Edwards
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Publication number: 20050133435Abstract: A connector apparatus is provided which is configured to replace a separation module in a system for dispensing a fluid.Type: ApplicationFiled: February 10, 2005Publication date: June 23, 2005Applicant: Mykrolis CorporationInventors: Jeffrey Campbell, J. Niermeyer
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Publication number: 20050126985Abstract: A connector apparatus is provided which is configured to replace a separation module in a system for dispensing a fluid. When it is desired to purge the system of a dispensed fluid, the connector apparatus, having the same configuration of an inlet and an outlet as the separation module, replaces the separation module and a purging fluid is passed through the system.Type: ApplicationFiled: January 28, 2005Publication date: June 16, 2005Applicant: Mykrolis CorporationInventors: Jeffrey Campbell, J. Niermeyer, Gaston Reyes, Christopher Wargo, Richard Miller, Stephen Guerrera
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Patent number: 6869463Abstract: A method is described for rapid and economical activation and/or preconditioning of gas purification substrates by providing forced convection of the preconditioning or activating gas through the pores of the substrate. The gas is pumped into the substrate-containing vessel and raised to an elevated pressure, which is maintained for a short predetermined time, followed by venting of contents of the vessel. The vessel is again pressurized with the purging gas to an elevated level, and the elevated pressure is maintained for a short predetermined time, followed by venting of the vessel. This cycle is repeated as often as needed or desired. Activation and/or preconditioning can be accomplished in a much shorter time and with much less gas usage compared to diffusion preconditioning and activation processes. This process is particularly suited for preconditioning and activation of gas purifier substrates for decontamination of gases down to ?1 ppm contaminants.Type: GrantFiled: October 23, 2003Date of Patent: March 22, 2005Assignee: Mykrolis CorporationInventors: Jeffrey J. Spiegelman, Daniel Alvarez, Jr., Joshua T. Cook
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Publication number: 20050051739Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.Type: ApplicationFiled: July 20, 2004Publication date: March 10, 2005Applicants: ASML NETHERLANDS B.V., MYKROLIS CORPORATIONInventors: Antonius Van Der Net, Jeffrey Spiegelman, Erik Johannus Van Bragt
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Patent number: 6865520Abstract: Embodiments of the present invention provide a method for filtering an indicated flow. One embodiment of the present invention can include the steps of (i) determining if the indicated flow is within an allowable deviation of a baseline, (ii) if the indicated flow is within the allowable deviation, outputting the indicated flow as the filtered indicated flow, and (iii) if the indicated flow is not within the allowable deviation, outputting a value that is within the predefined range as the filtered indicated flow. This embodiment of the present invention can also include determining if the indicated flow exceeds a buffer. If the indicated flow does not exceed the buffer, one embodiment of the present invention can continue to output the value that is within the allowable deviation.Type: GrantFiled: April 26, 2002Date of Patent: March 8, 2005Assignee: Mykrolis CorporationInventor: Faisal Tariq
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Patent number: 6846392Abstract: A plating tool cell anode for venting unwanted gases from a fluid plating solution. In a first embodiment, the solution is introduced into a chamber, defined by the plating tool cell (10), by fluid inlet (12) and contacts the anode (50). The fluid encounters a hydrophobic membrane (14) and a hydrophilic membrane (15) spaced from the hydrophobic membrane. A driving force, such as a vacuum, is applied to the gap (16) between the membranes to remove unwanted gases therein. In a second embodiment, a single membrane is used that is both hydrophobic and hydrophilic. Preferably, the hydrophobic portion of the membrane is located at or near the perimeter of the chamber and gas to be vented is directed toward the hydrophobic portion(s).Type: GrantFiled: May 31, 2000Date of Patent: January 25, 2005Assignee: Mykrolis CorporationInventor: David W. Stockbower
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Patent number: 6846409Abstract: The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process.Type: GrantFiled: September 13, 2001Date of Patent: January 25, 2005Assignee: Mykrolis CorporationInventors: Marc Laverdiere, Michael Clarke
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Patent number: 6837111Abstract: A variable capacitance measuring device can comprise a glass-ceramic insulator having a coefficient of thermal expansion that closely matches the coefficient of thermal expansion of a metallic materials used within the device. The glass-ceramic material may chemically bond to the surfaces of the metallic materials to provide a hermetic seal and eliminate the need for a separate glass seal or grooves within the electrode assembly. Additionally, a single-piece electrode assembly can be used instead of a separate electrode assembly (for the electrical feedthrough) and electrode. A shim may be used during the formation of the insulating material to reduce the likelihood of the insulator adhering to surfaces of the electrode portion during the manufacturing process. Also, separate bake-out and getter activation cycles may be combined into a single heat cycle.Type: GrantFiled: August 27, 2002Date of Patent: January 4, 2005Assignee: Mykrolis CorporationInventor: Hai Mei
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Patent number: 6832626Abstract: A check valve construction is provided which includes a housing having a first flow path and a second flow path. Liquid flow is controlled within the first and second flow path by movable plungers (22, 24) having a sealing surface and a plurality of prongs that control the length of movement of the plunger within the housing. One of the plungers permits liquid flow while the other of the plungers prevents liquid flow in response to pressure change within the flow paths.Type: GrantFiled: February 5, 2003Date of Patent: December 21, 2004Assignee: Mykrolis CorporationInventor: Iraj Gashgaee