Abstract: In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).

Abstract: A manufacturing method of the liquid crystal display panel and a liquid crystal dripping device for the liquid crystal dripping and panel pasting method, by which residual moisture, gas constituents, and foreign substances mixed in the liquid crystal can be removed assuredly, and an occurrence of display fault can be suppressed, and can also improve display quality and a yield of the liquid crystal display panel, is provided. In this manufacturing method, prior to drip the liquid crystal on the substrate, pre-treatments, which combines suitably vacuum treatment which removes residual moisture and gas constituents from the liquid crystal maintaining the liquid crystal in a reduced pressure environment, filtration treatment which removes foreign substances from the liquid crystal, and heat treatment which heats the liquid crystal as required for carrying out distributed removal of the organic substances, are performed.

Abstract: A channel-etch thin film transistor having a source electrode including a source electrode primary portion and a source electrode lead portion and a drain electrode including a drain electrode primary portion and a drain electrode lead portion. At least one of the source electrode lead portion and the drain electrode lead portion has a side-contact portion in contact directly with a side wall of the active layer. An averaged width of the side-contact portion is narrower than an averaged width of corresponding one of the source electrode primary portion and the drain electrode primary portion.

Abstract: An active matrix substrate comprises a matrix array of TFTs. A double-layered film includes an under-layer of aluminum-neodymium (Al—Nd) alloy and an over-layer of high melting point metal. The double-layered film forms first interconnection lines for connection to the TFTs. A triple-layered film includes an under-layer of said high melting point metal, a middle-layer of said Al—Nd alloy and an over-layer of the high melting point metal. The triple-layered film forms second interconnection lines for connection to the TFTs.

Abstract: A process for forming a pattern contains steps of: forming a first mask pattern on a film to be etched on a substrate; forming a first pattern of the film to be etched by using the first mask pattern as a mask; forming a second mask pattern having a plane shape different from that of the first mask pattern by deforming the first mask pattern; and forming a second pattern of the film to be etched different from the first pattern by using the second mask pattern. By applying the process for forming a pattern, for example, to the formation of a semiconductor layer and source and drain electrodes of a TFT substrate of a liquid crystal display apparatus, the above-stated formation requiring two photoresist process steps in a conventional manufacturing method of a liquid crystal display apparatus can be carried out by only one process step, thereby reducing manufacturing cost thereof.

Abstract: The LCD device includes a liquid crystal panel, a backlight unit, a circuit board disposed at rear side of the backlight unit, and a number of flexible substrates each mounting thereon a driver chip and connecting the terminals of the liquid crystal panel and the circuit board. The flexible substrate has a cut-out at each side edge thereof. A protrusion formed on the backlight unit or inner housing passes the cut-out to protrude toward the housing of the LCD device.

Abstract: In an active matrix liquid crystal display device, a drain and source of a TFT element for controlling power supply to a pixel electrode, are arranged so that an alignment direction of liquid crystal molecules over the source and drain does not change, thereby preventing formation of ghost images in the display. In one embodiment, an electric field generated between the source and drain is parallel to an initial non-zero alignment angle of the molecules.

Abstract: In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

Abstract: A liquid crystal display (LCD) panel unit is provided with a plurality of source drivers which are functionally divided into first and second source driver groups respectively assigned to first and second halves of an LCD panel. In order to properly drive the LCD panel irrespective of incoming pixel data of different formats, a pixel data rearrangement circuit is provided for rearranging the incoming pixel data to a predetermined data format. The data rearrangement circuit precedes the first and second source driver groups, and functions such as to receive 2N-path (N is a natural number) pixel data and rearranges the orders of the 2N-path pixel data according to the predetermined data format, and applies the rearranged N-path pixel data to the first source driver group and applying the rearranged other N-path pixel data to the second source driver group.

Abstract: A method of deforming a pattern comprising the steps of: forming, over a substrate, a layered-structure with an upper surface including at least one selected region and at least a re-flow stopper groove, wherein the re-flow stopper groove extends outside the selected region and separate from the selected region; selectively forming at least one pattern on the selected region; and causing a re-flow of the pattern, wherein a part of an outwardly re-flowed pattern is flowed into the re-flow stopper groove, and then an outward re-flow of the pattern is restricted by the re-flow stopper groove extending outside of the pattern, thereby to form a deformed pattern with at least an outside edge part defined by an outside edge of the re-flow stopper groove.

Abstract: A liquid crystal display device includes a liquid crystal display panel obtained by adhering upper and lower polarizing plates to upper and lower surfaces, respectively, of an electrode substrate. The upper polarizing plate has a first roughened surface on its outer surface. The first roughened surface is formed for the purpose of antiglare. The lower polarizing plate has a second roughened surface on its outer surface. The second roughened surface is formed to have a surface roughness equivalent to or less than that of the first roughened surface. As a result, a moiré fringe is decreased.

Abstract: At least one out of two substrates constituting a liquid crystal display device is formed from a plastic substrate. When attaching the plastic substrate to an opposing substrate that is disposed to face the plastic substrate, the plastic substrate and the support substrate are attached to each other without interposing an adhesive therebetween. That is, the plastic substrate is pressed against and attached to the support substrate under vacuum conditions. This prevents air from entering between the plastic substrate and the support substrate. Accordingly, the plastic substrate is able to maintain its flatness and therefore, the two substrates are spaced a uniform distance apart from each other, i.e., fabricated to maintain a constant cell gap therebetween as desired even after the plastic substrate and the opposing substrate are attached to each other via the sealing material.

Abstract: An anisotropic reflection electrode has an undulated shape and whose normal direction is distributed unevenly to a specific azimuth angle and whose reflection light intensity depends on said azimuth angle. Openings are formed in that area of the reflection electrode which has a tilt angle of 0 degree to 2 degrees and/or a tilt angle of 10 degrees or higher. In one aspect, the retardation of a liquid crystal layer is changed by making the liquid crystal molecular alignment mode different between the openings and the reflection electrode, so that the intensity of output light is increased in reflection mode as well as in transmission mode. The balance of colors displayed in transmission mode is determined by determining the area of the openings in pixels of each color, and the color temperature is set higher in transmission mode than in reflection mode. This provides a semi-transmission type liquid crystal display which has an excellent visibility in reflection mode as well as in transmission mode.

Abstract: In a semi-transmissive liquid crystal display device, the thickness of liquid crystal layer in the reflective region can be adjusted by controlling the film thickness of the organic insulating film for reflection and the film thickness of the color layer for reflection. Furthermore, the thickness of liquid crystal layer in the transmissive region can be adjusted by controlling the film thickness of the organic insulating film for transmission and the film thickness of the color layer for transmission. Since the thicknesses of liquid crystal layer in the reflective region and that in the transmissive region can be adjusted, the reflectance in the reflective region and the transmittance in the transmissive region can each be set at the most appropriate values.

Abstract: In a semi-transmissive liquid crystal display device, the thickness of liquid crystal layer in the reflective region can be adjusted by controlling the film thickness of the organic insulating film for reflection and the film thickness of the color layer for reflection. Furthermore, the thickness of liquid crystal layer in the transmissive region can be adjusted by controlling the film thickness of the organic insulating film for transmission and the film thickness of the color layer for transmission. Since the thicknesses of liquid crystal layer in the reflective region and that in the transmissive region can be adjusted, the reflectance in the reflective region and the transmittance in the transmissive region can each be set at the most appropriate values.

Abstract: After a polysilicon semiconductor film 5 and a first gate oxide film 6 are formed on a transparent insulating substrate 1, the semiconductor film 5 and the first gate oxide film 6 are patterned into an island shape to form an island part. At this time, an overhang part 8 of a visor shape is formed where side end surfaces of the first gate oxide film 6 and the semiconductor film 5 are not aligned and an end part of the first gate oxide film 6 projects slightly from a position of a side end surface of the semiconductor film 5. The overhang part 8 is removed, for example, during cleaning, which thus enhances yield.

Abstract: The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.

Abstract: In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

Abstract: In a provided LCD device, a common electrode and a picture element electrode which make up the main portion of a unit picture element of the LCD device are both made up of one thin conductive layer made of a Cr layer, while a common electrode wiring line and a data line or a like which are connected to the common electrode and the picture element electrode respectively are each formed as a stacked film made up of a first conductive film (thick Cr layer) and a second conductive film (thin Cr layer). This configuration enables increasing the film thickness of wiring lines such as, especially, the common electrode wiring line and the data line or the like, thus decreasing a wiring line resistance thereof.

Abstract: Alignment marks are formed when source and drain electrodes of a TFT are formed and thereon a thick red filter is formed. So that, the following respective color layers can be made thin on the red filter. Also, the exposure alignment laser permeates in an exposure step, and thereby the alignment marks can be accurately detected.