Patents Assigned to New Wave Research
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Publication number: 20030226830Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.Type: ApplicationFiled: February 11, 2003Publication date: December 11, 2003Applicant: New Wave ResearchInventors: Kuo-Ching Liu, Pei Hsien Fang, Dan Dere, Jenn Liu, Jih-Chuang Huang, Antonio Lucero, Scott Pinkham, Steven Oltrogge, Duane Middlebusher
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Publication number: 20030226832Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.Type: ApplicationFiled: March 6, 2003Publication date: December 11, 2003Applicant: New Wave ResearchInventors: Kuo-Ching Liu, Pei Hsien Fang, Dan Dere, Jenn Liu, Jih-Chuang Huang, Antonio Lucero, Scott Pinkham, Steven Oltrogge, Duane Middlebusher
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Patent number: 6580054Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.Type: GrantFiled: July 30, 2002Date of Patent: June 17, 2003Assignee: New Wave ResearchInventors: Kuo-Ching Liu, Pei Hsien Fang, Dan Dere, Jenn Liu, Jih-Chuang Huang, Antonio Lucero, Scott Pinkham, Steven Oltrogge, Duane Middlebusher
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Patent number: 6573702Abstract: A method and device for cleaning an electrical contact. Semiconductor testing device. Process of manufacturing integrated circuits. The electrical contact is used for contacting an integrated circuit and accumulates debris during use. The method comprises directing electromagnetic radiation at the contact. The electromagnetic energy reacts with at least one of the contact and the debris so as to cause at least a portion of the debris on the contact to be removed. The electromagnetic radiation may comprise coherent radiation, such as electromagnetic radiation generated using a laser. The portion of the debris may comprise organic debris, aluminum oxide, polyimide, or other debris. According to one aspect of the invention, the contact comprises a conductive material and the electromagnetic radiation causes removal of the portion of the debris substantially without removal of the conductive material.Type: GrantFiled: September 12, 1997Date of Patent: June 3, 2003Assignee: New Wave ResearchInventors: Arno G. Marcuse, Robert A. Most, Edward S. North
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Patent number: 5963364Abstract: A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers).Type: GrantFiled: October 14, 1997Date of Patent: October 5, 1999Assignee: New Wave ResearchInventors: Tony P. Leong, Edward S. North, Richard Linsley Herbst
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Patent number: 5811751Abstract: A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers).Type: GrantFiled: January 24, 1997Date of Patent: September 22, 1998Assignee: New Wave ResearchInventors: Tony P. Leong, Edward S. North, Richard Linsley Herbst
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Patent number: 5703713Abstract: A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers).Type: GrantFiled: May 31, 1995Date of Patent: December 30, 1997Assignee: New Wave ResearchInventors: Tony P. Leong, Edward S. North, Richard Linsley Herbst
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Patent number: 5611946Abstract: A probe station which comprises a base machine, a chuck mounted on the base machine to hold a device under test (DUT), a probe platen mounted on the base machine on which to mount probes for the device, a microscope mounted on the base machine having a field of view on the DUT on the chuck, and a single laser, mounted with the microscope. The single laser supplies an output beam in a plurality of wavelengths through the microscope optics on a beam line to the field of view of the microscope. The laser system includes a solid state laser, a harmonic generator coupled with the solid state laser, and switchable optics for selecting the wavelength of the output beam from among two or more selectable wavelengths. In addition, the laser system includes a variable attenuator, based on a unique half-wave plate, which operates for the plurality of wavelengths which are selectable as outputs in the infrared (1064 nanometers), in the green (532 nanometers), and in the ultraviolet (355 nanometers, or 266 nanometers).Type: GrantFiled: February 18, 1994Date of Patent: March 18, 1997Assignee: New Wave ResearchInventors: Tony P. Leong, Edward S. North, Richard L. Herbst