Abstract: Methods and apparatus for reducing vibrations in an extreme ultraviolet (EUV) lithography system associated with the cooling of minors are described. According to one aspect of the present invention, an apparatus includes a first assembly, a structure, a vibration isolator, and a hose arrangement. The first assembly includes a heat exchanger and a mirror assembly. The structure is subject to vibrations, and the vibration isolator is arranged to attenuate the vibrations when the vibrations are transmitted through the hose arrangement. The hose arrangement being coupled between the heat exchanger and the structure, and the vibration isolator is coupled to the hose arrangement.

Abstract: A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member.