Patents Assigned to Nikon Corporation
  • Patent number: 7075651
    Abstract: When actual measurement data of a wavefront aberration of a projection optical system is input, a main controller calculates a targeted image forming characteristic of the projection optical system based on the data and a Zernike sensitivity table of the image forming characteristic that is made prior to the input. By using the Zernike sensitivity table, the targeted image forming characteristic can be calculated with only one measurement of wavefront aberration. Moreover, parameters that denote a relation between an adjustment of an adjustable specific optical element and a change in the image forming characteristics of the projection optical system is obtained in advance, and are stored in advance in a storage unit.
    Type: Grant
    Filed: June 30, 2003
    Date of Patent: July 11, 2006
    Assignee: Nikon Corporation
    Inventor: Toshio Tsukakoshi
  • Patent number: 7075734
    Abstract: A zoom lens system having an exit pupil far away from the image plane, zoom ratio of about three, and in particular having compactness and high optical performance includes, in order from an object, a first lens group having negative refractive power, an aperture stop, a second lens group having positive refractive power, and a third lens group having positive refractive power. When zooming from a wide-angle end state to a telephoto end state, the first and second lens groups are moved and the third lens group is fixed such that a distance between the first lens group and the second lens group varies, and a distance between the second lens group and the third lens group increases. The second lens group is composed of four lenses or less and includes a diffractive optical surface formed on a lens surface except the most object side lens surface.
    Type: Grant
    Filed: May 13, 2005
    Date of Patent: July 11, 2006
    Assignee: Nikon Corporation
    Inventor: Kenzaburo Suzuki
  • Publication number: 20060146306
    Abstract: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.
    Type: Application
    Filed: March 3, 2006
    Publication date: July 6, 2006
    Applicant: NIKON CORPORATION
    Inventors: Hiroyuki Nagasaka, Soichi Owa, Yasufumi Nishii
  • Publication number: 20060146178
    Abstract: An image-capturing system diagnostic device includes: an image acquisition unit that obtains an image; and a monitoring unit that monitors a quantity of foreign matter present in an optical path by generating defect information indicating a defect at pixels caused by the foreign matter in the optical path based upon the image obtained by the image acquisition unit and calculating an areal ratio of defective pixels in the image based upon the defect information having been generated and issues a warning for a photographer if the areal ratio of the defective pixels exceeds a predetermined value.
    Type: Application
    Filed: February 27, 2006
    Publication date: July 6, 2006
    Applicant: NIKON CORPORATION
    Inventor: Kenichi Ishiga
  • Publication number: 20060146305
    Abstract: An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the supply of the liquid when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.
    Type: Application
    Filed: March 3, 2006
    Publication date: July 6, 2006
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Publication number: 20060146312
    Abstract: A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.
    Type: Application
    Filed: February 23, 2006
    Publication date: July 6, 2006
    Applicant: NIKON CORPORATION
    Inventors: Tsuneyuki Hagiwara, Hiromitsu Yoshimoto, Hiroto Horikawa, Hideo Mizutani
  • Patent number: 7070888
    Abstract: A photomask blank substrate is selected for use in a process where at least a masking film or a phase shift film is deposited on a top surface of a photomask blank substrate to form a photomask blank, the deposited film is patterned to form a photomask, and the photomask is mounted in an exposure tool. The substrate is selected by simulating a change in shape in the top surface of the substrate, from prior to film deposition thereon to when the photomask is mounted in the exposure tool; determining the shape of the substrate top surface prior to the change that will impart to the top surface a flat shape when the photomask is mounted in the exposure tool; and selecting, as an acceptable substrate, a substrate having this top surface shape. The selected substrate has an optimized top surface shape that improves productivity in photomask fabrication.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: July 4, 2006
    Assignees: Shin-Etsu Chemical Co., Ltd., Nikon Corporation
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo
  • Patent number: 7070862
    Abstract: This invention provides a resin-cemented optical element comprising a base member and a resin layer formed on the surface of the base member and comprising a cured product of a photosensitive resin composition, and the resin layer has (1) a refractive index of 1.55 or more, (2) a visible-light inner transmittance of 95% or more in a 100 ?m thick area, (3) a rate of hygroscopic dimensional change of 0.4% or less, (4) a durometer hardness of HDD 70 or more, (5) a gel percentage of 95% or more, (6) a glass transition temperature of 95° C. or above or (7) a rate of shrinkage on curing of 7% or less; and a production process for the element and an optical article having the element.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventors: Akiko Miyakawa, Toru Nakamura, Masahito Suzuki
  • Patent number: 7071451
    Abstract: An autofocus system according to the present invention comprises: a light source; a focusing illumination optical system that forms an optical image generated with light from the light source on a target object through an objective lens; a focusing image forming optical system that receives through the objective lens reflected light generated as the optical image is reflected off the target object and forms a reflected image of the optical image; a photoelectric converter that is provided at an image forming position at which the reflected image is formed by the focusing image forming optical system to detect the reflected image; a signal output device that outputs a signal for controlling a focus actuator based upon a signal corresponding to the reflected image obtained at the photoelectric converter; and an image forming position adjustment device that adjusts an offset quantity between a focus position of the objective lens and an image forming position of the optical image by moving at least one of the im
    Type: Grant
    Filed: June 16, 2003
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventors: Aiichi Ishikawa, Toshiaki Nihoshi
  • Patent number: 7072085
    Abstract: A plate part is positioned in front of the eye of the user. An image combiner causes light from an image display element to be superimposed on light that is transmitted through the plate part and conducts this light to the eye. The light from the image display element reaches the eye after being diffracted and reflected by a reflective type HOE inside the plate part. The wavelength at which the diffraction efficiency shows a maximum value when the chief rays that are emitted from the center of the display part of the image display element are diffracted and reflected by the reflective type HOE and the wavelength at which the diffraction efficiency shows a maximum value when the chief rays that are emitted from the peripheral portions of the display part in a specified direction are diffracted and reflected by the reflective type HOE are substantially different.
    Type: Grant
    Filed: January 10, 2005
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventor: Yumiko Ouchi
  • Patent number: 7070282
    Abstract: A projection type display apparatus includes a color separation optical system separating light emitted from a light source into first, second and third color light; reflection type light valves provided each in correspondence to one of the first through third color light; polarization beam splitters provided each in correspondence to one of the first through third color light, which executes polarization separation causing the first through third color light to enter the reflection type light valves, and analyzing light exiting from the reflection type light valves after being modulated; a color composition optical system having a first, a second and a third prism, wherein the analyzed first through third color light undergo color composition; and a projection lens projecting the resulting light from the color composition, and lengths of optical paths wherein each of the first through third color light travels are equal to one another.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventors: Yuji Manabe, Tetsuo Hattori, Atsushi Sekine
  • Patent number: 7072024
    Abstract: A lithographic projection apparatus for successively projecting a pattern on wafers by preliminarily determining locations of surface points of each wafer before it is illuminated in a projection station has a pair of measuring stations arranged oppositely with respect to the projection station at the center. Each measuring station has a wafer surface sensor for determining the locations of surface points of the wafer carried on a stage and a stage height sensor for measuring the height of a reference plane on the stage. A wafer on a stage is placed in one of the measuring stations to have measurements taken and ideal height data are collected while another wafer is being illuminated in the projection station. After these measurement and illumination processes are completed, the illuminated wafer is removed from the projection station and replaced with a new wafer to be measured and illuminated.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventor: W. Thomas Novak
  • Patent number: 7072026
    Abstract: In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: ?I?2L?1.7?0.02 (ns·mJ?2·cm2.3·pulse2) wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm?2·pulse?1) per pulse, and ? is the pulse width (unit: ns).
    Type: Grant
    Filed: August 12, 2005
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventors: Masafumi Mizuguchi, Norio Komine
  • Publication number: 20060139593
    Abstract: An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes; a liquid supply mechanism that supplies the liquid onto the substrate; a liquid recovery mechanism that recovers the liquid having been supplied on the substrate; and wherein when the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery mechanism does not perform the recover of the liquid.
    Type: Application
    Filed: February 17, 2006
    Publication date: June 29, 2006
    Applicant: NIKON CORPORATION
    Inventors: Hiroyuki Nagasaka, Yuuki Ishii, Susumu Makinouchi
  • Publication number: 20060139775
    Abstract: A frame member of an optical element holding device integrally includes an inner ring, an outer ring, six arms, and a lever connected to each arm. Each arm is rotatably connected to the inner ring and the lever. The lever is rotatable with respect to the outer ring. The orientation of the inner ring and the orientation of the optical element are adjusted in according with the displacement of the lever caused by a displacement module.
    Type: Application
    Filed: December 5, 2005
    Publication date: June 29, 2006
    Applicant: Nikon Corporation
    Inventor: Yuichi Shibazaki
  • Publication number: 20060139594
    Abstract: An exposure apparatus exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting the image of a pattern onto the substrate through the projection optical system and the liquid, and includes a liquid removing mechanism that intermittently blows a gas against a reference member, movable mirror, and the like, to which the liquid is adhered in order to remove that liquid.
    Type: Application
    Filed: February 24, 2006
    Publication date: June 29, 2006
    Applicant: NIKON CORPORATION
    Inventors: Hideaki Hara, Hiroaki Takaiwa
  • Publication number: 20060140613
    Abstract: An electronic camera includes an image capturing section, a microphone, a lens driving section, and a focus controlling section. The image capturing section generates image data based on a subject image via an imaging optical system. The microphone records speech outside the camera. The lens driving section includes a motor and a drive mechanism to drive the imaging optical system. The focus controlling section controls the lens driving section according to a focusing state of the subject image and makes different at least one of a continuous driving time of the lens driving section and a drive frequency of the motor during the recording with microphone and that during the non-recording.
    Type: Application
    Filed: December 16, 2005
    Publication date: June 29, 2006
    Applicant: NIKON CORPORATION
    Inventor: Toshiya Aikawa
  • Publication number: 20060139752
    Abstract: Light emitted from a taking lens 20 enters a first birefringent plate 1a to be spatially divided along a first direction extending perpendicular to the direction in which the light advances to achieve two separate rays L10 and L20. The vibrational planes of the two light fluxes L10 and L20 emitted from the first birefringent plate 1a are converted to a circularly polarized light by a phase plate 1c. The two light fluxes L10? and L20? emitted from the phase plate 1c are each spatially divided into two by a second birefringent plate id along a second direction extending perpendicular to the first direction to achieve four separate rays L11, L12, L21 and L22, to be guided to an imaging plane 15a of an imaging device 15. At least either the first birefringent plate or the second birefringent plate is constituted of lithium niobate, rutile, Chilean nitrate, or the like.
    Type: Application
    Filed: February 27, 2006
    Publication date: June 29, 2006
    Applicant: NIKON CORPORATION
    Inventors: Keiji Osawa, Kiyoshige Shibazaki
  • Publication number: 20060139614
    Abstract: In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
    Type: Application
    Filed: December 9, 2005
    Publication date: June 29, 2006
    Applicant: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20060139478
    Abstract: A camera for recording an image captured using image-capturing element in a recording medium is provided with a focal point detection device for detecting a focal point adjustment state of a photographic lens in each focal point detection region of a plurality of focal point detection regions set inside an photographic field. When electronic zoom shooting is carried out, part of an imaged picture is trimmed and an image for recording in the recording medium is created. For a plurality of focal point detection regions the focal point detection regions are changed according to the trimming range of the imaged picture. Focal point adjustment of the photographic lens is carried out based on focal point detection results for focal point detection regions that have been changed.
    Type: Application
    Filed: February 17, 2006
    Publication date: June 29, 2006
    Applicant: NIKON CORPORATION
    Inventor: Hirotake Nozaki