Patents Assigned to Nissan Chemical Industries, Ltd.
  • Publication number: 20190317405
    Abstract: An additive for a resist underlayer film-forming composition, including a copolymer having structural units of the following Formulae (1) to (3): wherein R1s are each independently a hydrogen atom or a methyl group, R2 is a C1-3 alkylene group, A is a protecting group, R3 is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, tricyclodecane skeleton, or norbornane skeleton, and R4 is a linear, branched, or cyclic organic group having a carbon atom number of 1 to 12, wherein at least one hydrogen atom is substituted with a fluoro group and that optionally has at least one hydroxy group as a substituent. A resist underlayer film-forming composition for lithography including additive, a resin that is different from copolymer, organic acid, crosslinker, and solvent, wherein the copolymer's content is 3 parts by mass to 40 parts by mass relative to 100 parts by mass of the resin.
    Type: Application
    Filed: November 8, 2016
    Publication date: October 17, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tokio NISHITA, Rikimaru SAKAMOTO
  • Patent number: 10437151
    Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: October 8, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto Ogata, Shigeo Kimura, Yuki Usui, Tomoya Ohashi, Takahiro Kishioka
  • Patent number: 10437150
    Abstract: Underlayer films of high-energy radiation resists applied onto semiconductor substrates in a lithography process for producing semiconductor devices and that are used to prevent reflection, static electrification, and development defects and to suppress outgassing during the exposure of resist layers with high-energy radiation are prepared from compositions including a film component having an aromatic ring structure or a hetero ring structure. The film component having an aromatic ring structure or a hetero ring structure is contained at a proportion of 5 to 85% by mass. The film component may be a compound having an aromatic ring structure or a hetero ring structure, and the compound may be a polymer or a polymer precursor including a specific repeating unit. The aromatic ring may be a benzene ring or fused benzene ring, and the hetero ring structure may be triazinetrione ring.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: October 8, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Rikimaru Sakamoto, Bangching Ho, Takafumi Endo
  • Patent number: 10435579
    Abstract: Described herein are compositions comprising hole carrier materials, typically conjugated polymers, and fluoropolymers ink compositions comprising hole carrier materials and fluoropolymers, and uses thereof, for example, in organic electronic devices.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: October 8, 2019
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Floryan De Campo, Robert Swisher, Elena Sheina
  • Patent number: 10428274
    Abstract: A liquid crystal alignment agent for photo-alignment for providing an aligning member has excellent photoreaction efficiency and is capable of aligning polymerizable liquid crystals with high sensitivity. A liquid crystal alignment agent for photo-alignment includes (A) a resin having a side chain including a structure of Formula (1) and (B) a compound of Formula (2), an alignment member obtained from the liquid crystal alignment agent, and a retardation member: wherein X1 is a benzene ring which may be arbitrarily substituted with an substituent, R is a substituent selected from OH and NH2, R1, R2, R3, R4 and R5 are each independently a substituent selected from a hydrogen atom, a halogen atom, C1-6 alkyl, C1-6 haloalkyl, etc., and n is an integer of 0 or 1.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: October 1, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Jun Ito, Yuta Kanno, Tadashi Hatanaka
  • Publication number: 20190292324
    Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.
    Type: Application
    Filed: August 12, 2016
    Publication date: September 26, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takehiro NAGASAWA, Taku KATO, Kentaro OHMORI, Keisuke SHUTO, Kenji TAKASE
  • Patent number: 10421055
    Abstract: There is provided a dispersion containing a lipid peptide type compound useful as a low molecular weight gelator and a solvent capable of dissolving the lipid peptide type compound at a lower temperature. There is provided also a dispersion from which a hydrogel can be formed by a simpler method and from which a gel can be obtained as a gel having high thermal stability, and provide a method for forming the gel. A dispersion including a lipid peptide type compound in which a peptide portion having an amino acid repeating bonding structure is bonded to a lipid portion consisting of a C9-23 aliphatic group; and at least one alcohol selected from the group consisting of 1,2-alkanediol, 1,3-alkanediol, and ethylene glycol monoalkyl ether or a mixed solution of the at least one alcohol and water; and a method for producing a hydrogel by use of the dispersion.
    Type: Grant
    Filed: June 25, 2013
    Date of Patent: September 24, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takayuki Imoto, Takehisa Iwama
  • Publication number: 20190284560
    Abstract: The objective of the present invention is to provide a DNA aptamer that can specifically binding to a molecular targeted medicine, a composition comprising the DNA aptamer, and a method for detecting a molecular targeted medicine using the DNA aptamer. A DNA aptamer comprising specifically binding to a molecular targeted medicine, a composition for detecting a molecular targeted medicine comprising the DNA aptamer, a kid for detecting a molecular targeted medicine, and a method for detecting a molecular targeted medicine comprising using the DNA aptamer.
    Type: Application
    Filed: November 29, 2016
    Publication date: September 19, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventor: Hitoshi FURUSHO
  • Patent number: 10414877
    Abstract: There are provided a hydrogel having a highly strengthened self-supporting property, which can be prepared by simply mixing at room temperature, and a method for producing the hydrogel. A hydrogel-formable composition capable of forming a hydrogel having a self-supporting property characterized by comprising: a water-soluble organic polymer having an organic acid structure, an organic acid salt structure, or an organic acid anion structure; a silicate; a compound having a diphosphonic acid structure of Formula (I): wherein R1 and R2 each are independently specific substituents, X1 and X2 each are independently a single bond or a linking group, and n is an integer of 1 to 5; or a salt thereof; and a compound having or generating a positive charge of divalent or more, a hydrogel which is formed from the composition, and a method for producing the hydrogel.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: September 17, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventor: Yoshihiro Kudo
  • Patent number: 10407581
    Abstract: Described herein are non-aqueous ink compositions containing a sulfonated conjugated polymer, a polymeric acid, an optional matrix compound, and an amine compound. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: September 10, 2019
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Floryan De Campo, Robert Swisher, Elena Sheina, Jing Wang, Carolyn Skillman
  • Patent number: 10400147
    Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: September 3, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kiyomi Ema, Noriyuki Takakuma, Tohru Nishimura, Naoki Kawashita, Kouji Yamaguchi
  • Patent number: 10394124
    Abstract: A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent, wherein each of R1 to R4 is independently hydrogen atom or methyl group, and X1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X1 in Formula (1) is organic group of Formula (2), wherein A1 is phenylene group or naphthylene group, A2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and wherein each of A3 and A4 is independently phenylene group or naphthylene group, and dotted line is bond.
    Type: Grant
    Filed: October 27, 2015
    Date of Patent: August 27, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keisuke Hashimoto, Rikimaru Sakamoto, Hirokazu Nishimaki, Takafumi Endo
  • Patent number: 10385229
    Abstract: Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with formula (I) described herein, one or more metallic nanoparticles, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.
    Type: Grant
    Filed: July 6, 2016
    Date of Patent: August 20, 2019
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Jing Wang, Sergey B. Li, Laura Difalco, Floryan Decampo, Shilei Chen
  • Patent number: 10386681
    Abstract: A liquid crystal display device, containing: a pair of substrates provided with an electrode and a liquid crystal layer formed by disposing a liquid crystal composition between the pair of substrates and by irradiating and curing the liquid crystal composition with ultraviolet rays using an ultraviolet irradiation apparatus, wherein at least one of the substrates is further provided with a liquid crystal alignment film to vertically align a liquid crystal, the liquid crystal composition contains a liquid crystal, a curable resin, a bifunctional monomer and a monomer having at least one polar group of a hydroxy group, a carboxy group or a phosphoric acid group, and the liquid crystal alignment film is a liquid crystal alignment film obtained from a liquid crystal aligning agent containing a polymer having a specific side chain structure.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: August 20, 2019
    Assignees: Nissan Chemical Industries, Ltd., Kyusyu Nanotec Optics Co. Ltd.
    Inventors: Kazuyoshi Hosaka, Noritoshi Miki, Hiroyuki Omura, Jun Hashimoto, Junichi Baba, Shota Yoshida
  • Patent number: 10370696
    Abstract: The present invention provides a method of isolating cells or tissues from a culture preparation of the cells or tissues in a medium composition which enables culture of the cells or tissues in suspension, which comprises at least one step selected from the group consisting of the following (A), (B) and (C): (A) passing the culture preparation through a filter having fine pores having a pore diameter of 5-500 ?m, (B) adding a chelator to the culture preparation, and (C) diluting the culture preparation with a physiological aqueous solution.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: August 6, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ayako Aihara, Taito Nishino
  • Patent number: 10372039
    Abstract: A resist underlayer film forming composition for lithography for a resist underlayer film usable as a hardmask. A resist underlayer film forming composition for lithography, including: as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1) or a hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2), and a content of the hydrolyzable silane of Formula (1) or the hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2) in all silanes is less than 50% by mole, R1aR2bSi(R3)4?(a+b)??Formula (1) R4a1R5b1Si(R6)4?(a1+b1)??Formula (2).
    Type: Grant
    Filed: October 24, 2013
    Date of Patent: August 6, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yuta Kanno, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama
  • Patent number: 10372040
    Abstract: A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: August 6, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Wataru Shibayama, Kenji Takase, Rikimaru Sakamoto
  • Publication number: 20190218326
    Abstract: Provided is an agent for dispersing an electrically conductive carbon material, in which the agent consists of a polymer which has an oxazoline group in a side chain and which is obtained by using an oxazoline group-containing monomer such as that represented by formula (1) for example, and in which the agent exhibits excellent dispersion of an electrically conductive carbon material and produces a thin film that exhibits excellent adhesion to a current collection substrate when formed into a thin film together with the electrically conductive carbon material. (In the formula, X denotes a polymerizable carbon-carbon double bond-containing group, and R1-R4 each independently denote a hydrogen atom, a halogen atom, an alkyl group optionally having a branched structure having 1-5 carbon atoms, an aryl group having 6-20 carbon atoms, or an aralkyl group having 7-20 carbon atoms.
    Type: Application
    Filed: March 20, 2019
    Publication date: July 18, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tatsuya HATANAKA, Yuki SHIBANO, Takuji YOSHIMOTO
  • Patent number: 10351651
    Abstract: A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.
    Type: Grant
    Filed: October 6, 2014
    Date of Patent: July 16, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei Kobayashi, Taku Kato, Keisuke Shuto, Masayoshi Suzuki
  • Patent number: 10336865
    Abstract: To provide a liquid crystal aligning agent to obtain a liquid crystal alignment film which has favorable seal adhesion and a favorable residual image property, and which is excellent in removability of a decomposed product formed after irradiation with ultraviolet rays. A liquid crystal aligning agent containing at least one polymer selected from the group consisting of a polyimide precursor having structural units represented by the formula (1) and structural units represented by the formula (2) and an imidized polymer of the polyimide precursor: wherein X1 and X2 are a tetravalent organic group, Y1 and Y2 are a bivalent organic group, and R1 and R2 are a hydrogen atom or a C1-5 alkyl group.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: July 2, 2019
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Naho Kunimi, Naoki Sakumoto, Atsuhiko Mandai