Patents Assigned to Nissan Chemical Industries, Ltd.
  • Patent number: 11155684
    Abstract: There is provided a composition for coating a stepped substrate that has high filling properties of a pattern, and is capable of forming a coating film that does not cause degassing and heat shrinkage, and is used to form a coating film having flattening properties on the substrate. The composition for coating a stepped substrate includes a compound (C) having in the molecule a partial structure of Formula (1) (where R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group, or a C6-40 aryl group; five R3s are each independently a hydrogen atom, a hydroxy group, a C1-10 alkoxy group, a C1-10 alkyl group, a nitro group, or a halogen atom; and * is a bond site to the compound); and a solvent.
    Type: Grant
    Filed: April 1, 2016
    Date of Patent: October 26, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Rikimaru Sakamoto, Takafumi Endo, Tadashi Hatanaka
  • Patent number: 11111387
    Abstract: The present invention relates to a polymer composition which contains (A) a photosensitive side-chain polymer that exhibits liquid crystallinity in a predetermined temperature range and has a repeating unit comprising a vertically aligning group, and (B) an organic solvent. The present invention provides: a liquid crystal alignment film which has excellent tilt angle characteristics, while being provided with alignment controllability with high efficiency; a polymer composition which enables the achievement of this liquid crystal alignment film; a twisted nematic liquid crystal display element; and a vertical field switching mode liquid crystal display element.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: September 7, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventor: Tatsuya Nagi
  • Patent number: 11112654
    Abstract: A liquid crystal display device, which includes a first substrate and a second substrate disposed to face each other with a liquid crystal sandwiched therebetween. The first substrate is an electrode-provided substrate having a first electrode and a plurality of second electrodes overlaid on the first electrode via an insulating film, formed on a pixel region on a surface on the liquid crystal side, where one of the first electrode and the second electrodes is a pixel electrode and the other is a counter electrode, having a first liquid crystal alignment film formed on the surface on the liquid crystal side of the first substrate covered with the second electrodes. The second substrate is a substrate having a second liquid crystal alignment film formed on a surface on the liquid crystal side, the second liquid crystal alignment film containing a photosensitive side chain type polymer which develops liquid crystallinity.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: September 7, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Atsuhiko Mandai, Naoki Sakumoto
  • Patent number: 11066599
    Abstract: Provided is a production method for a carbon-based light-emitting material that generates light having a wavelength of 500 to 700 nm when exposed to excitation light having a wavelength of 300 to 600 nm. The production method comprises a step for mixing and heating a starting material containing ascorbic acid, an acid catalyst containing an inorganic acid, and a solvent.
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: July 20, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tadayuki Isaji, Naoki Otani, Shinichi Maeda, Masahiro Ueda, Takayoshi Kawasaki
  • Patent number: 11061297
    Abstract: A nonlinear optically active copolymer having satisfactory orientation characteristics and able to allow for reduction in heat-induced orientation relaxation of a nonlinear optical material, and a nonlinear optical material obtained using the copolymer. The copolymer including at least a repeating unit A having adamantyl group and a repeating unit B having a nonlinear optically active moiety in one molecule, and an organic nonlinear optical material including the copolymer as a component.
    Type: Grant
    Filed: March 16, 2017
    Date of Patent: July 13, 2021
    Assignees: KYUSHU UNIVERSITY, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Shiyoshi Yokoyama, Hiroki Miura, Daisuke Maeda, Kei Yasui, Tsubasa Kashino, Masaaki Ozawa
  • Patent number: 11041120
    Abstract: Provided is a method for manufacturing a carbonaceous luminescent material in which a polycarboxylic-acid-containing starting material, an acid catalyst, and a solvent are mixed together and heated.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: June 22, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tadayuki Isaji, Naoki Otani, Masahiro Ueda, Takayoshi Kawasaki
  • Patent number: 11028323
    Abstract: Provided is a liquid crystal display element that can be baked at a low temperature when forming a liquid crystal alignment film capable of imparting an alignment regulating property and a pretilt angle developing property via a photoalignment method. Further provided is a liquid crystal display element in which the liquid crystal pretilt angles are highly stable, and display burn-in hardly occurs even due to long usage. Further provided are a vertical liquid crystal alignment film to be used in the liquid crystal display element, and a liquid crystal aligning agent with which it is possible to provide the vertical liquid crystal alignment film.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: June 8, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kanako Suzuki, Masato Moriuchi, Ryoichi Ashizawa, Kohei Goto
  • Patent number: 11022884
    Abstract: A resist underlayer film allows an excellent resist pattern shape to be formed when an upper resist layer is exposed to light and developed using an alkaline developing solution or organic solvent; and composition for forming the resist underlayer film. A resist underlayer film-forming composition for lithography, the composition including, as a silane, hydrolyzable silane, hydrolysis product thereof, hydrolysis-condensation product thereof, or combination, wherein the hydrolyzable silane includes hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): —R4—R5—R6??Formula (2) (where R4 is optionally substituted C1-10 alkylene group; R5 is a sulfonyl group or sulfonamide group; and R6 is a halogen-containing organic group)]. In Formula (2), R6 may be a fluorine-containing organic group like trifluoromethyl group.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: June 1, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Wataru Shibayama, Kenji Takase, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama, Rikimaru Sakamoto
  • Patent number: 11018303
    Abstract: A charge-transporting thin film, which enables the achievement of an organic EL element having excellent durability in cases where the charge-transporting thin film is applied to a hole injection layer of the element, is obtained using a charge-transporting varnish that contains a charge-transporting substance, a nonionic fluorine-containing surfactant and an organic solvent, and wherein the nonionic fluorine-containing surfactant has, for example, a perfluoroalkenyl group-containing perfluorohydrocarbon structure represented by one of formulae (1)-(3) and an alkylene oxide structure.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: May 25, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventor: Naoki Otani
  • Patent number: 11001867
    Abstract: A saccharification reaction mixture, a saccharification enzyme composition, and a saccharide production method are aimed to enhance saccharization rate by use of an enzyme in a simple step as well as a method for producing ethanol from a saccharide. The saccharification reaction mixture can saccharify at least one of cellulose and hemicellulose and contains at least one of cellulose and hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group made of thiourea, a thiourea derivative, an isothiourea derivative, and a salt of any of these.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: May 11, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kazutoshi Odaka, Kazutoshi Sekiguchi
  • Publication number: 20210102088
    Abstract: Methods for forming a film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acrylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.
    Type: Application
    Filed: December 18, 2020
    Publication date: April 8, 2021
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko UMEZAKI, Ryo KARASAWA, Shuhei SHIGAKI, Ryuta MIZUOCHI
  • Patent number: 10921650
    Abstract: The present invention relates to a liquid crystal aligning agent which contains a polymer that has a site having an isocyanate group and/or a blocked isocyanate group, a site having a photoreactive group having photoalignment, and a site having at least one functional group selected from an amino group and a hydroxyl group in each molecule. The present invention provides a liquid crystal display element which enables baking at low temperatures during the formation of a liquid crystal alignment film by a photoalignment method, the liquid crystal alignment film being able to be imparted with alignment regulating property and pretilt angle developing property.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: February 16, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ryoichi Ashizawa, Masato Moriuchi, Kanako Suzuki, Kohei Goto
  • Patent number: 10914725
    Abstract: The invention provides a medium additive, medium composition and a culture method and the like, capable of efficiently culturing cells or tissues in a well dispersed state, and further, permitting cell image analysis of the cells or tissues. The medium additive or medium composition contains agar, which preferably is a low molecular weight agar having a weight average molecular weight of 10,000-60,000. Using same, cells or tissues can be cultured in a well-dispersed state in a medium, and a proliferation promoting effect for the cells or tissues can also be obtained. In addition, the cells can be cultured in any of a floating state and a precipitated state by adjusting the concentration of the aforementioned agar.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: February 9, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Natsuki Abe, Taito Nishino, Ayako Otani
  • Publication number: 20210024689
    Abstract: A method includes applying a composition for forming a resist underlayer film to a substrate having a recess in a surface, and baking the composition for forming a resist underlayer film to form a resist underlayer film for filling at least the recess. The composition for forming a resist underlayer film has a copolymer having a structural unit of following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent: wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group.
    Type: Application
    Filed: October 14, 2020
    Publication date: January 28, 2021
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto OGATA, Yuki USUI, Mamoru TAMURA, Takahiro KISHIOKA
  • Patent number: 10899893
    Abstract: The aminosilane-modified colloidal silica dispersion contains colloidal silica particles having surfaces to which there are bound a first silyl group represented by the following formula (1): R1aSi(OR2)3-aO— and a second silyl group represented by the following formula (2): R3bSi(OR4)3-bO— and, as a dispersion medium, a mixed solvent formed of a polar solvent S1 having a dielectric constant at 20° C. of 15 or higher and lower than 60 and a non-polar solvent S2 having a dielectric constant at 20° C. of 1 or higher and lower than 15, at a mass ratio (S1/S2) of 0.3 to 6.
    Type: Grant
    Filed: May 11, 2016
    Date of Patent: January 26, 2021
    Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., NIIGATA UNIVERSITY
    Inventors: Natsumi Murakami, Masahiro Hida, Norio Tsubokawa, Takeshi Yamauchi, Tomoya Maeta
  • Patent number: 10899720
    Abstract: A polyester resin composition containing 100 parts by mass of a polyester resin and 0.01 to 10 parts by mass of a 2-amino-1,3,5-triazine derivative of Formula [1]: a polyester resin molded body obtained by the composition, and a crystal nucleating agent including the triazine derivative. A polyester resin composition containing a crystal nucleating agent that makes it possible to produce, with high productivity, a polyester resin molded product that promotes polyester resin crystallization and maintains high transparency after crystallization and is applicable for a wide variety of uses can be provided.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: January 26, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takuma Nagahama, Takeshi Suwa
  • Patent number: 10903106
    Abstract: A temporary adhesive is good peelability, heat resistance and cleaning removability after polishing of the rear surface of the wafer. A layered body for processing a rear surface of a wafer opposite to a circuit surface of the wafer, the layered body being a temporary adhesive loaded between a support and circuit surface of the wafer and including an adhesive layer (A) that includes a polyorganosiloxane to be cured by a hydrosilylation reaction and is releasably bonded, and a separation layer (B) includes a polyorganosiloxane and is releasably bonded, in which the polyorganosiloxane forming the separation layer (B) is a polyorganosiloxane containing a siloxane unit of RRSiO2/2 (provided that each R is bonded to a silicon atom as a Si—C bond), and at least one R is an aralkyl group, epoxy group, or phenyl group. Methods for producing and separating these layered bodies and composition for forming the separation layer.
    Type: Grant
    Filed: June 8, 2015
    Date of Patent: January 26, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Satoshi Kamibayashi, Hiroshi Ogino, Tomoyuki Enomoto, Kazuhiro Sawada
  • Patent number: 10899872
    Abstract: An epoxy resin composition in a liquid or solid state having excellent solubility and having high preservation stability. A modified epoxy resin composition including: Compound A containing tris-(2,3-epoxypropyl)-isocyanurate having 1 to 3 glycidyl group(s) in a molecule substituted with a functional group(s) of Formula (1): in which R1 and R2 are each independently an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an aralkyl group, a heterocyclic group; or a halogenated derivative, an aminated derivative, or a nitrated derivative of these groups; and Compound B containing tris-(2,3-epoxypropyl)-isocyanurate, wherein tris-(2,3-epoxypropyl)-isocyanurate of Compound A before the substitution and tris-(2,3-epoxypropyl)-isocyanurate of Compound B comprise 2% by mass to 15% by mass of ?-type tris-(2,3-epoxypropyl)-isocyanurate and a remaining percentage of ?-type tris-(2,3-epoxypropyl)-isocyanurate based on a total mass of Compound A before the substitution and Compound B.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: January 26, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yuki Endo, Motohiko Hidaka, Mikio Kasai, Takashi Oda, Nobuyuki Kakiuchi
  • Patent number: 10889791
    Abstract: The invention provides a coating agent for a flow passage which comprises a copolymer containing a recurring unit which contains an organic group of the formula (a) wherein Ua1 and Ua2 are defined herein, and a recurring unit which contains an organic group of the formula (b) wherein Ub1, Ub2, Ub3, and An? are defined herein. The invention also provides a flow passage device having the coating agent for a flow passage on at least part of an inner surface of a flow passage, a platelet-producing flow passage device and a method for manufacturing the same.
    Type: Grant
    Filed: October 14, 2016
    Date of Patent: January 12, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junko Katayama, Yoshiomi Hiroi, Ayako Aihara, Natsuki Abe, Taito Nishino
  • Patent number: 10870771
    Abstract: Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with formula (I) described herein, a transition metal complex having at least one ?-diketonate ligand, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: December 22, 2020
    Assignee: Nissan Chemical industries, Ltd.
    Inventors: Robert Swisher, Elena Sheina, Sergey B. Li, Marc Sims