Patents Assigned to Nissan Chemical Industries, Ltd.
  • Patent number: 11561472
    Abstract: A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1) R1aR2bSi(R3)4-(a+b)??Formula (1) wherein R1 is an organic group of Formula (1-2) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R3 is a hydrolyzable group; and Formula (2) R7cR8dSi(R9)4-(c+d)??Formula (2) wherein R7 is an organic group of Formula (2-1) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R9 is a hydrolyzable group.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: January 24, 2023
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makoto Nakajima, Kenji Takase, Satoshi Takeda, Wataru Shibayama
  • Patent number: 11560517
    Abstract: A photoreactive liquid crystal composition containing (A) a photoreactive polymer liquid crystal which includes a photoreactive side chain in which at least one type of reaction selected from (A-1) photocrosslinking and (A-2) photoisomerization occurs, and (B) a low molecular weight liquid crystal. An optical element or display element is formed having a liquid crystal cell including the photoreactive liquid crystal composition.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: January 24, 2023
    Assignees: UNIVERSITY OF HYOGO, NAGAOKA UNIVERSITY OF TECHNOLOGY, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tomoyuki Sasaki, Hiroshi Ono, Nobuhiro Kawatsuki, Kohei Goto
  • Patent number: 11542366
    Abstract: A method includes applying a composition for forming a resist underlayer film to a substrate having a recess in a surface, and baking the composition for forming a resist underlayer film to form a resist underlayer film for filling at least the recess. The composition for forming a resist underlayer film has a copolymer having a structural unit of following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent: wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group.
    Type: Grant
    Filed: October 14, 2020
    Date of Patent: January 3, 2023
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto Ogata, Yuki Usui, Mamoru Tamura, Takahiro Kishioka
  • Publication number: 20220404707
    Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B.
    Type: Application
    Filed: August 4, 2022
    Publication date: December 22, 2022
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hikaru TOKUNAGA, Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
  • Patent number: 11511316
    Abstract: There is provided a plasma annealing device that can change the crystal structure of a film by processing the film (coating) on a substrate and that has excellent productivity. A method for producing a film includes step (A) irradiating a film on a substrate with atmospheric pressure plasma, wherein the crystal structure of a constituent of the film is changed. The step (A) may include generating plasma under atmospheric pressure by energization at a frequency of 10 hertz to 100 megahertz and a voltage of 60 volts to 1,000,000 volts, and directly irradiating the film on the substrate with the generated plasma. A method for changing a crystal structure of a constituent of a film includes step (A). A plasma generation device used in step (A). An electronic device produced through step (A).
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: November 29, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventor: Hitoshi Furusho
  • Patent number: 11488824
    Abstract: A resist underlayer film for a resist pattern formation by developing a resist with organic solvent after exposure of resist. Method for manufacturing a semiconductor includes: applying onto a substrate a resist underlayer film forming composition including hydrolyzable silanes, hydrolysis products of hydrolyzable silanes, hydrolysis-condensation products of hydrolyzable silanes, or a combination thereof. Hydrolyzable silanes being silane of Formulas (1), (2) and (3).
    Type: Grant
    Filed: January 23, 2013
    Date of Patent: November 1, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Satoshi Takeda, Makoto Nakajima, Yuta Kanno, Hiroyuki Wakayama
  • Patent number: 11479627
    Abstract: A film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process, and a method for forming the film. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: October 25, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko Umezaki, Ryo Karasawa, Shuhei Shigaki, Ryuta Mizuochi
  • Publication number: 20220328635
    Abstract: Methods for producing the amorphous metal oxide semiconductor layer where amorphous metal oxide semiconductor layer is formed by use of a precursor composition containing a metal salt, a primary amide, and a water-based solution. The methodology for producing the amorphous metal oxide semiconductor layer includes applying the precursor composition onto a substrate to form a precursor film, and firing the film at a temperature of 150° C. or higher and lower than 300° C.
    Type: Application
    Filed: June 28, 2022
    Publication date: October 13, 2022
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yoshiomi HIROI, Shinichi MAEDA
  • Patent number: 11459414
    Abstract: Methods for forming a film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acrylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: October 4, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko Umezaki, Ryo Karasawa, Shuhei Shigaki, Ryuta Mizuochi
  • Publication number: 20220306985
    Abstract: The present invention provides a culture method of cells and/or tissues including culturing cells and/or tissues in a suspended state by using a medium composition wherein indeterminate structures are formed in a liquid medium, the structures are uniformly dispersed in the solution and substantially retain the cells and/or tissues without substantially increasing the viscosity of the solution, thus affording an effect of preventing sedimentation thereof, and the like
    Type: Application
    Filed: May 23, 2022
    Publication date: September 29, 2022
    Applicants: Nissan Chemical Industries, Ltd., Kyoto University
    Inventors: Taito NISHINO, Tatsuro KANAKI, Ayako OTANI, Koichiro SARUHASHI, Misayo Tomura, Takehisa IWAMA, Masato HORIKAWA, Norio NAKATSUJI, Tomomi OTSUJI
  • Patent number: 11452688
    Abstract: A transdermally absorbable base material including: a lipid peptide compound including at least one of compound of Formula (1) below and the similar compounds or pharmaceutically usable salts thereof; a surfactant; a specific polyhydric alcohol; a fatty acid; and water, wherein R1 is a C9-23 aliphatic group; R2 is a hydrogen atom or a C1-4 alkyl group that optionally has a branched chain having a carbon atom number of 1 or 2; R3 is a —(CH2)n—X group; n is a number of 1 to 4; and X is amino group, guanidino group, —CONH2 group, or a 5-membered cyclic group optionally having 1 to 3 nitrogen atoms, a 6-membered cyclic group optionally having 1 to 3 nitrogen atoms, or a condensed heterocyclic group constituted by a 5-membered cyclic group and a 6-membered cyclic group which optionally have 1 to 3 nitrogen atoms.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: September 27, 2022
    Assignees: KYUSHU UNIVERSITY, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Masahiro Goto, Nobuhide Miyachi, Takehisa Iwama, Takayuki Imoto
  • Patent number: 11450445
    Abstract: A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.
    Type: Grant
    Filed: June 8, 2020
    Date of Patent: September 20, 2022
    Assignees: TOKYO UNIVERSITY OF SCIENCE FOUNDATION, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Koji Arimitsu, Makoto Wakabayashi
  • Publication number: 20220267480
    Abstract: The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.
    Type: Application
    Filed: May 11, 2022
    Publication date: August 25, 2022
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hisato HAYASHI, Koichiro SARUHASHI, Tatsuro KANAKI
  • Patent number: 11392037
    Abstract: There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a hydrolyzable organosilane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof as a silane, wherein a silane having a cyclic amino group is contained in an amount of less than 1% by mole, preferably 0.01 to 0.95% by mole. A film forming composition comprising a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. A resist underlayer film forming composition for lithography comprising a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The cyclic amino group may be a secondary amino group or a tertiary amino group.
    Type: Grant
    Filed: February 16, 2009
    Date of Patent: July 19, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makoto Nakajima, Wataru Shibayama, Yuta Kanno
  • Patent number: 11371013
    Abstract: The present invention provides a culture method of cells and/or tissues including culturing cells and/or tissues in a suspended state by using a medium composition wherein indeterminate structures are formed in a liquid medium, the structures are uniformly dispersed in the solution and substantially retain the cells and/or tissues without substantially increasing the viscosity of the solution, thus affording an effect of preventing sedimentation thereof, and the like.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: June 28, 2022
    Assignees: Nissan Chemical Industries, Ltd., Kyoto University
    Inventors: Taito Nishino, Tatsuro Kanaki, Ayako Otani, Koichiro Saruhashi, Misayo Tomura, Takehisa Iwama, Masato Horikawa, Norio Nakatsuji, Tomomi Otsuji
  • Patent number: 11372330
    Abstract: There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.
    Type: Grant
    Filed: September 27, 2005
    Date of Patent: June 28, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama
  • Patent number: 11359220
    Abstract: A saccharification reaction mixture wherein the reaction mixture can saccharify at least one of cellulose and hemicellulose and contains at least one of cellulose and hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group including a polyhydric alcohol compound represented by the following formula (1) or a derivative thereof and an acetylene glycol represented by formula (2) or an alkylene oxide adduct thereof. The symbols in the chemical formulas are defined in the specification.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: June 14, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kazutoshi Odaka, Kazutoshi Sekiguchi
  • Patent number: 11345827
    Abstract: This is to provide a coating film having a function of inhibiting adhesion of a biological substance, a method for manufacturing the coating film, a copolymer obtainable by polymerizing a specific monomer mixture, a composition for forming a coating film having a specific composition, a method for manufacturing a varnish containing a copolymer to be used as a raw material of the composition for forming a coating film which is used for forming said film, and a sol for forming the coating film. In particular, this is to provide a coating film obtained by the method comprising a process of applying a composition for forming a coating film which comprises a copolymer comprising a recurring unit containing an organic group of the formula (a) and a recurring unit containing an organic group of the formula (b) and a solvent onto a substrate; and a process of drying at a temperature of ?200° C. to 200° C. (wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An? are as defined in the present specification and the claims).
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: May 31, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yoshiomi Hiroi, Ayako Otani, Takahiro Kishioka, Taito Nishino, Tomoyuki Ozawa
  • Patent number: 11345762
    Abstract: The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: May 31, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hisato Hayashi, Koichiro Saruhashi, Tatsuro Kanaki
  • Patent number: 11326010
    Abstract: Provided is an agent for dispersing an electrically conductive carbon material, in which the agent consists of a polymer which has an oxazoline group in a side chain and which is obtained by using an oxazoline group-containing monomer such as that represented by formula (1) for example, and in which the agent exhibits excellent dispersion of an electrically conductive carbon material and produces a thin film that exhibits excellent adhesion to a current collection substrate when formed into a thin film together with the electrically conductive carbon material. (In the formula, X denotes a polymerizable carbon-carbon double bond-containing group, and R1-R4 each independently denote a hydrogen atom, a halogen atom, an alkyl group optionally having a branched structure having 1-5 carbon atoms, an aryl group having 6-20 carbon atoms, or an aralkyl group having 7-20 carbon atoms.
    Type: Grant
    Filed: March 20, 2019
    Date of Patent: May 10, 2022
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tatsuya Hatanaka, Yuki Shibano, Takuji Yoshimoto