Patents Assigned to Nissan Chemical Industries, Ltd.
  • Patent number: 10550300
    Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition; the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: February 4, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kiyomi Ema, Noriyuki Takakuma, Tohru Nishimura, Naoki Kawashita, Kouji Yamaguchi
  • Patent number: 10544181
    Abstract: A novel gelator including a sugar derivative; a gelator including a compound of Formula (1) or Formula (2): wherein R1 is a linear or branched alkyl group having a carbon atom number of 9 to 20, a cyclic alkyl group having a carbon atom number of 13 to 20, or a linear or branched alkenyl group having a carbon atom number of 9 to 20, R2 is a hydrogen atom, a linear or branched alkyl group having a carbon atom number of 1 to 10, or an aryl group optionally having a substituent, and R3 and R4 are hydroxy groups.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: January 28, 2020
    Assignees: KYUSHU UNIVERSITY, INSTITUTE OF SYSTEMS, INFORMATION TECHNOLOGIES AND NANOTECHNOLOGIES, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Fumiyasu Ono, Koichiro Saruhashi, Osamu Hirata, Seiji Shinkai, Tatsuhiro Yamamoto
  • Publication number: 20200024511
    Abstract: Provided is a method for manufacturing a carbonaceous luminescent material in which a polycarboxylic-acid-containing starting material, an acid catalyst, and a solvent are mixed together and heated.
    Type: Application
    Filed: September 17, 2019
    Publication date: January 23, 2020
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tadayuki ISAJI, Naoki OTANI, Masahiro UEDA, Takayoshi KAWASAKI
  • Publication number: 20200026191
    Abstract: The present invention provides a resist underlayer film-forming composition for lithography for forming a resist underlayer film that can be used as a hard mask with use of hydrolysis-condensation product of a hydrolyzable silane which also absorbs KrF laser. A resist underlayer film-forming composition for lithography comprising, as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): and is bonded to a silicon atom through a Si—C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane.
    Type: Application
    Filed: December 4, 2018
    Publication date: January 23, 2020
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makoto NAKAJIMA, Wataru SHIBAYAMA, Satoshi TAKEDA, Kenji TAKASE
  • Patent number: 10533070
    Abstract: Provided is a fluorine atom-containing polymer which is a condensation polymer of a fluorene derivative that provides a repeating unit represented by formula (1), a fluorene derivative that provides a repeating unit represented by formula (2) and a fluorene derivative that provides a repeating unit represented by formula (3).
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: January 14, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naoki Otani, Hirofumi Ota
  • Publication number: 20190380949
    Abstract: A transdermally absorbable base material including: a lipid peptide compound including at least one of compound of Formula (1) below and the similar compounds or pharmaceutically usable salts thereof; a surfactant; a specific polyhydric alcohol; a fatty acid; and water, wherein R1 is a C9-23 aliphatic group; R2 is a hydrogen atom or a C1-4 alkyl group that optionally has a branched chain having a carbon atom number of 1 or 2; R3 is a —(CH2)n—X group; n is a number of 1 to 4; and X is amino group, guanidino group, —CONH2 group, or a 5-membered cyclic group optionally having 1 to 3 nitrogen atoms, a 6-membered cyclic group optionally having 1 to 3 nitrogen atoms, or a condensed heterocyclic group constituted by a 5-membered cyclic group and a 6-membered cyclic group which optionally have 1 to 3 nitrogen atoms.
    Type: Application
    Filed: August 28, 2019
    Publication date: December 19, 2019
    Applicants: KYUSHU UNIVERSITY, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Masahiro GOTO, Nobuhide MIYACHI, Takehisa IWAMA, Takayuki IMOTO
  • Patent number: 10508174
    Abstract: A composition applied over a resist pattern includes a modified polysiloxane in which some of silanol groups of a polysiloxane containing a hydrolysis condensate of a hydrolyzable silane are capped, and a solvent, wherein a ratio of silanol groups to all Si atoms contained in the modified polysiloxane is 40 mol % or less. The modified polysiloxane ratio of the silanol groups is adjusted to a desired ratio by reacting the silanol groups of the polysiloxane with an alcohol. A method for producing a semiconductor device having the steps of forming a resist film on a substrate, forming a resist pattern by exposing and developing the resist film, applying the composition over the resist pattern during or after development, and reversing a pattern by removing the resist pattern by etching.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: December 17, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Shuhei Shigaki, Hiroaki Yaguchi, Makoto Nakajima
  • Patent number: 10509320
    Abstract: There is provided an underlayer coating forming composition for lithography that is used in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to photoresists, does not intermix with photoresists, and is capable of flattening the surface of a semi conductor substrate having holes of a high aspect ratio. The underlayer coating forming composition for lithography comprises, a compound having two or more protected carboxylic groups, a compound having two or more epoxy groups, and a solvent.
    Type: Grant
    Filed: January 6, 2006
    Date of Patent: December 17, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Satoshi Takei, Tetsuya Shinjo, Keisuke Hashimoto, Yasushi Sakaida
  • Patent number: 10508181
    Abstract: An underlayer film-forming composition for a self-assembled film having a polymer including 0.2% by mole or more of a unit structure of a polycyclic aromatic vinyl compound relative to all unit structures of the polymer. The polymer includes 20% by mole or more of a unit structure of an aromatic vinyl compound relative to all the unit structures of the polymer and includes 1% by mole or more of a unit structure of the polycyclic aromatic vinyl compound relative to all the unit structures of the aromatic vinyl compound. The aromatic vinyl compound includes an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole. The aromatic vinyl compound includes an optionally substituted styrene and an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: December 17, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yasunobu Someya, Hiroyuki Wakayama, Takafumi Endo, Rikimaru Sakamoto
  • Patent number: 10501637
    Abstract: The invention provides silane-treated forsterite microparticles having a specific surface area of 5 to 100 m2/g, wherein 1 to 5 silyl groups are bound to 1 nm2 of the surface area thereof.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: December 10, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tadayuki Isaji, Masahiro Hida
  • Patent number: 10494480
    Abstract: A composition comprising both a polymer which contains triazine-ring-containing repeating units represented by formula (17) and a crosslinking agent which consists of either a poly-functional epoxy compound or a polyfunctional (meth)acrylic compound can be photo-cured even without the addition of an initiator to yield a cured film having a high refractive index and high heat resistance. Thus, a photocurable film-forming composition that comprises a triazine-ring-containing polymer, which can achieve, even without the addition of a metal oxide by the polymer alone, high heat resistance, high transparency, a high refractive index, high solubility and low volume shrinkage, and that is curable even without the addition of an acid generator can be provided.
    Type: Grant
    Filed: February 15, 2012
    Date of Patent: December 3, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naoya Nishimura, Masaaki Ozawa
  • Patent number: 10498101
    Abstract: A method for producing an organic microdisk structure 40, which is characterized by comprising: a cladding layer formation step 1 wherein a cladding layer 12 is formed by printing a first ink 11 that contains a fluorine-containing hyperbranched polymer on a substrate 10 by an inkjet method; a core layer formation step 2 wherein a core layer 22 is formed by printing a second ink 21 that contains a laser dye and a triazine-based hyperbranched polymer containing no fluorine on the cladding layer 12 by an inkjet method; and an etching step 3 wherein the cladding layer 12 is etched using a solvent 31 that dissolves only the fluorine-containing hyperbranched polymer. Consequently, an unconventional novel method for producing an organic microdisk structure with use of an inkjet method is able to be provided.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: December 3, 2019
    Assignees: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yuji Oki, Hiroaki Yoshioka, Kei Yasui, Masaaki Ozawa
  • Patent number: 10487205
    Abstract: A thermosetting resin composition for a flattened film or a microlens including: a copolymer having structural units of the following Formulae (1) and (2), wherein R0s are each independently a hydrogen atom or a methyl group, R1 is a single bond or a C1-5 alkylene group, in which the alkylene group may have an ether bond in the main chain, and R2 is an epoxy group or a C5-12 organic group having an epoxy ring; and a solvent.
    Type: Grant
    Filed: July 3, 2015
    Date of Patent: November 26, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Isao Adachi, Takahiro Sakaguchi
  • Publication number: 20190338095
    Abstract: A production method for an optical waveguide including: a first step of inserting a needle-like portion at a tip end of an ejection unit into uncured cladding; a second step of moving the needle-like portion in the uncured cladding while ejecting an uncured material from the needle-like portion to form an uncured core surrounded and covered with the uncured cladding; a third step of removing the needle-like portion from the uncured cladding; and a fourth step of curing the uncured cladding and core, wherein the uncured cladding is composed of a composition including a reactive silicone compound composed of a polycondensate of a diarylsilicic acid compound of Formula [1] and an alkoxy silicon compound of Formula [2] Ar3—Si(OR1)aR23-a??[2], and a di(meth)acrylate compound of Formula [3] and the uncured core is composed of a composition including a reactive silicone compound and an aromatic vinyl compound of Formula [4]
    Type: Application
    Filed: October 21, 2016
    Publication date: November 7, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takaaki ISHIGURE, Sho YOSHIDA, Yuki SAITO, Kazuki YASUHARA, Takehiro NAGASAWA, Kentaro OHMORI
  • Patent number: 10450418
    Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: October 22, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takehiro Nagasawa, Taku Kato, Kentaro Ohmori, Keisuke Shuto, Kenji Takase
  • Publication number: 20190317405
    Abstract: An additive for a resist underlayer film-forming composition, including a copolymer having structural units of the following Formulae (1) to (3): wherein R1s are each independently a hydrogen atom or a methyl group, R2 is a C1-3 alkylene group, A is a protecting group, R3 is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, tricyclodecane skeleton, or norbornane skeleton, and R4 is a linear, branched, or cyclic organic group having a carbon atom number of 1 to 12, wherein at least one hydrogen atom is substituted with a fluoro group and that optionally has at least one hydroxy group as a substituent. A resist underlayer film-forming composition for lithography including additive, a resin that is different from copolymer, organic acid, crosslinker, and solvent, wherein the copolymer's content is 3 parts by mass to 40 parts by mass relative to 100 parts by mass of the resin.
    Type: Application
    Filed: November 8, 2016
    Publication date: October 17, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tokio NISHITA, Rikimaru SAKAMOTO
  • Patent number: 10437151
    Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: October 8, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto Ogata, Shigeo Kimura, Yuki Usui, Tomoya Ohashi, Takahiro Kishioka
  • Patent number: 10435579
    Abstract: Described herein are compositions comprising hole carrier materials, typically conjugated polymers, and fluoropolymers ink compositions comprising hole carrier materials and fluoropolymers, and uses thereof, for example, in organic electronic devices.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: October 8, 2019
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Floryan De Campo, Robert Swisher, Elena Sheina
  • Patent number: 10437150
    Abstract: Underlayer films of high-energy radiation resists applied onto semiconductor substrates in a lithography process for producing semiconductor devices and that are used to prevent reflection, static electrification, and development defects and to suppress outgassing during the exposure of resist layers with high-energy radiation are prepared from compositions including a film component having an aromatic ring structure or a hetero ring structure. The film component having an aromatic ring structure or a hetero ring structure is contained at a proportion of 5 to 85% by mass. The film component may be a compound having an aromatic ring structure or a hetero ring structure, and the compound may be a polymer or a polymer precursor including a specific repeating unit. The aromatic ring may be a benzene ring or fused benzene ring, and the hetero ring structure may be triazinetrione ring.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: October 8, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Rikimaru Sakamoto, Bangching Ho, Takafumi Endo
  • Patent number: 10428274
    Abstract: A liquid crystal alignment agent for photo-alignment for providing an aligning member has excellent photoreaction efficiency and is capable of aligning polymerizable liquid crystals with high sensitivity. A liquid crystal alignment agent for photo-alignment includes (A) a resin having a side chain including a structure of Formula (1) and (B) a compound of Formula (2), an alignment member obtained from the liquid crystal alignment agent, and a retardation member: wherein X1 is a benzene ring which may be arbitrarily substituted with an substituent, R is a substituent selected from OH and NH2, R1, R2, R3, R4 and R5 are each independently a substituent selected from a hydrogen atom, a halogen atom, C1-6 alkyl, C1-6 haloalkyl, etc., and n is an integer of 0 or 1.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: October 1, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Jun Ito, Yuta Kanno, Tadashi Hatanaka