Patents Assigned to Novatronix Corporation
  • Patent number: 7773840
    Abstract: A method of coupling a waveguide to a multi-layered active device structure on a substrate is described. The method includes forming a junction area by etching the active device structure to form a sloped etch profile with respect to the substrate, aligning multiple layers of the multi-layered active device structure via an etch stop adjacent the multi-layered active device structure, and depositing the waveguide over the etched active device structure, wherein a sloped active passive junction is formed at the junction area that reduces residual interface reflection in a resulting coupled device. Also described is a method for removing at least one laser layer in a sloped junction region forming passive amorphous silicon waveguides. This includes depositing a SiN layer for use as an etch mask, patterning a photoresist mask, patterning the SiN layer by reactive ion etching, stripping the photoresist mask, and etching the at least one laser layer.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: August 10, 2010
    Assignee: Novatronix Corporation
    Inventors: Martin H. Kwakernaak, Winston Kong Chan, David Capewell, Hooman Mohseni
  • Patent number: 7657143
    Abstract: An apparatus, device, system, and method for controlling the index of refraction of at least one layer of amorphous silicon-based film deposited on a substrate are disclosed. The apparatus, device, system and method include providing at least one volume of each of N2, SiH4, and He, and depositing the at least one layer of amorphous silicon-based film on the substrate by vapor deposition. The device may include a waveguide that includes at least one layer of amorphous silicon-based film, wherein the at least one layer of amorphous silicon-based film is deposited by vapor deposition using an at least one volume of each of N2, SiH4, and He.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: February 2, 2010
    Assignee: Novatronix Corporation
    Inventor: Boris Kharas
  • Publication number: 20090238517
    Abstract: An optical waveguide assembly and method of forming the same is described. The optical waveguide assembly includes a waveguide, an amorphous silicon arrayed waveguide grating communicative with the waveguide, and an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to the amorphous silicon arrayed waveguide grating. The method includes providing a waveguide, providing an amorphous silicon arrayed waveguide grating communicative with the waveguide, and providing an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to the amorphous silicon arrayed waveguide grating.
    Type: Application
    Filed: May 12, 2009
    Publication date: September 24, 2009
    Applicant: Novatronix Corporation
    Inventors: Martin H. Kwakernaak, Hooman Mohseni, Gary Pajer
  • Patent number: 7546011
    Abstract: An optical waveguide assembly and method of forming the same is described. The optical waveguide assembly includes a waveguide, an amorphous silicon arrayed waveguide grating communicative with the waveguide, and an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to the amorphous silicon arrayed waveguide grating. The method includes providing a waveguide, providing an amorphous silicon arrayed waveguide grating communicative with the waveguide, and providing an integrated amorphous silicon waveguide grating laser which communicatively outputs a laser output responsive to the amorphous silicon arrayed waveguide grating.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: June 9, 2009
    Assignee: Novatronix Corporation
    Inventors: Martin H. Kwakernaak, Hooman Mohseni, Gary Pajer