Abstract: The invention relates to a physical vapor deposition coating device (1), comprising a process chamber (2) with an anode (3) and a consumable cathode (4) to be consumed by an electrical discharge for coating a substrate located within the process chamber (2). The coating device (1) further includes a first electrical energy source (5) being connected with its negative pole to said consumable cathode (4), and a second electrical energy source (6) being connected with its positive pole to said anode (3). According to the invention, a third electrical energy source (7) is provided being connected with its negative pole to a source cathode (8) which is different from the consumable cathode (4). In addition, the invention relates to a physical vapor deposition method for coating a substrate.

Abstract: The invention relates to a coating chamber (1) for performing a vacuum-assisted coating process, in particular PVD or CVD or electric arc coating chamber or hybrid coating chamber. The coating chamber (1) comprises a heat shield (3, 31, 32, 33), which is arranged on a temperature-controllable chamber wall (2) of the coating chamber (1) and is intended for adjusting an exchange of a predeterminable amount of thermal radiation between the heat shield (3, 31, 32, 33) and the temperature-controllable chamber wall (2).

Abstract: A power distributor that is capable of distributing the high power from a DC generator to more than two targets sequentially and without the power output of the DC generator being interrupted. Furthermore, the invention relates to a sputter source that includes the power generator described above.

Abstract: The invention relates to a method for coating substrates by sputtering of target material, the method comprising the following steps: —applying a first sputtering target made of a first material in a coating chamber to a power pulse by which, during a first time interval, a first amount of energy is transmitted to the sputtering target, wherein the maximum power density exceeds 50 W/cm2 and preferably 500 W/cm2; —applying a second sputtering target made of a second material that is different from the first material in the coating chamber to a power pulse by which, during a second time interval, a second amount of energy is transmitted to the sputtering target, wherein the maximum power density exceeds 50 W/cm2 and preferably 500 W/cm2, characterized in that the first amount of energy differs from the second amount of energy.

Abstract: A method for coating workpieces includes the following steps: charging a coating chamber with the workpieces to be coated; closing and evacuating the coating chamber to a predetermined process pressure, starting a coating source, which comprises a target as a material source, whereby particles are accelerated from the surface of the target toward substrates, characterized in that until the target has been conditioned a shield is provided between the target surface and the substrate, wherein meanwhile the substrates to be coated are at least partially subjected to a pretreatment.

Abstract: The magnetron sputtering source comprises a target mount for mounting a target arrangement comprising a sputtering target having a sputtering surface; a primary magnet arrangement for generating close to said sputtering surface a magnetron magnetic field describing one tunnel-like closed loop having an arc-shaped cross-section; a secondary magnet arrangement for generating close to said sputtering surface an auxiliary magnetic field having a substantially arc-shaped cross-section, said auxiliary magnetic field superposing with said magnetron magnetic field and being substantially inversely polarized with respect to said magnetron magnetic field; and an adjustment unit for adjusting said auxiliary magnetic field. The vacuum treatment apparatus comprises such a magnetron sputtering source.

Abstract: The present invention relates to coated sliding parts having coating systems which allow better sliding performance under dry and/or under lubricated conditions. The coating systems according to the present invention being characterized by having an outermost layer which—is a smooth oxide-containing layer in case of sliding applications under lubricated conditions, or—is a self-lubricated layer comprising molybdenum nitride, in case of sliding applications under dry or lubricated conditions, is a selflubricated layer with a structured surface comprising a multitude of essentially circular recesses with diameters of several micrometers or below, the recesses randomly distributed over the surface.

Abstract: The present invention relates to painting plant, the individual apparatus of which, which are required for different process steps, are accommodated in individual detachable modules, thus considerably simplifying the installation of the painting plant as well as the maintenance and servicing thereof.

Abstract: A system, in particular a turbocharger with a barrier layer for protecting against high temperature corrosion of parts and/or components of the system or turbocharger that are subjected to high temperatures, where the barrier layer includes at least one Cr—Al—O layer.

Abstract: A component, the surface of which is at least partially covered with a coating, wherein the coating comprises a PVD coating arranged between a first paint layer and a second paint layer and the first paint layer forms a base coat layer on the surface and the second paint layer forms a top coat layer having a top coat thickness on the PVD coating, wherein at least the top coat layer was produced with UV-curable paint. Proceeding from the interface of the PVD coating in a region smaller than the top coat thickness, the top coat layer has a lower degree of cross-linking induced by UV light than in the part of the top coat layer connected to said region. The invention relates in particular to a method for producing such a component.

Abstract: This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current. The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18? and an additional power supply 13?, 18?, or a power supply 21, 21?, 22 designed with switchable combinatorial circuitry.

Abstract: A coating system comprising at least one layer made at least essentially of ZrO2 which is used for providing insulating properties to parts of medical devices, particularly of electrosurgical devices.

Abstract: A hard coating comprising at least one hard layer with dedicated architectural design for attaining enhanced tribological performance (low abrasive and adhesive wear) at room and elevated temperatures in contact with Al-, Zn- and Fe-based or other counter bodies.

Abstract: A coated product having coating that includes a layer of hard material having a defined multi-ply layer structure, thereby significantly minimizing or preventing heat input into the coated substrate resulting from the effect of thermal hot spots.

Abstract: In order to produce zirconia-based layers on a deposition substrate, wherein reactive spark deposition using pulsed spark current and/or the application of a magnetic field that is perpendicular to the spark target are employed, a mixed target comprising elemental zircon and at least one stabilizer is used, or a zirconium target comprising elemental zirconium is used, wherein in addition to oxygen, nitrogen is used as the reactive gas. As an alternative, combined with the use of the mixed target, nitrogen can also be used as the reactive gas in addition to oxygen.

Abstract: The invention relates to a target which is embodied as a material source for a depositing method from the gas phase, comprising a front side and a rear side, characterized in that a self-adhesive carbon film is applied to the rear side. Said target can be embodied as a material source for a sputtering method and/or for an arc evaporation method. A particular advantage is that the target is used in a coating source with indirect cooling, the self-adhesive carbon film being in contact with the surface of the membrane which is part of a cooling channel.

Abstract: The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

Abstract: The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.

Abstract: A coating method based on gas phase deposition by arc evaporation, with the steps: selecting a first target as a material source for the coating; providing a coating chamber with an arc evaporation source including the selected target; loading the chamber with substrates to be coated; pumping down the chamber to a process pressure suitable for the arc evaporation; and igniting and operating the arc such that material is evaporated from the first target and is then deposited on the substrates to be coated, optionally after reaction with a reactive gas admitted into the coating chamber. The first target includes at least one matrix component and one doping component such that the doping component has a melting point at least 500° C. lower than the matrix component, and a melted drop of the doping component on a solid surface of the matrix component assumes a contact angle of a least 90°.

Abstract: A hard coating containing at least one layer including chromium, aluminum, tantalum and nitrogen as main components and a chemical composition (AlaCrbTac)N in which the following conditions are satisfied: a=x, (1?c), b=(1?x)·(1?c), 0.60?x?0.70, and 0.01?c?0.5. The layer has an X-ray diffraction peak intensity ratio of I200/(I200+I111)?0.25. The application also relates to a reactive arc ion plating PVD process for making the hard coating.