Abstract: A component, the surface of which is at least partially covered with a coating, wherein the coating comprises a PVD coating arranged between a first paint layer and a second paint layer and the first paint layer forms a base coat layer on the surface and the second paint layer forms a top coat layer having a top coat thickness on the PVD coating, wherein at least the top coat layer was produced with UV-curable paint. Proceeding from the interface of the PVD coating in a region smaller than the top coat thickness, the top coat layer has a lower degree of cross-linking induced by UV light than in the part of the top coat layer connected to said region. The invention relates in particular to a method for producing such a component.

Abstract: This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current. The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18? and an additional power supply 13?, 18?, or a power supply 21, 21?, 22 designed with switchable combinatorial circuitry.

Abstract: A coating system comprising at least one layer made at least essentially of ZrO2 which is used for providing insulating properties to parts of medical devices, particularly of electrosurgical devices.

Abstract: A hard coating comprising at least one hard layer with dedicated architectural design for attaining enhanced tribological performance (low abrasive and adhesive wear) at room and elevated temperatures in contact with Al-, Zn- and Fe-based or other counter bodies.

Abstract: A coated product having coating that includes a layer of hard material having a defined multi-ply layer structure, thereby significantly minimizing or preventing heat input into the coated substrate resulting from the effect of thermal hot spots.

Abstract: In order to produce zirconia-based layers on a deposition substrate, wherein reactive spark deposition using pulsed spark current and/or the application of a magnetic field that is perpendicular to the spark target are employed, a mixed target comprising elemental zircon and at least one stabilizer is used, or a zirconium target comprising elemental zirconium is used, wherein in addition to oxygen, nitrogen is used as the reactive gas. As an alternative, combined with the use of the mixed target, nitrogen can also be used as the reactive gas in addition to oxygen.

Abstract: The invention relates to a target which is embodied as a material source for a depositing method from the gas phase, comprising a front side and a rear side, characterized in that a self-adhesive carbon film is applied to the rear side. Said target can be embodied as a material source for a sputtering method and/or for an arc evaporation method. A particular advantage is that the target is used in a coating source with indirect cooling, the self-adhesive carbon film being in contact with the surface of the membrane which is part of a cooling channel.

Abstract: The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

Abstract: The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.

Abstract: A coating method based on gas phase deposition by arc evaporation, with the steps: selecting a first target as a material source for the coating; providing a coating chamber with an arc evaporation source including the selected target; loading the chamber with substrates to be coated; pumping down the chamber to a process pressure suitable for the arc evaporation; and igniting and operating the arc such that material is evaporated from the first target and is then deposited on the substrates to be coated, optionally after reaction with a reactive gas admitted into the coating chamber. The first target includes at least one matrix component and one doping component such that the doping component has a melting point at least 500° C. lower than the matrix component, and a melted drop of the doping component on a solid surface of the matrix component assumes a contact angle of a least 90°.

Abstract: A hard coating containing at least one layer including chromium, aluminum, tantalum and nitrogen as main components and a chemical composition (AlaCrbTac)N in which the following conditions are satisfied: a=x, (1?c), b=(1?x)·(1?c), 0.60?x?0.70, and 0.01?c?0.5. The layer has an X-ray diffraction peak intensity ratio of I200/(I200+I111)?0.25. The application also relates to a reactive arc ion plating PVD process for making the hard coating.

Abstract: A coated body includes a body (1) with a body surface (3) and a coating system (20) deposited on at least a portion of the body surface (3). The coating system (20) includes at least one hard friction reducing coating deposited as an outermost layer (9) which exhibits droplets (10) at its surface. The outermost layer (9) includes molybdenum copper nitride and/or molybdenum nitride and copper nitride, and at least some of the droplets (10) consist mainly of copper. Preferably most of the largest droplets (10) consist mainly of copper.

Abstract: The invention relates to a vacuum chamber for the treatment of substances, comprising at least the following elements: heat supply elements for the heat supply into a treatment area of the vacuum chamber, in which at least one substrate (10) can be treated, a chamber wall (20), through which heat can be removed from the treatment area, comprising an inner and an outer chamber wall side, and a shielding wall (30), which is arranged between the chamber wall (20) and the treatment area, such that an averted shielding wall side regarding to the treatment area is placed opposite the inner chamber wall side, and characterized in, that the shielding wall side placed opposite the inner chamber wall side is at least partially, preferred largely applied with a first coating (31), which has an emission coefficient ??0.65.

Abstract: The present invention relates to a holder for a number of drills, which can advantageously be used for coating drill tips. The holders according to the invention make it possible to arrange the drills in the coating unit in such a way that their tips rest on a cylindrical wall and these can be rotated past a coating source at the same minimum distance. The holder comprises a first curved wall with holes, a second curved wall with holes or slits and a third wall which serves as stop for drills inserted in the holes of the first and second wall.

Abstract: A hard material layer system with a multilayer structure, comprising alternating layers A and B, with A layers having the composition MeApAOnANmA in atomic percent and B layers having the composition MeBpBOnBNmB in atomic percent, where the thermal conductivity of the A layers is greater than the thermal conductivity of the B layers. MeA and MeB each comprise at least one metal of the group Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, and Al, pA indicates the atomic percentage of MeA and pB indicates the atomic percentage of MeB and the following is true: PA=PB, nA indicates the oxygen concentration in the A layers in atomic percent and nB indicates the oxygen concentration in the B layers in atomic percent and the following is true: nA<nB, and mA indicates the nitrogen concentration in the A layers in atomic percent and mB indicates the nitrogen concentration in the B layers in atomic percent and the following is true: pA/(nA+mA)=pB/(nB+mB).

Abstract: The present invention relates to a wear resistant coating suitable to be deposited on cutting tool inserts for chip forming metal machining. The coating comprises at least two layers with different grain size, but with essentially the same composition. The coating is deposited by Physical Vapor Deposition (PVD).

Abstract: The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

Abstract: A jet-black coating that resists wear; first, at least one DLC layer with a high degree of hardness is applied to a component and then a gradient layer, whose density decreases in the direction toward the surface, is applied to this DLC layer. By means of the refraction index progression that this produces in the gradient layer, the gradient layer functions as a reflection-reducing layer.

Abstract: A workpiece having a coating, said coating comprising at least one TiXSi1-xN layer, characterized in that x?0.85 and the TixSi1-xN layer contains nanocrystals, the nanocrystals present having an average grain size of not more than 15 nm and having a (200) texture. The invention also relates to a process for producing the aforementioned layer, characterized in that the layer is produced using a sputtering process, in which current densities of greater than 0.2 A/cm2 arise on the target surface of the sputtering target, and the target is a TiXSi1-xN target, where x?0.85. An intermediate layer containing TiAlN or CrAlN is preferably provided between the TixSi1-xN layer and the substrate body of the workpiece.

Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.