Abstract: The lithium ion conductive material includes, in mole percent on an oxide basis, 36.6 to 37.3% of a P2O5 component, 43.0 to 48.1% of a TiO2 component, 0.6 to 3.2% of an Al2O3 component and 13.9 to 17.5% of a Li2O component, wherein a mole percent of the Al2O3 component is 0.3 to 3.0% by mole smaller than a mole percent of an Al2O3 component calculated by the composition formula Li1+xAlxTi2-xP3O12 (x=0.05 to 0.4) derived from the composition of Ti and Li, and a mole percent of the P2O5 component is 0.2 to 2.0% by mole smaller than a mole percent of a P2O5 component calculated by the above composition formula, and wherein the lithium ion conductive material further includes a crystal phase with a rhombohedral NASICON structure or a Li1+xAlxTi2-xP3O12 (x?0) crystal phase.

Abstract: To provide a crystallized glass substrate including a surface with a compressive stress layer, where a stress depth DOLzero of the compressive stress layer, at which the compressive stress is 0 MPa, is 45 to 200 ?m, a compressive stress CS on an outermost surface of the compressive stress layer is 400 to 1400 MPa, and a central stress CT determined by using curve analysis is 55 to 300 MPa.

Abstract: To provide a crystallized glass substrate including a surface with a compressive stress layer, in which a stress depth DOLzero of the compressive stress layer, at which the compressive stress is 0 MPa, is 45 to 200 ?m, a compressive stress CS on an outermost surface of the compressive stress layer is 400 to 1400 MPa, and CS×DOLzero, which is a product of the compressive stress CS on the outermost surface and the stress depth DOLzero (?m), is 4.8×104 or more.

Abstract: Provided is a crystallized glass substrate including a surface with a compressive stress layer, in which a gradient A of a surface compressive stress from an outermost surface to a depth of 6 ?m in the compressive stress layer is 50.0 to 110.0 MPa/?m, a gradient B of a surface compressive stress from a depth of (a stress depth DOLzero—10 ?m) to the stress depth DOLzero is 2.5 to 15.0 MPa/?m, where the stress depth DOLzero is a depth of the compressive stress layer at a surface compressive stress of 0 MPa, and a hardness of the outermost surface at an indentation depth of 20 nm is 7.50 to 9.50 GPa.

Abstract: To provide a crystallized glass substrate including a surface with a compressive stress layer, in which, CS is 400 to 1400 MPa and CT×(T?2×DOLzero)/CS×DOLzero is 0.60 or more, where CS (MPa) denotes a compressive stress on an outermost surface of the compressive stress layer, DOLzero (?m) denotes a stress depth of the compressive stress layer at which the compressive stress is 0 MPa, CT (MPa) denotes a central stress determined by curve analysis, and T (?m) denotes a thickness of the substrate.

Abstract: To provide a crystallized glass substrate including a surface with a compressive stress layer, in which a compressive stress CS (MPa) on an outermost surface of the compressive stress layer is 400 to 1400 MPa, and DOL50%/DOLzero is 0.30 or more, where DOL50% (?m) is a depth at which the value of the compressive stress is 50% of the CS and DOLzero (?m) is a depth at which the value of the compressive stress is 0 MPa.

Abstract: To provide an inorganic composition article containing at least one kind selected from ?-cristobalite and ?-cristobalite solid solution as a main crystal phase, in which by mass % in terms of oxide, a content of a SiO2 component is 50.0% to 75.0%, a content of a Li2O component is 3.0% to 10.0%, a content of an Al2O3 component is 5.0% or more and less than 15.0%, and a total content of the Al2O3 component and a ZrO2 component is 10.0% or more, and a surface compressive stress value is 600 MPa or more.

Abstract: To provide a crystallized glass substrate including a surface with a compressive stress layer, in which a stress depth DOLzero of the compressive stress layer, at which the compressive stress is 0 MPa, is 45 to 200 ?m, a compressive stress CS on an outermost surface of the compressive stress layer is 400 to 1400 MPa, and CS×DOLzero, which is a product of the compressive stress CS on the outermost surface and the stress depth DOLzero (?m), is 4.8×104 or more.

Abstract: To provide a crystallized glass substrate including a surface with a compressive stress layer, where a stress depth DOLzero of the compressive stress layer, at which the compressive stress is 0 MPa, is 45 to 200 ?m, a compressive stress CS on an outermost surface of the compressive stress layer is 400 to 1400 MPa, and a central stress CT determined by using curve analysis is 55 to 300 MPa.

Abstract: The purpose of the present invention is to provide a cell culture substratum which has excellent resistance to liquid culture media and low cytotoxicity, can achieve a high cell adhesion ratio and a high viability of cultured cells, has excellent thermal stability, and is less likely to absorbs ultraviolet ray.

Abstract: To provide an optical glass having the optical characteristics of a high refractive index and low dispersion, and moreover, which makes it possible to further reduce devitrification and which can be stably obtained, and a preform and an optical element using the same. The optical glass comprises, expressed in cation % (mol %), 17.0% to 42.0% of P5+, 7.0% to 30.0% of Al3+, more than 0% to 22.0% of Mg2+, more than 0% to 25.0% Ca2+, more than 0% to 30.0% of Sr2+, more than 0% to 35.0% Ba2+, and expressed in anion % (mol %), a content ratio of F? of 37.0 to 64.0%, a content ratio of O2? of 36.0 to 63.0%, a refractive index (nd) of 1.48 to 1.58, and having an Abbe number (vd) of 70 to 88, and a liquidus temperature of 800° C. or less.

Abstract: A crystallized glass includes a crystallized glass mother material, and, in a surface, a compressive stress layer, wherein the crystallized glass has, for a thickness of 10 mm, a light transmittance of, including reflection loss, 80% at a wavelength in 400 to 669 nm, and has a Vickers hardness [Hv] of 835 to 1300. In the crystallized glass, the crystallized glass mother material contains, in % by weight on an oxide basis, 40.0% to 70.0% of a SiO2 component, 11.0% to 25.0% of an Al2O3 component, 5.0% to 19.0% of a Na2O component, 0% to 9.0% of a K2O component, 1.0% to 18.0% of a MgO component, 0% to 3.0% of a CaO component, and 0.5% to 12.0% of a TiO2 component, and a total content of the SiO2 component, the Al2O3 component, the Na2O component, the K2O component, the MgO component, and the TiO2 component is 90% or more.

Abstract: To provide a crystallized glass substrate that is hard and resistant to fracture and that is also resistant to shattering upon breakage. A crystallized glass substrate includes a crystallized glass serving as a base material and a compressive stress layer forming a surface thereof. The crystallized glass contains, in % by weight on an oxide basis, 40.0% to 70.0% of a SiO2 component, 11.0% to 25.0% of an Al2O3 component, 5.0% to 19.0% of a Na2O component, 0% to 9.0% of a K2O component, 1.0% to 18.0% of one or more selected from a MgO component and a ZnO component, 0% to 3.0% of a CaO component, and 0.5% to 12.0% of a TiO2 component. The SiO2 component, the Al2O3 component, the Na2O component, the one or more selected from the MgO component and the ZnO component, and the TiO2 component are present in a total amount of 90% or more. The compressive stress layer has a depth of layer of 40 ?m or more. The compressive stress layer has a surface compressive stress of 750 MPa or more.

Abstract: An electrochemical cell includes an all-solid-state electrode body in which a positive electrode layer and a negative electrode layer are laminated together through a solid electrolyte and an exterior body having a cavity in which the electrode body is stored. The exterior body has a first case and a second case which sandwich the electrode body and a sealing member that defines the cavity together with the first case and the second case by joining the first case and the second. The thermal expansion coefficients of the electrode body, the first case, the second case, and the sealing member are all 10×10?6/° C. or lower.

Abstract: Provided is a high-strength crystallized glass or substrate having a high visible light transmittance and a good color balance, which is suitable for use in protecting members of portable electronic devices, optical devices and the like. Provided is a crystallized glass comprising, in terms of mol % on an oxide basis: an SiO2 component of 30.0% or more and 70.0% or less, an Al2O3 component of 8.0% or more and 25.0%, an Na2O component of 0% or more and 25.0% or less, an MgO component of 0% or more and 25.0% or less, a ZnO component of 0% or more and 30.0% or less and a TiO2 component of 0% or more and 10.0% or less, the molar ratio [Al2O3/(MgO+ZnO)] having a value of 0.5 or more and 2.0 or less, and comprising one or more selected from RAl2O4, RTi2O5, R2TiO4, R2SiO4, RAl2Si2O8 and R2Al4Si5O18 as a crystal phase.

Abstract: An optical glass having a small partial dispersion ratio (?g,F), while having a refractive index (nd) and Abbe number (?d) within desired ranges, is obtained. The optical glass, in mass %, comprises 10.0 to 70.0% of an SiO2 component, 1.0 to 50.0% of an Nb2O5 component, and 1.0 to 30.0% of an Na2O component, and has a refractive index (nd) of 1.62 to 1.75, an Abbe number (?d) of 30 to 42, and a partial dispersion ratio (?g,F) of no greater than 0.594.

Abstract: An optical glass having a small partial dispersion ratio (?g,F), while having a refractive index (nd) and Abbe number (?d) within desired ranges, is obtained. The optical glass, in mass %, comprises 10.0 to 70.0% of an SiO2 component, 1.0 to 50.0% of an Nb2O5 component, and 1.0 to 30.0% of an Na2O component, and has a refractive index (nd) of 1.62 to 1.75, an Abbe number (?d) of 30 to 42, and a partial dispersion ratio (?g,F) of no greater than 0.594.

Abstract: Provided are an optical glass that has optical properties including a medium refractive index and low dispersion and that has good chemical durability and a low specific gravity, and a preform material and an optical element that use the optical glass. The optical glass contains a SiO2 component: 0% or more and less than 30.0%; 8.0% to 30.0% of an Al2O3 component; less than 20.0% of an RO component (where R represents at least one selected from the group consisting of Zn, Mg, Ca, Sr, and Ba) in terms of a mass sum; and 10.0% to 55.0% of an Ln2O3 component (where Ln represents at least one selected from the group consisting of La, Gd, Y, and Lu) in terms of a mass sum. A mass ratio (SiO2+Al2O3)/B2O3 is 0.3 to 10.0, and the optical glass has a refractive index (nd) of 1.58 or more and 1.80 or less and an Abbe number (?d) of 35 or more and 65 or less.

Abstract: Provided is glass having a predetermined index of refraction (nd) and Abbe number (?d), high chemical resistance (acid resistance) and a small degree of abrasion. The optical glass contains, in wt %, 10.0-40.0% of a SiO2 component, 15.0-50.0% of a La2O3 component and 5.0% to less than 25.0% of a TiO2 component, has a mass ratio B2O3/SiO2 less than or equal to 1.00, an index of refraction (nd) of 1.78-1.95 and an Abbe number (?d) of 25-45, and chemical resistance (acid resistance) via a powder method that is class 1-3. The optical glass has a degree of abrasion of less than or equal to 200.

Abstract: The present invention provides an electrochemical cell including: an electrode body; an exterior packaging body in which a plurality of substrates including a first substrate formed from a ceramic material are stacked in the first direction, and a cavity in which the electrode body is accommodated is formed; a first electrode connection wiring that is formed in the exterior packaging body and connects a first electrode layer and an external substrate to each other; and a second electrode connection wiring that is forming in the exterior packaging body and connects a second electrode layer and the external substrate to each other. At least the first electrode connection wiring is formed in the first substrate, and an attachment portion, to which a fastening member configured to mount at least the first electrode connection wiring to the external substrate is attached, is formed in the first substrate.