Patents Assigned to OSAKA ORGANIC CHEMICAL INDUSTRIES LTD.
  • Publication number: 20160136538
    Abstract: A (meth)acrylate production system having a reactor (A1) provided with a distillation column (2) and a distillation apparatus (B3) provided with a distillation column (4). A condensing apparatus (6) is provided at the top of the distillation column (2).
    Type: Application
    Filed: December 22, 2015
    Publication date: May 19, 2016
    Applicant: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
    Inventors: Shigeaki Matsumoto, Keisuke Ito, Masayoshi Matsuno
  • Publication number: 20160045414
    Abstract: Provided is a composition containing, as an alkane polyol, a C4-18 1,2-alkane polyol in which the degradation over time of the C4-18 1,2-alkane polyol, which has inferior chemical stability and degrades easily, is suppressed, the composition being suitable for use in a cosmetic, an inkjet ink, a fiber or a coating material such as a paint. A composition containing 1,2-alkane polyol that can be used in a cosmetic, an inkjet ink, a raw material for fibers or a coating material, the alkane polyol being a C4-18 1,2-alkane polyol, and the composition containing a radical scavenger.
    Type: Application
    Filed: October 9, 2015
    Publication date: February 18, 2016
    Applicant: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
    Inventors: Yutaka Hoshino, Takahiro Mukaiyama
  • Publication number: 20150316847
    Abstract: A (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester of formula wherein R1 and R2 are each independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms; R3 is a hydrogen atom, a methyl group, or a trifluoromethyl group; and n and m are each independently an integer of 0 to 3, provided that n and m are not simultaneously 0. Also, a positive photoresist composition including the (meth)acrylic polymer and a method of forming a photoresist pattern with the positive photoresist composition.
    Type: Application
    Filed: July 14, 2015
    Publication date: November 5, 2015
    Applicant: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
    Inventors: Shinji TANAKA, Yoshitaka Uenoyama, Hidetoshi Ono, Naoya Kawano, Katsuki Ito
  • Publication number: 20150259570
    Abstract: A hydrophilic coating agent for use in the formation of a coating film that can keep hydrophilicity, an anti-fogging property and an anti-fogging effect thereof and has water resistance, the coating agent including an alkoxysilyl-group-containing compound, a film which has an anti-fogging property and can be produced by shaping the hydrophilic coating agent into a film-like form; and a product which has an anti-fogging layer formed on the surface thereof, wherein the anti-fogging layer is formed from the hydrophilic coating agent.
    Type: Application
    Filed: May 28, 2015
    Publication date: September 17, 2015
    Applicant: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
    Inventors: Kazuyoshi Matsuoka, Yoshiyuki Saruwatari, Masayuki Ando
  • Publication number: 20150126766
    Abstract: A process for preparing 4-hydroxybutyl acrylate by transesterifying an alkyl acrylate with 1,4-butanediol in the presence of a dialkyltin oxide such that each of the alkyl groups has 4 to 8 carbon atoms, characterized in that the amount of the dialkyltin oxide is adjusted to 0.00001 to 0.01 moles per one mole of the alkyl acrylate.
    Type: Application
    Filed: October 17, 2014
    Publication date: May 7, 2015
    Applicant: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
    Inventors: Yukio Tanaka, Kohei Okamura, Toyoyuki Sugiura, Keisuke Ito, Naohiko Kawakami, Shigeaki Matsumoto, Masayoshi Matsuno
  • Publication number: 20130224861
    Abstract: A method for manufacturing a cell culture substrate obtained by forming a coating layer of a polymer on the surface of a substrate, wherein the polymer is formed by polymerizing a monomer component containing a nitrogen atom-containing monomer represented by formula (I): wherein R1 is hydrogen atom or methyl group, R2 is an alkylene group having 1 to 6 carbon atoms, each of R3 and R4 is independently an alkyl group having 1 to 4 carbon atoms, R5 is an alkylene group having 1 to 4 carbon atoms, and Y is oxygen atom or —NH— group, includes irradiating the polymer with ion beam at a predetermined position of the coating layer of the polymer, to remove the coating layer of the polymer irradiated with the ion beam.
    Type: Application
    Filed: August 30, 2011
    Publication date: August 29, 2013
    Applicant: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
    Inventors: Hiromi Kitano, Yoshiyuki Saruwatari, Kazuyoshi Matsuoka