Patents Assigned to Osmic, Inc.
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Publication number: 20100284516Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two-dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Qmin.Type: ApplicationFiled: April 5, 2010Publication date: November 11, 2010Applicant: Osmic, Inc.Inventor: Licai Jiang
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Patent number: 7280634Abstract: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.Type: GrantFiled: June 8, 2006Date of Patent: October 9, 2007Assignee: Osmic, Inc.Inventors: Boris Verman, Jimpei Harada
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Patent number: 7245699Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.Type: GrantFiled: February 26, 2004Date of Patent: July 17, 2007Assignee: Osmic, Inc.Inventors: Boris Verman, Licai Jiang
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Patent number: 7139366Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two-dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Qmin.Type: GrantFiled: May 31, 2005Date of Patent: November 21, 2006Assignee: Osmic, Inc.Inventor: Licai Jiang
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Patent number: 7076026Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.Type: GrantFiled: June 10, 2004Date of Patent: July 11, 2006Assignee: Osmic, Inc.Inventors: Boris Verman, Jimpei Harada
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Patent number: 6944270Abstract: The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.Type: GrantFiled: February 26, 2004Date of Patent: September 13, 2005Assignee: Osmic, Inc.Inventor: Bonglea Kim
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Patent number: 6870896Abstract: A method of imaging an object that includes subjecting an object to a beam of radiation that is directed along a first direction and analyzing a first portion of the beam of radiation that is transmitted through the object along the first direction so that the intensity of the first portion is suppressed. Analyzing a second portion of the beam of radiation that is refracted from the object. Generating an image of the object based on the suppressed first portion of the beam of radiation and the second portion of the beam of radiation.Type: GrantFiled: December 28, 2001Date of Patent: March 22, 2005Assignee: Osmic, Inc.Inventor: Vladimir V. Protopopov
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Patent number: 6809864Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.Type: GrantFiled: November 22, 2002Date of Patent: October 26, 2004Assignee: Osmic, IncInventors: Vladimir V. Martynov, Yuriy Platonov
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Publication number: 20040170250Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.Type: ApplicationFiled: February 26, 2004Publication date: September 2, 2004Applicant: Osmic, Inc.Inventors: Boris Verman, Licai Jiang
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Patent number: 6763086Abstract: The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanum-based alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n−1.Type: GrantFiled: September 5, 2002Date of Patent: July 13, 2004Assignee: Osmic, Inc.Inventor: Yuriy Platonov
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Patent number: 6643353Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.Type: GrantFiled: January 10, 2002Date of Patent: November 4, 2003Assignee: Osmic, Inc.Inventors: Boris Verman, Karsten Joensen, Yuriy Platonov, Srivatsan Seshardi
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Publication number: 20030128810Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.Type: ApplicationFiled: January 10, 2002Publication date: July 10, 2003Applicant: Osmic, Inc.Inventors: Boris Verman, Karsten Joensen, Yuriy Platonov, Srivatsan Seshadri
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Publication number: 20030128811Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.Type: ApplicationFiled: May 14, 2002Publication date: July 10, 2003Applicant: Osmic, Inc.Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
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Publication number: 20030072412Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.Type: ApplicationFiled: November 22, 2002Publication date: April 17, 2003Applicant: Osmic, Inc.Inventors: Vladimir V. Martynov, Yuriy Platonov
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Patent number: 6510200Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.Type: GrantFiled: June 29, 2001Date of Patent: January 21, 2003Assignee: Osmic, Inc.Inventors: Vladimir V. Martynov, Yuriy Platonov
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Publication number: 20030002622Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.Type: ApplicationFiled: June 29, 2001Publication date: January 2, 2003Applicant: Osmic, Inc.Inventors: Vladimir V. Martynov, Yuriy Platonov
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Patent number: 6421417Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.Type: GrantFiled: August 2, 1999Date of Patent: July 16, 2002Assignee: Osmic, Inc.Inventors: Licai Jiang, Boris Verman
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Patent number: 6389100Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.Type: GrantFiled: April 9, 1999Date of Patent: May 14, 2002Assignee: Osmic, Inc.Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
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Patent number: 6330301Abstract: An x-ray analysis system including a focusing optic for focusing an x-ray beam to a focal point, a first slit optically coupled to the focusing optic, a second slit optically coupled to the first slit, and an x-ray detector, where the focal point is located in front of the detector.Type: GrantFiled: December 17, 1999Date of Patent: December 11, 2001Assignee: Osmic, Inc.Inventor: Licai Jiang
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Patent number: 6069934Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.Type: GrantFiled: April 7, 1998Date of Patent: May 30, 2000Assignee: Osmic, Inc.Inventors: Boris Verman, Licai Jiang