Patents Assigned to Plex LLC
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Patent number: 9578729Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low-temperature plasma. The plasma is initially trapped in a mirror magnetic field configuration with a low magnetic field barrier to axial motion. Plasma overflows axially at each end of the mirror into magnetic cusps and is conducted by radial magnetic field lines to annular beam dumps disposed around the waist of each cusp.Type: GrantFiled: November 17, 2015Date of Patent: February 21, 2017Assignee: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 9544986Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted within a cone-shaped sheet to an annular beam dump.Type: GrantFiled: February 18, 2016Date of Patent: January 10, 2017Assignee: PLEX LLCInventor: Malcolm W. McGeoch
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Publication number: 20160242268Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted within a cone-shaped sheet to an annular beam dump.Type: ApplicationFiled: February 18, 2016Publication date: August 18, 2016Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Publication number: 20160150625Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low-temperature plasma. The plasma is initially trapped in a mirror magnetic field configuration with a low magnetic field barrier to axial motion. Plasma overflows axially at each end of the mirror into magnetic cusps and is conducted by radial magnetic field lines to annular beam dumps disposed around the waist of each cusp.Type: ApplicationFiled: November 17, 2015Publication date: May 26, 2016Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 9301380Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted by radial field lines to a large area annular array of beam dumps.Type: GrantFiled: September 14, 2015Date of Patent: March 29, 2016Assignee: PLEX LLCInventor: Malcolm W. McGeoch
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Publication number: 20160007433Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted by radial field lines to a large area annular array of beam dumps.Type: ApplicationFiled: September 14, 2015Publication date: January 7, 2016Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 9155178Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted by radial field lines to a large area annular array of beam dumps.Type: GrantFiled: June 27, 2014Date of Patent: October 6, 2015Assignee: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 8592788Abstract: A plasma pinch extreme ultraviolet source using lithium vapor requires surrounding surfaces that are heated or cooled in order to evaporate the desired quantity of lithium, typically setting the vapor pressure of lithium at a pressure of a few torr. Two distinct surfaces within the whole set are designated as the electrodes that emit and receive the high current of the plasma pinch. A method is described whereby the temperature of these designated electrode surfaces is manipulated in order to condense lithium and provide a liquid metal protective layer to absorb both plasma and extreme ultraviolet heat thereby controlling electrode erosion. A further method is described that provides a protective flow of liquid lithium exactly on the axis of the pair of discharge electrodes.Type: GrantFiled: February 25, 2013Date of Patent: November 26, 2013Assignee: Plex LLCInventor: Malcolm W. McGeoch
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Patent number: 8569724Abstract: The successful use of lithium vapor in an extreme ultraviolet (EUV) light source depends upon an intense localized heat source at the center of conical structures that evaporate, condense and re-supply liquid lithium. Induction heating of a hollow structure with toroidal topology via an internal helical field coil, can supply intense heat at its innermost radius. The resulting slim radio frequency heated structure has high optical transmission from a central EUV producing plasma to collection mirrors outside of the structure, improving EUV source efficiency and reliability.Type: GrantFiled: December 14, 2011Date of Patent: October 29, 2013Assignee: Plex LLCInventor: Malcolm W. McGeoch
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Publication number: 20130153568Abstract: The succesful use of lithium vapor in an extreme ultraviolet (EUV) light source depends upon an intense localized heat source at the center of conical structures that evaporate, condense and re-supply liquid lithium. Induction heating of a hollow structure with toroidal topology via an internal helical field coil, can supply intense heat at its innermost radius. The resulting slim radio frequency heated structure has high optical transmission from a central EUV producing plasma to collection mirrors outside of the structure, improving EUV source efficiency and reliability.Type: ApplicationFiled: December 14, 2011Publication date: June 20, 2013Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 8440988Abstract: A magnetically shielded, efficient plasma generation configuration for a pulsed discharge extreme ultraviolet (EUV) light source comprises two opposed convex electrodes mounted with axes parallel to a static magnetic field. A limiter aperture disposed between the electrodes, in conjunction with the field lines, defines a hollow plasma cylinder connecting the electrodes. A high pulsed voltage and current compresses the plasma cylinder and its interior magnetic field onto the electrode surfaces to create a magnetic insulating layer at the same time as propelling the working gas from each side toward the space between the electrode tips. The plasma then collapses radially in a three-dimensional compression to form a dense plasma on the axis of the device with radiation of extreme ultraviolet light.Type: GrantFiled: December 9, 2010Date of Patent: May 14, 2013Assignee: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 8269199Abstract: A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.Type: GrantFiled: November 25, 2008Date of Patent: September 18, 2012Assignee: Plex LLCInventor: Malcolm W. McGeoch
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Publication number: 20120146510Abstract: A magnetically shielded, efficient plasma generation configuration for a pulsed discharge extreme ultraviolet (EUV) light source comprises two opposed convex electrodes mounted with axes parallel to a static magnetic field. A limiter aperture disposed between the electrodes, in conjunction with the field lines, defines a hollow plasma cylinder connecting the electrodes. A high pulsed voltage and current compresses the plasma cylinder and its interior magnetic field onto the electrode surfaces to create a magnetic insulating layer at the same time as propelling the working gas from each side toward the space between the electrode tips. The plasma then collapses radially in a three-dimensional compression to form a dense plasma on the axis of the device with radiation of extreme ultraviolet light.Type: ApplicationFiled: December 9, 2010Publication date: June 14, 2012Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Publication number: 20110089834Abstract: A configuration of two opposed electrodes with conical depressions and symmetry around an axis along which there is an applied steady magnetic field, is supplied with a pulsed voltage and current to create an azimuthally very uniform pre-ionization cylinder of a working gas as a precursor to stable and accurate compression of the working gas into a Z-pinch plasma photon source or plasma target for laser-pumped photon sources. A further compound hollow electrode configuration permits the generation of a cool, dense, core plasma surrounded and compressed by a hot liner plasma. Modulation of the radial density profile within this core can provide optical guiding for a laser-pumped recombination laser.Type: ApplicationFiled: August 11, 2010Publication date: April 21, 2011Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 7637403Abstract: Small, high velocity liquid metal droplets are produced for applications that require the accurate and remote placement of small quantities of a metal. The magnetic pressure of current flowing through liquid metal is used to force small quantities of liquid metal through an orifice. Examples of applications are to feed metal fuel into plasma extreme ultraviolet sources, and to place solder bumps on an integrated circuit prior to the attachment of connections.Type: GrantFiled: October 25, 2005Date of Patent: December 29, 2009Assignee: Plex LLCInventor: Malcolm W. McGeoch
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Publication number: 20090224182Abstract: A self-magnetically confined lithium plasma that has an applied axial magnetic field is irradiated at sub-critical density by a perpendicularly oriented carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size. Lithium reflux is facilitated by ionization, electric field induced drift toward, and capture on surfaces intersected perpendicularly by the applied axial magnetic field.Type: ApplicationFiled: February 20, 2009Publication date: September 10, 2009Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Publication number: 20090212241Abstract: A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.Type: ApplicationFiled: November 25, 2008Publication date: August 27, 2009Applicant: PLEX LLCInventor: Malcolm W. McGeoch
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Patent number: 7479646Abstract: An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.Type: GrantFiled: December 11, 2006Date of Patent: January 20, 2009Assignee: PLEX LLCInventor: Malcolm W. McGeoch
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Publication number: 20070158595Abstract: An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.Type: ApplicationFiled: December 11, 2006Publication date: July 12, 2007Applicant: PLEX LLCInventor: Malcolm McGeoch
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Patent number: 7079306Abstract: An optically addressed extreme ultraviolet (EUV) modulator in which a spatial amplitude or phase pattern is provided to an EUV beam that is reflected from, or transmitted through the modulator. The modulator includes a modulator structure that includes a material with a high coefficient of thermal expansion. When a thermal impulse is incident on one part of the modulator, the resulting expansion changes the reflected phase or amplitude of the EUV beam from that part. A thermal pattern is imprinted on the modulator by absorption of a visible or ultraviolet pattern, resulting in a corresponding modulation of the EUV beam. A lithography system is based on the optically addressed EUV modulator.Type: GrantFiled: August 19, 2004Date of Patent: July 18, 2006Assignee: Plex LLCInventor: Malcolm W. McGeoch