Abstract: A source of extreme ultraviolet or soft X-ray photon source includes discharge chamber containing a buffer gas, first and second electrodes in the discharge chamber configured to deliver a heating current to a plasma discharge region, and an injector to project a particle of a working substance into the plasma discharge region. The particle is evaporated and ionized by the heating current to form a hot plasma that radiates extreme ultraviolet or soft X-ray photons.

Abstract: Small, high velocity liquid metal droplets are produced for applications that require the accurate and remote placement of small quantities of a metal. The magnetic pressure of current flowing through liquid metal is used to force small quantities of liquid metal through an orifice. Examples of applications are to feed metal fuel into plasma extreme ultraviolet sources, and to place solder bumps on an integrated circuit prior to the attachment of connections.

Abstract: A source of extreme ultraviolet or soft X-ray photon source includes discharge chamber containing a buffer gas, first and second electrodes in the discharge chamber configured to deliver a heating current to a plasma discharge region, and an injector to project a particle of a working substance into the plasma discharge region. The particle is evaporated and ionized by the heating current to form a hot plasma that radiates extreme ultraviolet or soft X-ray photons.

Abstract: An optically addressed extreme ultraviolet (EUV) modulator in which a spatial amplitude or phase pattern is provided to an EUV beam that is reflected from, or transmitted through the modulator. The modulator includes a modulator structure that includes a material with a high coefficient of thermal expansion. When a thermal impulse is incident on one part of the modulator, the resulting expansion changes the reflected phase or amplitude of the EUV beam from that part. A thermal pattern is imprinted on the modulator by absorption of a visible or ultraviolet pattern, resulting in a corresponding modulation of the EUV beam. A lithography system is based on the optically addressed EUV modulator.

Abstract: A source of photons or neutrons includes a housing that defines a discharge chamber, a first group of ion beam sources directed toward a plasma discharge region in the discharge chamber, the first group of ion beam sources including a first electrode and an inner shell, and a second electrode spaced from the plasma discharge region. The source of photons or neutrons further includes a first power supply for energizing the first group of ion beam sources to electrostatically accelerate toward the plasma discharge region ion beams which are at least partially neutralized before they enter the plasma discharge region, and a second power supply coupled between the first and second electrodes for delivering a heating current to the plasma discharge region. The ion beams and the heating current form a hot plasma that radiates photons or neutrons. The source of photons or neutrons may further include a second group of ion beam sources.

Abstract: A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.

Abstract: A source of photons or neutrons includes a housing that defines a discharge chamber, a first group of ion beam sources directed toward a plasma discharge region in the discharge chamber, the first group of ion beam sources including a first electrode and an inner shell, and a second electrode spaced from the plasma discharge region. The source of photons or neutrons further includes a first power supply for energizing the first group of ion beam sources to electrostatically accelerate toward the plasma discharge region ion beams which are at least partially neutralized before they enter the plasma discharge region, and a second power supply coupled between the first and second electrodes for delivering a heating current to the plasma discharge region. The ion beams and the heating current form a hot plasma that radiates photons or neutrons. The source of photons or neutrons may further include a second group of ion beam sources.

Abstract: A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.

Abstract: A source of photons includes a discharge chamber, a plurality of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams enter the plasma discharge region and form a hot plasma that radiates photons. The photons may be in the soft X-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.

Abstract: A plasma x-ray source includes a chamber defining a pinch region having a central axis, a gas supply for introducing a gas mixture into the pinch region, a preionizing device disposed around the pinch region for preionizing the gas mixture in the pinch region, and a pinch anode and a pinch cathode disposed at opposite ends of the pinch region. The gas mixture includes a primary X-radiating gas, such as xenon, and a low atomic number diluent gas, such as helium. The pinch anode and the pinch cathode produce a current through the plasma shell in an axial direction and produce an azimuthal magnetic field in the pinch region in response to application of a high energy electrical pulse to the pinch anode and the pinch cathode. The azimuthal magnetic field causes the plasma shell to collapse to the central axis and to generate X-rays. The gas mixture provides enhanced radiation intensity and reduced cost for the primary X-radiating gas.