Patents Assigned to Precision, Inc.
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Patent number: 5886776Abstract: A laser beam receiver is provided wherein the position of a laser beam incident upon an array of a plurality of photosensitive cells is calculated by coupling the plurality of photosensitive cells to a plurality of signal amplifiers, wherein each subset of adjacent photosensitive cells is coupled to a distinct subset of amplifiers among the plurality of signal amplifiers and wherein each non-adjacent mutually-coupled cell subset is connected to a single one of the plurality of signal amplifiers; and calculating the position of the laser beam based upon amplified signals read at the plurality of signal amplifiers.Type: GrantFiled: February 10, 1997Date of Patent: March 23, 1999Assignee: Spectra Precision, Inc.Inventors: Jerald W. Yost, Evelyn K. Beachy, Timothy D. Kaiser
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Patent number: 5883386Abstract: A light-receiving apparatus comprises a light-receiving device positioned relative to an external component with increased accuracy. A sealing frame is mounted on a printed circuit board. One corner of this sealing frame is detectable by image processing. The position inside of the sealing frame at which the light-receiving device should be mounted is determined from the detected position of the corner of the sealing frame. A sealing material is injected inside the sealing frame and cured, thereby sealing the light-receiving device. Pins of the external components are inserted into holes or cutouts in the sealing frame and made stationary when the light-receiving device is mounted to the external component. The mounting of the light-receiving device inside the sealing frame is based on the sealing frame, and the mounting of the apparatus to the external part is based on the sealing frame. Therefore, the light-receiving device can be mounted relative to the external part with high accuracy.Type: GrantFiled: September 16, 1997Date of Patent: March 16, 1999Assignee: Seiko Precision Inc.Inventors: Hiroto Tsuyuki, Hironobu Amemiya, Tomoki Nakamura
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Patent number: 5873921Abstract: Processes for manufacturing glass optical elements by press molding a heated and softened glass material in preheated molds. In the process, the glass material is heated while it is floated by a gas blow and the heated and softened glass material is transferred to the preheated molds and then subjected to press molding. Alternatively, the process comprises: heating a glass material at a temperature at which the glass material has a viscosity of lower than 10.sup.9 poises, preheating molds at a temperature at which the glass material has a viscosity of from 10.sup.9 to 10.sup.12 poises, subjecting the heated and softened glass material to initial press in the preheated molds for 3 to 60 seconds, starting to cool the vicinity of molding surfaces of the molds at a rate of 20.degree. C.Type: GrantFiled: June 24, 1997Date of Patent: February 23, 1999Assignees: Hoya Precisions Inc., Hoya CorporationInventors: Shin-ichiro Hirota, Ken Uno, Hiroaki Takahara, Tadayuki Fujimoto, Hiroshi Enomoto
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Patent number: 5875363Abstract: A camera shutter is capable of switching between a spring-drive mode and a motor-drive mode through a single electromagnet without performing an exposure operation. A control circuit controls a stepping motor for rotating a driving ring and the electromagnet for controlling the opening and closing operations of the diaphragm. A control circuit operates in a mode in which a first switch is turned ON, and in another mode in which a second switch is turned ON. When the first and second switches are turned ON, a normal photographing operation can be performed. However, when the first switch is turned ON and then OFF while keeping the second switch OFF, a power supply stop signal is transmitted to the electromagnet so that a closing sector is released from its restrained condition allowing the shutter to return to its initial state.Type: GrantFiled: October 20, 1997Date of Patent: February 23, 1999Assignee: Seiko Precision Inc.Inventors: Seiichi Imano, Kazuo Akimoto
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Patent number: 5867522Abstract: An autofocusing system for a laser transmitter is provided. A laser beam is swept across a target having a plurality of sections. The target includes a first reflective section and a second reflective section with a non-reflective section positioned therebetween. A photodetector detects a signal representative of the laser beam reflected from the target. The laser beam is focused by adjusting the focusing lens until a ratio of the duration of the non-reflective portion of the signal to the sum of the durations of the reflective portions of the signal is maximized.Type: GrantFiled: April 11, 1997Date of Patent: February 2, 1999Assignee: Spectra Precision, Inc.Inventors: Francisco Roberto Green, Philip Lynn Detweiler, Frank Beard Douglas
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Patent number: 5866935Abstract: A method and apparatus to analyze the aerial image of an optical system using a subwavelength slit. A slit configuration yields a higher signal-to-noise ratio than that achievable with a round aperture. The slit also allows the polarization of the aerial image to be analyzed. In an alternative embodiment a tunneling slit is used. The tunneling slit comprises an optically transparent ridge-like structure mounted to a substrate, the combined structure covered by a thin, planar metal film.Type: GrantFiled: November 25, 1996Date of Patent: February 2, 1999Assignee: Nikon Precision, Inc.Inventor: Michael R. Sogard
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Patent number: 5862418Abstract: A distance measurement apparatus comprises a light emitting device for emitting light to an object, a light receiving device including a plurality of photocells for receiving light emitted by the light emitting device and reflected by the object, an adding circuit for adding outputs of an arbitrary number of photocells from among the plurality of photocells, and a control circuit for controlling the light emitting device, the light receiving device and the adding circuit. The control circuit comprises a determining circuit for determining a first group of photocells having a maximum addition result based on the addition performed by the adding circuit, and a calculating circuit for setting a second group of photocells comprised of the first group of photocells and a single or a series of photocells contiguous to the first group of photocells, dividing the second group of photocells into element subgroups, and calculating a distance to an object based on outputs of respective divided element groups.Type: GrantFiled: September 19, 1997Date of Patent: January 19, 1999Assignee: Seiko Precision Inc.Inventor: Akira Ito
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Patent number: 5862420Abstract: A control device for a camera shutter comprises a diaphragm value setting device for setting a predetermined diaphragm value of the shutter, an exposure value setting device for setting an exposure value of the shutter, a storing device for storing an opening size of the shutter, output timings of signals for controlling opening and closing operations of the shutter, and an exposure value of the shutter corresponding to the set diaphragm value, and a control apparatus for controlling the opening and closing operations of the shutter on the basis of output signals from the diaphragm value setting device, the exposure value setting device and the storing device. The control apparatus calculates the output timings of the signals for controlling the opening and closing operations of the shutter on the basis of the exposure value of the shutter outputted from the exposure value setting device, and controls the opening and closing operations of the shutter on the basis of the results of the calculation.Type: GrantFiled: September 24, 1997Date of Patent: January 19, 1999Assignee: Seiko Precision Inc.Inventors: Kazuo Akimoto, Seiichi Imano
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Patent number: 5855735Abstract: A process comprising removing surface layer materials from the wafer by inducing micro-fractures in the surface using a rotating pad and an abrasive slurry until all of the surface layer materials are removed; and chemically etching the surfaces of the wafer until all micro-fractures are removed therefrom. Edge materials are removed by abrasive tape. Wafer thickness reduction during recycling is less than 30 microns per cycle. One of the front and back surfaces of the wafer substrate is polished, any dots or grooves being on the non-polished side. The abrasive slurry contains more than 6 volume percent abrasive particles, and the abrasive slurry has a viscosity greater than about 2 cP at ambient temperature. The preferred pad comprises an organic polymer having a hardness greater than about 40 on the Shore D scale, optimally a polyurethane. The pressure of the pad against the wafer surface preferably does not exceed about 3 psi. Preferably, the chemical etching solution contains potassium hydroxide.Type: GrantFiled: October 3, 1995Date of Patent: January 5, 1999Assignee: Kobe Precision, Inc.Inventors: Satoru Takada, Hidetoshi Inoue, Yoshihiro Hara
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Patent number: 5852493Abstract: A self-aligning laser transmitter having a dual slope grade mechanism is provided. The laser transmitter includes a light source coupled to a frame which is suspended from a gimbal mechanism. The gimbal mechanism and the frame are coupled to a rotatable base. X and Y axes leveling devices are coupled to the gimbal mechanism and the frame to level the light source. A grade arm having two level sensors mounted at ninety degrees to one another is coupled to the frame. The grade arm is pivoted along the X or Y axes by a grade arm pivoting device. The X and Y axes leveling devices reposition the light source so that the level sensors are level thereby introducing a slope to the light source corresponding to the amount of pivot of the grade arm. The base may be rotated for a dual slope capability. The laser transmitter may be self-aligned automatically by aligning the laser transmitter with a target positioned at a reference location.Type: GrantFiled: March 13, 1997Date of Patent: December 22, 1998Assignee: Spectra Precision, Inc.Inventor: Douglas Bernard Monnin
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Patent number: 5848485Abstract: The present invention is an apparatus and method for accurately determining the position of a tool, for example an earthmoving bucket, mounted at the end of an arm which has a plurality of pivot points and is pivotally attached to the base of a machine, for example a piece of construction equipment like the platform of an excavator or other earthmoving machine. The present apparatus includes a plurality of reflectors mounted on the machine for indicating movement of the arm and the tool. Each reflector is operatively adapted for reflecting light back toward a light source. A light transceiver is mounted on the machine in a known relationship to the reflectors. The light transceiver is operatively adapted for transmitting a beam of light to illuminate each of the reflectors, thereby generating reflective light. The light transceiver detects the reflective light and the angular orientation of the reflective light it detects.Type: GrantFiled: December 27, 1996Date of Patent: December 15, 1998Assignee: Spectra Precision, Inc.Inventors: Robert Allen Anderson, Jan Bos, Ronald Peter Krom
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Patent number: 5844679Abstract: A system for adjusting the orientation of a plane defined by a rotating laser beam from a laser transmitter is provided. The laser beam is swept across one or more targets having a plurality of sections. The targets each include a first reflective section and a second reflective section with a non-reflective section positioned therebetween. The non-reflective section includes a portion which slopes across the reflective sections. A photodetector detects a signal representative of the laser beam reflected from each of the targets. The orientation of the laser beam is adjusted until the laser beam traverses the center of the target at which point the width of the first reflective section equals the width of the second reflective section. A processor calculates the distance or angle in which to adjust the laser transmitter so that the laser beam traverses the center of the target once the laser beam traverses the portion of the target including the sloped non-reflective section.Type: GrantFiled: April 11, 1997Date of Patent: December 1, 1998Assignee: Spectra Precision, Inc.Inventors: Philip Lynn Detweiler, Francisco Roberto Green, Frank Beard Douglas
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Patent number: 5838644Abstract: An electroluminescent display which is simple to manufacture and which is capable of high luminance consists of a transparent electrode disposed on a transparent substrate. On the transparent electrode are sequentially laminated layers including a fluorescent print pattern layer, a luminescent layer, an insulating layer and a rear electrode layer. The fluorescent layer is preferably formed of a fluorescent pigment and a fluoride resin binder and is provided at a portion of the electroluminescent display at which a display is to be created, such as the time indicating indicia on the dial of a timepiece. In a preferred embodiment, the electroluminescent display is provided as a timepiece dial and has a central hole therethrough for providing shafts for driving an hour hand, a minute hand and a second hand.Type: GrantFiled: October 27, 1995Date of Patent: November 17, 1998Assignee: Seiko Precision Inc.Inventors: Koji Yoneda, Koji Hirose, Shigehiko Aoki, Iwao Hirayama
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Patent number: 5838450Abstract: A mask alignment system for integrated circuit lithography achieves reticle to wafer referencing. A detection system located below the main projection lens detects the image of reticle alignment marks while also detecting wafer alignment marks. The reticle marks are imaged in light at the exposure wavelength. A first detection method images the fluorescence produced in the photoresist by the reticle mark images. A microscope located below the main projection lens produces the image and also images the wafer marks with broadband non-actinic illumination. The second method images the reticle marks in exposure light using a microscope which images and detects the exposure wavelength while maintaining the illumination and detection of the wafer marks. The third method collects directly both the exposure light and fluorescent light that is scattered and reflected from the wafer surface; the presence of wafer alignment marks changes this light collection.Type: GrantFiled: June 2, 1995Date of Patent: November 17, 1998Assignee: Nikon Precision Inc.Inventors: John H. McCoy, Martin E. Lee, Kyoichi Suwa
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Patent number: 5835227Abstract: A method and apparatus for determining performance characteristics in lithographic tools includes projecting a predetermined image with a projection system having a known predetermined performance characteristic to obtain data indicative of the relationship between the size of the projected image and the predetermined performance characteristic. The same image is then projected in a system having an unknown value for the predetermined performance characteristic. The predetermined performance characteristic for the system under consideration is then determined based on the data obtained when the image was projected in the system having the known predetermined performance characteristic.Type: GrantFiled: March 14, 1997Date of Patent: November 10, 1998Assignee: Nikon Precision Inc.Inventors: Ilya Grodnensky, Etsuya Morita, Kyoichi Suwa, Shigeru Hirukawa
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Patent number: 5831443Abstract: A probe card array check plate is provided with transition zones to prevent a semi-conductor probe from impacting an epoxy joint in the check plate during an over travel test. The transition zone is in the form of beveled edges or tapers between first and second testing surfaces. In alternate embodiments, two or more different types of testing surfaces are juxta positioned, or an optical measurement window is made sufficiently large to prevent an over traveling probe tip from entering an epoxied area.Type: GrantFiled: June 5, 1996Date of Patent: November 3, 1998Assignee: Applied Precision, Inc.Inventors: Steven C. Quarre, John P. Stewart
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Patent number: 5830515Abstract: A mold insert for an injection molding machine has a circumferential liquid conduit groove and a plurality of liquid-receiving bores extending inwardly from the groove. Baffles are removably inserted into the liquid-receiving bores and have heads located in locking engagement with the sidewalls, including the undercut portions thereof, to retain the baffles in their respective liquid-receiving bores. Each baffle has a blade that fits snugly within a liquid-receiving bore to separate the liquid-receiving bore into a liquid inlet passageway and a liquid outlet passageway. Fins project outwardly from opposite faces of the blade to create turbulence in liquid flowing into and out of the liquid-receiving bore, which enhances cooling (or heating) of the mold insert. The baffle is also useful with other solid components having a liquid conduit for cooling purposes and a transverse liquid-receiving bore intersecting the liquid conduit.Type: GrantFiled: September 18, 1996Date of Patent: November 3, 1998Assignee: Pleasant Precision, Inc.Inventors: Ronald E. Pleasant, H. Eugene Lafferty
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Patent number: 5828584Abstract: A device for determining the measurement zone of an object which permits the adjustable setting of a plurality of measurement zones bounded by user-defined division points comprises a distance measurement apparatus for measuring a distance to an object, a specific division point setting circuit, such as a digital switch, for adjustably setting a specific distance point within the effective measurement range of the distance measurement apparatus, a circuit for adjustably setting one or more predetermined division points on at least one of the near side and the far side of the specific distance point, such that the specific distance point and the at least one predetermined division point define a plurality of measurement zones within the effective measurement range of the distance measurement apparatus, and a judgment circuit for judging which of the plurality of measurement zones a distance measurement result of the distance measurement apparatus belongs to.Type: GrantFiled: December 18, 1995Date of Patent: October 27, 1998Assignee: Seiko Precision Inc.Inventors: Hajime Oda, Takuma Takahashi, Shinichi Endo
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Patent number: D402649Type: GrantFiled: October 9, 1997Date of Patent: December 15, 1998Assignee: Hon Hai Precision Inc. Co., Ltd.Inventor: Richard C. Y. Fu
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Patent number: D404019Type: GrantFiled: May 15, 1997Date of Patent: January 12, 1999Assignee: Microtome Precision, Inc.Inventors: Robert K. Lindsley, Joseph A. Durben, Charles D. Travis