Patents Assigned to Process Technologies, Inc.
  • Patent number: 7411352
    Abstract: A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle extending outwardly therefrom to emit the ion beam. The aperture or outlet of the nozzle has a second width, which second width is less than the first width. An ionizable gas is introduced to the discharge cavity. At least one electrode connected to the AC power supply, alternatively serving as an anode or a cathode, is capable of supporting at least one magnetron discharge region within the discharge cavity when serving as a cathode electrode. A plurality of magnets generally facing one another, are disposed adjacent each discharge cavity to create a magnetic field null region within the discharge cavity.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: August 12, 2008
    Assignee: Applied Process Technologies, Inc.
    Inventor: John E. Madocks
  • Publication number: 20080175671
    Abstract: A system and method for the in-situ removal or remediation of contaminants in a soil formation containing a subsurface groundwater aquifer, the method comprising the steps of: injecting a first oxidant into the aquifer at an injection point to create a volume of influence of the first oxidant in the aquifer thereby treating the contaminants contained within the volume of influence; and injecting a compressed gas into the aquifer to increase the size of the volume of influence of the first oxidant. The injection of the compressed gas into the aquifer can also force the groundwater in the aquifer away from the injection point into a surrounding area to transport the first oxidant into the surrounding area thereby extracting contaminants from soil adjacent to the surrounding area.
    Type: Application
    Filed: August 31, 2007
    Publication date: July 24, 2008
    Applicant: Applied Process Technology, Inc.
    Inventors: Reid H. Bowman, Tom Lahey, Peter Herlihy
  • Patent number: 7402290
    Abstract: Methods and apparatus are disclosed for mixing fluid streams of different compositions to minimize fluid condensation inside a mixing vessel where the objective is to produce an all-vapor mixture product.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: July 22, 2008
    Assignee: Stone & Webster Process Technology Inc.
    Inventors: Douglas S. Hubbell, Dino Pizzelli, Edward P. Hunt, Glenn D. Nasman
  • Patent number: 7392732
    Abstract: A scribing tool for use in semiconductor scribing apparatus includes a rotatable semiconductor wafer scribing wheel engageable with the semiconductor wafer to form a scribe line when the tool exerts pressure on the semiconductor wafer and the scribing wheel rotates. Bearings are engageable with the scribing wheel sides to resist sideways deflection during the scribing operation.
    Type: Grant
    Filed: January 24, 2005
    Date of Patent: July 1, 2008
    Assignee: Micro Processing Technology, Inc.
    Inventors: Paul C. Lindsey, Jr., Christopher K. Lindsey, Jeffery D. Atkinson
  • Patent number: 7363334
    Abstract: Digital signal-processing structure and methodology which feature a time-slice-based digital fabricating engine, and software operating structure operatively associated with that engine structured to operate the engine in a time-slice-based fabrication mode wherein the engine, in a time-differentiated and instantiating manner, functions to fabricate a time-succession of individual, composite wave digital filters. Each of these filters takes the form of (1) a concatenated assembly including one to a plurality of upstream, early-stage, decimate-by-two, signal-processing agencies connected in a cascade series arrangement, with each such agency possessing a first transfer function having a first transition bandwidth, and (2) a single, downstream, later-stage, decimate-by-two, signal-processing agency which possesses a second transfer function having a transition bandwidth which is less than the mentioned first transition bandwidth.
    Type: Grant
    Filed: August 28, 2003
    Date of Patent: April 22, 2008
    Assignee: Accoutic Processing Technology, Inc.
    Inventors: Thomas E. Curtis, Steven B. Sidman
  • Patent number: 7327089
    Abstract: A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending outwardly therefrom, where the nozzle is formed to include an aperture extending through the top portion and into the discharge cavity, wherein the aperture has a second width, where the second width is less than the first width. The plasma source further includes a power supply, a conduit disposed in the discharge cavity for introducing an ionizable gas therein, and at least one cathode electrode connected to the power supply, where that cathode electrode is capable of supporting at least one magnetron discharge region within the discharge cavity. The plasma source further includes a plurality of magnets disposed adjacent the wall portion, where that plurality of magnets create a null magnetic field point within the discharge cavity.
    Type: Grant
    Filed: September 19, 2003
    Date of Patent: February 5, 2008
    Assignee: Applied Process Technologies, Inc.
    Inventor: John E. Madocks
  • Patent number: 7294283
    Abstract: The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron Hall current in a region between two surfaces. When a substrate (10) is positioned proximal to at least one of the electrodes (11, 12) and is moved relative to the plasma, the substrate (10) is plasma treated, coated or otherwise modified depending upon the process gas used and the process pressure. This confinement arrangement produces dramatic results not resembling known prior art. Using this new source, many applications for PECVD, plasma etching, plasma treating, sputtering or other plasma processes will be substantial improved or made possible. In particular, applications using flexible webs (10) are benefited.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: November 13, 2007
    Assignee: Applied Process Technologies, Inc.
    Inventor: John Madocks
  • Publication number: 20070227971
    Abstract: A method for flocculating microorganisms is described. The method comprises the steps of contacting the microorganisms with a cationic flocculating agent, contacting the microorganisms with an anionic flocculating agent, and flocculating the microorganisms. A method for sedimenting microorganisms is also described. The method comprises the steps of contacting the microorganisms with a cationic flocculating agent, contacting the microorganisms with an anionic flocculating agent, flocculating the microorganisms, and sedimenting the microorganisms. Also described are the flocculated microorganisms produced by the described methods and an animal feed supplement and a feed composition containing these flocculated microorganisms. The flocculated microorganisms can be, for example, yeast, bacteria, fungi, mycoplasma, and combinations thereof.
    Type: Application
    Filed: May 16, 2005
    Publication date: October 4, 2007
    Applicant: Biomass Processing Technology, Inc.
    Inventor: Larry Denney
  • Publication number: 20070221552
    Abstract: A system for processing a biomaterial waste stream includes a waste fermentation system for converting the biomaterial waste stream to fermenting organism and a residual liquid. The waste fermentation system has a waste inlet port (LWI) receiving the biomaterial waste stream, a product outlet port (PO) for removing the fermenting organism and a liquid outlet (RLO) for removing the residual liquid. A number of sensors produce sensory information relating to operation of the waste fermentation system, and at least one control circuit monitors the sensory information and controls operation of the waste fermentation system by controlling one or more actuators associated with the waste fermentation system.
    Type: Application
    Filed: May 16, 2005
    Publication date: September 27, 2007
    Applicant: Biomass Processing Technology, Inc.
    Inventor: Larry Denney
  • Patent number: 7273543
    Abstract: A process and an apparatus for catalytic cracking a hydrocarbon feed to lighter hydrocarbon employing a catalyst cooler in flow communication with a catalyst stripper is disclosed.
    Type: Grant
    Filed: August 4, 2003
    Date of Patent: September 25, 2007
    Assignee: Stone & Webster Process Technology, Inc.
    Inventor: Warren Letzsch
  • Patent number: 7264419
    Abstract: A system and method for the in-situ removal or remediation of contaminants in a soil formation containing a subsurface groundwater aquifer, the method comprising the steps of: injecting a first oxidant into the aquifer at an injection point to create a volume of influence of the first oxidant in the aquifer thereby treating the contaminants contained within the volume of influence; and injecting a compressed gas into the aquifer to increase the size of the volume of influence of the first oxidant. The injection of the compressed gas into the aquifer can also force the groundwater in the aquifer away from the injection point into a surrounding area to transport the first oxidant into the surrounding area thereby extracting contaminants from soil adjacent to the surrounding area.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: September 4, 2007
    Assignee: Applied Process Technology, Inc.
    Inventors: Reid H. Bowman, Tom Lahey, Peter Herlihy
  • Patent number: 7264781
    Abstract: Particulate material to be calcined is conditioned and then introduced into a stream of flue gases which transport the material along a sloping drying duct while drying the material. The dried material is then introduced into the same stream of flue gases upstream of the drying duct, and the flue gases transport the dried material along a sloping preheating duct while preheating the material. The preheated material is fed tangentially into the lower end of a vertical calcine reactor and calcined product is withdrawn tangentially from the upper end of the reactor. The flue gases used for drying and preheating are produced in the calcine reactor and are cooled during the drying and preheating.
    Type: Grant
    Filed: October 22, 2004
    Date of Patent: September 4, 2007
    Assignee: Pneumatic Processing Technologies, Inc.
    Inventor: Michael A. Jones
  • Patent number: 7259378
    Abstract: A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.
    Type: Grant
    Filed: July 8, 2005
    Date of Patent: August 21, 2007
    Assignee: Applied Process Technologies, Inc.
    Inventor: John Madocks
  • Patent number: 7165331
    Abstract: A system for controlling scribing forces when scribing a semiconductor wafer includes supporting a scribe tool on an air bearing shaft. An encoder reads an encoder scale attached to the air bearing shaft and transport structure moves the tool support structure up or down to control the scribing force responsive to signals from the encoder.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: January 23, 2007
    Assignee: Micro Processing Technology, Inc.
    Inventors: Paul C. Lindsey, Jr., Bradley B. Engel
  • Patent number: 7048041
    Abstract: Systems and apparatuses for stabilizing the movement of the reactor furnace tubes of a fired heater, furnace, heat exchanger or other device utilizing reactor furnace tubes to thereby reduce harmful stresses on the tubes, extend the useful life of the tubes, increase the efficiency and safety of reaction processes and allow for the streamlining the design of the tubes.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: May 23, 2006
    Assignee: Stone & Webster Process Technology, Inc.
    Inventors: John R. Brewer, David J. Brown, J. Parks Craig, Chinh T. Dang, Martyn D. Roberts
  • Patent number: 7038389
    Abstract: A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid magnetic field. The solenoid magnetic field impedes radial electron flow in the nozzle and the process chamber. Process gas flows into the discharge cavity and through the nozzle to the process chamber. This gas is ionized in the nozzle and the process chamber by electrons trapped in the solenoid magnetic field. The result is a dense plasma plume in the process chamber useful for a number of applications. The source has particular advantages for reactive gas processes such as those requiring oxygen.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: May 2, 2006
    Assignee: Applied Process Technologies, Inc.
    Inventor: John Madocks
  • Patent number: 7025833
    Abstract: A chill drum (14) is modified to improve heat transfert between the drum and a flexible web substrate (20) disposed around the drum. The drum surface (22) contains a series of passages (44) and distribution holes (46). A working gas is injected into these passages and flows out of the distribution holes into the space between the web and drum. A cover (32) prevents working gas from escaping from frum passages in the area not covered by the web, and supplies the working gas to the passages at the drum cover. Once gas is in the passages, leakage only occurs from the edges of the web. The pressure in the passages remains essentially constant around the drum, producing uniform elevated pressures under the entire web. Elevated pressure behind the web significantly improves overall heat transfert, thereby allowing higher deposition rates and other process advantages.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: April 11, 2006
    Assignee: Applied Process Technologies, Inc.
    Inventor: John Madocks
  • Patent number: 7023128
    Abstract: A dipole ion source (FIG. 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: April 4, 2006
    Assignee: Applied Process Technologies, Inc.
    Inventor: John Madocks
  • Patent number: 7020569
    Abstract: The health of a tool is predicted based on temporally ordered input data representing parameters indicative of tool health. A sliding time window is used to partition input data into temporally displaced data sets. Non-linear regression models determine, based on the data sets, a set of predictive values relating to tool health at a future time. A tool-health metric is then determined based on one or more of the predictive values.
    Type: Grant
    Filed: March 15, 2004
    Date of Patent: March 28, 2006
    Assignee: Ibex Process Technology, Inc.
    Inventors: An Cao, Wai T. Chan, Jill P. Card
  • Patent number: RE40208
    Abstract: A self-contained calcination plant is enclosed in a feed-storage silo. The plant consists of a vertical reactor, a separation cyclone and a pair of heat exchangers connected by appropriate piping and immersed in the feed material stored in powdery form in the silo. A positive displacement blower creates an air stream that is preheated in one of the heat exchangers and fed in part to a gas burner and in part to a feed pipe at the bottom of the reactor. The feed material is kept in a fluidized state in the silo by air heated in the other heat exchanger and blown upward from the bottom of the storage compartment, from where the material is dropped into the feed pipe through rotary valves prior to injection into the reactor. The feed pipe is connected tangentially to the reactor so as to produce an upward swirling flow around the burner's flame.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: April 1, 2008
    Assignee: Pneumatic Processing Technologies, Inc.
    Inventor: Michael A. Jones